TWI675039B - 有機矽氧烷、硬化性聚矽氧組合物、及半導體裝置 - Google Patents
有機矽氧烷、硬化性聚矽氧組合物、及半導體裝置 Download PDFInfo
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- TWI675039B TWI675039B TW104118176A TW104118176A TWI675039B TW I675039 B TWI675039 B TW I675039B TW 104118176 A TW104118176 A TW 104118176A TW 104118176 A TW104118176 A TW 104118176A TW I675039 B TWI675039 B TW I675039B
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- organosiloxane
- polysiloxane composition
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- composition
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- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 91
- 239000000203 mixture Substances 0.000 title claims abstract description 90
- 125000005375 organosiloxane group Chemical group 0.000 title claims abstract description 38
- 239000004065 semiconductor Substances 0.000 title claims abstract description 26
- -1 polysiloxane Polymers 0.000 claims abstract description 135
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 37
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 33
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 29
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 24
- 239000002318 adhesion promoter Substances 0.000 claims abstract description 18
- 239000003054 catalyst Substances 0.000 claims abstract description 15
- 238000006459 hydrosilylation reaction Methods 0.000 claims abstract description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 8
- 150000002430 hydrocarbons Chemical group 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 2
- 239000005977 Ethylene Substances 0.000 claims description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000002683 reaction inhibitor Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 7
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 abstract description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 46
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 20
- 239000000463 material Substances 0.000 description 18
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 18
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 15
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 15
- 239000004615 ingredient Substances 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 13
- 239000000047 product Substances 0.000 description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 12
- 229910052684 Cerium Inorganic materials 0.000 description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 10
- 239000000843 powder Substances 0.000 description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 9
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- 239000004954 Polyphthalamide Substances 0.000 description 6
- 229910004283 SiO 4 Inorganic materials 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- 229920006375 polyphtalamide Polymers 0.000 description 6
- 125000005372 silanol group Chemical group 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000011787 zinc oxide Substances 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 125000003710 aryl alkyl group Chemical group 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 5
- 239000012964 benzotriazole Substances 0.000 description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 5
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 150000003961 organosilicon compounds Chemical class 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 4
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 125000003944 tolyl group Chemical group 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 3
- 239000000920 calcium hydroxide Substances 0.000 description 3
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 125000004344 phenylpropyl group Chemical group 0.000 description 3
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 3
