TWI699582B - Manufacturing device and manufacturing method of bonded device - Google Patents
Manufacturing device and manufacturing method of bonded device Download PDFInfo
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- TWI699582B TWI699582B TW105118973A TW105118973A TWI699582B TW I699582 B TWI699582 B TW I699582B TW 105118973 A TW105118973 A TW 105118973A TW 105118973 A TW105118973 A TW 105118973A TW I699582 B TWI699582 B TW I699582B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
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- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
- B32B37/1284—Application of adhesive
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/35—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being liquid crystals
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Abstract
本發明提供一種貼合器件的製造裝置及製造方法。去除殘留在下側工件的局部應力並以平滑狀態與上側工件貼合。上側保持構件具有上側工件被保持為無法移動的保持部。下側保持構件具有:浮升部,具備在與下側工件之間個別地產生反方向的分離壓力及接近壓力之機構;及接觸保持部,具備調整分離壓力及接近壓力之機構。控制部相對於下側保持構件使下側工件保持浮升部的分離壓力及接近壓力的平衡,下側工件以從下側卡盤面浮起之方式非接觸地被支撐。從浮升部切換為接觸保持部,使接近壓力相比分離壓力逐漸增大,下側工件被接觸保持在下側卡盤面。藉由升降驅動部使上側保持構件或下側保持構件中的任一個或者這兩個相對接近移動,藉由保持部被保持在上側卡盤面的上側工件與下側工件重疊。 The invention provides a manufacturing device and a manufacturing method of a bonded device. Remove the local stress remaining on the lower workpiece and fit the upper workpiece in a smooth state. The upper holding member has a holding portion in which the upper workpiece is held immovably. The lower holding member has: a floating part with a mechanism for separately generating separation pressure and approach pressure in the opposite direction from the lower workpiece; and a contact holding part with a mechanism for adjusting the separation pressure and approach pressure. The control part maintains the balance of the separation pressure and the approach pressure of the lifting part with respect to the lower holding member, and the lower workpiece is supported in a non-contact manner so as to float from the lower chuck surface. The floating part is switched to the contact holding part, the approach pressure is gradually increased compared to the separation pressure, and the lower workpiece is held in contact with the lower chuck surface. Either or both of the upper holding member and the lower holding member are moved relatively close by the lift drive unit, and the upper workpiece held on the upper chuck surface by the holding unit overlaps the lower workpiece.
Description
本發明係有關一種相對於例如液晶顯示器(LCD)、有機EL顯示器(OLED)、等離子顯示器(PDP)、可撓性顯示器等平板顯示器(FPD)或感測器器件、或例如如觸控面板式FPD或3D(3維)顯示器或電子書籍等液晶模塊(LCM)或可撓性印刷電路板(FPC)等板狀工件(基板),貼合觸控面板、蓋玻片、覆蓋膜或FPD等另一個板狀工件(基板)的貼合器件的製造裝置、及貼合器件的製造方法。 The present invention relates to a flat panel display (FPD) or sensor device such as a liquid crystal display (LCD), an organic EL display (OLED), a plasma display (PDP), a flexible display, or, for example, a touch panel type Liquid crystal modules (LCM) such as FPD or 3D (3-dimensional) displays or e-books or plate-like workpieces (substrates) such as flexible printed circuit boards (FPC), which are bonded to touch panels, cover glasses, cover films, or FPD, etc. Another bonding device manufacturing apparatus of a plate-shaped workpiece (substrate), and a bonding device manufacturing method.
以往,作為這種貼合器件的製造裝置及製造方法,有如下基板重疊裝置,即沿著設置於上側基板保持件及下側基板保持件的貫穿孔,將上側基板及下側基板的交接用升降銷個別地設為能夠上下移動,在大氣壓下搬入時,將由搬送機器人的臂進行保持並搬送之上側基板及下側基板以從上側基板保持件及下側基板保持件的表面突出之方式個別地利用上下移動的上側升降銷及下側升降銷接收。接著,上側升降銷及下側升降銷向反方向移動,將上側基板及下側基板個別地交接至上側基板保持件及下側基板保持件的表面(例如,參閱專利文獻1)。 Conventionally, as a manufacturing apparatus and manufacturing method of such a bonded device, there has been a substrate stacking device that is used to transfer the upper substrate and the lower substrate along the through holes provided in the upper substrate holder and the lower substrate holder The lift pins are individually set to move up and down, and when carried in under atmospheric pressure, they are held by the arm of the transfer robot and transport the upper and lower substrates so as to protrude from the surfaces of the upper substrate holder and the lower substrate holder. The ground is received by the upper lifting pin and the lower lifting pin that move up and down. Next, the upper lift pin and the lower lift pin are moved in opposite directions, and the upper substrate and the lower substrate are individually transferred to the surfaces of the upper substrate holder and the lower substrate holder (for example, see Patent Document 1).
尤其,下側基板中,上側為元件表面,因此利用搬送機器人的臂真空吸附下側的面並進行搬送,在不幹涉該臂的位置藉由上升的下側升降銷真空吸附下側基板,從搬送機器人的臂交接至下側升降銷。之後,從下側升降銷將下側基板交接至下側基板保持件,真空吸附機 構進行動作,將下側基板真空吸附至下側基板保持件。 In particular, in the lower substrate, the upper side is the surface of the component. Therefore, the lower surface is vacuum sucked and transported by the arm of the transfer robot, and the lower substrate is vacuum sucked by the raised lower lift pin at a position that does not interfere with the arm. The arm of the transfer robot is transferred to the lower lift pin. After that, transfer the lower substrate from the lower lift pin to the lower substrate holder, and the vacuum suction machine The structure operates to vacuum the lower substrate to the lower substrate holder.
此時,下側基板保持件上均等設有複數個(例如4個)升降銷用貫穿孔,下側升降銷藉由升降機構從貫穿孔上升而接收下側基板,下降而將下側基板交接至下側基板保持件,之後,下側升降銷進一步下降並在規定的待機位置停止。 At this time, the lower substrate holder is evenly provided with a plurality of (for example, 4) through holes for lift pins. The lower lift pins are raised from the through holes by the lift mechanism to receive the lower substrate, and descend to transfer the lower substrate. After reaching the lower substrate holder, the lower lift pin further descends and stops at the predetermined standby position.
進一步交接上側基板及下側基板之後,上側基板保持件與下側基板保持件接近移動,將兩者間的真空容器內設為真空狀態之後,重疊上側基板與下側基板,臨時固定兩者間的密封材,真空容器內成為大氣壓之後,藉由升降銷將貼合的上側基板及下側基板交接至搬送機器人的臂,並從真空容器中搬出。 After the upper substrate and the lower substrate are further transferred, the upper substrate holder and the lower substrate holder move closer, and the vacuum container between the two is set to a vacuum state, and the upper substrate and the lower substrate are overlapped to temporarily fix the space between the two After the sealing material in the vacuum container becomes atmospheric pressure, the upper and lower substrates that are bonded are transferred to the arm of the transfer robot by the lift pins, and are carried out from the vacuum container.
專利文獻1:日本專利公開2002-229471號公報 Patent Document 1: Japanese Patent Publication No. 2002-229471
然而,這種習知之貼合器件的製造裝置中,上側基板與下側基板的貼合中使用的下側基板保持件的表面開口且凹陷有複數個升降銷用貫穿孔和槽等,因此下側基板的一部分因其自重而下降,且局部性伸縮而彎曲成凹凸狀,在殘留有因該局部性伸縮導致的應力的狀態下與上側基板貼合。 However, in this conventional bonding device manufacturing apparatus, the surface of the lower substrate holder used for bonding the upper substrate and the lower substrate is open and has a plurality of through holes for lift pins, grooves, etc. A part of the side substrate is lowered due to its own weight, and locally expands and contracts to bend into a concavo-convex shape, and is bonded to the upper substrate in a state where stress due to the local expansion and contraction remains.
該貼合之前在下側基板產生之局部應力最終在進行貼合後成為基板的殘留應力,不僅影響貼合精度,還存在如下問題,即在上側基板及下側基板之間產生氣泡而降低品質,導致成品率下降。 The local stress generated on the lower substrate before the lamination will eventually become the residual stress of the substrate after the lamination, which not only affects the lamination accuracy, but also has the following problem that bubbles are generated between the upper substrate and the lower substrate to reduce quality. Lead to a decline in yield.
而且,存在如下問題,即基於搬送機器人的臂的下側基板的保持部位為局部性線狀而非下側基板的整個面,並且基於下側升降銷的真空吸附的下側基板的保持部位為局部性點狀而非下側基板的整個面,因此,在這種保持狀態下,下側基板因其自重而局部性伸縮並彎 曲成凹凸狀。亦即,將下側基板從搬送機器人的臂交接至下側升降銷的情況亦成為個別地保持時發生的因局部性伸縮導致的應力殘留在下側基板的主要原因,使貼合精度進一步下降而成品率下降的問題。 Furthermore, there is a problem that the holding part of the lower substrate based on the arm of the transfer robot is a local linear shape instead of the entire surface of the lower substrate, and the holding part of the lower substrate based on the vacuum suction of the lower lift pin is Localized dots rather than the entire surface of the lower substrate. Therefore, in this holding state, the lower substrate locally stretches and bends due to its own weight Curved into a bumpy shape. In other words, the transfer of the lower substrate from the arm of the transfer robot to the lower lift pin also becomes the main cause of the stress caused by the local expansion and contraction remaining on the lower substrate when held individually, which further reduces the bonding accuracy. The problem of reduced yield.
並且,還存在如下問題,即在下側基板上搬送機器人的臂或下側升降銷所接觸的部位附著有雜質等異物,與其他部位之間產生不均,無法高精度貼合。 In addition, there is also a problem in that foreign matter such as foreign matter adheres to the area where the arm of the transport robot or the lower lift pin touches on the lower substrate, causing unevenness with other areas, and high-precision bonding cannot be performed.
