TWI716864B - 三維積體電路之形成方法 - Google Patents

三維積體電路之形成方法 Download PDF

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TWI716864B
TWI716864B TW108115449A TW108115449A TWI716864B TW I716864 B TWI716864 B TW I716864B TW 108115449 A TW108115449 A TW 108115449A TW 108115449 A TW108115449 A TW 108115449A TW I716864 B TWI716864 B TW I716864B
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Taiwan
Prior art keywords
substrate
layer
dielectric
split
die
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TW108115449A
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English (en)
Chinese (zh)
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TW201933585A (zh
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席爾多E 馮
麥克I 古倫
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美商矽基因股份有限公司
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Priority claimed from US15/829,442 external-priority patent/US10049915B2/en
Priority claimed from US15/899,622 external-priority patent/US20180175008A1/en
Priority claimed from US16/057,747 external-priority patent/US10573627B2/en
Application filed by 美商矽基因股份有限公司 filed Critical 美商矽基因股份有限公司
Publication of TW201933585A publication Critical patent/TW201933585A/zh
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