- 150000003377 silicon compounds Chemical class 0.000 description 3
- 150000003852 triazoles Chemical class 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- 125000005023 xylyl group Chemical group 0.000 description 3
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 description 2
- KFJDQPJLANOOOB-UHFFFAOYSA-N 2h-benzotriazole-4-carboxylic acid Chemical compound OC(=O)C1=CC=CC2=NNN=C12 KFJDQPJLANOOOB-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 150000000703 Cerium Chemical class 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910052693 Europium Inorganic materials 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 125000006038 hexenyl group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 125000005187 nonenyl group Chemical group C(=CCCCCCCC)* 0.000 description 2
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 2
- 150000001282 organosilanes Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 2
- IALUUOKJPBOFJL-UHFFFAOYSA-N potassium oxidosilane Chemical compound [K+].[SiH3][O-] IALUUOKJPBOFJL-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 150000004819 silanols Chemical class 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 2
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1 -dodecene Natural products CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 description 1
- MDTUWBLTRPRXBX-UHFFFAOYSA-N 1,2,4-triazol-3-one Chemical compound O=C1N=CN=N1 MDTUWBLTRPRXBX-UHFFFAOYSA-N 0.000 description 1
- FMCUPJKTGNBGEC-UHFFFAOYSA-N 1,2,4-triazol-4-amine Chemical compound NN1C=NN=C1 FMCUPJKTGNBGEC-UHFFFAOYSA-N 0.000 description 1
- LZTSCEYDCZBRCJ-UHFFFAOYSA-N 1,2-dihydro-1,2,4-triazol-3-one Chemical compound OC=1N=CNN=1 LZTSCEYDCZBRCJ-UHFFFAOYSA-N 0.000 description 1
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 1
- AJARSKDYXXACJR-UHFFFAOYSA-N 1-[(dibutylamino)methyl]benzotriazole-4-carboxylic acid Chemical compound C1=CC=C2N(CN(CCCC)CCCC)N=NC2=C1C(O)=O AJARSKDYXXACJR-UHFFFAOYSA-N 0.000 description 1
- LQPDFQFGNCXQSL-UHFFFAOYSA-N 1-[(dioctylamino)methyl]benzotriazole-4-carboxylic acid Chemical compound C1=CC=C2N(CN(CCCCCCCC)CCCCCCCC)N=NC2=C1C(O)=O LQPDFQFGNCXQSL-UHFFFAOYSA-N 0.000 description 1
- KGEPBYXGRXRFGU-UHFFFAOYSA-N 1-[[bis(2-ethylhexyl)amino]methyl]benzotriazole-4-carboxylic acid Chemical compound C1=CC=C2N(CN(CC(CC)CCCC)CC(CC)CCCC)N=NC2=C1C(O)=O KGEPBYXGRXRFGU-UHFFFAOYSA-N 0.000 description 1
- DYNVQVFAPOVHNT-UHFFFAOYSA-N 1-[[bis(2-hydroxypropyl)amino]methyl]benzotriazole-4-carboxylic acid Chemical compound C1=CC=C2N(CN(CC(C)O)CC(O)C)N=NC2=C1C(O)=O DYNVQVFAPOVHNT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- RMSGQZDGSZOJMU-UHFFFAOYSA-N 1-butyl-2-phenylbenzene Chemical group CCCCC1=CC=CC=C1C1=CC=CC=C1 RMSGQZDGSZOJMU-UHFFFAOYSA-N 0.000 description 1
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- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- AFBBKYQYNPNMAT-UHFFFAOYSA-N 1h-1,2,4-triazol-1-ium-3-thiolate Chemical compound SC=1N=CNN=1 AFBBKYQYNPNMAT-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 1
- ITLDHFORLZTRJI-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-5-octoxyphenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1N1N=C2C=CC=CC2=N1 ITLDHFORLZTRJI-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- WKZLYSXRFUGBPI-UHFFFAOYSA-N 2-[benzotriazol-1-ylmethyl(2-hydroxyethyl)amino]ethanol Chemical compound C1=CC=C2N(CN(CCO)CCO)N=NC2=C1 WKZLYSXRFUGBPI-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- YTZPUTADNGREHA-UHFFFAOYSA-N 2h-benzo[e]benzotriazole Chemical compound C1=CC2=CC=CC=C2C2=NNN=C21 YTZPUTADNGREHA-UHFFFAOYSA-N 0.000 description 1
- ZDWPBMJZDNXTPG-UHFFFAOYSA-N 2h-benzotriazol-4-amine Chemical compound NC1=CC=CC2=C1NN=N2 ZDWPBMJZDNXTPG-UHFFFAOYSA-N 0.000 description 1
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 1
