TWI699618B - 著色層的製造方法、彩色濾光片、遮光膜、固體攝影元件及圖像顯示裝置 - Google Patents

著色層的製造方法、彩色濾光片、遮光膜、固體攝影元件及圖像顯示裝置 Download PDF

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Publication number
TWI699618B
TWI699618B TW105125996A TW105125996A TWI699618B TW I699618 B TWI699618 B TW I699618B TW 105125996 A TW105125996 A TW 105125996A TW 105125996 A TW105125996 A TW 105125996A TW I699618 B TWI699618 B TW I699618B
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Taiwan
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group
pigment
acid
general formula
formula
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TW105125996A
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English (en)
Chinese (zh)
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TW201708955A (zh
Inventor
金子祐士
高桑英希
留場恒光
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日商富士軟片股份有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/1462—Coatings
    • H01L27/14621—Colour filter arrangements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Power Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW105125996A 2015-08-31 2016-08-16 著色層的製造方法、彩色濾光片、遮光膜、固體攝影元件及圖像顯示裝置 TWI699618B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-171586 2015-08-31
JP2015171586 2015-08-31

Publications (2)

Publication Number Publication Date
TW201708955A TW201708955A (zh) 2017-03-01
TWI699618B true TWI699618B (zh) 2020-07-21

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TW105125996A TWI699618B (zh) 2015-08-31 2016-08-16 著色層的製造方法、彩色濾光片、遮光膜、固體攝影元件及圖像顯示裝置

Country Status (4)

Country Link
JP (1) JP6476302B2 (ja)
KR (1) KR102079525B1 (ja)
TW (1) TWI699618B (ja)
WO (1) WO2017038339A1 (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7045001B2 (ja) * 2017-04-21 2022-03-31 日産化学株式会社 感光性樹脂組成物
JP7239895B2 (ja) * 2017-04-21 2023-03-15 日産化学株式会社 感光性樹脂組成物
JP7090628B2 (ja) * 2017-09-20 2022-06-24 富士フイルム株式会社 着色組成物、硬化膜、パターン形成方法、カラーフィルタ、固体撮像素子及び画像表示装置
KR102456394B1 (ko) * 2018-03-20 2022-10-19 동우 화인켐 주식회사 녹색 감광성 수지 조성물 및 이를 포함하는 컬러필터
JP7084985B2 (ja) 2018-04-19 2022-06-15 富士フイルム株式会社 パターンの製造方法、光学フィルタの製造方法、固体撮像素子の製造方法、画像表示装置の製造方法、光硬化性組成物および膜
JP7169362B2 (ja) * 2018-09-26 2022-11-10 富士フイルム株式会社 着色組成物、硬化膜の形成方法、カラーフィルタの製造方法および表示装置の製造方法
WO2020202329A1 (ja) * 2019-03-29 2020-10-08 日立化成株式会社 感光性樹脂組成物、硬化物、感光性エレメント、及び、レジストパターンの製造方法
KR102511654B1 (ko) * 2019-07-22 2023-03-17 미쯔비시 케미컬 주식회사 감광성 착색 수지 조성물, 경화물, 격벽 및 화상 표시 장치
CN114846405A (zh) * 2019-12-20 2022-08-02 三菱化学株式会社 感光性树脂组合物、间隔壁、有机场致发光元件、以及图像显示装置
JPWO2022107469A1 (ja) 2020-11-17 2022-05-27
CN115207003A (zh) * 2021-04-09 2022-10-18 和鑫光电股份有限公司 光感测装置的光感测单元
KR102352657B1 (ko) * 2021-07-19 2022-01-18 동우 화인켐 주식회사 반사방지 필름 및 이를 포함하는 유기발광 표시장치
WO2024053662A1 (ja) * 2022-09-07 2024-03-14 富士フイルム株式会社 光吸収フィルタ、光学フィルタ及びその製造方法、有機エレクトロルミネッセンス表示装置、無機エレクトロルミネッセンス表示装置及び液晶表示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060275676A1 (en) * 2005-06-03 2006-12-07 Fuji Photo Film Co., Ltd. Pigment-containing heat-curable composition, color filter, image-recording material, and method of producing color filter
TW201127812A (en) * 2009-09-14 2011-08-16 Fujifilm Corp Photopolymerizable composition, color filter and method of producing the same, solid-state image pick-up device, liquid crystal display, planographic printing plate, and novel compound
JP2013080003A (ja) * 2011-09-30 2013-05-02 Fujifilm Corp 平版印刷版原版及び平版印刷版の作製方法
WO2014132703A1 (ja) * 2013-02-28 2014-09-04 富士フイルム株式会社 パターン形成方法、感電子線又は感極紫外線性樹脂組成物、それを用いたレジスト膜、電子デバイスの製造方法、及び、電子デバイス
TW201516583A (zh) * 2013-10-23 2015-05-01 Fujifilm Corp 圖案形成方法、電子元件的製造方法以及電子元件