尤其,近年來的LCD等中,基板傾向於大型化、薄型化,一般G8(2200×2500mm)尺寸的液晶用玻璃基板的厚度成為0.2mm,G11(3000×3320mm)尺寸液晶用玻璃基板的厚度成為0.5mm,非常容易彎曲變形。並且,對於4k×2k板或高精細板及多視角的3D技術等板,要求高精細的板,對於整個板面要求TFT基板與濾色片基板的對位誤差為2μm程度以下的精度。 In particular, in recent LCDs, etc., substrates tend to be larger and thinner. Generally, the thickness of the G8 (2200×2500mm) size liquid crystal glass substrate is 0.2mm, and the G11 (3000×3320mm) size liquid crystal glass substrate thickness It becomes 0.5mm, which is very easy to bend and deform. In addition, 4k×2k boards, high-definition boards, and multi-view 3D technology boards require high-definition boards. For the entire board surface, the alignment error between the TFT substrate and the color filter substrate is required to be less than 2 μm.
另一方面,進行貼合裝置的對位的基準標志位置與確認其標志位置的相機並不是在基板的整個面進行,一般即使為G8尺寸的液晶用玻璃基板,亦在其端部位置進行4處至8處左右的對準。 On the other hand, the position of the fiducial mark for the alignment of the laminating device and the camera for confirming the mark position are not performed on the entire surface of the substrate. Generally, even for the G8 size liquid crystal glass substrate, it is performed at the end position. Alignment from place to 8 places.
因此,若玻璃基板的中心位置殘留有局部應力,則利用相機進行標志對位的端部位置上,雖然位置偏離非常少,但是在玻璃基板的中心位置上,與端部位置相比在基板彼此相對的位置偏離變大,將G8尺寸的液晶用玻璃基板的對位誤差控制在亞微米的精度非常困難。 Therefore, if there is a local stress in the center of the glass substrate, there will be very little positional deviation at the end position where the camera is used for mark alignment. However, at the center of the glass substrate, compared with the end position, it is between the substrates. The relative positional deviation becomes large, and it is very difficult to control the alignment error of the G8 size liquid crystal glass substrate to sub-micron accuracy.
為了實現這種課題,本發明之貼合器件的製造裝置為如下,在貼合空間中將上側工件保持在上側保持構件且將下側工件保持在下側保持構件,藉由前述上側保持構件與前述下側保持構件相對接近移動,貼合前述上側工件與前述下側工件,前述貼合器件的製造裝置的 特徵為,具備:前述上側保持構件,配置於前述貼合空間且具有裝卸自如地保持前述上側工件的上側卡盤面;前述下側保持構件,配置於前述貼合空間且具有裝卸自如地保持前述下側工件的平滑的下側卡盤面;升降驅動部,使前述上側保持構件或前述下側保持構件中的任一個或者這兩個相對接近移動來重疊前述上側工件及前述下側工件;及控制部,對前述上側卡盤面、前述下側卡盤面及前述升降驅動部個別地進行作動控制,前述上側保持構件具有前述上側工件被保持為無法移動的保持部,前述下側保持構件具有:浮升部,具備在與前述下側工件之間個別地產生反方向的分離壓力及接近壓力之機構;及接觸保持部,具備調整前述分離壓力及前述接近壓力之機構,前述控制部如下進行控制,相對於前述下側保持構件使前述下側工件保持前述浮升部的前述分離壓力及前述接近壓力的平衡,前述下側工件以從前述下側卡盤面浮起之方式非接觸地被支撐,從前述浮升部切換為前述接觸保持部,使前述接近壓力相比前述分離壓力逐漸增大而前述下側工件被接觸保持在前述下側卡盤面,藉由前述升降驅動部使前述上側保持構件或前述下側保持構件中的任一個或者這兩個相對接近移動,藉由前述保持部被保持在前述上側卡盤面的前述上側工件與前述下側工件重疊。 In order to achieve such a problem, the manufacturing apparatus of the bonding device of the present invention is as follows. In the bonding space, the upper workpiece is held by the upper holding member and the lower workpiece is held by the lower holding member. The upper holding member and the aforementioned The lower holding member moves relatively close to each other, bonding the upper workpiece and the lower workpiece, and the manufacturing device of the bonding device It is characterized by comprising: the upper holding member arranged in the bonding space and having an upper chuck surface for detachably holding the upper workpiece; and the lower holding member arranged in the bonding space and having detachably holding the lower The smooth lower chuck surface of the side workpiece; a lift drive unit that moves either or both of the upper holding member or the lower holding member relatively close to overlap the upper workpiece and the lower workpiece; and a control unit , The upper chuck surface, the lower chuck surface, and the lifting drive unit are individually actuated and controlled, the upper holding member has a holding portion in which the upper workpiece is held immovably, and the lower holding member has: a lifting portion , Equipped with a mechanism for separately generating separation pressure and approach pressure in the opposite direction between the lower workpiece; and a contact holding section equipped with a mechanism for adjusting the separation pressure and the approach pressure, the control section controls as follows, relative to The lower holding member allows the lower workpiece to maintain the balance of the separation pressure and the approach pressure of the floating portion, and the lower workpiece is supported in a non-contact manner so as to float from the lower chuck surface to float from the The lifting part is switched to the contact holding part, so that the approach pressure is gradually increased compared to the separation pressure and the lower workpiece is contacted and held on the lower chuck surface. The lifting driving part causes the upper holding member or the lower Either one or both of the side holding members move relatively close to each other, and the upper workpiece held on the upper chuck surface by the holding portion overlaps the lower workpiece.
並且本發明之貼合器件的製造方法為如下方法,在貼合空間中將上側工件保持在上側保持構件且將下側工件保持在下側保持構件,藉由前述上側保持構件與前述下側保持構件相對接近移動,貼合前述上側工件與前述下側工件,前述貼合器件的製造方法的特徵為,包括:保持步驟,將前述上側工件保持在前述上側保持構件的上側卡盤面,將前述下側工件保持在前述下側保持構件的平滑的下側卡盤面;及接合步驟,藉由使前述上側保持構件或前述下側保持構件中的任一個或這兩個相對接近移動來重疊前述上側工件及前述下側工件,前述 保持步驟中,相對於前述下側保持構件使前述下側工件保持藉由浮升部在與前述下側工件之間個別地向反方向產生之分離壓力及接近壓力的平衡,以從前述下側卡盤面浮起之方式非接觸地支撐前述下側工件,接著,藉由接觸保持部使前述接近壓力相比前述分離壓力逐漸增大,使前述下側工件與前述下側卡盤面接觸並保持為無法移動,前述接合步驟中,重疊前述上側工件與前述下側工件。 And the manufacturing method of the bonding device of the present invention is a method in which the upper workpiece is held by the upper holding member and the lower workpiece is held by the lower holding member in the bonding space, by the upper holding member and the lower holding member The upper workpiece and the lower workpiece are bonded relatively close to each other. The method of manufacturing the bonding device is characterized by including a holding step of holding the upper workpiece on the upper chuck surface of the upper holding member, and holding the lower side The workpiece is held on the smooth lower chuck surface of the lower holding member; and in the joining step, by moving either or both of the upper holding member or the lower holding member relatively close to each other to overlap the upper workpiece and The aforementioned lower workpiece, the aforementioned In the holding step, the lower workpiece is held relative to the lower holding member by a balance between the separation pressure and the approach pressure generated in the opposite direction from the lower workpiece by the floating portion, so as to move from the lower side The chuck surface is lifted to support the lower workpiece in a non-contact manner. Then, the approach pressure is gradually increased compared to the separation pressure by the contact holding portion, so that the lower workpiece is in contact with the lower chuck surface and held as Unable to move, in the aforementioned joining step, the aforementioned upper workpiece and the aforementioned lower workpiece are overlapped.
A:貼合器件的製造裝置 A: Manufacturing equipment for bonded devices
1:上側保持構件 1: Upper holding member
11:上側卡盤面 11: Upper chuck surface
11a:保持部 11a: Holding part
12:交接機構 12: Handover Organization
12a:交接用驅動部 12a: Drive unit for handover
12b:升降銷 12b: Lift pin
12c:連結構件 12c: connecting member
2:下側保持構件 2: Lower holding member
21:下側卡盤面 21: Lower chuck surface
21a:接觸保持部 21a: Contact holding part
22:浮升部 22: Floating part
22a:空氣膜 22a: Air film
22b:多孔層 22b: Porous layer
23:定位導件 23: positioning guide
23a:導軌 23a: rail
3:升降驅動部 3: Lifting drive
4:搬入構件 4: move in components
41:搬入面 41: move in noodles
41a:搬入用浮升部 41a: Lifting part for moving in
41b:空氣膜 41b: Air film
42:搬入用驅動部 42: Drive unit for moving in
43:浮起搬送部 43: Floating transport department
44:搬送導件 44: transport guide
5:搬出構件 5: Move out the components
51:搬出面 51: move out
52:搬出用驅動部 52: Drive unit for moving out
6:腔室 6: Chamber
6a:減壓用驅動部 6a: Decompression drive unit
61:出入口 61: entrance and exit
61a:搬入通路 61a: Move into the channel
62:開閉用驅動部 62: Driving part for opening and closing
63:蓋壁 63: cover wall
64:底壁 64: bottom wall
7:控制部 7: Control Department
S1:貼合空間 S1: Fitting space
S2:外部空間 S2: External space
W1:上側工件 W1: Upper workpiece
W2:下側工件 W2: Lower workpiece
W:貼合器件 W: bonded device
圖1係表示本發明的實施形態之貼合器件的製造裝置的整體結構的說明圖,圖1(a)係上側工件搬入時的縱剖面前視圖,圖1(b)係上側工件交接時的縱剖面前視圖。 Fig. 1 is an explanatory diagram showing the overall structure of a manufacturing apparatus for a bonded device according to an embodiment of the present invention. Fig. 1(a) is a longitudinal sectional front view when the upper workpiece is loaded in, and Fig. 1(b) is a view when the upper workpiece is transferred Front view in longitudinal section.
圖2係表示本發明的實施形態之貼合器件的製造裝置的整體結構的說明圖,圖2(a)係下側工件搬入時的縱剖面前視圖,圖2(b)係重疊時的縱剖面前視圖。 Fig. 2 is an explanatory diagram showing the overall structure of the manufacturing apparatus of the bonded device according to the embodiment of the present invention. Fig. 2(a) is a longitudinal sectional front view when the lower workpiece is loaded in, and Fig. 2(b) is a longitudinal view when the lower workpiece is loaded. Sectional front view.
