TWI620039B - 位置判斷裝置、位置判斷方法、微影設備及用於製造物件的方法 - Google Patents

位置判斷裝置、位置判斷方法、微影設備及用於製造物件的方法 Download PDF

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Publication number
TWI620039B
TWI620039B TW104139186A TW104139186A TWI620039B TW I620039 B TWI620039 B TW I620039B TW 104139186 A TW104139186 A TW 104139186A TW 104139186 A TW104139186 A TW 104139186A TW I620039 B TWI620039 B TW I620039B
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Taiwan
Prior art keywords
substrate
light
mark
unit
light receiving
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TW104139186A
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English (en)
Chinese (zh)
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TW201621481A (zh
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田村剛一
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佳能股份有限公司
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW104139186A 2014-11-28 2015-11-25 位置判斷裝置、位置判斷方法、微影設備及用於製造物件的方法 TWI620039B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2014-242526 2014-11-28
JP2014242526 2014-11-28
JP2015171202A JP6590599B2 (ja) 2014-11-28 2015-08-31 位置決定装置、位置決定方法、リソグラフィ装置、および物品の製造方法
JP2015-171202 2015-08-31

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TW201621481A TW201621481A (zh) 2016-06-16
TWI620039B true TWI620039B (zh) 2018-04-01

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TW104139186A TWI620039B (zh) 2014-11-28 2015-11-25 位置判斷裝置、位置判斷方法、微影設備及用於製造物件的方法

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JP (1) JP6590599B2 (enExample)
KR (1) KR101993950B1 (enExample)
CN (1) CN105652611B (enExample)
TW (1) TWI620039B (enExample)

Families Citing this family (8)

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Publication number Priority date Publication date Assignee Title
CN109313405B (zh) * 2016-06-13 2021-09-24 Asml荷兰有限公司 用于确定衬底上目标结构的位置的方法和设备、用于确定衬底的位置的方法和设备
JP6276449B1 (ja) * 2017-03-30 2018-02-07 株式会社荏原製作所 基板処理装置、基板処理装置の制御方法、プログラムを格納した記憶媒体
JP6490771B1 (ja) * 2017-09-27 2019-03-27 株式会社アルバック 位置検出装置、位置検出方法、および、蒸着装置
CN109585351B (zh) * 2018-10-29 2021-06-22 苏州腾晖光伏技术有限公司 一种提高晶硅双面太阳电池的背铝栅线对准精度的方法
CN111355541A (zh) * 2020-04-02 2020-06-30 Oppo广东移动通信有限公司 网络设备、搜寻网络信号的方法
JP7508313B2 (ja) * 2020-08-27 2024-07-01 キヤノン株式会社 搬送装置、露光装置、及び物品の製造方法
JP7609676B2 (ja) * 2021-03-29 2025-01-07 東京エレクトロン株式会社 基板処理装置及び基板搬送位置調整方法
CN118641478B (zh) * 2024-08-14 2024-11-05 江苏福拉特自动化设备有限公司 Micro-LED拼接面磨边倒角多角度检测用工业相机自适应聚焦装置及方法

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US20090130784A1 (en) * 2007-09-06 2009-05-21 Vistec Semiconductor Systems Gmbh Method for determining the position of the edge bead removal line of a disk-like object
TW201415159A (zh) * 2012-10-02 2014-04-16 United Microelectronics Corp 形成光罩的方法

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US7342642B2 (en) * 2005-06-20 2008-03-11 Asml Netherlands B.V. Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200627085A (en) * 2004-12-27 2006-08-01 Asml Netherlands Bv Lithographic apparatus with multiple alignment arrangements and alignment measurement method
US20060194123A1 (en) * 2005-02-03 2006-08-31 Asml Netherlands B.V. Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus
US20090130784A1 (en) * 2007-09-06 2009-05-21 Vistec Semiconductor Systems Gmbh Method for determining the position of the edge bead removal line of a disk-like object
TW201415159A (zh) * 2012-10-02 2014-04-16 United Microelectronics Corp 形成光罩的方法

Also Published As

Publication number Publication date
JP6590599B2 (ja) 2019-10-16
KR20160065019A (ko) 2016-06-08
CN105652611B (zh) 2018-05-08
KR101993950B1 (ko) 2019-06-27
JP2016110066A (ja) 2016-06-20
CN105652611A (zh) 2016-06-08
TW201621481A (zh) 2016-06-16

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