TWI596811B - Manufacturing method and manufacturing apparatus of a substrate having an uneven pattern using a film-shaped mold and a method of manufacturing the apparatus having the substrate - Google Patents

Manufacturing method and manufacturing apparatus of a substrate having an uneven pattern using a film-shaped mold and a method of manufacturing the apparatus having the substrate Download PDF

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Publication number
TWI596811B
TWI596811B TW102103257A TW102103257A TWI596811B TW I596811 B TWI596811 B TW I596811B TW 102103257 A TW102103257 A TW 102103257A TW 102103257 A TW102103257 A TW 102103257A TW I596811 B TWI596811 B TW I596811B
Authority
TW
Taiwan
Prior art keywords
film
substrate
roller
mold
shaped mold
Prior art date
Application number
TW102103257A
Other languages
English (en)
Chinese (zh)
Other versions
TW201349612A (zh
Original Assignee
Jx Nippon Oil & Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Oil & Energy Corp filed Critical Jx Nippon Oil & Energy Corp
Publication of TW201349612A publication Critical patent/TW201349612A/zh
Application granted granted Critical
Publication of TWI596811B publication Critical patent/TWI596811B/zh

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1852Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00009Production of simple or compound lenses
    • B29D11/00317Production of lenses with markings or patterns
    • B29D11/00326Production of lenses with markings or patterns having particular surface properties, e.g. a micropattern
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0268Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/0036Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/40Optical elements or arrangements
    • H10F77/413Optical elements or arrangements directly associated or integrated with the devices, e.g. back reflectors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/109Sols, gels, sol-gel materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Electroluminescent Light Sources (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
TW102103257A 2012-03-16 2013-01-29 Manufacturing method and manufacturing apparatus of a substrate having an uneven pattern using a film-shaped mold and a method of manufacturing the apparatus having the substrate TWI596811B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012060925 2012-03-16
JP2012064140 2012-03-21

Publications (2)

Publication Number Publication Date
TW201349612A TW201349612A (zh) 2013-12-01
TWI596811B true TWI596811B (zh) 2017-08-21

Family

ID=49160766

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102103257A TWI596811B (zh) 2012-03-16 2013-01-29 Manufacturing method and manufacturing apparatus of a substrate having an uneven pattern using a film-shaped mold and a method of manufacturing the apparatus having the substrate

Country Status (9)