圖3係表示本發明的實施形態之貼合器件的製造裝置的整體結構的說明圖,圖3(a)係貼合後的縱剖面前視圖,圖3(b)係貼合器件搬出時的縱剖面前視圖。 Fig. 3 is an explanatory view showing the overall structure of the manufacturing apparatus of the bonded device according to the embodiment of the present invention, Fig. 3(a) is a longitudinal sectional front view after bonding, and Fig. 3(b) is when the bonded device is carried out Front view in longitudinal section.
圖4係表示本發明的實施形態之貼合器件的製造裝置的整體結構的說明圖,圖4(a)係圖2(a)的橫剖面俯視圖,圖4(b)係圖3(b)的橫剖面俯視圖。 Fig. 4 is an explanatory view showing the overall structure of the manufacturing apparatus of the bonded device according to the embodiment of the present invention, Fig. 4(a) is a cross-sectional plan view of Fig. 2(a), and Fig. 4(b) is Fig. 3(b) Cross-sectional top view.
圖5係表示本發明的實施形態之貼合器件的製造裝置的變形例的說明圖,圖5(a)係上側工件搬入時的縱剖面前視圖,圖5(b)係上側工件交接時的縱剖面前視圖。 Fig. 5 is an explanatory diagram showing a modification of the manufacturing apparatus of the bonded device according to the embodiment of the present invention. Fig. 5(a) is a longitudinal sectional front view when the upper workpiece is loaded in, and Fig. 5(b) is a view when the upper workpiece is transferred Front view in longitudinal section.
圖6係表示本發明的實施形態之貼合器件的製造裝置的變形例的說明圖,圖6(a)係下側工件搬入時的縱剖面前視圖,圖6(b)係重疊時的縱剖面前視圖。 Fig. 6 is an explanatory diagram showing a modification of the manufacturing apparatus of the bonded device according to the embodiment of the present invention. Fig. 6(a) is a longitudinal sectional front view when the lower workpiece is loaded in, and Fig. 6(b) is a longitudinal view when the lower workpiece is loaded. Sectional front view.
圖7係表示本發明的實施形態之貼合器件的製造裝置的變形例的說明圖,圖7(a)係貼合後的縱剖面前視圖,圖7(b)係貼合器件搬出時的縱剖面前視圖。 Fig. 7 is an explanatory diagram showing a modification of the manufacturing apparatus of the bonded device according to the embodiment of the present invention, Fig. 7(a) is a longitudinal sectional front view after bonding, and Fig. 7(b) is a view when the bonded device is carried out Front view in longitudinal section.
以下,依據附圖對本發明的實施形態進行詳細說明。 Hereinafter, embodiments of the present invention will be described in detail based on the drawings.
如圖1~圖7所示,本發明的實施形態之貼合器件W的製造裝置A及製造方法中,上側保持構件1與下側保持構件2對向配置在貼合空間S1,將上側工件W1保持在上側保持構件1,將下側工件W2保持在下側保持構件2。之後,藉由使上側保持構件1或下側保持構件2中的任一個或這兩個相對移動,在大氣氣氛或減壓氣氛下,上側工件W1與下側工件W2重疊,以規定的間隙貼合(接合)。
As shown in FIGS. 1 to 7, in the manufacturing apparatus A and manufacturing method of the bonded device W according to the embodiment of the present invention, the upper holding
而且,該工件的貼合中,在上側工件W1與下側工件W2相對對位結束之後,進行上側工件W1與下側工件W2的貼合為較佳。該工件的貼合中,在能夠調整減壓的貼合空間S1以真空氛圍貼合上側工件W1與下側工件W2為較佳。 Furthermore, in the bonding of the work, it is preferable to perform bonding of the upper work W1 and the lower work W2 after the relative alignment of the upper work W1 and the lower work W2 is completed. In the bonding of the work, it is preferable to bond the upper work W1 and the lower work W2 in a vacuum atmosphere in the bonding space S1 where the pressure can be adjusted.
尤其,在貼合空間S1的工件的貼合中,將上側工件W1與下側工件W2向貼合空間S1搬入,並個別地交接至上側保持構件1與下側保持構件2來進行保持為較佳。並且,在貼合空間S1中貼合結束的貼合器件W從貼合空間S1被搬出,之後,藉由重複前述作動,連續製作複數個貼合器件W為較佳。
In particular, in the bonding of the work in the bonding space S1, the upper work W1 and the lower work W2 are carried in to the bonding space S1, and they are individually transferred to the upper holding
此時,本發明的實施形態之貼合器件W的製造裝置A成為用於製作貼合器件W的真空工件貼合裝置。 At this time, the manufacturing apparatus A of the bonding device W of the embodiment of the present invention becomes a vacuum work bonding apparatus for manufacturing the bonding device W.
若詳細說明,本發明的實施形態之貼合器件W的製造裝置A作為主要構成要件具備:上側保持構件1,配置於貼合空間S1並保持上側工件W1;下側保持構件2,配置於貼合空間S1並保持下側工件W2;升降驅動部3,使上側保持構件1或下側保持構件2中的任一個或這兩
個以相對接近或分離之方式移動而重疊上側工件W1及下側工件W2。
In detail, the manufacturing apparatus A of the bonding device W according to the embodiment of the present invention includes as main components: an
除此之外,具備:搬入構件4,向貼合空間S1至少搬入下側工件W2;搬出構件5,將貼合結束的貼合器件W從貼合空間S1向外部空間S2搬出;腔室6,形成有貼合空間S1;及控制部7,對上側保持構件1、下側保持構件2、升降驅動部3、搬入構件4及搬出構件5等個別地進行作動控制為較佳。
In addition, it is equipped with: the
另外,如圖1~圖7所示,上側工件W1及下側工件W2通常配置成在上下方向上對向,將上側工件W1與下側工件W2重疊的方向即工件貼合方向稱為“Z方向”。將沿著與Z方向交叉的上側工件W1及下側工件W2的貼合面的方向稱為“XY方向”。 In addition, as shown in Figures 1 to 7, the upper workpiece W1 and the lower workpiece W2 are usually arranged to face each other in the vertical direction. The direction in which the upper workpiece W1 and the lower workpiece W2 overlap, that is, the workpiece bonding direction is called "Z direction". The direction along the bonding surfaces of the upper workpiece W1 and the lower workpiece W2 intersecting the Z direction is referred to as "XY direction".
貼合器件W為例如FPD或感測器器件等複數個構成組件組裝成一體的薄板狀的結構體。 The bonding device W is, for example, a thin plate-shaped structure in which a plurality of constituent components such as an FPD or a sensor device are assembled together.
作為貼合器件W的具體例如圖1~圖7所示的例的情況下,上側工件W1為由LCM或FPC等構成的矩形薄板。下側工件W2為由比上側工件W1薄的觸控面板或蓋玻片或覆蓋膜等構成的矩形薄板,藉由以覆蓋上側工件W1之方式黏結,構成FPD或感測器器件等。 As a specific example of the bonding device W, in the case of the examples shown in FIGS. 1 to 7, the upper workpiece W1 is a rectangular thin plate made of LCM, FPC, or the like. The lower workpiece W2 is a rectangular thin plate composed of a touch panel, a cover glass, or a cover film thinner than the upper workpiece W1, and is bonded to cover the upper workpiece W1 to form an FPD or a sensor device.
藉由點膠機等定量吐出噴嘴將密封材(未圖示)塗佈至上側工件W1及下側工件W2上由膜面等構成的貼合面中的任一個或這兩個為較佳。作為該密封材,使用藉由吸收紫外線等的光能量進行重合而固化並顯現黏結性的UV固化性光學透明樹脂(OCR)等的光固化型黏結劑為較佳。 It is preferable to apply a sealing material (not shown) to either or both of the bonding surfaces composed of the film surface and the like on the upper workpiece W1 and the lower workpiece W2 by a quantitative discharge nozzle such as a dispenser. As the sealing material, it is preferable to use a photocurable adhesive such as a UV curable optically transparent resin (OCR) that is cured by absorbing light energy such as ultraviolet rays and superimposed to express adhesiveness.
被前述密封材包圍的空間填充有液晶等的封入材料(未圖示)。 The space surrounded by the sealing material is filled with a sealing material (not shown) such as liquid crystal.
並且,作為其他例雖未圖示,但亦可以進行如下變更,即貼合比下側工件W2薄的上側工件W1,或使用藉由熱能量的吸収進行重合而固化的熱固化型黏結劑或二液混合固化型黏結劑等作為前述密封材從而代替光固化型黏結劑,或不包含前述密封材或前述封入材料而直 接貼合工件彼此。 In addition, although not shown in the figure as another example, it can be modified as follows, that is, bonding the upper workpiece W1 thinner than the lower workpiece W2, or using a thermosetting adhesive that is superimposed and cured by the absorption of thermal energy, or Two-component mixed-curing adhesive, etc., as the aforementioned sealing material to replace the light-curing adhesive, or without including the aforementioned sealing material or the aforementioned sealing material. Fit the work pieces together.