- HMVBQEAJQVQOTI-UHFFFAOYSA-N 3,5-dimethylhex-3-en-1-yne Chemical compound CC(C)C=C(C)C#C HMVBQEAJQVQOTI-UHFFFAOYSA-N 0.000 description 1
- WVIXTJQLKOLKTQ-UHFFFAOYSA-N 3-(benzotriazol-1-yl)propane-1,2-diol Chemical compound C1=CC=C2N(CC(O)CO)N=NC2=C1 WVIXTJQLKOLKTQ-UHFFFAOYSA-N 0.000 description 1
- MVRGLMCHDCMPKD-UHFFFAOYSA-N 3-amino-1h-1,2,4-triazole-5-carboxylic acid Chemical compound NC1=NNC(C(O)=O)=N1 MVRGLMCHDCMPKD-UHFFFAOYSA-N 0.000 description 1
- CQLAMJKGAKHIOC-UHFFFAOYSA-N 3-hydroxybenzotriazole-5-carboxylic acid Chemical compound OC(=O)C1=CC=C2N=NN(O)C2=C1 CQLAMJKGAKHIOC-UHFFFAOYSA-N 0.000 description 1
- GRGVQLWQXHFRHO-UHFFFAOYSA-N 3-methylpent-3-en-1-yne Chemical compound CC=C(C)C#C GRGVQLWQXHFRHO-UHFFFAOYSA-N 0.000 description 1
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- IMDPTYFNMLYSLH-UHFFFAOYSA-N 3-silylpropyl 2-methylprop-2-enoate Chemical class CC(=C)C(=O)OCCC[SiH3] IMDPTYFNMLYSLH-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- NGKNMHFWZMHABQ-UHFFFAOYSA-N 4-chloro-2h-benzotriazole Chemical compound ClC1=CC=CC2=NNN=C12 NGKNMHFWZMHABQ-UHFFFAOYSA-N 0.000 description 1
- QRHDSDJIMDCCKE-UHFFFAOYSA-N 4-ethyl-2h-benzotriazole Chemical compound CCC1=CC=CC2=C1N=NN2 QRHDSDJIMDCCKE-UHFFFAOYSA-N 0.000 description 1
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical compound [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 1
- WZUUZPAYWFIBDF-UHFFFAOYSA-N 5-amino-1,2-dihydro-1,2,4-triazole-3-thione Chemical compound NC1=NNC(S)=N1 WZUUZPAYWFIBDF-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 1
- JEPCASZHBPZHLT-KTKRTIGZSA-N C(CCCCCCC\C=C/CCCCCCCC)N1N=NC2=C1C1=C(C=C2)C=CC=C1 Chemical compound C(CCCCCCC\C=C/CCCCCCCC)N1N=NC2=C1C1=C(C=C2)C=CC=C1 JEPCASZHBPZHLT-KTKRTIGZSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical group N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- GJWAPAVRQYYSTK-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)amino]-dimethylsilicon Chemical compound C[Si](C)N[Si](C)C GJWAPAVRQYYSTK-UHFFFAOYSA-N 0.000 description 1
- NTSNXSJENBZFSF-UHFFFAOYSA-N [Na+].[SiH3][O-] Chemical compound [Na+].[SiH3][O-] NTSNXSJENBZFSF-UHFFFAOYSA-N 0.000 description 1
- QYJHBNLRANFWHO-UHFFFAOYSA-N [ethenyl-[(ethenyl-methyl-phenylsilyl)amino]-methylsilyl]benzene Chemical compound C=1C=CC=CC=1[Si](C)(C=C)N[Si](C)(C=C)C1=CC=CC=C1 QYJHBNLRANFWHO-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000004202 aminomethyl group Chemical group [H]N([H])C([H])([H])* 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- PMLUEBXXHBVGNR-UHFFFAOYSA-N benzene 2H-benzotriazole Chemical compound C1=CC=CC=C1.N1N=NC2=C1C=CC=C2 PMLUEBXXHBVGNR-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- VYLVYHXQOHJDJL-UHFFFAOYSA-K cerium trichloride Chemical compound Cl[Ce](Cl)Cl VYLVYHXQOHJDJL-UHFFFAOYSA-K 0.000 description 1
- HZMBANJECWHRGE-GNOQXXQHSA-K cerium(3+);(z)-octadec-9-enoate Chemical compound [Ce+3].CCCCCCCC\C=C/CCCCCCCC([O-])=O.CCCCCCCC\C=C/CCCCCCCC([O-])=O.CCCCCCCC\C=C/CCCCCCCC([O-])=O HZMBANJECWHRGE-GNOQXXQHSA-K 0.000 description 1
- GGVUYAXGAOIFIC-UHFFFAOYSA-K cerium(3+);2-ethylhexanoate Chemical compound [Ce+3].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O GGVUYAXGAOIFIC-UHFFFAOYSA-K 0.000 description 1
- WWLPQKCJNXAEFE-UHFFFAOYSA-K cerium(3+);dodecanoate Chemical compound [Ce+3].CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O WWLPQKCJNXAEFE-UHFFFAOYSA-K 0.000 description 1
- BTVVNGIPFPKDHO-UHFFFAOYSA-K cerium(3+);octadecanoate Chemical compound [Ce+3].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O BTVVNGIPFPKDHO-UHFFFAOYSA-K 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 150000007973 cyanuric acids Chemical class 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 229940069096 dodecene Drugs 0.000 description 1
- 125000005066 dodecenyl group Chemical group C(=CCCCCCCCCCC)* 0.000 description 1
