TWI589580B - 用於有機電子裝置之聚并苯(phenacene)化合物 - Google Patents
用於有機電子裝置之聚并苯(phenacene)化合物 Download PDFInfo
- Publication number
- TWI589580B TWI589580B TW102116265A TW102116265A TWI589580B TW I589580 B TWI589580 B TW I589580B TW 102116265 A TW102116265 A TW 102116265A TW 102116265 A TW102116265 A TW 102116265A TW I589580 B TWI589580 B TW I589580B
- Authority
- TW
- Taiwan
- Prior art keywords
- groups
- organic
- group
- printing
- thin film
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title claims description 42
- 239000004065 semiconductor Substances 0.000 claims description 35
- 229910052739 hydrogen Inorganic materials 0.000 claims description 17
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 229920003026 Acene Polymers 0.000 claims description 13
- 229910052736 halogen Inorganic materials 0.000 claims description 13
- 150000002367 halogens Chemical class 0.000 claims description 13
- 239000010409 thin film Substances 0.000 claims description 12
- 230000005669 field effect Effects 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 7
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 125000000304 alkynyl group Chemical group 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 5
- 125000000262 haloalkenyl group Chemical group 0.000 claims description 5
- 125000001188 haloalkyl group Chemical group 0.000 claims description 5
- 125000000232 haloalkynyl group Chemical group 0.000 claims description 5
- 229920006395 saturated elastomer Polymers 0.000 claims description 5
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 4
- 230000000295 complement effect Effects 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- -1 2-pentyl Chemical group 0.000 description 38
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 35
- 239000000463 material Substances 0.000 description 22
- 239000000243 solution Substances 0.000 description 21
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 18
- 235000019439 ethyl acetate Nutrition 0.000 description 17
- 239000000203 mixture Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 11
- 238000007639 printing Methods 0.000 description 11
- 239000011541 reaction mixture Substances 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 238000000151 deposition Methods 0.000 description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000010410 layer Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 238000005266 casting Methods 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 238000002508 contact lithography Methods 0.000 description 5