上側保持構件1與下側保持構件2例如由形成為不會因金屬或陶瓷等的鋼體而應力(彎曲)變形的厚度的平板狀的平面板等構成,且具有在Z方向上對向的這些上側卡盤面11與平滑的下側卡盤面21。
The
上側保持構件1及下側保持構件2設置成上側卡盤面11與下側卡盤面21在貼合空間S1彼此平行。
The
上側保持構件1的上側卡盤面11具有保持部11a,在前述保持部11a藉由後述的搬入構件4搬入之上側工件W1被保持為裝卸自如且無法移動。
The
作為上側卡盤面11的保持部11a,使用基於負壓吸引的吸附力或基於黏附材的黏附力或靜電吸附力或這些的組合等。構成為藉由將這些配置成遍及大致整個上側卡盤面11的面狀或在整個上側卡盤面11個別地分散配置複數個,即使貼合空間S1被減壓至真空,亦可不使上側工件W1掉落而繼續保持。
As the holding
而且,上側保持構件1除了上側卡盤面11之外,還具有用於保持藉由後述搬入構件4搬入之上側工件W1並從後述的下側卡盤面21交接至上側卡盤面11的交接機構12為較佳。交接機構12由升降銷或其他結構體構成,且具有用於與由後述的搬入構件4搬入之上側工件W1接近並進行保持而交接至上側卡盤面11的交接用驅動部12a。
In addition to the
作為交接機構12的具體例,如圖1~圖3所示的例子的情況下,使用向Z方向移動自如的升降銷12b,如圖1(b)所示,在下降的升降銷12b的前端面裝卸自如地吸附保持上側工件W1的非貼合面(上面)。之後,如圖2(a)所示,藉由交接用驅動部12a的作動使升降銷12b上升,並使上側工件W1的非貼合面與上側卡盤面11接觸。與此同時,切換為基於保持部11a的工件保持,能夠進行上側工件W1的交接。
As a specific example of the
圖示例的情況下,升降銷12b沿XY方向按每規定間隔配置複數
個,利用連結構件12c使這些末端一體化,所有的升降銷12b構成為藉由交接用驅動部12a經由連結構件12c向Z方向往複移動自如。
In the case of the example in the figure, the lift pins 12b are arranged in plural at predetermined intervals along the XY direction
However, these ends are integrated by the connecting
並且,作為其他例,亦可以將交接機構12變更為其他結構體,從而代替升降銷12b。
In addition, as another example, the
下側保持構件2的平滑的下側卡盤面21具有:浮升部22,由後述的搬入構件4搬入之下側工件W2以從下側卡盤面21浮起之方式非接觸地支撐為能夠移動;及接觸保持部21a,與下側卡盤面21接觸並保持為裝卸自如且無法移動。
The smooth
下側卡盤面21的浮升部22使用氣體的噴出力或超聲波力等。浮升部22構成為,在下側卡盤面21與下側工件W2的非貼合面之間的對向空間,個別地同時產生從下側卡盤面21側向下側工件W2側的分離壓力及與其相反地從下側工件W2側向下側卡盤面21側的接近壓力。亦即,浮升部22具備產生分離壓力及接近壓力之機構,藉由保持前述分離壓力及前述接近壓力的平衡,在下側卡盤面21與下側工件W2之間向Z方向形成空氣膜22a,維持下側工件W2從下側卡盤面21浮起的非接觸狀態。
The floating
作為浮升部22的具體例,如圖1~圖7所示的例子的情況下,由多孔材料構成的板狀的多孔層22b層疊形成於下側卡盤面21的表面。藉由從整個多孔層22b向下側工件W2噴出氣體而產生前述分離壓力的同時,藉由從開設於多孔層22b的微小的複數個吸氣孔(未圖示)進行負壓吸引而產生前述接近壓力。
As a specific example of the floating
接觸保持部21a使用基於負壓吸引的吸附力或靜電吸附力或這些的組合等。接觸保持部21a具備調整基於浮升部22的前述分離壓力及前述接近壓力的平衡之機構。若詳細說明,接觸保持部21a藉由後述的控制部7調整基於浮升部22的前述分離壓力及前述接近壓力的平衡,以與前述分離壓力相比前述接近壓力逐漸增大之方式進行作動控
制。由此,空氣膜22a的厚度逐漸變薄,下側工件W2的非貼合面順利地到達下側卡盤面21的表面,藉由前述接近壓力接觸保持下側工件W2而使其無法移動。
The
作為接觸保持部21a的具體例,如圖1~圖7所示的例子的情況下,逐漸減少從整個多孔層22b向下側工件W2噴出的氣體的流量而抑制前述分離壓力的同時,維持或增大從開設於多孔層22b的微小的複數個前述吸氣孔進行的負壓吸引。
As a specific example of the
並且,作為其他例雖未圖示,但亦可以進行如下變更,即在下側卡盤面21的表面一體層疊板狀的超聲探頭來代替多孔層22b,藉由通電對超聲探頭的表面的空氣進行基於超聲波的週期性壓縮與壓縮解除,由此產生前述分離壓力的同時,藉由從開設於超聲探頭的微小的複數個吸氣孔進行負壓吸引而產生前述接近壓力。
In addition, although not shown in the figure as another example, it may be modified as follows. A plate-shaped ultrasonic probe is integrally laminated on the surface of the
而且,上側保持構件1或下側保持構件2中的任一個或上側保持構件1及下側保持構件2這兩個向Z方向移動自如地被支撐,藉由升降驅動部3使上側保持構件1與下側保持構件2以相對接近或分離之方式移動。
Furthermore, any one of the upper holding
升降驅動部3由致動器等構成。升降驅動部3藉由後述的控制部7如下進行作動控制,亦即,使上側保持構件1或下側保持構件2中的任一個或這兩個向Z方向相對接近移動,以使上側工件W1與下側工件W2經由塗佈於這些貼合面中的一個或這兩個的前述密封材彼此重疊。
The
作為升降驅動部3的具體例,如圖1~圖7前述的例子的情況下,使上側保持構件1向下側保持構件2下降。
As a specific example of the raising/lowering
並且,作為其他例雖未圖示,但亦可以進行如下變更,亦即,使下側保持構件2上升來代替上側保持構件1,或使上側保持構件1及下側保持構件2這兩個彼此接近移動,或使上側保持構件1旋轉移動並
反轉而朝向Z方向與下側保持構件2對向,之後使上側保持構件1或下側保持構件2中的任一個或這兩個向Z方向相對接近移動。
In addition, although not shown in the figure as another example, it may be modified as follows. That is, the
搬入構件4為從外部空間S2向貼合空間S1搬入上側工件W1與下側工件W2的工件搬入用搬送機構。
The carry-in
作為搬入構件4,有以從其平滑的搬入面41浮起之方式非接觸地搬送上側工件W1和下側工件W2的浮起搬送方式、利用搬送機器人(未圖示)搬送上側工件W1和下側工件W2的機器人搬送方式、利用輸送機(未圖示)搬送上側工件W1和下側工件W2輸送帶搬送方式等。這些浮起搬送方式或機器人搬送方式或輸送帶搬送方式等中具有從外部空間S2向貼合空間S1使搬入面41或前述搬送機器人或前述輸送機等以接近或分離之方式移動的搬入用驅動部42。
As the carry-in
尤其,搬入構件4為浮起搬送方式時,具有平滑的搬入面41及以上側工件W1和下側工件W2從搬入面41浮起的狀態非接觸地搬送之浮起搬送部43為較佳。
In particular, when the carry-in
搬入構件4的搬入用驅動部42由致動器等構成。搬入用驅動部42藉由後述的控制部7如下進行作動控制,即搬入上側工件W1和下側工件W2時,使搬入面41或前述搬送機器人或前述輸送機等向下側保持構件2的下側卡盤面21向X方向或Y方向等接近移動。搬入上側工件W1和下側工件W2之後,使搬入面41或前述搬送機器人或前述輸送機等從下側保持構件2的下側卡盤面21向X方向或Y方向等分離移動。
The driving
而且,浮起搬送方式的搬入構件4中,平滑的搬入面41被支撐為向與Z方向交叉的X方向或Y方向等往複移動自如,且具有使上側工件W1和下側工件W2以從搬入面41浮起之方式非接觸地支撐為能夠移動的搬入用浮升部41a。
In addition, in the carry-in
搬入用浮升部41a使用氣體的噴出力或超聲波力等,在搬入面41與下側工件W2的非貼合面之間的對向空間,個別地同時產生從搬入
面41側向下側工件W2側的分離壓力及與此相反地從下側工件W2側向搬入面41側的接近壓力。構成為藉由保持這些分離壓力及接近壓力的平衡,在搬入面41與下側工件W2之間向Z方向形成空氣膜41b,保持下側工件W2從搬入面41浮起的狀態。
The lifting
作為使用氣體噴出力的搬入用浮升部41a,有“伯努利型”及“多孔型”。
There are "Bernoulli type" and "porous type" as the lifting
“伯努利型”中,藉由負壓的空氣膜41b與大氣氣氛的壓力差非接觸地保持上側工件W1和下側工件W2。若詳細說明,“伯努利型”中,藉由從搬入面41側向下側工件W2側噴出氣體而形成的負壓的空氣膜41b與大氣氣氛的壓力差,將下側工件W2拉到搬入面41側。隨此,若負壓的空氣膜41b的間隔變窄而壓力急劇上升,則推離下側工件W2,而保持空氣膜41b的壓力均衡。由此,非接觸地保持時需要噴出大量的氣體。
In the "Bernoulli type", the upper workpiece W1 and the lower workpiece W2 are held in non-contact with the pressure difference between the negative
並且“多孔型”中,藉由從整個多孔層向下側工件W2噴出氣體,產生前述分離壓力的同時,藉由從開設於多孔層的複數個吸氣孔(未圖示)進行負壓吸引而產生前述接近壓力。 In the "porous type", by blowing gas from the entire porous layer to the lower workpiece W2, the aforementioned separation pressure is generated, and at the same time, vacuum suction is performed from a plurality of suction holes (not shown) opened in the porous layer And the aforementioned proximity pressure is generated.