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- ZMMBQCILDZFYKX-UHFFFAOYSA-N methyl 2h-benzotriazole-5-carboxylate Chemical compound C1=C(C(=O)OC)C=CC2=NNN=C21 ZMMBQCILDZFYKX-UHFFFAOYSA-N 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- ACXIAEKDVUJRSK-UHFFFAOYSA-N methyl(silyloxy)silane Chemical compound C[SiH2]O[SiH3] ACXIAEKDVUJRSK-UHFFFAOYSA-N 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- OKQVTLCUHATGDD-UHFFFAOYSA-N n-(benzotriazol-1-ylmethyl)-2-ethyl-n-(2-ethylhexyl)hexan-1-amine Chemical compound C1=CC=C2N(CN(CC(CC)CCCC)CC(CC)CCCC)N=NC2=C1 OKQVTLCUHATGDD-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000001367 organochlorosilanes Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical compound [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 210000004508 polar body Anatomy 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical group [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 238000003878 thermal aging Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- ZQTYRTSKQFQYPQ-UHFFFAOYSA-N trisiloxane Chemical compound [SiH3]O[SiH2]O[SiH3] ZQTYRTSKQFQYPQ-UHFFFAOYSA-N 0.000 description 1
- 125000005065 undecenyl group Chemical group C(=CCCCCCCCCC)* 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- MQWLIFWNJWLDCI-UHFFFAOYSA-L zinc;carbonate;hydrate Chemical compound O.[Zn+2].[O-]C([O-])=O MQWLIFWNJWLDCI-UHFFFAOYSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/14—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/10—Polycondensates containing more than one epoxy group per molecule of polyamines with epihalohydrins or precursors thereof
-
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Abstract
本發明提供一種新穎之有機矽氧烷、含有其作為接著促進劑而形成對各種基材之接著性優異之硬化物之硬化性聚矽氧組合物、及使用該組合物而成之可靠性優異之半導體裝置。
本發明提供一種通式所表示之有機矽氧烷,至少包含(A)一分子中具有至少2個烯基之有機聚矽氧烷、(B)一分子中具有至少2個與矽原子鍵結之氫原子之有機氫聚矽氧烷、(C)包含上述有機矽氧烷之接著促進劑、及(D)矽氫化反應用觸媒的硬化性聚矽氧組合物,及利用上述組合物之硬化物密封半導體元件而成之半導體裝置。
Description
本發明係關於一種新穎之有機矽氧烷、含有其作為接著促進劑之硬化性聚矽氧組合物、及使用其而製作之半導體裝置。
矽氫化反應硬化性聚矽氧組合物通常由於缺乏對金屬或有機樹脂、尤其是熱塑性樹脂等基材之接著性,故而例如提出有如下硬化性聚矽氧組合物:一種硬化性聚矽氧組合物,其包含:有機聚矽氧烷,其具有鍵結於矽原子之烯基;有機氫聚矽氧烷,其具有與矽原子鍵結之氫原子;接著促進劑,其包含分別具有選自環氧基、縮水甘油氧基、烷氧基矽烷基中之1種以上之官能基與選自交聯性之乙烯基與氫矽烷基(Si-H基)中之1種以上之基的異三聚氰酸衍生物;及矽氫化反應用觸媒(參照專利文獻1);一種硬化性聚矽氧組合物,其包含:有機聚矽氧烷,其於一分子中具有至少2個烯基;有機氫聚矽氧烷,其於一分子中具有至少2個與矽原子鍵結之氫原子;含異三聚氰酸環之有機矽氧烷,其於一分子中具有烯丙基、環氧基、及有機矽烷氧基;及矽氫化反應用觸媒(參照專利文獻2);及一種硬化性聚矽氧組合物,其包含:有機聚矽氧烷,其具有鍵結於矽原子之烯基;有機氫聚矽氧烷,其具有鍵結於矽原子之氫原子;接著促進劑,其包含分別具有烷氧基矽烷基及/或環氧基與二價之含矽烷氧基單元之基之異三聚氰酸
衍生物、與具有烷氧基及/或環氧基且不含異三聚氰酸環之矽烷或矽氧烷化合物;及矽氫化反應用觸媒(參照專利文獻3)。
然而,即便為該等硬化聚矽氧組合物,亦有對在硬化中途接觸之基材之接著力不充分之課題。
[專利文獻1]日本專利特開2010-065161號公報
[專利文獻2]日本專利特開2011-057755號公報
[專利文獻3]日本專利特開2011-208120號公報
本發明之目的在於提供一種新穎之有機矽氧烷、含有其作為接著促進劑而形成對各種基材之接著性優異之硬化物之硬化性聚矽氧組合物、及使用該組合物而成之可靠性優異之半導體裝置。
本發明之有機矽氧烷係由如下通式所表示:
{式中,R1為相同或不同之不具有脂肪族不飽和鍵之碳數1~12之一價烴基,R2為碳數2~12之烯基,R3為相同或不同之碳數1~3之烷基,X為通式:[化2]
(式中,R1與上述相同,R4為相同或不同之伸烷基,p為0~50之整數,q為0或1)
所表示之基,m為0~50之整數,n為1~50之整數}。
本發明之硬化性聚矽氧組合物含有上述有機矽氧烷作為接著促進劑,較佳為藉由矽氫化反應而進行硬化者,進而較佳為至少包含如下成分者:(A)一分子中具有至少2個烯基之有機聚矽氧烷100質量份、(B)一分子中具有至少2個與矽原子鍵結之氫原子之有機氫聚矽氧烷{相對於(A)成分與(C)成分中所含之烯基之合計1莫耳,提供0.1~10.0莫耳的與矽原子鍵結之氫原子之量}、(C)包含上述有機矽氧烷之接著促進劑0.01~50質量份、及(D)矽氫化反應用觸媒(對促進本組合物之硬化而言足夠之量)。
本發明之半導體裝置之特徵在於:利用上述硬化性聚矽氧組合物之硬化物密封半導體元件,較佳為該半導體元件為發光元件。
本發明之有機矽氧烷為新穎之化合物,且具有可對硬化性聚矽
氧組合物賦予優異之接著性之特徵。又,本發明之硬化性聚矽氧組合物具有形成對在硬化中途接觸之各種基材之接著性優異之硬化物之特徵。進而,本發明之半導體裝置由於利用上述組合物之硬化物被覆半導體元件,故而具有可靠性優異之特徵。
1‧‧‧發光元件
2‧‧‧引線框架
3‧‧‧引線框架
4‧‧‧接合線
5‧‧‧框架材料
6‧‧‧硬化性聚矽氧組合物之硬化物
圖1係作為本發明之半導體裝置之一例之LED(Light Emitting Diode,發光二極體)之剖面圖。
首先,對本發明之有機矽氧烷詳細地進行說明。
本發明之有機矽氧烷係由如下通式所表示:
式中,R1為相同或不同之不具有脂肪族不飽和鍵之碳數1~12之一價烴基。具體而言,可例示:甲基、乙基、丙基、異丙基、丁基、異丁基、第三丁基、戊基、新戊基、己基、環己基、庚基、辛基、壬基、癸基、十一烷基、十二烷基等烷基;苯基、甲苯基、二甲苯基、萘基等芳基;苄基、苯乙基、苯基丙基等芳烷基;將該等基之氫原子之一部分或全部利用氟原子、氯原子、溴原子等鹵素原子進行取代而成之基,較佳為甲基、苯基。
式中,R2為碳數2~12之烯基。具體而言,可例示:乙烯基、烯丙基、丁烯基、戊烯基、己烯基、庚烯基、辛烯基、壬烯基、癸烯
基、十一烯基、十二烯基,較佳為乙烯基。
式中,R3為相同或不同之碳數1~3之烷基。具體而言,可例示:甲基、乙基、丙基,較佳為甲基。
式中,X為如下通式所表示之基:
式中,R1為相同或不同之不具有脂肪族不飽和鍵之碳數1~12之一價烴基,可例示與上述相同之基。
式中,R4為相同或不同之碳數2~12之伸烷基。具體而言,可例示:伸乙基、伸丙基、伸丁基、伸戊基、伸己基、伸庚基、伸辛基、伸壬基、伸癸基、伸十一烷基、伸十二烷基,較佳為伸乙基、伸丙基。