- 238000007641 inkjet printing Methods 0.000 description 5
- 229910001867 inorganic solvent Inorganic materials 0.000 description 5
- 239000003049 inorganic solvent Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- 239000000725 suspension Substances 0.000 description 5
- VYQIJKXFFLDLDN-UHFFFAOYSA-N trimethyl-(5-tetradecylthiophen-2-yl)stannane Chemical compound CCCCCCCCCCCCCCC1=CC=C([Sn](C)(C)C)S1 VYQIJKXFFLDLDN-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 239000002800 charge carrier Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 239000012043 crude product Substances 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000012074 organic phase Substances 0.000 description 4
- 238000013086 organic photovoltaic Methods 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 239000000284 extract Substances 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- 238000007646 gravure printing Methods 0.000 description 3
- 238000000813 microcontact printing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000007649 pad printing Methods 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- PRSIEYLGCNAOAK-UHFFFAOYSA-N 2,3-dibromo-1,4-diiodobenzene Chemical compound BrC1=C(Br)C(I)=CC=C1I PRSIEYLGCNAOAK-UHFFFAOYSA-N 0.000 description 2
- HZZUFNXZYKMRBE-UHFFFAOYSA-N 2-tetradecylthiophene Chemical compound CCCCCCCCCCCCCCC1=CC=CS1 HZZUFNXZYKMRBE-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- FCBWGZWXNDQKIM-UHFFFAOYSA-N CC(CCCCCCCCCC#C[Sn](CCCC)(CCCC)CCCC)(C)C Chemical compound CC(CCCCCCCCCC#C[Sn](CCCC)(CCCC)CCCC)(C)C FCBWGZWXNDQKIM-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- QZRGKCOWNLSUDK-UHFFFAOYSA-N Iodochlorine Chemical compound ICl QZRGKCOWNLSUDK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 229920002367 Polyisobutene Polymers 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000000022 bacteriostatic agent Substances 0.000 description 2
- 125000002511 behenyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000003139 biocide Substances 0.000 description 2
- 239000012267 brine Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- OJCSPXHYDFONPU-UHFFFAOYSA-N etoac etoac Chemical compound CCOC(C)=O.CCOC(C)=O OJCSPXHYDFONPU-UHFFFAOYSA-N 0.000 description 2