因此,作為搬入用浮升部41a的具體例,如圖1~圖7所示,與前述“伯努利型”相比,採用氣體的瞬間噴出流量至少能夠在上側工件W1與下側工件W2之間形成空氣膜41b,並且能夠使上側工件W1和下側工件W2從搬入面41浮起的前述“多孔型”為較佳。
Therefore, as a specific example of the lift-in
浮起搬送方式的搬入構件4中,浮起搬送部43具有把持以藉由搬入用浮升部41a從搬入面41浮起之方式非接觸地被支撐的上側工件W1和下側工件W2的操作機構(未圖示)等。
In the carry-in
該操作機構使用致動器等,且構成為在沿搬入面41的XY方向移動自如地被支撐。
The operating mechanism uses an actuator or the like, and is configured to be supported movably in the XY direction of the carry-in
而且,操作機構具有藉由吸引等整體把持上側工件W1和下側工
件W2或局部把持上側工件W1和下側工件W2的端部的卡盤部(未圖示)。操作機構構成為以從搬入面41浮起(浮出)的狀態向X方向或Y方向等移動而交接至下側保持構件2的下側卡盤面21。
Moreover, the operating mechanism has an overall gripping of the upper work W1 and the lower work
The workpiece W2 or a chuck part (not shown) that partially grips the ends of the upper workpiece W1 and the lower workpiece W2. The operating mechanism is configured to move in the X direction, the Y direction, or the like in a floating (floating) state from the carrying-in
作為搬入構件4的具體例,如圖1~圖7所示的例子的情況下,藉由搬入用驅動部42使搬入面41朝向下側保持構件2的下側卡盤面21向X方向接近移動。藉由浮起搬送部43將上側工件W1與下側工件W2向X方向依次浮起搬送,搬入下側保持構件2的下側卡盤面21。
As a specific example of the carry-in
並且,作為其他例雖未圖示,但亦可以進行如下變更,亦即,將基於搬入用驅動部42的搬入面41的移動方向與上側工件W1和下側工件W2的搬入方向變更為X方向以外的方向,或不使上側工件W1和下側工件W2從搬入面41浮起而利用搬入構件4向貼合空間S1搬入,或使用前述搬送機器人或前述輸送機等作為搬入構件4,從而代替浮起搬送方式。
In addition, although not shown as another example, it is also possible to change the direction of movement of the
搬出構件5為從貼合空間S1將貼合結束的貼合器件W向外部空間S2搬出的工件搬出用搬送機構。
The carrying-out
作為搬出構件5,與搬入構件4同樣地有以從搬出面51浮起之方式非接觸地搬送貼合器件W的浮起搬送方式、利用搬送機器人(未圖示)搬送貼合器件W的機器人搬送方式、利用輸送機(未圖示)搬送貼合器件W的輸送帶搬送方式等。這些浮起搬送方式或機器人搬送方式或輸送帶搬送方式等中具有從外部空間S2向貼合空間S1使搬出面51或搬送機器人以接近或分離之方式移動的搬出用驅動部52。
As the carry-out
尤其,搬出構件5為浮起搬送方式時,具有平滑的搬出面51、及以從搬出面51浮起之方式非接觸地搬送貼合器件W的搬出用浮起搬送部53為較佳。
In particular, when the carry-out
搬出構件5的搬出用驅動部52由致動器等構成。搬出用驅動部52藉由後述的控制部7如下進行作動控制,即在上側工件W1及下側工件
W2的貼合後,將搬出面51或前述搬送機器人或前述輸送機等朝向下側保持構件2的下側卡盤面21向X方向或Y方向等接近移動。搬出貼合器件W之後,使搬出面51或前述搬送機器人或前述輸送機等從下側保持構件2的下側卡盤面21向X方向或Y方向等分離移動。
The driving
作為搬出構件5的具體例,如圖1~圖7所示的例子的情況下,藉由搬出用驅動部52使搬出面51從外部空間S2朝向下側保持構件2的下側卡盤面21向X方向接近移動。藉由搬出用浮起搬送部53將貼合器件W從下側保持構件2的下側卡盤面21浮起搬送,朝向搬出面51以與搬入方向在一條直線上搬出。
As a specific example of the unloading
並且,作為其他例雖未圖示,但亦可以進行如下變更,即將基於搬出用驅動部52的搬出面51的移動方向與貼合器件W的搬出方向變更為X方向以外的方向,或將基於搬入構件4的工件搬入方向與基於搬出構件5的工件搬出方向向XYθ方向彎曲成規定角度,或將搬入構件4與搬出構件5一體化並向工件搬入方向的反方向搬出,或變更為不使貼合器件W從搬出面51浮起而利用搬出構件5搬出,或使用前述搬送機器人或前述輸送機等作為搬出構件5,從而代替浮起搬送方式。
In addition, although not shown in the figure as another example, it is also possible to change the movement direction of the unloading
並且,貼合空間S1形成於可變壓腔室6的內部,藉由腔室6的壁劃分外部空間S2,在腔室6內的貼合空間S1配備有上側保持構件1及下側保持構件2為較佳。
In addition, the bonding space S1 is formed inside the
腔室6具有:出入口61,藉由搬入構件4和搬出構件5使上側工件W1及下側工件W2通過;開閉用驅動部62,開閉出入口61;及減壓用驅動部6a,由用於對貼合空間S1進行減壓的壓縮機等構成。
The
而且,上側保持構件1或下側保持構件2中的任一個或這兩個具備檢測預先標註在上側工件W1和下側工件W2上的標志或角部等的相機等位置檢測部(未圖示)、及使上側保持構件1或下側保持構件2中的任一個相對於另一個向XYθ方向相對移動的對位用驅動部(未圖示)。
由前述位置検出部依據輸出使前述對位用驅動部作動,藉由使上側保持構件1及下側保持構件2向XYθ方向相對移動,使上側工件W1與下側工件W2在XYθ方向上對位。
In addition, either or both of the upper holding
若詳細說明,在大氣氣氛下,藉由搬入構件4從外部空間S2向腔室6內的貼合空間S1個別地搬入上側工件W1與下側工件W2,在減壓過的貼合空間S1進行上側工件W1與下側工件W2的重疊的同時進行在XYθ方向上的對位。之後,在大氣氣氛下,藉由搬出構件5將上側工件W1及下側工件W2的貼合結束的貼合器件W從貼合空間S1向外部空間S2搬出。
To explain in detail, in an atmospheric atmosphere, the upper workpiece W1 and the lower workpiece W2 are individually loaded from the external space S2 to the bonding space S1 in the
作為腔室6的具體例,如圖1~圖7所示的例子的情況下,構成為在腔室6中配備了上側保持構件1的蓋壁63相對於配備了下側保持構件2的底壁64能夠向Z方向分割。藉由以向Z方向相對接近或分離之方式往複移動,貼合空間S1構成為開閉自如且成為密封結構。藉由開閉用驅動部62使腔室6的蓋壁63從底壁64向Z方向分離時,作為出入口61使搬入通路61a與搬出路61b開口的同時,使上側保持構件1與下側保持構件2相對分離移動。
As a specific example of the
因此,還能夠以一個驅動源構成腔室6的開閉用驅動部62與升降驅動部3。
Therefore, it is also possible to configure the opening/
而且,下側保持構件2相對於腔室6的底壁64向XYθ方向移動自如地被支撐,下側工件W2藉由前述對位用驅動部的作動並經由下側保持構件2與被保持在上側保持構件1的上側工件W1在XYθ方向上對位。
In addition, the
並且,作為其他例雖未圖示,但亦可以進行如下變更,即藉由使向Z方向被分割的腔室6中的任一個朝向另一個反轉而構成為開閉自如且成為密封結構,或在腔室6的一部分設置開閉自如的門,而構成為貼合空間S1開閉自如且成為密封結構,從而代替腔室6的分割式,
或利用不同的驅動源構成腔室6的開閉用驅動部62與升降驅動部3,或使上側保持構件1的上側工件W1與下側保持構件2的下側工件W2在XYθ方向上對位。
In addition, although not shown in the figure as another example, it is also possible to change it by reversing any one of the
控制部7為與上側保持構件1的保持部11a、交接機構12的交接用驅動部12a、下側保持構件2的浮升部22、升降驅動部3、搬入構件4的搬入用驅動部42及浮起搬送部43、搬出構件5的搬出用驅動部52及搬出用浮起搬送部53個別地電連接的控制器。而且,控制部7還與腔室6的開閉用驅動部62及前述變壓用驅動部、用於使上側工件W1與下側工件W2向XYθ方向相對移動的前述對位用驅動部、使前述密封材固化的固化機構等電連接。
The
成為控制部7的控制器按照預先設定於其控制電路(未圖示)的程序,以預先設定的時間點依次個別地進行作動控制。
The controller serving as the
若詳細說明,例如圖1(a)或圖5(a)所示,控制部7如下進行作動控制,即腔室6的出入口61(搬入通路61a)藉由開閉用驅動部62(升降驅動部3)進行打開操作,使腔室6內的貼合空間S1成為大氣氣氛。
In detail, for example, as shown in Fig. 1(a) or Fig. 5(a), the
在此狀態下,控制部7如下進行作動控制,即藉由搬入構件4的搬入用驅動部42使搬入面41或搬送機器人等接近下側保持構件2的下側卡盤面21,藉由浮起搬送部43或搬送機器人等使上側工件W1通過出入口61(搬入通路61a)朝向大氣氣氛下的下側卡盤面21搬入。
In this state, the
之後,如圖1(b)或圖5(b)所示,控制部7如下進行作動控制,即藉由交接機構12的交接用驅動部12a將上側工件W1交接至上側保持構件1的上側卡盤面11,利用保持部11a保持為無法移動。
After that, as shown in Fig. 1(b) or Fig. 5(b), the
接著,如圖2(a)或圖6(a)所示,控制部7如下進行作動控制,即藉由浮起搬送部43或搬送機器人等使下側工件W2利用搬送導件44從外部空間S2進行位置限制的同時通過出入口61(搬入通路61a)朝向大氣氣氛下的下側卡盤面21搬入。
Next, as shown in Fig. 2(a) or Fig. 6(a), the
此時,即使利用浮起搬送部43或搬送機器人等中的任一個使上側工件W1和下側工件W2搬入至下側保持構件2的下側卡盤面21,亦如下進行作動控制,即上側工件W1和下側工件W2首先藉由浮升部22以從平滑的下側卡盤面21浮起之方式非接觸地被支撐為能夠移動。
At this time, even if the upper workpiece W1 and the lower workpiece W2 are carried into the
接下來,如下進行作動控制,即從浮升部22切換為接觸保持部21a,下側工件W2與下側卡盤面21接觸並被保持為無法移動。
Next, the operation control is performed such that the floating
之後,如圖2(b)或圖6(b)所示,控制部7如下進行作動控制,腔室6的出入口61(搬入通路61a)藉由開閉用驅動部62(升降驅動部3)進行關閉操作,藉由減壓用驅動部6a開始對腔室6內的貼合空間S1進行減壓。
After that, as shown in Fig. 2(b) or Fig. 6(b), the
與此大致同時,利用升降驅動部3使上側保持構件1與下側保持構件2相對接近移動。在該時間點如下進行控制,即藉由前述對位用驅動部使上側保持構件1或下側保持構件2中的任一個相對於另一個向XYθ調整移動,進行上側工件W1與下側工件W2的對位(對準)。
At about the same time, the upper holding
該對位結束後,控制部7如下進行控制,即利用升降驅動部3使上側保持構件1的上側卡盤面11與下側保持構件2的下側卡盤面21進一步接近移動,保持在上側卡盤面11的上側工件W1與接觸保持在下側卡盤面21的下側工件W2在彼此之間向Z方向隔著前述密封材及前述封入材料重疊。
After the alignment is completed, the
前述的對位結束時,如下進行控制,即利用減壓用驅動部6a將貼合空間S1減壓至真空或接近真空的減壓氣氛,在真空氛圍下使上側工件W1與下側工件W2向Z方向重疊。
At the end of the aforementioned positioning, control is performed as follows, that is, the bonding space S1 is decompressed to a vacuum or a decompression atmosphere close to a vacuum by the
接著,如圖3(a)或圖7(a)所示,控制部7如下進行作動控制,腔室6的出入口61(搬出路61b)藉由開閉用驅動部62(升降驅動部3)進行打開操作,使腔室6內的貼合空間S1與外氣空間S2連通而成為大氣氣氛。
Next, as shown in Fig. 3(a) or Fig. 7(a), the
因此,藉由大氣壓將上側工件W1與下側工件W2壓扁成規定間隙 而成為貼合器件W。 Therefore, the upper workpiece W1 and the lower workpiece W2 are squashed into a predetermined gap by atmospheric pressure It becomes the bonding device W.