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63147163A (ja) * 1986-12-11 1988-06-20 Dainippon Ink & Chem Inc ネガ型フオトレジストの現像方法
JPH04194943A (ja) * 1990-11-27 1992-07-14 Sanyo Chem Ind Ltd 着色画像形成用材料および着色画像の形成法
JPH11352701A (ja) * 1998-06-09 1999-12-24 Nippon Zeon Co Ltd 感光性ポリイミド樹脂用リンス液及びパターン形成方法
JP2003131378A (ja) * 2001-10-22 2003-05-09 Fuji Photo Film Co Ltd 感光性樹脂組成物、転写材料、画像形成方法、カラーフィルター及びその製造方法、フォトマスク及びその製造方法
JP2003255119A (ja) * 2002-02-28 2003-09-10 Dainippon Ink & Chem Inc カラーフィルター
JP4581325B2 (ja) 2002-12-25 2010-11-17 日産自動車株式会社 燃料電池
JP4378163B2 (ja) * 2003-12-16 2009-12-02 東洋インキ製造株式会社 カラーフィルタ用青色着色組成物およびカラーフィルタ
JP2007254510A (ja) * 2006-03-20 2007-10-04 Fujifilm Corp 洗浄処理液
JP2009031713A (ja) * 2006-09-27 2009-02-12 Fujifilm Corp ジピロメテン系ホウ素錯体化合物及びその互換異性体、感光性着色硬化性組成物、カラーフィルタ、及びその製造方法
JP2008249868A (ja) * 2007-03-29 2008-10-16 Fujifilm Corp 感光性樹脂組成物、感光性転写材料、表示装置用遮光膜及びその製造方法、遮光膜付基板、液晶表示素子、並びに、液晶表示装置
JP5657442B2 (ja) 2011-03-22 2015-01-21 富士フイルム株式会社 着色感放射線性組成物、パターンの形成方法、カラーフィルタ及びそのカラーフィルタの製造方法、並びに、固体撮像素子
JP6054798B2 (ja) * 2013-03-29 2016-12-27 富士フイルム株式会社 カラーフィルタの製造方法、カラーフィルタ、及び、固体撮像素子

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060275676A1 (en) * 2005-06-03 2006-12-07 Fuji Photo Film Co., Ltd. Pigment-containing heat-curable composition, color filter, image-recording material, and method of producing color filter
TW201127812A (en) * 2009-09-14 2011-08-16 Fujifilm Corp Photopolymerizable composition, color filter and method of producing the same, solid-state image pick-up device, liquid crystal display, planographic printing plate, and novel compound
JP2013080003A (ja) * 2011-09-30 2013-05-02 Fujifilm Corp 平版印刷版原版及び平版印刷版の作製方法
WO2014132703A1 (ja) * 2013-02-28 2014-09-04 富士フイルム株式会社 パターン形成方法、感電子線又は感極紫外線性樹脂組成物、それを用いたレジスト膜、電子デバイスの製造方法、及び、電子デバイス
TW201516583A (zh) * 2013-10-23 2015-05-01 Fujifilm Corp 圖案形成方法、電子元件的製造方法以及電子元件

Also Published As

Publication number Publication date
KR20180034570A (ko) 2018-04-04
JP6476302B2 (ja) 2019-02-27
WO2017038339A1 (ja) 2017-03-09
JPWO2017038339A1 (ja) 2018-03-01
KR102079525B1 (ko) 2020-02-20
TW201708955A (zh) 2017-03-01

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