- 239000003906 humectant Substances 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N n-Butyllithium Substances [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- UQPUONNXJVWHRM-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 UQPUONNXJVWHRM-UHFFFAOYSA-N 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- GBROPGWFBFCKAG-UHFFFAOYSA-N picene Chemical compound C1=CC2=C3C=CC=CC3=CC=C2C2=C1C1=CC=CC=C1C=C2 GBROPGWFBFCKAG-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920000128 polypyrrole Polymers 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 238000010129 solution processing Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000010345 tape casting Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- KOFZTCSTGIWCQG-UHFFFAOYSA-N 1-bromotetradecane Chemical compound CCCCCCCCCCCCCCBr KOFZTCSTGIWCQG-UHFFFAOYSA-N 0.000 description 1
- YMMGRPLNZPTZBS-UHFFFAOYSA-N 2,3-dihydrothieno[2,3-b][1,4]dioxine Chemical compound O1CCOC2=C1C=CS2 YMMGRPLNZPTZBS-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- FVQJFPXYHWKHSC-UHFFFAOYSA-N 3-chloro-2,2-dimethylundecane Chemical compound CCCCCCCCC(Cl)C(C)(C)C FVQJFPXYHWKHSC-UHFFFAOYSA-N 0.000 description 1
- MXZBUPIHPZFQPQ-UHFFFAOYSA-N 7,16-di(tetradecyl)-8,15-dithiapentacyclo[11.7.0.02,10.05,9.014,18]icosa-1(13),2(10),3,5(9),6,11,14(18),16,19-nonaene Chemical compound C1=C2C3=CC=C4C=C(CCCCCCCCCCCCCC)SC4=C3C=CC2=C2SC(CCCCCCCCCCCCCC)=CC2=C1 MXZBUPIHPZFQPQ-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 241000587155 Athene Species 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 229910004140 HfO Inorganic materials 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920000144 PEDOT:PSS Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- GCTFWCDSFPMHHS-UHFFFAOYSA-M Tributyltin chloride Chemical compound CCCC[Sn](Cl)(CCCC)CCCC GCTFWCDSFPMHHS-UHFFFAOYSA-M 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000003115 biocidal effect Effects 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- KWTSZCJMWHGPOS-UHFFFAOYSA-M chloro(trimethyl)stannane Chemical compound C[Sn](C)(C)Cl KWTSZCJMWHGPOS-UHFFFAOYSA-M 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 229940125890 compound Ia Drugs 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000003818 flash chromatography Methods 0.000 description 1