之後,如圖3(b)或圖7(b)所示,控制部7藉由搬出構件5的搬出用驅動部52使搬出面51或搬送機器人等接近下側保持構件2的下側卡盤面21。之後,如下進行作動控制,即藉由搬出用浮起搬送部53或搬送機器人等使貼合器件W從下側卡盤面21通過出入口61(搬出路61b)向外部空間S2被搬出。
After that, as shown in Fig. 3(b) or Fig. 7(b), the
而且,將設定於控制部7的控制電路的程序作為貼合器件W的製造方法進行說明。
Furthermore, the program of the control circuit set in the
本發明的實施形態之貼合器件W的製造方法作為主要步驟包括:保持步驟,將上側工件W1保持在上側保持構件1的上側卡盤面11並且將下側工件W2保持在下側保持構件2的平滑的下側卡盤面21;及接合步驟,藉由上側保持構件1或下側保持構件2中的任一個或這兩個相對接近移動,重疊上側工件W1及下側工件W2。
The manufacturing method of the bonding device W of the embodiment of the present invention includes, as a main step, a holding step of holding the upper workpiece W1 on the
除此之外,作為保持步驟的前步驟,包括搬入步驟,從外部空間S2向配置於貼合空間S1的上側保持構件1的上側卡盤面11利用搬入構件4搬入上側工件W1,向配置於貼合空間S1的下側保持構件2的平滑的下側卡盤面21利用搬入構件4搬入下側工件W2為較佳。
In addition, as a previous step of the holding step, a loading step is included, from the external space S2 to the
而且,保持步驟中,相對於下側保持構件2,藉由浮升部22以從下側卡盤面21浮起之方式非接觸地支撐利用搬入構件4搬入到貼合空間S1的下側工件W2,接著,在藉由減壓用驅動部6a對貼合空間S1減壓結束之前,藉由接觸保持部21a使下側工件W2接觸保持在下側卡盤面21。
Furthermore, in the holding step, with respect to the
接合步驟中,藉由升降驅動部3使上側保持構件1或下側保持構件2中的任一個朝向另一個向Z方向相對接近移動,或使上側保持構件1及下側保持構件2這兩個彼此向Z方向相對接近移動。由此,在基於減壓用驅動部6a的貼合空間S1的減壓結束之後,使上側工件W1與下
側工件W2在彼此之間向Z方向隔著前述密封材或前述封入材料重疊或直接使工件彼此重疊。
In the joining step, either the upper holding
藉由這種本發明的實施形態之貼合器件W的製造裝置A及製造方法,在基於搬送機器人的搬入等中,即使下側工件W2殘留有因局部性伸縮導致的應力,亦可藉由浮升部22以從下側卡盤面21浮起之方式非接觸地支撐下側工件W2。由此,放出了下側工件W2的局部應力,下側工件W2成為沿下側保持構件2的平滑的下側卡盤面21的平滑狀態。
With the manufacturing apparatus A and manufacturing method of the bonded device W according to this embodiment of the present invention, even if the lower workpiece W2 has residual stress due to local expansion and contraction during loading by a transfer robot, it can be The floating
接著,藉由接觸保持部21a使平滑狀態的下側工件W2與下側卡盤面21接觸並被保持為無法移動。
Then, the lower workpiece W2 in a smooth state is brought into contact with the
之後,升降驅動部3藉由控制部7使上側保持構件1或下側保持構件2中的一個或這兩個相對接近移動。由此,平滑狀態的下側工件W2與藉由保持部11a保持在上側卡盤面11的上側工件W1能夠無位置偏離地重疊。
After that, the
因此,能夠去除殘留在下側工件W2的局部應力並以平滑狀態與上側工件W1貼合。 Therefore, the local stress remaining on the lower workpiece W2 can be removed and the upper workpiece W1 can be bonded in a smooth state.
其結果,與在下側基板保持件的表面開口凹陷有複數個升降銷用貫穿孔或槽等的習知之保持件相比,具有下側保持構件2的表面沒有升降銷用貫穿孔或槽等的凹陷且平滑的下側卡盤面21,因此不會發生下側工件W2的一部分因其自重而局部性伸縮並彎曲成凹凸狀的情況。由此,能夠提高上側工件W1及下側工件W2的貼合精度。與此同時,即使是鋼性較低的超薄板狀工件(基板),亦能夠防止在上側工件W1及下側工件W2之間的貼合面產生氣泡,可進行沒有氣泡的均勻的貼合。
As a result, compared with the conventional holder in which a plurality of through holes or grooves for lift pins are recessed in the surface of the lower substrate holder, the surface with the
而且,搬送機器人的臂或下側升降銷可不接觸板狀工件(基板)而進行板狀工件(基板)的搬送。因此,能夠防止因接觸搬送機器人的臂 或下側升降銷而附著雜質等異物,不會與其他部位之間產生不均,能夠進行非常均勻的貼合。 Furthermore, the arm or lower lift pin of the transport robot can transport the plate-shaped workpiece (substrate) without contacting the plate-shaped workpiece (substrate). Therefore, it is possible to prevent contact with the arm of the transport robot Or foreign matter such as foreign matter adhered to the lower lift pin, there is no unevenness with other parts, and very uniform bonding can be performed.
作為其具體例,即使利用習知之對位方法貼合G8尺寸的厚度為0.2mm的液晶用玻璃基板,亦能夠將上側工件W1及下側工件W2的對位誤差改善至亞微米精度,可實現成品率的提高。 As a specific example, even if a G8-size glass substrate for liquid crystal with a thickness of 0.2 mm is bonded by a conventional alignment method, the alignment error of the upper workpiece W1 and the lower workpiece W2 can be improved to sub-micron accuracy, which can be realized Improved yield.
尤其,具備向貼合空間S1至少搬入下側工件W2的搬入構件4,上側保持構件1及下側保持構件2配備於可變壓腔室6的內部,腔室6具有使搬入構件4通過的開閉自如的出入口61為較佳。
In particular, a
此時,在大氣氣氛下打開腔室6的出入口61,藉由搬入構件4將下側工件W2搬入下側保持構件2的下側卡盤面21。之後,在關閉出入口61並對腔室6進行了減壓的狀態下,藉由使上側保持構件1或下側保持構件2中的任一個或這兩個相對接近移動,在減壓氣氛下,平滑狀態的下側工件W2與上側工件W1重疊。
At this time, the entrance and
因此,能夠在真空氛圍下貼合去除了殘留的局部應力的平滑狀態的下側工件W2與上側工件W1。 Therefore, it is possible to bond the lower workpiece W2 and the upper workpiece W1 in a smooth state from which residual local stresses have been removed under a vacuum atmosphere.
其結果,在真空或接近真空的減壓氣氛下貼合下側工件W2與上側工件W1,因此能夠可靠地防止空氣從貼合空間S1混入上側工件W1及下側工件W2的重疊面。由此,能夠防止由於氣泡進入上側工件W1及下側工件W2的重疊面而局部性發生規定間隙不均勻的情況,能夠製作更高品質的貼合器件W。 As a result, the lower workpiece W2 and the upper workpiece W1 are bonded under a vacuum or a reduced pressure atmosphere close to a vacuum, and therefore, it is possible to reliably prevent air from entering the overlapping surface of the upper workpiece W1 and the lower workpiece W2 from the bonding space S1. As a result, it is possible to prevent the occurrence of localized unevenness in the predetermined gap due to bubbles entering the overlapping surfaces of the upper workpiece W1 and the lower workpiece W2, and it is possible to produce a bonding device W of higher quality.
而且,搬入構件4具有浮起搬送部43,至少以從其平滑的搬入面41浮起之方式非接觸地搬送下側工件W2為較佳。
Furthermore, the carry-in
此時,藉由搬入構件4至少將下側工件W2向下側保持構件2搬入時,利用浮起搬送部43以從搬入構件4的平滑的搬入面41浮起之方式非接觸地搬送下側工件W2。由此,下側工件W2的一部分中不會產生局部應力,下側工件W2以平滑的浮起(浮出)狀態交接至下側保持構件
2的下側卡盤面21。
At this time, when at least the lower workpiece W2 is loaded into the
因此,能夠進一步去除殘留在下側工件W2的局部應力並以更平滑的狀態與上側工件W1貼合。 Therefore, the local stress remaining on the lower workpiece W2 can be further removed, and the upper workpiece W1 can be bonded in a smoother state.