式中,p為0~50之整數,較佳為0~30之整數,進而較佳為0~10之整數。又,式中,q為0或1。
式中,m為0~50之整數,較佳為0~30之整數,進而較佳為0~15之整數。又,式中,n為1~50之整數,較佳為1~30之整數,進而較佳為1~15之整數。又,m+n為2~100之整數,較佳為2~50之整
數,進而較佳為2~30之整數。其原因在於,若m為上限以上,則於硬化性聚矽氧組合物中之溶解性減少,且其原因在於,若n為下限以上,則接著促進劑容易被導入至硬化性聚矽氧組合物中,另一方面,其原因在於,若為上限以下,則不易引起硬化抑制。又,其原因在於,若m+n為下限以上,則容易溶解於硬化性聚矽氧組合物中,另一方面,其原因在於,若為上限以下,則操作性提高。
製備此種有機矽氧烷之方法並無限定,例如可列舉如下方法:使通式:
所表示之有機矽氧烷與通式:
所表示之化合物於酸或者鹼觸媒下進行反應。
於上述有機矽氧烷中,式中之R1為相同或不同之不具有脂肪族不飽和鍵之碳數1~12之一價烴基,可例示與上述相同之基。又,式中,R2為碳數2~12之烯基,可例示與上述相同之基。又,式中,m及n係與上述相同之整數。
作為此種有機矽氧烷,可例示如下所述者。再者,式中,m'為1~50之整數,n為1~50之整數。
又,於上述化合物中,式中,R1為相同或不同之不具有脂肪族不
飽和鍵之碳數1~12之一價烴基,可例示與上述相同之基。又,式中,R3為相同或不同之碳數1~3之烷基,可例示與上述相同之基。又,式中,R4為相同或不同之碳數2~12之伸烷基,可例示與上述相同之基。又,式中,p係與上述相同之整數,q為0或1。
作為此種化合物,可例示如下所述者。
於上述製備方法中,需要使相對於上述有機矽氧烷1莫耳,上述化合物至少成為1莫耳~2莫耳之量進行反應。其原因在於,若上述化合物之量為上述範圍之下限以上,則所獲得之有機矽氧烷可對硬化性聚矽氧組合物賦予充分之接著性,另一方面,若為上述範圍之上限以下,則所獲得之有機矽氧烷會與矽氫化反應硬化性聚矽氧組合物中之與矽原子鍵結之氫原子進行反應,而可提高所獲得之硬化物之透過率。
作為上述製備方法中所使用之酸,可例示:鹽酸、乙酸、甲酸、硝酸、草酸、硫酸、磷酸、多磷酸、多元羧酸、三氟甲磺酸、離子交換樹脂。又,作為上述製備方法中所使用之鹼,可例示:氫氧化
鉀、氫氧化鈉、氫氧化鈣、氫氧化鎂等無機鹼;三乙基胺、二乙基胺、單乙醇胺、二乙醇胺、三乙醇胺、氨水、氫氧化四甲基銨、具有胺基之烷氧基矽烷、胺基丙基三甲氧基矽烷、矽醇鈉、矽醇鉀等有機鹼化合物。
於上述製備方法中,可使用有機溶劑。作為可使用之有機溶劑,可例示:醚類、酮類、乙酸酯類、芳香族或脂肪族烴、γ-丁內酯、及該等之2種以上之混合物。作為較佳之有機溶劑,可例示:丙二醇單甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚、丙二醇單丙醚、丙二醇單丁醚、丙二醇單-第三丁基醚、γ-丁內酯、甲苯、二甲苯。
於上述製備方法中,該反應因加熱而得到促進,於使用有機溶劑之情形時,較佳為於其回流溫度下進行反應。
其次,對本發明之硬化性聚矽氧組合物進行說明。
本發明之硬化性聚矽氧組合物之特徵在於:其含有上述有機矽氧烷作為接著促進劑。此種硬化性聚矽氧組合物之硬化機制並無限定,可例示:矽氫化反應、縮合反應、自由基反應,較佳為矽氫化反應。作為該矽氫化反應硬化性聚矽氧組合物,較佳為至少包含如下成分者:(A)一分子中具有至少2個烯基之有機聚矽氧烷100質量份、(B)一分子中具有至少2個與矽原子鍵結之氫原子之有機氫聚矽氧烷{相對於(A)成分與(C)成分中所含之烯基之合計1莫耳,提供0.1~10莫耳的與矽原子鍵結之氫原子之量}、(C)包含上述有機矽氧烷之接著促進劑0.01~50質量份、及(D)矽氫化反應用觸媒。
(A)成分係作為本組合物之主劑之一分子中具有至少2個烯基之有機聚矽氧烷。作為(A)成分中之烯基,可例示:乙烯基、烯丙基、丁烯基、戊烯基、己烯基、庚烯基、辛烯基、壬烯基、癸烯基、十一烯
基、十二烯基等碳數為2~12個之烯基,較佳為乙烯基。又,作為(A)成分中之烯基以外之鍵結於矽原子之基,可例示:甲基、乙基、丙基、異丙基、丁基、異丁基、第三丁基、戊基、新戊基、己基、環己基、庚基、辛基、壬基、癸基、十一烷基、十二烷基等碳數為1~12個之烷基;苯基、甲苯基、二甲苯基、萘基等碳數為6~20個之芳基;苄基、苯乙基、苯基丙基等碳數為7~20個之芳烷基;將該等基之氫原子之一部分或全部利用氟原子、氯原子、溴原子等鹵素原子進行取代而成之基。再者,於(A)成分中之矽原子上,於不損及本發明之目的之範圍內,亦可具有少量羥基或甲氧基、乙氧基等烷氧基。
(A)成分之分子結構並無特別限定,可例示:直鏈狀、一部分具有支鏈之直鏈狀、支鏈狀、環狀、及三維網狀結構。(A)成分亦可為具有該等分子結構之1種之有機聚矽氧烷、或具有該等分子結構之2種以上之有機聚矽氧烷混合物。
(A)成分於25℃下之性狀並無限定,例如為液狀或固體狀。於(A)成分為液狀之情形時,其25℃下之黏度較佳為1~1,000,000mPa‧s之範圍內,尤佳為10~1,000,000mPa‧s之範圍內。再者,該黏度例如可藉由使用依據JIS K 7117-1之B型黏度計之測定而求出。
作為此種(A)成分,除可例示分子鏈兩末端經二甲基乙烯基矽烷氧基封端之二甲基聚矽氧烷、分子鏈兩末端經二甲基乙烯基矽烷氧基封端之二甲基矽氧烷-甲基乙烯基矽氧烷共聚物、分子鏈兩末端經二甲基乙烯基矽烷氧基封端之二甲基矽氧烷-甲基苯基矽氧烷共聚物、分子鏈兩末端經二甲基乙烯基矽烷氧基封端之甲基苯基聚矽氧烷、分子鏈兩末端經三甲基矽烷氧基封端之二甲基矽氧烷-甲基乙烯基矽氧烷共聚物、分子鏈兩末端經三甲基矽烷氧基封端之二甲基矽氧烷-甲基乙烯基矽氧烷-甲基苯基矽氧烷共聚物、包含(CH3)3SiO1/2單元、(CH3)2(CH2=CH)SiO1/2單元及SiO4/2單元之共聚物、包含
(CH3)2(CH2=CH)SiO1/2單元與SiO4/2單元之共聚物以外,亦可例示如下所述之有機聚矽氧烷。再者,式中,Me、Vi、Ph分別表示甲基、乙烯基、苯基,x、x'分別為1~5,000之整數。
ViMe2SiO(Me2SiO)xSiMe2Vi
ViPhMeSiO(Me2SiO)xSiMePhVi
ViPh2SiO(Me2SiO)xSiPh2Vi
ViMe2SiO(Me2SiO)x(Ph2SiO)x'SiMe2Vi
ViPhMeSiO(Me2SiO)x(Ph2SiO)x'SiPhMeVi
ViPh2SiO(Me2SiO)x(Ph2SiO)x'SiPh2Vi
ViMe2SiO(MePhSiO)zSiMe2Vi
MePhViSiO(MePhSiO)xSiMePhVi
Ph2ViSiO(MePhSiO)xSiPh2Vi
ViMe2SiO(Ph2SiO)x(PhMeSiO)x'SiMe2Vi
ViPhMeSiO(Ph2SiO)x(PhMeSiO)x'SiPhMeVi
ViPh2SiO(Ph2SiO)x(PhMeSiO)x'SiPh2Vi
(B)成分為本組合物之交聯劑,係一分子中具有至少2個與矽原子鍵結之氫原子之有機聚矽氧烷。作為(B)成分之分子結構,例如可列舉:直鏈狀、一部分具有支鏈之直鏈狀、支鏈狀、環狀、樹枝狀,較佳為直鏈狀、一部分具有支鏈之直鏈狀、樹枝狀。(B)成分中之與矽原子鍵結之氫原子之鍵結位置並無限定,例如可列舉分子鏈之末端及/或側鏈。又,作為(B)成分中之與矽原子鍵結之氫原子以外之與矽原子鍵結之基,可例示:甲基、乙基、丙基等烷基;苯基、甲苯基、二甲苯基等芳基;苄基、苯乙基等芳烷基;3-氯丙基、3,3,3-三氟丙基等鹵化烷基,較佳為甲基、苯基。又,(B)成分之黏度並無特別限定,25℃下之黏度較佳為1~10,000mPa‧s之範圍內,尤佳為1~1,000mPa‧s之範圍內。
作為此種(B)成分,除可例示1,1,3,3-四甲基二矽氧烷、1,3,5,7-四甲基環四矽氧烷、三(二甲基氫矽烷氧基)甲基矽烷、三(二甲基氫矽烷氧基)苯基矽烷、1-縮水甘油氧基丙基-1,3,5,7-四甲基環四矽氧烷、1,5-縮水甘油氧基丙基-1,3,5,7-四甲基環四矽氧烷、1-縮水甘油氧基丙基-5-三甲氧基矽烷基乙基-1,3,5,7-四甲基環四矽氧烷、分子鏈兩末端經三甲基矽烷氧基封端之甲基氫聚矽氧烷、分子鏈兩末端經三甲基矽烷氧基封端之二甲基矽氧烷-甲基氫矽氧烷共聚物、分子鏈兩末端經二甲基氫矽烷氧基封端之二甲基聚矽氧烷、分子鏈兩末端經二甲基氫矽烷氧基封端之二甲基矽氧烷-甲基氫矽氧烷共聚物、分子鏈兩末端經三甲基矽烷氧基封端之甲基氫矽氧烷-二苯基矽氧烷共聚物、分子鏈兩末端經三甲基矽烷氧基封端之甲基氫矽氧烷-二苯基矽氧烷-二甲基矽氧烷共聚物、三甲氧基矽烷之水解縮合物、包含(CH3)2HSiO1/2單元與SiO4/2單元之共聚物、及包含(CH3)2HSiO1/2單元、SiO4/2單元及(C6H5)SiO3/2單元之共聚物以外,亦可例示如下所述之有機氫聚矽氧烷。再者,式中,Me、Vi、Ph分別表示甲基、乙烯基、苯基,y、y'分別為1~100之整數,c、d、e、f分別為正數,其中,c、d、e、f之合計為1。