- 238000007647 flexography Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000002463 lignoceryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000005394 methallyl group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920001291 polyvinyl halide Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003303 ruthenium Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical class [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 229910000080 stannane Inorganic materials 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
- C07D495/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/78—Benzo [b] furans; Hydrogenated benzo [b] furans
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/87—Benzo [c] furans; Hydrogenated benzo [c] furans
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/52—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/72—Benzo[c]thiophenes; Hydrogenated benzo[c]thiophenes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6576—Polycyclic condensed heteroaromatic hydrocarbons comprising only sulfur in the heteroaromatic polycondensed ring system, e.g. benzothiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Thin Film Transistor (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Photovoltaic Devices (AREA)
Description
本發明係關於聚并苯化合物及其用途。
有機半導體材料可用於電子裝置中,如有機光伏打(OPV)電池、有機場效應電晶體(OFET)及有機發光二極體(OLED)。
希望該等有機半導體材料與諸如旋塗、溶液澆鑄或印刷之液體加工技術相容。液體加工技術就可加工性而言係便利,且亦可應用於塑膠基板。因此,與液體加工技術相容之有機半導體材料允許製造低成本、輕重量且視需要亦可撓之電子裝置,此係此等有機半導體材料相較於無機半導體材料之一顯然優勢。
此外,希望該等有機半導體材料係安定,特定言之,對氧化作用係安定。
當用於有機場效應電晶體(OFET)中時,該等有機半導體材料應顯示高電荷載子遷移率及高通/斷比。
本技藝中已知有機半導體材料在電子裝置(特定言之,有機場效應電晶體(OFET))中之用途。
Okamoto,K.;Kawasaki,N.;Kaji,Y.;Kubozono,Y.;Fujiwara,A.;Yamaji,M.J.Am.Chem.Soc.2008,130,10470-10471及Kawasaki,N.;Kubozono,Y.;Okamoto,H.;Fujiwara,A.;Yamaji,M.Appl.Phys.Lett.2009,94,043310描述苉(picene)
其係用於真空沈積型OFET,且具有接近3cm2V-1s-1之電荷載子遷移率。
JP2009/063846揭示烷基化苉作為溶液型OFET,其具有最高2cm2V-1s-1之電荷載子遷移率。
S.Shinamura等人,K.J.Am.Chem.Soc.2011,133,5024-5035揭示如下式之直鏈及角狀萘并二噻吩:
其中R為H、正C8H17或苯基,該等萘并二噻吩係用於真空沈積型OFET,且具有接近1.5cm2/V s之電荷載子遷移率。
J.Gao等人,Adv.Mater.2007,19,3008-3011揭示二苯并噻吩并二噻吩:
其係用於FET,且具有高於0.5cm2V-1s-1之電荷載子遷移率及大於106之通/斷比。
K.Xiao等人,J.Am.Chem.Soc.2005,127,13286揭示并五噻吩:
其係用於真空沈積型OFET,且具有0.045cm2V-1s-1之電荷載子遷移率及103之通/斷比。
J.Wang等人,Chem.Mater.2009,21,2595-2597描述以下小分子:
其係用於真空沈積型OFET,且具有最高0.4cm2/V s之電荷載子遷移率。
因此,鑒於在可藉由高產量捲帶式製法生產之廉價及大面積有機電子裝置中的可能應用,本技藝需要新穎的有機p型半導體化合物,尤其係彼等具有理想性質(如空氣安定性、高電荷傳輸效率及在常見有機溶劑中之良好溶解度)者。
鑒於上述內容,本發明之目的係提供可解決現有技術中的各種缺陷及缺點(包括上述彼等缺陷及缺點)之化合物(其可用作有機半導體及相關材料)、組合物、複合物及/或裝置。
該目的係藉由式I聚并苯化合物來實現:
其中基團a、b及c中之一者係X且其他兩個基團分別為C-R1及C-R2,基團d、e及f中之一者係X且其他兩個基團分別為C-R5及C-R6,其中X係彼此獨立地選自由NH、O、S及Se組成之群,較佳選自由O、S及Se組成之群,更佳選自由O及S組成之群,且特佳為S,R1至R10彼此獨立地為H、鹵素、-CN、-NO2或可經鹵素(F、Cl、Br、I)、-ORa、-NRa 2、-CN及/或-NO2取代1至5次之直鏈或分支鏈、飽和或不飽和C1至C40烴殘基,且其中一或多個CH2-基團可經-O-、-S-、-NRb-、-OC(O)-或-C(O)-置換,且其中Ra及Rb彼此獨立地為H、C1至C30烷基、C2至C30烯基、C2至C30炔基、C1至C30鹵烷基、C2至C30鹵烯基、C2至C30鹵炔基或C2至C30醯基。
較佳地,R1、R2、R5及R8係選自由H、鹵素(F、Cl、Br、I)及C1-20烷基組成之群。
較佳地,R3、R4係選自由H、鹵素(F、Cl、Br、I)及C1-20烷基組成之群。
較佳地,R7、R8、R9、R10係選自由H、鹵原子及C1-20烷基組成之群。
已發現本發明之聚并苯化合物具有半導體活性。自此等化合物製備之材料已顯示意料之外的性質。已發現本發明化合物在場效應裝置(例如,薄膜電晶體)中可具有高載子遷移率及/或良好的電流調變特性。此外,已發現本發明化合物相較於相關典型化合物可具有某
些加工優勢,如允許獲得溶液可加工性的更佳溶解度及/或在環境條件下之良好安定性(例如,空氣安定性)。此外,該等化合物可經用於各種半導體型裝置之其他組分包埋。
較佳聚并苯化合物係選自式Ia至If化合物:
其中以化合物Ia最佳。
在一較佳實施例中,X係硫。硫之存在可藉由S-S相互作用導致額外分子間相互作用且可導致更高遷移率。
R1至R10彼此獨立地為H、鹵素、-CN、-NO2或可經鹵素(F、Cl、Br、I)、-ORa、-NRa 2、-CN及/或-NO2取代1至5次之直鏈或分支鏈、飽和或不飽和C1至C40烴殘基,且其中一或多個CH2-基團可經-O-、-S-、-NRb-、-OC(O)-或-C(O)-置換,且其中Ra及Rb彼此獨立地為H、C1至C30烷基、C2至C30烯基、C2至C30炔基、C1至C30鹵烷基、C2至C30鹵烯基、C2至C30鹵炔基或C2至C30醯基。
較佳地,R1至R10彼此獨立地為H、鹵素、C1至C30烷基、C1至C30烷氧基、C1至C30烷硫基、C2至C30烯基、C2至C30炔基、C1至C30鹵烷基、C2至C30鹵烯基或鹵炔基(例如C1至C30全氟烷基)或C2至C10醯基。更佳地,R1至R10彼此獨立地為H、鹵素、C1至C30烷基或C1至C30烷氧基。最佳地,R1至R10彼此獨立地為H、鹵素或C1至C30烷基。
在任何可能的情況下,C1至C30烷基均可為直鏈或分支鏈。
實例為甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、2-戊基、3-戊基、2,2-二甲基丙基、1,1,3,3-四甲基戊基、正己基、1-甲基己基、1,1,3,3,5,5-六甲基己基、正庚基、異庚基、1,1,3,3-四甲基丁基、1-甲基庚基、3-甲基庚基、正辛基、1,1,3,3-四甲基丁基及2-乙基己基、正壬基、癸基、十一烷基、十二烷基、十三烷基、十四烷基、十五烷基、十六烷基、十七烷基、十八烷基、二十烷基、二十一烷基、二十二烷基、二十四烷基或二十五烷基。
C1至C30烷氧基為直鏈或分支鏈烷氧基,例如甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、第二丁氧基、第三丁氧基、戊氧基、異戊氧基、第三戊氧基、庚氧基、辛氧基、異辛氧基、壬氧基、癸氧基、十一烷氧基、十二烷氧基、十四烷氧基、十五烷氧基、十六烷氧基、十七烷氧基或十八烷氧基。
術語「烷硫基」意指與該等烷氧基相同但醚鍵中之氧原子經硫原子置換之基團。
C2至C30烯基為直鏈或分支鏈烯基,如(例如)乙烯基、烯丙基、甲基烯丙基、異丙烯基、2-丁烯基、3-丁烯基、異丁烯基、正戊-2,4-二烯基、3-甲基-丁-2-烯基、正辛-2-烯基、正十二碳-2-烯基、異十二碳烯基、正十二碳-2-烯基或正十八碳-4-烯基。
C2至30炔基為直鏈或分支鏈且可為未經取代或經取代,如(例如)
乙炔基、1-丙炔-3-基、1-丁炔-4-基、1-戊炔-5-基、2-甲基-3-丁炔-2-基、1,4-戊二炔-3-基、1,3-戊二炔-5-基、1-己炔-6-基、順式-3-甲基-2-戊-4-炔-1-基、反式-3-甲基-2-戊-4-炔-1-基、1,3-己二炔-5-基、1-辛炔-8-基、1-壬炔-9-基、1-癸炔-10-基或1-二十四碳炔-24-基。
C1至C30全氟烷基為分支鏈或非分支鏈基團,如(例如)-CF3、-CF2CF3、-CF2CF2CF3、-CF(CF3)2、-(CF2)3CF3或-C(CF3)3。
術語「鹵烷基、鹵烯基及鹵炔基」意指藉由以鹵素部分或完全取代上述烷基、烯基及炔基所得到之基團。
C2至C30醯基為直鏈或分支鏈且可為飽和或不飽和,如(例如)乙醯基、丙醯基、異丁醯基、正丁醯基、戊醯基、己醯基、庚醯基、辛醯基、壬醯基、癸醯基或十二碳醯基。
特佳的基團R1、R2、R5及R6係選自H及C1-20烷基。
特佳的基團R3、R4係選自H及C1-20烷基。
特佳的基團R7至R10係選自H及C1-20烷基。
在一較佳實施例中,R7至R10係氫。
在另一較佳實施例中,R3及R4係氫。
在另一較佳實施例中,R1及R2中之一者係氫,及另一者係C1-20烷基,且R5及R6中之一者係氫,及另一者為C1-20烷基。
極佳C1-20烷基為C10-20烷基。
可藉由如下所示之合成路徑獲得通式I化合物。
