TWI685713B - 著色感光性樹脂組合物、使用其製造的濾色器和圖像顯示裝置 - Google Patents
著色感光性樹脂組合物、使用其製造的濾色器和圖像顯示裝置 Download PDFInfo
- Publication number
- TWI685713B TWI685713B TW105139404A TW105139404A TWI685713B TW I685713 B TWI685713 B TW I685713B TW 105139404 A TW105139404 A TW 105139404A TW 105139404 A TW105139404 A TW 105139404A TW I685713 B TWI685713 B TW I685713B
- Authority
- TW
- Taiwan
- Prior art keywords
- photosensitive resin
- resin composition
- rhodamine
- color filter
- pigment
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B41/00—Special methods of performing the coupling reaction
- C09B41/001—Special methods of performing the coupling reaction characterised by the coupling medium
- C09B41/005—Special methods of performing the coupling reaction characterised by the coupling medium containing low molecular weight dispersing agents; containing surface active polythylene gylcols
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
??10-2016-0036568 | 2016-03-28 | ||
KR1020160036568A KR102383698B1 (ko) | 2016-03-28 | 2016-03-28 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 |
KR10-2016-0036568 | 2016-03-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201802585A TW201802585A (zh) | 2018-01-16 |
TWI685713B true TWI685713B (zh) | 2020-02-21 |
Family
ID=59982976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105139404A TWI685713B (zh) | 2016-03-28 | 2016-11-30 | 著色感光性樹脂組合物、使用其製造的濾色器和圖像顯示裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6654556B2 (ja) |
KR (1) | KR102383698B1 (ja) |
CN (1) | CN107239004B (ja) |
TW (1) | TWI685713B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021162854A (ja) * | 2020-03-31 | 2021-10-11 | 住友化学株式会社 | ネガ型レジスト組成物 |
CN113201017B (zh) * | 2021-04-29 | 2022-07-01 | 宁波中苑颜料有限公司 | 一种基于三嗪衍生物的有机颜料分散剂及其制备方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011022542A (ja) * | 2009-07-21 | 2011-02-03 | Jsr Corp | 着色組成物、カラーフィルタ及びカラー液晶表示素子 |
TW201134840A (en) * | 2009-11-30 | 2011-10-16 | Tamura Seisakusho Kk | Curable composition, cured material therefrom, and use thereof |
TW201350544A (zh) * | 2012-04-10 | 2013-12-16 | Sumitomo Chemical Co | 著色劑分散液 |
TW201400553A (zh) * | 2012-05-21 | 2014-01-01 | Toyo Ink Sc Holdings Co Ltd | 濾色器用著色組成物及濾色器 |
CN104428331A (zh) * | 2012-07-11 | 2015-03-18 | 东洋油墨Sc控股株式会社 | 活性能量射线聚合性树脂组合物、以及使用该树脂组合物的层叠体 |
TW201518422A (zh) * | 2013-10-03 | 2015-05-16 | Sumitomo Chemical Co | 染料分散液 |
WO2016006738A1 (ko) * | 2014-07-10 | 2016-01-14 | 전북대학교산학협력단 | 액정 수직배향 유도제 및 이를 이용하여 제조된 액정 표시장치 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1977221A (zh) * | 2004-05-31 | 2007-06-06 | 富士胶片株式会社 | 图案形成方法及滤色片的制造方法以及滤色片及液晶显示装置 |
KR101505671B1 (ko) * | 2010-08-30 | 2015-03-25 | 주식회사 알파켐 | 안료 분산 조성물, 컬러 레지스트 및 이를 이용하여 제조된 컬러필터 |
JP5737078B2 (ja) * | 2011-02-28 | 2015-06-17 | 東洋インキScホールディングス株式会社 | カラーフィルタ用赤色着色組成物、およびカラーフィルタ |
JP4911253B1 (ja) * | 2011-04-28 | 2012-04-04 | 大日本印刷株式会社 | 染料分散液、カラーフィルター用感光性樹脂組成物、カラーフィルター、液晶表示装置及び、有機発光表示装置 |
JP2012246393A (ja) * | 2011-05-27 | 2012-12-13 | Dainippon Printing Co Ltd | 顔料分散剤、顔料分散液、カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機発光表示装置。 |
JP2013041145A (ja) * | 2011-08-17 | 2013-02-28 | Toyo Ink Sc Holdings Co Ltd | カラーフィルタ用着色組成物、およびカラーフィルタ |
JP2013061619A (ja) | 2011-08-24 | 2013-04-04 | Toray Ind Inc | カラーフィルター用青色着色剤組成物およびそれを用いたカラーフィルター基板。 |
JP5789847B2 (ja) * | 2011-10-12 | 2015-10-07 | 東洋インキScホールディングス株式会社 | カラーフィルタ用着色組成物、およびカラーフィルタ |
KR20140112228A (ko) * | 2013-03-13 | 2014-09-23 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물 및 컬러 필터 |
TWI547486B (zh) * | 2013-12-12 | 2016-09-01 | 中央研究院 | 用於醣類分析及合成的化合物及方法 |
-
2016
- 2016-03-28 KR KR1020160036568A patent/KR102383698B1/ko active IP Right Grant
- 2016-11-30 TW TW105139404A patent/TWI685713B/zh active
- 2016-12-27 JP JP2016252876A patent/JP6654556B2/ja active Active
-
2017
- 2017-01-10 CN CN201710016692.2A patent/CN107239004B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011022542A (ja) * | 2009-07-21 | 2011-02-03 | Jsr Corp | 着色組成物、カラーフィルタ及びカラー液晶表示素子 |
TW201134840A (en) * | 2009-11-30 | 2011-10-16 | Tamura Seisakusho Kk | Curable composition, cured material therefrom, and use thereof |
TW201350544A (zh) * | 2012-04-10 | 2013-12-16 | Sumitomo Chemical Co | 著色劑分散液 |
TW201400553A (zh) * | 2012-05-21 | 2014-01-01 | Toyo Ink Sc Holdings Co Ltd | 濾色器用著色組成物及濾色器 |
CN104428331A (zh) * | 2012-07-11 | 2015-03-18 | 东洋油墨Sc控股株式会社 | 活性能量射线聚合性树脂组合物、以及使用该树脂组合物的层叠体 |
TW201518422A (zh) * | 2013-10-03 | 2015-05-16 | Sumitomo Chemical Co | 染料分散液 |
WO2016006738A1 (ko) * | 2014-07-10 | 2016-01-14 | 전북대학교산학협력단 | 액정 수직배향 유도제 및 이를 이용하여 제조된 액정 표시장치 |
Also Published As
Publication number | Publication date |
---|---|
CN107239004B (zh) | 2021-07-13 |
KR102383698B1 (ko) | 2022-04-05 |
TW201802585A (zh) | 2018-01-16 |
CN107239004A (zh) | 2017-10-10 |
JP2017182044A (ja) | 2017-10-05 |
KR20170111323A (ko) | 2017-10-12 |
JP6654556B2 (ja) | 2020-02-26 |
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