Country Link
US (1) US20140357012A1 (enExample)
EP (1) EP2826754A4 (enExample)
KR (1) KR101652781B1 (enExample)
CN (1) CN104245608B (enExample)
AU (1) AU2013233704C1 (enExample)
CA (1) CA2865604C (enExample)
IN (1) IN2014DN07538A (enExample)
TW (1) TWI596811B (enExample)
WO (1) WO2013136844A1 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101894342B1 (ko) * 2013-12-27 2018-09-03 제이엑스티지 에네루기 가부시키가이샤 발광 소자
KR101732789B1 (ko) * 2014-04-04 2017-05-08 주식회사 엘지화학 액정 소자
JP6382729B2 (ja) * 2015-01-14 2018-08-29 富士フイルム株式会社 筒型パターン膜の作製方法、パターンロールの作製方法および剥離装置
TW201641294A (zh) * 2015-03-17 2016-12-01 綜研化學股份有限公司 凹凸圖案形成體的製造方法及壓印裝置
CN104690955A (zh) * 2015-03-26 2015-06-10 何炎权 制造立体光栅的方法及装置
CN107533958B (zh) * 2015-05-13 2021-08-27 凸版印刷株式会社 凹凸图案形成体的制造方法、其制造装置以及贴纸
CN107637184B (zh) * 2015-06-04 2020-07-17 住友电气工业株式会社 印刷线路板用基板和印刷线路板
JP6623058B2 (ja) * 2015-12-18 2019-12-18 デクセリアルズ株式会社 反射防止光学体の形成方法およびディスプレイパネル
JP2017188394A (ja) * 2016-04-08 2017-10-12 株式会社半導体エネルギー研究所 積層体の加工装置および加工方法
US10549494B2 (en) 2016-04-20 2020-02-04 Himax Technologies Limited Imprinting apparatus and imprinting method
KR101951997B1 (ko) * 2016-11-09 2019-02-25 한국광기술원 대면적 마이크로 렌즈 어레이 제조방법
US12242184B2 (en) * 2017-03-16 2025-03-04 Universite D'aix-Marseille Nanoimprint lithography process and patterned substrate obtainable therefrom
CN107650241B (zh) * 2017-09-20 2019-10-01 宁波伏尔肯科技股份有限公司 一种防弹陶瓷插板的制作方法
JP7481794B2 (ja) * 2017-10-18 2024-05-13 日東電工株式会社 ロール体
KR102571964B1 (ko) * 2017-12-15 2023-08-29 도레이 카부시키가이샤 고분자 박막의 제조 장치 및 제조 방법
KR20190086884A (ko) * 2018-01-15 2019-07-24 주식회사 엘지화학 패턴 성형 장치
JP7146412B2 (ja) * 2018-02-22 2022-10-04 キヤノン株式会社 樹脂膜の貼着方法及び液体吐出ヘッドの製造方法
IT201800003096A1 (it) * 2018-02-27 2019-08-27 Coveme S P A Metodo per applicare uno strato di rivestimento superiore protettivo trasparente ad una struttura stratiforme riflettente
CN108819429B (zh) * 2018-08-03 2024-04-26 扬州智翔石油工程技术有限公司 光固化复合材料真空浸涂装置
CN209709000U (zh) * 2018-09-10 2019-11-29 广州市龙珠化工有限公司 一种太阳能光伏电池用的玻璃面板
ES3015014T3 (en) * 2018-12-03 2025-04-28 Barberan Latorre Jesus Francisco Method and device for obtaining a raised pattern on a substrate
JP7245973B2 (ja) * 2019-02-04 2023-03-27 パナソニックIpマネジメント株式会社 パターンの形成方法および装置
EP4530066A1 (en) * 2019-03-29 2025-04-02 Nitto Denko Corporation Method for manufacturing glass resin laminated body
US11505454B2 (en) * 2019-09-25 2022-11-22 Taiwan Semiconductor Manufacturing Company Ltd. MEMS structure and manufacturing method thereof
US10991339B1 (en) * 2019-11-26 2021-04-27 Facebook Technologies, Llc System and method for increasing light uniformity for a display backlight
KR102147280B1 (ko) * 2020-02-25 2020-08-24 국방과학연구소 마이크로 렌즈 어레이 제조용 몰드의 제조 방법
TWI765314B (zh) * 2020-08-10 2022-05-21 光群雷射科技股份有限公司 轉印滾輪與其製造方法、及光學膜片與其製造方法
US20230327045A1 (en) * 2021-03-03 2023-10-12 Solaero Technologies Corp. Multijunction solar cells with light scattering layer
US11329181B1 (en) * 2021-03-03 2022-05-10 Solaero Technologies Corp. Multijunction solar cells
CN114578465B (zh) * 2022-04-08 2022-08-26 绍兴翔宇绿色包装有限公司 一种pet基扩散膜及其制备方法
KR102813672B1 (ko) * 2022-08-19 2025-05-29 (주)세경하이테크 압출을 이용한 시트 전면 패터닝 공법
CN115534295A (zh) * 2022-10-07 2022-12-30 晋江市亿跃机械科技有限公司 一种覆膜板成型加工设备及加工工艺
TWI844279B (zh) * 2023-02-22 2024-06-01 耀穎光電股份有限公司 光學薄膜之抗散射及抗干涉鍍膜圖形結構