HMe2SiO(Ph2SiO)ySiMe2H
HMePhSiO(Ph2SiO)ySiMePhH
HMeNaphSiO(Ph2SiO)ySiMeNaphH
HMePhSiO(Ph2SiO)y(MePhSiO)y'SiMePhH
HMePhSiO(Ph2SiO)y(Me2SiO)y'SiMePhH
(HMe2SiO1/2)c(PhSiO3/2)d
(HMePhSiO1/2)c(PhSiO3/2)d
(HMePhSiO1/2)c(NaphSiO3/2)d
(HMe2SiO1/2)c(NaphSiO3/2)d
(HMePhSiO1/2)c(HMe2SiO1/2)d(PhSiO3/2)e
(HMe2SiO1/2)c(Ph2SiO2/2)d(PhSiO3/2)e
(HMePhSiO1/2)c(Ph2SiO2/2)d(PhSiO3/2)e
(HMe2SiO1/2)c(Ph2SiO2/2)d(NaphSiO3/2)e
(HMePhSiO1/2)c(Ph2SiO2/2)d(NaphSiO3/2)e
(HMePhSiO1/2)c(HMe2SiO1/2)d(NaphSiO3/2)e
(HMePhSiO1/2)c(HMe2SiO1/2)d(Ph2SiO2/2)e(NaphSiO3/2)f
(HMePhSiO1/2)c(HMe2SiO1/2)d(Ph2SiO2/2)e(PhSiO3/2)f
(B)成分之含量係相對於(A)成分及(C)成分中所含之烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.1~10莫耳之量,較佳為成為0.5~5莫耳之量。其原因在於,若(B)成分之含量為上述範圍之上限以下,則所獲得之硬化物之機械特性良好,另一方面,若為上述範圍之下限以上,則所獲得之組合物之硬化性良好。
(C)成分係用於對本組合物賦予接著性之接著促進劑。關於(C)成分,如上所述。關於(C)成分之含量,相對於(A)成分100質量份,為0.01~50質量份之範圍內,較佳為0.1~20質量份之範圍內。其原因在於,若(C)成分之含量為上述範圍之下限以上,則可對所獲得之組合物賦予充分之接著性,另一方面,若為上述範圍之下限以下,則不易抑制所獲得之組合物之硬化性,又,可抑制所獲得之硬化物之著色等。
(D)成分係用於促進本組合物之硬化之矽氫化反應用觸媒,可例示:鉑系觸媒、銠系觸媒、鈀系觸媒。尤其是就可明顯促進本組合物之硬化之觀點而言,(D)成分較佳為鉑系觸媒。作為該鉑系觸媒,可例示:鉑微粉末、氯鉑酸、氯鉑酸之醇溶液、鉑-烯基矽氧烷錯合物、鉑-烯烴錯合物、鉑-羰基錯合物,較佳為鉑-烯基矽氧烷錯合物。
(D)成分之含量係對用於促進本組合物之硬化而言有效之量。具
體而言,關於(D)成分之含量,就可充分地促進本組合物之硬化反應之觀點而言,相對於本組合物,以質量單位計,較佳為(D)成分中之觸媒金屬成為0.01~500ppm之範圍內之量,進而較佳為成為0.01~100ppm之範圍內之量,尤佳為成為0.01~50ppm之範圍內之量。
又,於本組合物中,亦可含有2-甲基-3-丁炔-2-醇、3,5-二甲基-1-己炔-3-醇、2-苯基-3-丁炔-2-醇等炔醇;3-甲基-3-戊烯-1-炔、3,5-二甲基-3-己烯-1-炔等烯炔化合物;1,3,5,7-四甲基-1,3,5,7-四乙烯基環四矽氧烷、1,3,5,7-四甲基-1,3,5,7-四己烯基環四矽氧烷、苯并三唑等(E)矽氫化反應抑制劑作為其他任意成分。於本組合物中,該(E)成分之含量並無特別限定,相對於上述(A)成分~(D)成分之合計100質量份,較佳為0.0001~5質量份之範圍內。
進而,於本組合物中,為了提高硬化物對在硬化中途接觸之基材之接著性,亦可含有(C)成分以外之接著促進劑。作為該接著促進劑,較佳為一分子中具有至少1個鍵結於矽原子之烷氧基之有機矽化合物。作為該烷氧基,可例示:甲氧基、乙氧基、丙氧基、丁氧基、甲氧基乙氧基,尤佳為甲氧基。又,作為鍵結於該有機矽化合物之矽原子之烷氧基以外之基,可例示:烷基、烯基、芳基、芳烷基、鹵化烷基等經取代或者未經取代之一價烴基;3-縮水甘油氧基丙基、4-縮水甘油氧基丁基等縮水甘油氧基烷基;2-(3,4-環氧基環己基)乙基、3-(3,4-環氧基環己基)丙基等環氧基環己基烷基;3,4-環氧基丁基、7,8-環氧基辛基等環氧基烷基;3-甲基丙烯醯氧基丙基等含丙烯醯基之一價有機基;氫原子。該有機矽化合物較佳為具有與矽原子鍵結之烯基或與矽原子鍵結之氫原子。作為此種有機矽化合物,可例示:有機矽烷化合物、有機矽氧烷低聚物、烷基矽酸鹽。作為該有機矽氧烷低聚物或烷基矽酸鹽之分子結構,可例示:直鏈狀、一部分具有支鏈之直鏈狀、支鏈狀、環狀、網狀,尤佳為直鏈狀、支鏈狀、網狀。作為此
種有機矽化合物,可例示:3-縮水甘油氧基丙基三甲氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷等矽烷化合物;一分子中分別具有至少各1個與矽原子鍵結之烯基或者與矽原子鍵結之氫原子、及與矽原子鍵結之烷氧基之矽氧烷化合物、具有至少1個與矽原子鍵結之烷氧基之矽烷化合物或矽氧烷化合物和一分子中分別具有至少各1個與矽原子鍵結之羥基及與矽原子鍵結之烯基之矽氧烷化合物的混合物、甲基聚矽酸鹽、乙基聚矽酸鹽、含環氧基之乙基聚矽酸鹽。
進而,於本組合物中,亦可含有用於對自利用本組成之硬化物密封或者被覆而成之發光元件發出的光之波長進行轉換,而獲得所需之波長之光之螢光體。作為此種螢光體,可例示廣泛地用於發光二極體(LED)之包含氧化物系螢光體、氮氧化物系螢光體、氮化物系螢光體、硫化物系螢光體、氧硫化物系螢光體等之黃色、紅色、綠色、藍色發光螢光體。作為氧化物系螢光體,可例示:包含鈰離子之釔、鋁、石榴石系之YAG系綠色~黃色發光螢光體、包含鈰離子之鋱、鋁、石榴石系之TAG系黃色發光螢光體、及包含鈰或銪離子之矽酸鹽系綠色~黃色發光螢光體。作為氮氧化物系螢光體,可例示包含銪離子之矽、鋁、氧、氮系之賽隆系紅色~綠色發光螢光體。作為氮化物系螢光體,可例示包含銪離子之鈣、鍶、鋁、矽、氮系之CASN系紅色發光螢光體。作為硫化物系螢光體,可例示包含銅離子或鋁離子之ZnS系綠色發色螢光體。作為氧硫化物系螢光體,可例示包含銪離子之Y2O2S系紅色發光螢光體。該等螢光體亦可使用1種或者2種以上之混合物。於本組合物中,關於螢光體之含量,相對於(A)成分~(D)成分之合計量,為0.1~70質量%之範圍內,較佳為1~20質量%之範圍內。
又,於本組合物中,只要不損及本發明之目的,則亦可含有二
氧化矽、玻璃、氧化鋁、氧化鋅等無機質填充劑;聚甲基丙烯酸酯樹脂等有機樹脂微粉末;耐熱劑、染料、顏料、阻燃性賦予劑、溶劑等作為其他任意成分。
於本組合物中,進而,為了充分地抑制由空氣中之含硫氣體所引起之光半導體裝置中之銀電極或基板的銀鍍層之變色,亦可含有選自由如下微粉末所組成之群中之平均粒徑為0.1nm~5μm之至少一種微粉末:表面被覆有選自由Al、Ag、Cu、Fe、Sb、Si、Sn、Ti、Zr、及稀土元素所組成之群中之至少1種元素之氧化物而成之氧化鋅微粉末、利用不具有烯基之有機矽化合物進行表面處理而成之氧化鋅微粉末、及碳酸鋅之水合物微粉末。
於表面被覆有氧化物而成之氧化鋅微粉末中,作為稀土元素,可例示:釔、鈰、銪。作為氧化鋅微粉末之表面之氧化物,可例示:Al2O3、AgO、Ag2O、Ag2O3、CuO、Cu2O、FeO、Fe2O3、Fe3O4、Sb2O3、SiO2、SnO2、Ti2O3、TiO2、Ti3O5、ZrO2、Y2O3、CeO2、Eu2O3、及該等氧化物之2種以上之混合物。
於利用有機矽化合物進行表面處理而成之氧化鋅微粉末中,該有機矽化合物係不具有烯基者,可例示:有機矽烷、有機矽氮烷、聚甲基矽氧烷、有機氫聚矽氧烷、及有機矽氧烷低聚物,具體而言,可例示:三甲基氯矽烷、二甲基氯矽烷、甲基三氯矽烷等有機氯矽烷;甲基三甲氧基矽烷、甲基三乙氧基矽烷、苯基三甲氧基矽烷、乙基三甲氧基矽烷、正丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷等有機三烷氧基矽烷;二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二苯基二甲氧基矽烷等二有機二烷氧基矽烷;三甲基甲氧基矽烷、三甲基乙氧基矽烷等三有機烷氧基矽烷;該等有機烷氧基矽烷之部分縮合物;六甲基二矽氮烷等有機矽氮烷;聚甲基矽氧烷、有機氫聚矽氧烷、具有矽烷醇基或者烷氧基之有機矽氧烷低聚物、包含
R8SiO3/2單元(式中,R8為甲基、乙基、丙基等烷基;苯基等芳基中所例示之除烯基以外之一價烴基)或SiO4/2單元且具有矽烷醇基或烷氧基之樹脂狀有機聚矽氧烷。
