TWI639540B - 容器收納裝置 - Google Patents

容器收納裝置 Download PDF

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Publication number
TWI639540B
TWI639540B TW104131060A TW104131060A TWI639540B TW I639540 B TWI639540 B TW I639540B TW 104131060 A TW104131060 A TW 104131060A TW 104131060 A TW104131060 A TW 104131060A TW I639540 B TWI639540 B TW I639540B
Authority
TW
Taiwan
Prior art keywords
container
mounting table
liquid
moving member
processing liquid
Prior art date
Application number
TW104131060A
Other languages
English (en)
Chinese (zh)
Other versions
TW201632435A (zh
Inventor
園田主稅
宮原強
大川勝宏
宇都宮由典
赤田光
長谷部和久
Original Assignee
東京威力科創股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東京威力科創股份有限公司 filed Critical 東京威力科創股份有限公司
Publication of TW201632435A publication Critical patent/TW201632435A/zh
Application granted granted Critical
Publication of TWI639540B publication Critical patent/TWI639540B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Coating Apparatus (AREA)
TW104131060A 2014-09-24 2015-09-21 容器收納裝置 TWI639540B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2014-193581 2014-09-24
JP2014193581 2014-09-24
JP2015158322A JP6342368B2 (ja) 2014-09-24 2015-08-10 容器収容装置
JP2015-158322 2015-08-10

Publications (2)

Publication Number Publication Date
TW201632435A TW201632435A (zh) 2016-09-16
TWI639540B true TWI639540B (zh) 2018-11-01

Family

ID=55805865

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104131060A TWI639540B (zh) 2014-09-24 2015-09-21 容器收納裝置

Country Status (3)

Country Link
JP (1) JP6342368B2 (enrdf_load_stackoverflow)
CN (1) CN106716598B (enrdf_load_stackoverflow)
TW (1) TWI639540B (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI763944B (zh) * 2017-11-01 2022-05-11 日商東京威力科創股份有限公司 處理液供給系統、處理液供給裝置及載具保管裝置
WO2020154325A1 (en) 2019-01-22 2020-07-30 Shanghai Yanfeng Jinqiao Automotive Trim Systems Co. Ltd. Vehicle interior component

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05160016A (ja) * 1991-12-04 1993-06-25 Tokyo Electron Ltd 処理装置
JPH11342360A (ja) * 1998-06-02 1999-12-14 Dainippon Screen Mfg Co Ltd 基板処理装置
US20060174832A1 (en) * 2005-02-10 2006-08-10 Dainippon Screen Mfg., Co., Ltd. Substrate processing apparatus
JP2010171258A (ja) * 2009-01-23 2010-08-05 Sokudo Co Ltd 基板処理装置及び基板処理方法
JP2013247276A (ja) * 2012-05-28 2013-12-09 Sokudo Co Ltd 薬液供給方法と薬液供給装置と基板処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040082483A (ko) * 2003-03-19 2004-09-30 삼성전자주식회사 포토레지스트 공급장치
KR20050088734A (ko) * 2004-03-03 2005-09-07 삼성전자주식회사 포토레지스트 공급 장치
CN101364046A (zh) * 2007-08-06 2009-02-11 力晶半导体股份有限公司 液体与液位的侦测预警系统及方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05160016A (ja) * 1991-12-04 1993-06-25 Tokyo Electron Ltd 処理装置
JPH11342360A (ja) * 1998-06-02 1999-12-14 Dainippon Screen Mfg Co Ltd 基板処理装置
US20060174832A1 (en) * 2005-02-10 2006-08-10 Dainippon Screen Mfg., Co., Ltd. Substrate processing apparatus
JP2010171258A (ja) * 2009-01-23 2010-08-05 Sokudo Co Ltd 基板処理装置及び基板処理方法
JP2013247276A (ja) * 2012-05-28 2013-12-09 Sokudo Co Ltd 薬液供給方法と薬液供給装置と基板処理装置

Also Published As

Publication number Publication date
JP2016066784A (ja) 2016-04-28
JP6342368B2 (ja) 2018-06-13
CN106716598B (zh) 2020-08-14
TW201632435A (zh) 2016-09-16
CN106716598A (zh) 2017-05-24

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