其結果,與藉由搬送機器人的臂或升降銷的真空吸附而在下側基板的一部分殘留局部應力的狀態下交接的習知之情況相比,無需搬送機器人或升降銷,因此能夠在實際上沒有凹凸的狀態下搬送下側工件W2。由此,即使將下側工件W2保持在下側保持構件2的平滑的下側卡盤面21,局部性應力亦完全不會殘留,貼合上側工件W1及下側工件W2時,能夠實現貼合面內均勻且高精度的貼合。
As a result, compared with the conventional case where a part of the lower substrate is transferred under a state where local stress remains on a part of the lower substrate by vacuum suction by the arm of the transfer robot or the lift pins, the transfer robot or lift pins are not required, so there is virtually no unevenness. The lower workpiece W2 is conveyed in the state of. As a result, even if the lower workpiece W2 is held on the smooth
而且,藉由基於習知之搬送機器人的搬入,很難搬送厚度為數10um的玻璃或塑料膜,尤其無法搬送G8尺寸等大型的薄型基板。但是,基於浮起搬送部4b的下側工件W2的搬入,不使用搬送機器人或升降銷而能夠實現直接搬入,即使不使用輔助的支架或夾具亦能夠直接以高精度貼合薄型的基板彼此。 In addition, it is difficult to transport glass or plastic films with a thickness of several tens of um by carrying in by a conventional transport robot, especially large and thin substrates such as G8 size. However, the lower workpiece W2 of the floating conveyance portion 4b can be loaded directly without using a conveying robot or lift pins, and thin substrates can be directly bonded to each other with high precision even without using auxiliary brackets or jigs.
接著,依據附圖對本發明的各實施例進行說明。 Next, embodiments of the present invention will be described based on the drawings.
如圖1(a)、圖1(b)~圖4(a)、圖4(b)所示,本發明的實施例1之貼合器件W的製造裝置A中,搬入構件4採用了前述的工件被浮起搬送之浮起搬送方式,且設置了工件的定位用導件,而不是前述的基於搬送機器人的機器人搬送方式。
As shown in Figure 1 (a), Figure 1 (b) ~ Figure 4 (a), Figure 4 (b), in the manufacturing apparatus A of the bonded device W of the
若詳細說明,搬入構件4具有搬送導件44,在基於浮起搬送部43的工件搬送中與上側工件W1和下側工件W2接觸,沿與基於浮起搬送部43的工件搬送方向(X方向)交叉之方向(Y方向)進行位置限制。
In detail, the carry-in
搬送導件44在與成為基於浮起搬送部43的工件搬送方向的X方向交叉的Y方向上隔著大致相當於上側工件W1和下側工件W2的寬度尺寸的間隔配置複數個為較佳。
The
配置複數個搬送導件44的情況下,基於浮起搬送部43的工件搬送時,使搬送導件44中的任一個或這兩個向與工件搬送方向(X方向)交叉之方向(Y方向)接近移動,工件搬送以外的待機時,使搬送導件44中的任一個或這兩個分離移動為較佳。
When a plurality of transport guides 44 are arranged, when the workpiece is transported by the floating
圖1(a)、圖1(b)~圖4(a)、圖4(b)所示的例中,搬送導件44為一對導軌。使藉由浮起搬送部43以從搬入面41浮起的狀態非接觸地被搬送之上側工件W1和下側工件W2的端部與一對搬送導件44個別地直接或間接接觸。由此,上側工件W1和下側工件W2不會向Y方向位置偏離,而被引導至下側保持構件2的下側卡盤面21的固定位置。
In the examples shown in Figs. 1(a), 1(b) to 4(a), and 4(b), the
圖示例的情況下,使上側工件W1和下側工件W2的端部與成為搬送導件44的一對導軌的內側面個別地滑動接觸。
In the case of the example shown in the figure, the ends of the upper workpiece W1 and the lower workpiece W2 are brought into sliding contact with the inner surfaces of the pair of rails serving as the conveying
並且,作為其他例雖未圖示,但可以進行如下各種變更,即藉由在成為搬送導件44的導軌的內側面配置輥等旋轉體來降低與工件的摩擦阻力,或從其中一個導軌的內側面對工件噴吹壓縮空氣等的氣體,向另一個導軌的內側面推壓工件,或作為搬送導件44附加將工件向X方向定位的位置限制器。
In addition, although not shown in the figure as another example, various changes can be made, that is, by arranging a rotating body such as a roller on the inner surface of the guide rail that becomes the conveying
下側保持構件2的下側卡盤面21具有與利用搬入構件4的浮起搬送部43搬入之上側工件W1和下側工件W2接觸並沿工件搬送方向(X方向)及交叉方向(Y方向)進行位置限制的定位導件23。
The
定位導件23由沿Y方向一對配置的導軌23a及將工件向X方向定位的位置限制器23b等構成。
The
一對導軌23a在搬入構件4的基於浮起搬送部43的工件搬送時,個別地向工件搬送方向(X方向)的交叉方向(Y方向)接近移動,工件搬送以外的待機時使其個別地分離移動,並在不幹涉基於升降驅動部3的上側保持構件1的移動的位置待機為較佳。
The pair of
圖1(a)、圖1(b)~圖4(a)、圖4(b)所示的例中,使與搬送導件44的
導軌同樣構成的一對導軌23a與藉由浮起搬送部43以從搬入面41浮起的狀態非接觸地被搬送之上側工件W1和下側工件W2的端部個別地直接或間接接觸。由此,上側工件W1和下側工件W2不會向Y方向位置偏離,而被引導至下側保持構件2的下側卡盤面21的固定位置。
Figure 1 (a), Figure 1 (b) ~ Figure 4 (a), Figure 4 (b) shown in the example, using the
位置限制器23b突出或陷入自如地設置在下側卡盤面21,藉由與工件的X方向前端面接觸來定位。
The position limiter 23b is provided on the
藉由這種本發明的實施例1之貼合器件W的製造裝置A,藉由浮起搬送部43至少將下側工件W2從搬入構件4的搬入面41向下側保持構件2浮起搬送時,與搬送導件44及定位導件23依次接觸,沿與工件搬送方向(X方向)交叉之方向(Y方向)進行定位。
According to the manufacturing apparatus A of the bonded device W of the
因此,能夠將下側工件W2準確地浮起搬送至下側保持構件2上的規定位置。
Therefore, the lower workpiece W2 can be accurately floated and transported to a predetermined position on the
其結果,具有如下優點:亦即,能夠提高上側工件W1與下側工件W2的貼合精度,並製作更高品質的貼合器件W。 As a result, there is an advantage that the bonding accuracy of the upper workpiece W1 and the lower workpiece W2 can be improved, and a higher-quality bonding device W can be produced.
並且,本發明的實施例1之貼合器件W的製造方法中,作為前述接合步驟的後步驟,包括將上側工件W1及下側工件W2的貼合結束的貼合器件W利用搬出構件5從貼合空間S1向外部空間S2搬出的搬出步驟。
In addition, in the manufacturing method of the bonded device W of the first embodiment of the present invention, as a post-step of the aforementioned bonding step, the bonding device W that has completed bonding of the upper workpiece W1 and the lower workpiece W2 is removed from the bonding device W using the unloading
前述搬出步驟中,藉由搬出構件5的搬出用浮起搬送部53將貼合器件W從下側保持構件2的下側卡盤面21朝向搬出構件5的搬出面51以浮起狀態向外部空間S2搬出。
In the aforementioned unloading step, the lamination device W is moved from the
浮起搬送方式的搬出構件5的搬出面51與搬入構件4同樣地,具有以從搬出面51浮起之方式非接觸地支撐貼合器件W的搬出用浮升部51a。搬出用浮升部51a使用氣體的噴出力或超聲波力等,在搬出面51與貼合器件W的下側工件W2的對向空間向Z方向形成有搬出用空氣膜51b,且構成為保持貼合器件W從搬出面51浮起的狀態。
Like the carry-in
藉由這種本發明的實施例1之貼合器件W的製造方法,在貼合空間S1中上側工件W1與下側工件W2的貼合結束之後,以從搬出構件5的搬出面51浮起的狀態浮起搬出貼合結束的貼合器件W。
According to the method of manufacturing the bonding device W of the
因此,尤其即使下側工件W2為如薄膜那樣的薄板狀基板,貼合過的上側工件W1與下側工件W2亦不會局部性伸縮而兩者相對位置偏離或產生應力,而在保持貼合時的精度的狀態下被搬出。 Therefore, even if the lower workpiece W2 is a thin plate-like substrate such as a film, the upper workpiece W1 and the lower workpiece W2 that have been bonded will not locally expand and contract, and the relative positions of the two will deviate or stress will be generated. It is carried out in a state of accuracy at the time.
因此,能夠將貼合了薄膜狀的下側工件W2的貼合器件W以保持較高位置精度貼合的狀態搬出。 Therefore, the bonding device W to which the film-like lower workpiece W2 is bonded can be carried out while maintaining high positional accuracy.
其結果,與藉由搬送機器人或升降銷搬出的習知之方法相比,能夠製作更高品質的貼合器件W。 As a result, it is possible to produce a bonding device W of higher quality than the conventional method of carrying out by a transport robot or a lift pin.