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0411620U (enExample) * 1990-05-21 1992-01-30
JP2003340844A (ja) * 2002-05-24 2003-12-02 Dainippon Printing Co Ltd ゾルゲル法による反射防止物品及びその製造方法
CN101360689A (zh) * 2005-11-23 2009-02-04 法国圣戈班玻璃厂 玻璃产品表面结构化方法,具有结构化表面的玻璃产品与用途
CN101674896A (zh) * 2007-04-30 2010-03-17 S·D·沃伦公司 具有纹饰表面的材料及其制造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5650251A (en) * 1993-07-07 1997-07-22 Canon Kabushiki Kaisha Process for producing color filter comprising an ultrasonic wave projected perpendicularly to the substrate
US6586077B1 (en) * 2000-02-07 2003-07-01 Guardian Industries Corp. Temperable patterned glass articles and methods of making same
US20040176476A1 (en) 2001-06-22 2004-09-09 Gyurik Robert J. Pharmaceutical composition
US7033534B2 (en) * 2001-10-09 2006-04-25 3M Innovative Properties Company Method for forming microstructures on a substrate using a mold
US6833667B2 (en) * 2002-02-27 2004-12-21 Matsushita Electric Industrial Co., Ltd. Organic electroluminescence element and image forming apparatus or portable terminal unit using thereof
JP4258154B2 (ja) * 2002-02-28 2009-04-30 パナソニック株式会社 有機エレクトロルミネッセンス素子、それを用いた画像形成装置、携帯端末、有機エレクトロルミネッセンス素子の製造方法
TWI417564B (zh) * 2005-02-21 2013-12-01 Dainippon Printing Co Ltd Manufacturing method and manufacturing apparatus for optical laminate
JP2006236748A (ja) 2005-02-24 2006-09-07 Konica Minolta Holdings Inc 有機電界発光装置
JP4940784B2 (ja) * 2006-06-28 2012-05-30 凸版印刷株式会社 インプリント用モールドおよびインプリント用モールド製造方法
JP4591555B2 (ja) * 2008-06-12 2010-12-01 株式会社日本自動車部品総合研究所 燃料噴射ノズルおよびそれを用いた燃料噴射制御装置
KR101065744B1 (ko) * 2009-02-27 2011-09-19 주식회사 티지솔라 요철구조가 형성된 기판을 이용한 태양전지의 제조방법
EP2455786A1 (en) 2009-07-16 2012-05-23 JX Nippon Oil & Energy Corporation Diffraction grating, organic el element using same, and method for manufacturing said diffraction grating and organic el element
JP5322182B2 (ja) * 2010-05-14 2013-10-23 Jx日鉱日石エネルギー株式会社 有機el素子用のマイクロレンズ、それを用いた有機el素子、及びそれらの製造方法
JP2013037164A (ja) * 2011-08-08 2013-02-21 Sony Corp 拡散シート、バックライト、液晶表示装置および拡散シートの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0411620U (enExample) * 1990-05-21 1992-01-30
JP2003340844A (ja) * 2002-05-24 2003-12-02 Dainippon Printing Co Ltd ゾルゲル法による反射防止物品及びその製造方法
CN101360689A (zh) * 2005-11-23 2009-02-04 法国圣戈班玻璃厂 玻璃产品表面结构化方法,具有结构化表面的玻璃产品与用途
CN101674896A (zh) * 2007-04-30 2010-03-17 S·D·沃伦公司 具有纹饰表面的材料及其制造方法

Also Published As

Publication number Publication date
EP2826754A1 (en) 2015-01-21
CA2865604A1 (en) 2013-09-19
US20140357012A1 (en) 2014-12-04
AU2013233704A1 (en) 2014-10-23
CN104245608B (zh) 2017-02-22
KR20140107457A (ko) 2014-09-04
CA2865604C (en) 2017-06-27
AU2013233704B2 (en) 2016-03-10
WO2013136844A1 (ja) 2013-09-19
IN2014DN07538A (enExample) 2015-04-24
AU2013233704C1 (en) 2016-07-14
KR101652781B1 (ko) 2016-08-31
CN104245608A (zh) 2014-12-24
TW201349612A (zh) 2013-12-01
EP2826754A4 (en) 2015-12-30

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