TWI670140B - 乾式筒式研磨方法及介質之製造方法 - Google Patents

乾式筒式研磨方法及介質之製造方法 Download PDF

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Publication number
TWI670140B
TWI670140B TW104110333A TW104110333A TWI670140B TW I670140 B TWI670140 B TW I670140B TW 104110333 A TW104110333 A TW 104110333A TW 104110333 A TW104110333 A TW 104110333A TW I670140 B TWI670140 B TW I670140B
Authority
TW
Taiwan
Prior art keywords
medium
workpiece
mass
polishing
dry
Prior art date
Application number
TW104110333A
Other languages
English (en)
Chinese (zh)
Other versions
TW201544238A (zh
Inventor
平塚陽一郎
末菅啟朗
Original Assignee
日商新東工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商新東工業股份有限公司 filed Critical 日商新東工業股份有限公司
Publication of TW201544238A publication Critical patent/TW201544238A/zh
Application granted granted Critical
Publication of TWI670140B publication Critical patent/TWI670140B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/12—Accessories; Protective equipment or safety devices; Installations for exhaustion of dust or for sound absorption specially adapted for machines covered by group B24B31/00
    • B24B31/14—Abrading-bodies specially designed for tumbling apparatus, e.g. abrading-balls
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/02—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving rotary barrels

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW104110333A 2014-04-07 2015-03-30 乾式筒式研磨方法及介質之製造方法 TWI670140B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014078918 2014-04-07
JP2014-078918 2014-04-07

Publications (2)

Publication Number Publication Date
TW201544238A TW201544238A (zh) 2015-12-01
TWI670140B true TWI670140B (zh) 2019-09-01

Family

ID=54287614

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104110333A TWI670140B (zh) 2014-04-07 2015-03-30 乾式筒式研磨方法及介質之製造方法

Country Status (4)

Country Link
JP (1) JP6414206B2 (fr)
CN (1) CN106029298A (fr)
TW (1) TWI670140B (fr)
WO (1) WO2015156033A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105586005B (zh) * 2016-01-14 2018-02-23 洛阳三睿宝纳米科技有限公司 一种纳米刚玉磨料的制备方法
WO2019065253A1 (fr) * 2017-09-28 2019-04-04 新東工業株式会社 Dispositif de polissage à tambour rotatif sec, système de polissage à tambour rotatif à sec, et procédé de polissage à tambour rotatif sec
JP7159842B2 (ja) * 2018-12-14 2022-10-25 新東工業株式会社 バレル研磨用の研磨メディア

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013994B2 (fr) * 1972-08-05 1975-05-23
JPS6363634B2 (fr) * 1985-10-03 1988-12-08
TW200408502A (en) * 2002-11-29 2004-06-01 Sintobrator Ltd Barrel polishing method, and barrel polishing device
WO2012086679A1 (fr) * 2010-12-24 2012-06-28 新東工業株式会社 Milieu inorganique destiné au polissage d'un cylindre

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4217114Y1 (fr) * 1967-02-25 1967-10-02
US4235051A (en) * 1979-06-21 1980-11-25 Fremont Industries, Inc. Finishing compound for barrel and vibratory surface conditioning of ferrous and non-ferrous metals
JP3590906B2 (ja) * 1993-01-22 2004-11-17 株式会社チップトン バレル研磨用コンパウンド及びバレル研磨法
JPH07179622A (ja) * 1993-12-22 1995-07-18 Tipton Mfg Corp コンパウンド入りバレル研磨石及びその製造方法
CN1060145C (zh) * 1994-04-12 2001-01-03 南京化工学院陶瓷厂 陶瓷微珠及其制造方法
JPH0879613A (ja) * 1994-09-07 1996-03-22 Minolta Co Ltd フィルム画像再生装置
JP4009339B2 (ja) * 1996-01-29 2007-11-14 関西マテック株式会社 アルミナ−ジルコニア系焼結体、その製造法及びアルミナ−ジルコニア系焼結体を用いた衝撃式粉砕機
JP2777356B2 (ja) * 1996-11-15 1998-07-16 新東ブレーター株式会社 乾式バレル研磨用無機質メディア
US6287353B1 (en) * 1999-09-28 2001-09-11 3M Innovative Properties Company Abrasive grain, abrasive articles, and methods of making and using the same
WO2003011786A1 (fr) * 2001-08-02 2003-02-13 3M Innovative Properties Company Vitroceramiques
JP3841784B2 (ja) * 2003-11-21 2006-11-01 株式会社チップトン 乾式バレル研磨用メディアの調整方法及び乾式バレル研磨方法
JP4401855B2 (ja) * 2004-04-26 2010-01-20 株式会社資生堂 バレル研磨・洗浄用組成物
JP4456145B2 (ja) * 2007-09-27 2010-04-28 株式会社チップトン 乾式バレル研磨方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013994B2 (fr) * 1972-08-05 1975-05-23
JPS6363634B2 (fr) * 1985-10-03 1988-12-08
TW200408502A (en) * 2002-11-29 2004-06-01 Sintobrator Ltd Barrel polishing method, and barrel polishing device
WO2012086679A1 (fr) * 2010-12-24 2012-06-28 新東工業株式会社 Milieu inorganique destiné au polissage d'un cylindre

Also Published As

Publication number Publication date
WO2015156033A1 (fr) 2015-10-15
TW201544238A (zh) 2015-12-01
JP6414206B2 (ja) 2018-10-31
JPWO2015156033A1 (ja) 2017-04-13
CN106029298A (zh) 2016-10-12

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