又,於本組合物中,就可進一步抑制由空氣中之含硫氣體所引起之銀電極或基板的銀鍍層之變色之觀點而言,亦可含有三唑系化合物作為任意成分。具體而言,可例示:1H-1,2,3-三唑、2H-1,2,3-三唑、1H-1,2,4-三唑、4H-1,2,4-三唑、2-(2'-羥基-5'-甲基苯基)苯并三唑、1H-1,2,3-三唑、2H-1,2,3-三唑、1H-1,2,4-三唑、4H-1,2,4-三唑、苯并三唑、甲苯基三唑、羧基苯并三唑、1H-苯并三唑-5-羧酸甲酯、3-胺基-1,2,4-三唑、4-胺基-1,2,4-三唑、5-胺基-1,2,4-三唑、3-巰基-1,2,4-三唑、氯苯并三唑、硝基苯并三唑、胺基苯并三唑、環己基[1,2-d]三唑、4,5,6,7-四羥基甲苯基三唑、1-羥基苯并三唑、乙基苯并三唑、萘并三唑、1-N,N-雙(2-乙基己基)-[(1,2,4-三唑-1-基)甲基]胺、1-[N,N-雙(2-乙基己基)胺基甲基]苯并三唑、1-[N,N-雙(2-乙基己基)胺基甲基]甲苯基三唑、1-[N,N-雙(2-乙基己基)胺基甲基]羧基苯并三唑、1-[N,N-雙(2-羥基乙基)-胺基甲基]苯并三唑、1-[N,N-雙(2-羥基乙基)-胺基甲基]甲苯基三唑、1-[N,N-雙(2-羥基乙基)-胺基甲基]羧基苯并三唑、1-[N,N-雙(2-羥基丙基)胺基甲基]羧基苯并三唑、1-[N,N-雙(1-丁基)胺基甲基]羧基苯并三唑、1-[N,N-雙(1-辛基)胺基甲基]羧基苯并三唑、1-(2',3'-二-羥基丙基)苯并三唑、1-(2',3'-二-羧基乙基)苯并三唑、2-(2'-羥基-3',5'-二-第三丁基苯基)苯并三唑、2-(2'-羥基-3',5'-戊基苯基)苯并三唑、2-(2'-羥基-4'-辛氧基苯基)苯并三唑、2-(2'-羥基-5'-第三丁基苯基)苯并三唑、1-羥基苯并三唑-6-羧酸、1-油醯基苯并三唑、1,2,4-三唑-3-醇、5-胺基-3-巰基-1,2,4-三唑、5-胺基-1,2,4-三唑-3-羧酸、1,2,4-三唑-3-羧基醯胺、4-胺基脲唑、及1,2,4-三唑-5-酮。該三唑系化合物之含量並無特別限定,於本組合物中,係以質量單位
計成為0.01ppm~3%之範圍內之量,較佳為成為0.1ppm~1%之範圍內之量。
於本組合物中,為了進一步抑制由所獲得之硬化物之熱老化引起之龜裂,亦可含有含鈰之有機聚矽氧烷作為其他任意成分。含鈰之有機聚矽氧烷例如可藉由氯化鈰或羧酸之鈰鹽、含矽烷醇基之有機聚矽氧烷之鹼金屬鹽之反應而製備。
作為上述羧酸之鈰鹽,可例示:2-乙基己酸鈰、環烷酸鈰、油酸鈰、月桂酸鈰、及硬脂酸鈰。
又,作為上述含矽烷醇基之有機聚矽氧烷之鹼金屬鹽,可例示:分子鏈兩末端經矽烷醇基封端之二有機聚矽氧烷之鉀鹽、分子鏈兩末端經矽烷醇基封端之二有機聚矽氧烷之鈉鹽、分子鏈單末端經矽烷醇基封端且另一分子鏈單末端經三有機矽烷氧基封端之二有機聚矽氧烷之鉀鹽、及分子鏈單末端經矽烷醇基封端且另一分子鏈單末端經三有機矽烷氧基封端之二有機聚矽氧烷之鈉鹽。再者,作為該有機聚矽氧烷中之鍵結於矽原子之基,可例示:甲基、乙基、丙基、異丙基、正丁基、異丁基、第三丁基、正戊基、新戊基、己基、環己基、庚基、辛基、壬基、癸基、十一烷基、及十二烷基等碳數為1~12個之烷基;苯基、甲苯基、二甲苯基、及萘基等碳數為6~20個之芳基;苄基、苯乙基、及苯基丙基等碳數為7~20個之芳烷基;以及將該等基之氫原子之一部分或全部利用氟原子、氯原子、溴原子等鹵素原子進行取代而成之基。
上述反應係於甲醇、乙醇、異丙醇、及丁醇等醇;甲苯、及二甲苯等芳香族烴;己烷、及庚烷等脂肪族烴;礦油精、石油英(ligroin)、及石油醚等有機溶劑中,以室溫或者藉由進行加熱而進行。又,所獲得之反應產物較佳為視需要將有機溶劑或低沸點成分蒸餾去除,或將沈澱物過濾。又,為了促進該反應,亦可添加二烷基甲
醯胺、六烷基磷醯胺等。以上述方式製備之含鈰之有機聚矽氧烷中之鈰原子的含量較佳為0.1~5質量%之範圍內。
含鈰之有機聚矽氧烷之含量並無特別限定,較佳為相對於本組合物之鈰原子以質量單位計成為10~2,000ppm之範圍內之量、成為20~2,000ppm之範圍內之量、成為20~1,000ppm之範圍內之量、或成為20~500ppm之範圍內之量。其原因在於,若含鈰之有機聚矽氧烷之含量為上述範圍之下限以上,則可提高所獲得之硬化物之耐熱性,另一方面,若為上述範圍之上限以下,則可減少用於光半導體器件中之情形時之發光色度變化。
本組合物係以室溫或者藉由加熱而進行硬化,為了使之迅速地硬化,較佳為進行加熱。作為其加熱溫度,較佳為50~200℃之範圍內。
其次,對本發明之半導體裝置詳細地進行說明。
本發明之半導體裝置之特徵在於:其係利用上述硬化性聚矽氧組合物之硬化物密封半導體元件而成。作為此種本發明之半導體裝置,可例示:發光二極體(LED)、光電耦合器、CCD(Charge Coupled Device,電荷耦合元件)。又,作為半導體元件,可例示:發光二極體(LED)晶片、固體攝像元件。
將作為本發明之半導體裝置之一例之單體之表面安裝型LED之剖面圖示於圖1。圖1所示之LED中,發光元件(LED晶片)1被黏晶於引線框架2上,該發光元件(LED晶片)1與引線框架3係利用接合線4而進行引線接合。於該發光元件(LED晶片)1之周圍設置有框架材料5,該框架材料5之內側之發光元件(LED晶片)1係利用本發明之硬化性聚矽氧組合物之硬化物6而被密封。
作為製造圖1所示之表面安裝型LED之方法,可例示如下之方法:將發光元件(LED晶片)1黏晶於引線框架2,利用金製接合線4對該
發光元件(LED晶片)1與引線框架3進行引線接合,繼而,於設置於發光元件(LED晶片)1之周圍之框架材料5之內側填充本發明之硬化性聚矽氧組合物,然後於50~200℃下進行加熱,藉此使之硬化。
藉由實施例對本發明之有機矽氧烷、硬化性聚矽氧組合物、及半導體裝置詳細地進行說明。再者,式中,Me、Vi、Ph、Ep分別表示甲基、乙烯基、苯基、3-縮水甘油氧基丙基。
[參考例1]
於反應容器中,投入苯基三甲氧基矽烷400g(2.02mol)及1,3-二乙烯基-1,3-二苯基二甲基二矽氧烷93.5g(0.30mol),預先進行混合後,投入三氟甲磺酸1.74g(11.6mmol),於攪拌下,投入水110g(6.1mol),進行2小時加熱回流。其後,進行加熱常壓蒸餾去除直至達到85℃。繼而,投入甲苯89g及氫氧化鉀1.18g(21.1mmol),進行加熱常壓蒸餾去除直至反應溫度達到120℃,並於該溫度下使之反應6小時。其後,冷卻至室溫,投入乙酸0.68g(11.4mmol),進行中和。將所產生之鹽過濾分離後,自所獲得之透明之溶液將低沸點物加熱減壓去除,而製備如下平均單元式所表示之有機聚矽氧烷樹脂347g(產率:98%):(MePhViSiO1/2)0.23(PhSiO3/2)0.77。
[實施例1]
於反應容器中,添加平均式:
所表示之有機矽氧烷190g、式:
所表示之化合物598g、及矽醇鉀0.23g,並於120~130℃下加熱6小時,而獲得淡黃色液體。對該液體進行NMR(Nuclear Magnetic Resonance,核磁共振)分析,結果得知為平均式:
(式中,X為式:[化14]
所表示之基)
所表示之有機矽氧烷。
[實施例2]
於反應容器中,添加式:
所表示之有機矽氧烷26g、式:[化16]
所表示之化合物30g、及氫氧化鈣1.7g,並於100℃下加熱6小時,而獲得淡黃色液體。對該液體進行NMR分析,結果得知為平均式:
(式中,X為式:[化18]
所表示之基)
所表示之有機矽氧烷。
[實施例3]
於反應容器中,添加式:
所表示之有機矽氧烷10g、式:[化20]
所表示之化合物9.8g、氫氧化鈣1.1g,並於120~130℃下加熱6小時,而獲得淡黃色液體。對該液體進行NMR分析,結果得知為平均式:
(式中,X為式:[化22]
所表示之基)
所表示之有機矽氧烷。
[實施例4~8、比較例1~3]
使用下述成分,製備表1所示之硬化性聚矽氧組合物。再者,表1中,(D)成分之含量係以質量單位之鉑金屬相對於硬化性聚矽氧組合物之含量(ppm)表示。又,表1中,SiH/Vi表示(B)成分中之與矽原子鍵結之氫原子相對於(A)成分及(C)成分中所含之烯基之合計1莫耳之莫耳數。
使用以下之成分作為(A)成分。
(A-1)成分:平均單元式:
(Me2ViSiO1/2)0.2(PhSiO3/2)0.8
所表示之有機聚矽氧烷
(A-2)成分:參考例1中所製備之平均單元式
(MePhViSiO1/2)0.23(PhSiO3/2)0.77
所表示之有機聚矽氧烷
(A-3)成分:黏度為3,000mPa‧s之分子鏈兩末端經二甲基乙烯基矽烷氧基封端之甲基苯基聚矽氧烷
使用以下之成分作為(B)成分。
(B-1)成分:式:
HMe2SiOPh2SiOSiMe2H
所表示之有機三矽氧烷
使用以下之成分作為(C)成分。
(C-1)成分:包含實施例1中所製備之有機矽氧烷之接著促進劑
(C-2)成分:包含實施例2中所製備之有機矽氧烷之接著促進劑
(C-3)成分:包含實施例3中所製備之有機矽氧烷之接著促進劑
(C-4)成分:包含25℃下之黏度為30mPa‧s之分子鏈兩末端經矽烷醇基封端之甲基乙烯基矽氧烷低聚物與3-縮水甘油氧基丙基三甲氧基矽烷之縮合反應物的接著促進劑
使用以下之成分作為(D)成分。