如圖5(a)、圖5(b)~圖7(a)、圖7(b)所示,本發明的實施例2之貼合器件W的製造裝置A中,作為上側保持構件1的交接機構12,藉由上側保持構件1或下側保持構件2中的任一個或這兩個的相對接近移動,將上側工件W1交接至上側卡盤面11的結構與圖1~圖4所示的實施例1不同。除此以外的結構與圖1~圖4所示的實施例1相同。
As shown in Figure 5 (a), Figure 5 (b) ~ Figure 7 (a), Figure 7 (b), in the manufacturing apparatus A of the bonded device W of Example 2 of the present invention, as the upper holding
若詳細說明,實施例2中,作為上側保持構件1的交接機構12,代替圖1~圖3所示的升降銷12b,如圖5(b)及圖6(a)所示,藉由升降驅動部3使上側保持構件1與下側保持構件2相對接近移動,將藉由下側保持構件2的浮升部22以從下側卡盤面21浮起之方式非接觸地被保持的上側工件W1保持浮起狀態以面狀交接至上側卡盤面11的保持部11a。
To explain in detail, in the second embodiment, as the
而且,成為交接目的地的上側卡盤面11的保持部11a構成為藉由基於負壓吸引的吸附力和黏附力或靜電吸附力組合,將上側工件W1保持沿上側卡盤面11的平滑的面狀的結構,而不是圖1~圖3所示的如升降銷12b那樣的局部性保持為較佳。
Furthermore, the holding
控制部7在圖5(b)所示的上側工件W1的交接時,藉由升降驅動部3使上側保持構件1或下側保持構件2中的任一個朝向另一個接近移動。由此,以上側卡盤面11的保持部11a與藉由浮升部22從下側卡盤面21浮起的上側工件W1的非貼合面面接觸之方式進行作動控制。
The
上側保持構件1的上側卡盤面11與上側工件W1面接觸之後,切換為基於保持部11a的工件保持,能夠交接上側工件W1。
After the
接著,如圖5(b)的雙點劃線及圖6(a)所示,藉由升降驅動部3使上側保持構件1或下側保持構件2中的任一個從另一個分離移動,由此能夠搬入後續的下側工件W2。
Next, as shown by the two-dot chain line in Fig. 5(b) and Fig. 6(a), the
圖5(a)、圖5(b)~圖7(a)、圖7(b)所示的例中,腔室6的開閉用驅動部62與升降驅動部3由一個驅動源構成。藉由開閉用驅動部62使腔室6的蓋壁63向底壁64接近移動而使出入口61(搬入通路61a)進行關閉操作,與此大致同時,藉由升降驅動部3使上側卡盤面11的保持部11a與上側工件W1的非貼合面面接觸而進行保持。由此,上側工件W1以從下側卡盤面21浮起的狀態交接至上側卡盤面11的保持部11a。
In the examples shown in FIGS. 5(a), 5(b) to 7(a), and 7(b), the opening/
並且,作為其他例雖未圖示,但亦可以是腔室6的開閉用驅動部62與升降驅動部3由各自獨立的驅動源構成,與基於開閉用驅動部62的腔室6的出入口61(搬入通路61a)的關閉操作無關,藉由升降驅動部3使上側保持構件1接近移動至上側卡盤面11的保持部11a與從下側卡盤面21浮起的上側工件W1的非貼合面面接觸的位置。
Also, although not shown as another example, the opening and
藉由這種本發明的實施例2之貼合器件W的製造裝置A及製造方法,利用下側保持構件2的浮升部22使從下側卡盤面21浮起(浮出)保持的上側工件W1保持浮起狀態下以面狀交接至上側保持構件1的上側卡盤面11。
According to the manufacturing apparatus A and manufacturing method of the bonded device W of Example 2 of the present invention, the upper side held by the
因此,能夠在完全沒有局部應力的狀態下將上側工件W1交接至上側保持構件1的上側卡盤面11。
Therefore, it is possible to transfer the upper workpiece W1 to the
其結果,具有如下優點,能夠提高上側工件W1與下側工件W2的貼合精度,並製作更高品質的貼合器件W。 As a result, there is an advantage that the bonding accuracy of the upper workpiece W1 and the lower workpiece W2 can be improved, and a higher-quality bonding device W can be produced.
而且,作為上側保持構件1的交接機構12,還具有如下優點,如圖1~圖3所示那樣藉由貫穿腔室6的蓋壁63,與利用向Z方向移動自如的升降銷12b的實施例1相比,無需在腔室6的蓋壁63與升降銷12b之間設置O型環等密封構件,能夠簡化交接機構12及腔室6的結構。
Moreover, as the
另外,前示的實施形態中,利用交接機構12將藉由搬入構件4搬入(浮起搬送)的上側工件W1交接至上側保持構件1的上側卡盤面11,利用保持部11a保持為無法移動,但並不限定於此,亦可以在上側保持構件1中將交接機構12及保持部11a變更為前述浮升部及接觸保持部。
In addition, in the aforementioned embodiment, the upper workpiece W1 carried in (floating and transported) by the carry-in
此時,上側保持構件1具有:浮升部,具備在與上側工件W1之間個別地產生反方向的分離壓力及接近壓力之機構;及接觸保持部,具備調整分離壓力及接近壓力之機構。
At this time, the upper holding
由此,即使由於搬入構件4等而在上側工件W1殘留因局部性伸縮而導致的應力,藉由浮升部以從上側卡盤面11浮起之方式非接觸地支撐上側工件W1。因此,放出了上側工件W1的局部應力,上側工件W1成為沿上側保持構件1的平滑的上側卡盤面11的平滑狀態。接著,藉由接觸保持部使平滑狀態的上側工件W1與上側卡盤面11接觸並保持為無法移動。因此,能夠去除殘留在上側工件W1的局部應力並以平滑狀態保持在上側卡盤面11。
Thereby, even if stress caused by local expansion and contraction remains on the upper workpiece W1 due to the
並且,前示的實施例中,作為搬入構件4及搬出構件5,採用了將工件浮起搬送之浮起搬送方式,但並不限定於此,亦可以將搬入構件4或搬出構件5中的一個或這兩個變更為機器人搬送方式或輸送帶搬送方式。
In addition, in the foregoing embodiment, as the carry-in
A:貼合器件的製造裝置 A: Manufacturing equipment for bonded devices
1:上側保持構件 1: Upper holding member
2:下側保持構件 2: Lower holding member
3:升降驅動部 3: Lifting drive
4:搬入構件 4: move in components
5:搬出構件 5: Move out the components
6:腔室 6: Chamber
6a:減壓用驅動部 6a: Decompression drive unit
7:控制部 7: Control Department
11:上側卡盤面 11: Upper chuck surface
11a:保持部 11a: Holding part
12:交接機構 12: Handover Organization
12a:交接用驅動部 12a: Drive unit for handover
12b:升降銷 12b: Lift pin
12c:連結構件 12c: connecting member
21:下側卡盤面 21: Lower chuck surface
21a:接觸保持部 21a: Contact holding part
22:浮升部 22: Floating part
22a:空氣膜 22a: Air film
22b:多孔層 22b: Porous layer
23:定位導件 23: positioning guide
23a:導軌 23a: rail
41:搬入面 41: move in noodles
41a:搬入用浮升部 41a: Lifting part for moving in
41b:空氣膜 41b: Air film
42:搬入用驅動部 42: Drive unit for moving in
43:浮起搬送部 43: Floating transport department
44:搬送導件 44: transport guide
51:搬出面 51: move out
52:搬出用驅動部 52: Drive unit for moving out
61:出入口 61: entrance and exit
61a:搬入通路 61a: Move into the channel
62:開閉用驅動部 62: Driving part for opening and closing
63:蓋壁 63: cover wall
64:底壁 64: bottom wall
S1:貼合空間 S1: Fitting space
S2:外部空間 S2: External space
W1:上側工件 W1: Upper workpiece
W2:下側工件 W2: Lower workpiece
W:貼合器件 W: bonded device
Claims (6)
Applications Claiming Priority (4)
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JP2015132728A JP5877264B1 (en) | 2015-07-01 | 2015-07-01 | Bonding device manufacturing apparatus and manufacturing method |
JP2015-132728 | 2015-07-01 | ||
JP2015146419A JP6049820B1 (en) | 2015-07-24 | 2015-07-24 | Bonding device manufacturing apparatus and manufacturing method |
JP2015-146419 | 2015-07-24 |
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TW201702702A TW201702702A (en) | 2017-01-16 |
TWI699582B true TWI699582B (en) | 2020-07-21 |
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KR (1) | KR20170004864A (en) |
CN (1) | CN106313858B (en) |
TW (1) | TWI699582B (en) |
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JP6896588B2 (en) * | 2017-11-06 | 2021-06-30 | 株式会社Screenホールディングス | Board delivery system and board delivery method |
CN111231481B (en) * | 2020-02-24 | 2020-11-27 | 新昌县勤勉生物医药科技有限公司 | Medical treatment detects accessory plant tissue paster equipment for thin slice processing |
CN112976765A (en) * | 2021-03-04 | 2021-06-18 | 广东德远科技股份有限公司 | Glass laminating device of tempered glass and liquid crystal glass zero-laminating all-in-one machine |
CN115352173B (en) * | 2022-08-31 | 2024-01-05 | 佛山市华箭建材装饰有限公司 | Cambered surface laminating equipment for multilayer glass |
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CN1176625A (en) * | 1995-02-28 | 1998-03-18 | 三星电子株式会社 | Method and apparatus for transporting lead frame, and in-line system using them |
JP2008185748A (en) * | 2007-01-30 | 2008-08-14 | Canon Anelva Corp | Substrate overlapping device and fabrication method of display device |
TW201332778A (en) * | 2011-11-22 | 2013-08-16 | Sumitomo Chemical Co | Film member attachment apparatus |
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JP4690572B2 (en) | 2000-11-30 | 2011-06-01 | キヤノンアネルバ株式会社 | Substrate overlay device |
KR101018909B1 (en) * | 2002-10-25 | 2011-03-02 | 도쿄엘렉트론가부시키가이샤 | Substrate alignment apparatus, substrate processing apparatus and substrate transfer apparatus |
JP4642787B2 (en) * | 2006-05-09 | 2011-03-02 | 東京エレクトロン株式会社 | Substrate transfer device and vertical heat treatment device |
CN101801645B (en) * | 2007-11-16 | 2013-04-10 | 株式会社爱发科 | Bonding substrate manufacturing apparatus and bonding substrate manufacturing method |
JP4896236B2 (en) * | 2010-01-21 | 2012-03-14 | 東京エレクトロン株式会社 | Substrate transport apparatus and substrate transport method |
WO2011102410A1 (en) * | 2010-02-17 | 2011-08-25 | 株式会社ニコン | Transfer apparatus, transfer method, exposure apparatus, and device manufacturing method |
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- 2016-06-16 TW TW105118973A patent/TWI699582B/en not_active IP Right Cessation
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CN1176625A (en) * | 1995-02-28 | 1998-03-18 | 三星电子株式会社 | Method and apparatus for transporting lead frame, and in-line system using them |
JP2008185748A (en) * | 2007-01-30 | 2008-08-14 | Canon Anelva Corp | Substrate overlapping device and fabrication method of display device |
TW201332778A (en) * | 2011-11-22 | 2013-08-16 | Sumitomo Chemical Co | Film member attachment apparatus |
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CN106313858B (en) | 2019-11-19 |
KR20170004864A (en) | 2017-01-11 |
CN106313858A (en) | 2017-01-11 |
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