(D-1)成分:鉑-1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3,5,7-四甲基-1,3,5,7-四乙烯基環四矽氧烷之溶液(以鉑計含有0.1質量%之溶液)
以如下方式測定硬化性聚矽氧組合物之硬化物之接著力。
[接著力]
將開有直徑5mm之孔之厚度2mm之氟樹脂製之間隔件設置於接著用測試面板(鋁板,PPA(Polyphthalamide,聚鄰苯二甲醯胺)樹脂板,銀板)上,於上述間隔件之孔之中流入硬化性聚矽氧組合物,然後於150℃之熱風循環式烘箱中放置1小時,藉此製作直徑5mm×高度2mm之圓柱狀之硬化物。使用晶片剪切強度測定裝置以50mm/min之速度將該硬化物剝離,並測定此時之荷重(MPa)。
使用硬化性聚矽氧組合物以如下方式製作表面安裝型之發光二極體(LED)。
[發光二極體之製作]
引線框架2、3朝向底部封閉之圓筒狀之聚鄰苯二甲醯胺(PPA)樹脂製框架材料5(內徑2.0mm,深度1.0mm)之內底部之中心部自側壁延出,於引線框架2之中央部上載置有LED晶片1,於LED晶片1與引線框架3利用接合線4進行電性連接之未密封之發光二極體內,藉由分注器注入經消泡之硬化性聚矽氧組合物。其後,於加熱烘箱中,於100℃下加熱30分鐘,繼而於150℃加熱下1小時,而使硬化性聚矽氧組合物硬化,藉此製作圖1所示之發光二極體。
[油墨試驗]
將藉由上述方法製作之16個發光二極體浸漬於市售之紅油墨中,於50℃放置下24小時。放置後,利用顯微鏡觀察紅油墨向發光二極體內之滲入,並以如下之方式進行評價。
◎:確認到油墨之滲入之發光二極體為2個以下。
△:確認到油墨之滲入之發光二極體為3個~8個。
×:確認到油墨之滲入之發光二極體為9個以上。
[導線切斷]
對藉由上述方法製作之16個發光二極體,進行將於-40℃下30分鐘、繼而於125℃下30分鐘之溫度循環設為1個循環之熱循環試驗1000個循環,其後,通電而調査LED之點亮,並以如下之方式進行評價。
◎:點亮之發光二極體為14個以上。
○:點亮之發光二極體為8個~13個。
△:點亮之發光二極體為7個以下。
[實施例8~9、比較例4~5]
使用以下之成分,製備表2所示之硬化性聚矽氧組合物。再者,表2中,(D)成分之含量表示以質量單位之鉑金屬相對於硬化性聚矽氧組合物之含量(ppm)。又,表2中,SiH/Vi表示(B)成分中之與矽原子鍵結之氫原子相對於(A)成分及(C)成分中所含之烯基之合計1莫耳之莫耳數。
除使用上述(A-2)成分,亦使用以下之成分作為(A)成分。又,黏度為於25℃下之值,係依據JIS K 7117-1使用B型黏度計而進行測定。又,乙烯基之含量係藉由FT-IR(Fourier Transform Infrared Radiation,傅立葉變換紅外光譜)、NMR、GPC(Gel Permeation Chromatography,凝膠滲透層析法)等分析而加以測定。
(A-4)成分:黏度為300mPa‧s,且為平均式:
Me2ViSiO(Me2SiO)150SiMe2Vi
所表示之分子鏈兩末端經二甲基乙烯基矽烷氧基封端之二甲基
聚矽氧烷(乙烯基之含量=0.48質量%)
(A-5)成分:黏度為10,000mPa‧s,且為平均式:
Me2ViSiO(Me2SiO)500SiMe2Vi
所表示之分子鏈兩末端經二甲基乙烯基矽烷氧基封端之二甲基聚矽氧烷(乙烯基之含量=0.15質量%)
(A-6)成分:於25℃下為白色固體狀,且為甲苯可溶性之平均單元式:
(Me2ViSiO1/2)0.15(Me3SiO1/2)0.47(SiO4/2)0.38(HO1/2)0.0001
所表示之一分子中具有2個以上之乙烯基之有機聚矽氧烷樹脂(乙烯基之含量=5.4質量%)
(A-7)成分:於25℃下為白色固體狀,且為甲苯可溶性之平均單元式:
(Me2ViSiO1/2)0.15(Me3SiO1/2)0.38(SiO4/2)0.47(HO1/2)0.01
所表示之一分子中具有2個以上之乙烯基之有機聚矽氧烷(乙烯基之含量=4.2質量%)
(A-8)成分:於25℃下為白色固體狀,且為甲苯可溶性之平均單元式:
(PhSiO3/2)0.75(Me2ViSiO1/2)0.25
所表示之一分子中具有2個以上之乙烯基之有機聚矽氧烷(乙烯基之含量=5.6質量%)
除使用上述(B-1)成分,亦使用以下之成分作為(B)成分。
(B-2)成分:平均式:
Me3SiO(MeHSiO)55SiMe3
所表示之黏度20mPa‧s之分子鏈兩末端經三甲基矽烷氧基封端之聚甲基氫矽氧烷(與矽原子鍵結之氫原子含量=1.6質量%)
(B-3)成分:平均單元式:
(PhSiO3/2)0.4(HMe2SiO1/2)0.6
所表示之黏度25mPa‧s之一分子中具有2個以上之與矽原子鍵結之氫原子的支鏈狀有機聚矽氧烷(與矽原子鍵結之氫原子之含量=0.65質量%)
使用上述(C-1)成分及(C-4)成分作為(C)成分。
使用以下之成分作為(D)成分。
(D-2)成分:鉑之1,3-二乙烯基四甲基二矽氧烷錯合物之1,3-二乙烯基四甲基二矽氧烷溶液(鉑金屬之含量=約5000ppm)
使用以下之成分作為(E)成分。
(E-1)成分:1-乙炔基環己-1-醇
以如下方式測定硬化性聚矽氧組合物之硬度。
[硬化物之硬度]
藉由以5MPa之壓力將硬化性聚矽氧組合物於150℃下加壓成形1小時,而製作片狀之硬化物。藉由JIS K 6253中所規定之A型硬度計測定該片狀之硬化物之硬度。將其結果示於表2。
使用硬化性聚矽氧組合物以如下方式製作表面安裝型之發光二極體(LED)。
[發光二極體之製作]
引線框架2、3朝向底部封閉之圓筒狀之聚鄰苯二甲醯胺(PPA)樹脂製框架材料5(內徑2.0mm,深度1.0mm)之內底部之中心部自側壁延出,於引線框架2之中央部上載置有LED晶片1,於LED晶片1與引線框架3利用接合線4進行電性連接之未密封之發光二極體內,藉由分注器注入經消泡之硬化性聚矽氧組合物。其後,於加熱烘箱中,於100℃下加熱30分鐘,繼而於150℃下加熱1小時,而使硬化性聚矽氧組合物硬化,藉此製作圖1所示之表面安裝型之發光二極體。
[硬化物之初始剝離率]
對藉由上述方法製作之20個發光二極體,利用光學顯微鏡觀察引線框架2、3、及接合線4與硬化物6間之剝離狀態,將可見剝離之發光二極體之個數之比率示於表2。
[吸濕回流焊後之剝離率]
將藉由上述方法製作之20個發光二極體放入至85℃、85%之恆溫恆濕室中168小時後,於280℃之烘箱內放置30秒鐘,其後,恢復至室溫(25℃)下,利用光學顯微鏡觀察引線框架2、3、及接合線4與硬化物6間之剝離狀態,將可見剝離之發光二極體之個數之比率示於表2。
由表2之結果顯示,實施例8~9之硬化性聚矽氧組合物之硬化物與比較例4~5之硬化性聚矽氧組合物相比,具有較高之耐剝離性。
本發明之硬化性聚矽氧組合物由於流動性優異,且可進行硬化,使螢光體均勻地分散,而形成折射率較高之硬化物,故而適宜作為發光二極體(LED)等光半導體裝置中之發光元件之密封劑或者被覆劑。
Claims (9)
- 一種有機矽氧烷,其係由如下通式所表示:
- 如請求項1之有機矽氧烷,其中R4為伸乙基或伸丙基。
- 一種接著促進劑,其包含如請求項1或2之有機矽氧烷。
- 一種硬化性聚矽氧組合物,其含有如請求項1或2之有機矽氧烷作為接著促進劑。
- 如請求項4之硬化性聚矽氧組合物,其係藉由矽氫化反應而進行硬化。
- 如請求項5之硬化性聚矽氧組合物,其中藉由矽氫化反應而進行硬化之硬化性聚矽氧組合物至少包含:(A)一分子中具有至少2個烯基之有機聚矽氧烷100質量份、(B)一分子中具有至少2個與矽原子鍵結之氫原子之有機氫聚矽氧烷{相對於(A)成分與(C)成分中所含之烯基之合計1莫耳,提供0.1~10莫耳之與矽原子鍵結之氫原子之量}、(C)包含如請求項1或2之有機矽氧烷之接著促進劑0.1~10質量份、及(D)矽氫化反應用觸媒(對促進本組合物之硬化而言足夠之量)。
- 如請求項6之硬化性聚矽氧組合物,其進而含有(E)矽氫化反應抑制劑{相對於(A)成分~(D)成分之合計100質量份為0.0001~5質量份}。
- 一種半導體裝置,其特徵在於:半導體元件係利用如請求項4至7中任一項之硬化性聚矽氧組合物之硬化物而被密封。
- 如請求項8之半導體裝置,其中半導體元件為發光元件。
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JP6863878B2 (ja) * | 2017-11-02 | 2021-04-21 | 信越化学工業株式会社 | 付加硬化型シリコーン組成物、硬化物、及び光学素子 |
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KR102267622B1 (ko) * | 2019-09-27 | 2021-06-22 | 주식회사 케이씨씨실리콘 | 실리콘 점착제 조성물 |
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