由於本文中所揭示之化合物可溶於常見溶劑中,故本發明可在製造電裝置(如薄膜半導體、場效應裝置、有機發光二極體(OLED)、有機光伏打裝置、光偵測器、電容器及感應器)中提供加工優勢。如本文中所使用,當可將至少1mg化合物溶於1ml溶劑中時,該化合物可被視為可溶於該溶劑。常見有機溶劑之實例包括:石油醚;乙腈;芳族烴,如苯、甲苯、二甲苯及三甲苯;酮,如丙酮及甲基乙基酮;醚,如四氫呋喃、二氧雜環己烷、雙(2-甲氧基乙基)醚、乙醚、二異丙醚及第三丁基甲基醚;醇,如甲醇、乙醇、丁醇及異丙醇;脂族烴,如己烷;乙酸酯,如乙酸甲酯、乙酸乙酯、甲酸甲酯、甲酸乙酯、乙酸異丙酯及乙酸丁酯;醯胺,如二甲基甲醯胺及二甲基乙醯胺;亞碸,如二甲亞碸;鹵化脂族及芳族烴,如二氯甲烷、氯仿、二氯乙烷、氯苯、二氯苯及三氯苯;及環狀溶劑,如環戊酮、
環己酮及2-甲基吡咯啶酮。常見無機溶劑之實例包括水及離子液體。
因此,本發明另外提供組合物,其包含溶解或分散於液體介質(例如有機溶劑、無機溶劑或其組合(例如,有機溶劑、無機溶劑或有機與無機溶劑之混合物))中之本文所揭示之一或多種化合物。在一些實施例中,該組合物可另外包含一或多種添加劑,其等係獨立地選自去垢劑、分散劑、黏結劑、增容劑、固化劑、引發劑、保濕劑、消泡劑、潤濕劑、pH調節劑、殺生物劑及抑菌劑。例如,可包含界面活性劑及/或其他聚合物(例如,聚苯乙烯、聚乙烯、聚-α-甲基苯乙烯、聚異丁烯、聚丙烯、聚甲基丙烯酸甲酯及類似物)作為分散劑、黏結劑、增容劑及/或消泡劑。在一些實施例中,此等組合物可包含本文中所揭示之一或多種化合物,例如,可將本發明之兩種或更多種不同化合物溶於有機溶劑中以製備用於沈積之組合物。在某些實施例中,該組合物可包含兩種或更多種區域異構體。此外,應理解本文中所述之裝置亦可包含本發明之一或多種化合物,例如,如本文中所述之兩種或更多種區域異構體。
已將各種沈積技術(包括各種溶液加工技術)用於製備有機電子裝置。例如,許多印刷電子裝置技術已關注噴墨印刷,此主要係因為此技術對特徵位置及多層配準提供較高控制。噴墨印刷係非接觸式方法,其益處在於不需要預形成母版(相較於接觸式印刷技術),以及對油墨射出之數位控制,由此提供按需滴墨印刷。微分散係另一種非接觸式印刷方法。然而,接觸式印刷技術具有十分適合極快速捲帶式加工之關鍵優勢。示例性接觸式印刷技術包括(但不限於)絲網印刷、凹板印刷、平板印刷、柔板印刷、微影印刷、移印及微接觸印刷。如本文中所使用,「印刷」包括非接觸式方法,例如,噴墨印刷、微分散及類似方法;及接觸式方法,例如,絲網印刷、凹板印刷、平板印刷、柔板印刷、微影印刷、移印、微接觸印刷及類似方
法。其他溶液加工技術包括(例如)旋塗、滴鑄、區域澆鑄、浸塗、刮塗或噴塗。此外,可藉由真空氣相沈積實施該沈積步驟。
因此,本發明另外提供製備半導體材料之方法。該等方法可包括製備包含溶解或分散於液體介質(如溶劑或溶劑混合物)中之本文所揭示之一或多種化合物之組合物,及將該組合物沈積在基板上以提供包含本文所揭示之一或多種化合物之半導體材料(例如,薄膜半導體)。在各個實施例中,該液體介質可為有機溶劑、無機溶劑(如水)或其組合。在一些實施例中,該組合物可另外包含一或多種添加劑,其等係獨立地選自黏度調節劑、去垢劑、分散劑、黏結劑、增容劑、固化劑、引發劑、保濕劑、消泡劑、潤濕劑、pH調節劑、殺生物劑及抑菌劑。例如,可包含界面活性劑及/或聚合物(例如,聚苯乙烯、聚乙烯、聚-α-甲基苯乙烯、聚異丁烯、聚丙烯、聚甲基丙烯酸甲酯及類似物)作為分散劑、黏結劑、增容劑及/或消泡劑。在一些實施例中,可藉由印刷實施該沈積步驟,該印刷包括噴墨印刷及各種接觸式印刷技術(例如,絲網印刷、凹板印刷、平板印刷、移印、微影印刷、柔板印刷及微接觸印刷)。在其他實施例中,可藉由旋塗、滴鑄、區域澆鑄、浸塗、刮塗或噴塗實施該沈積步驟。
使用本文所揭示之化合物及半導體材料之各種製造物件(包括電子裝置、光學裝置及光電子裝置,如場效應電晶體(例如,薄膜電晶體)、光伏打裝置、有機發光二極體(OLED)、互補型金屬氧化物半導體(CMOS)、互補型反相器、D型正反器、整流器及環形振盪器)以及製造此等物件之方法皆在本發明之範圍內。
因此,本發明提供製造物件,如本文中所述之各種裝置,其包含具有本發明半導體材料、基板組件及/或介電組件之複合物。該基板組件可選自包括摻雜矽、氧化銦錫(ITO)、ITO塗層玻璃、ITO塗層聚醯亞胺或其他塑膠、單獨存在或塗覆在聚合物或其他基板上之鋁
或其他金屬、摻雜聚噻吩或其他聚合物及類似物之材料。該介電組件可由以下材料製備:無機介電材料,如各種氧化物(例如SiO2、Al2O3、HfO2);有機介電材料,如各種聚合材料(例如,聚碳酸酯、聚酯、聚苯乙烯、聚鹵乙烯、聚丙烯酸酯)、自組裝超晶格/自組裝奈米介電(SAS/SAND)材料(例如,描述於Yoon,M-H等人,PNAS,102(13):4678-4682(2005)中,該文獻之全部揭示內容係以引用之方式併入本文中)及混合有機/無機介電材料(例如,描述於美國專利申請案第11/642,504號中,該案之全部揭示內容係以引用之方式併入本文中)。在一些實施例中,該介電組件可包括描述於美國專利申請案第11/315,076號、60/816,952號及60/861,308號中之交聯聚合物摻合物,該等案之各者之全部揭示內容係以引用之方式併入本文中。該複合物亦可包含一或多個電接點。源極、汲極及閘極之合適材料包括金屬(例如,Au、Al、Ni、Cu)、透明導電氧化物(例如,ITO、IZO、ZITO、GZO、GIO、GITO)及導電聚合物(例如,聚(3,4-伸乙二氧基噻吩)聚(苯乙烯磺酸酯)(PEDOT:PSS)、聚苯胺(PANI)、聚吡咯(PPy))。可將本文中所描述之複合物中之一或多者併入各種有機電子、光學及光電子裝置(如有機薄膜電晶體(OTFT),具體言之為有機場效應電晶體(OFET),以及感應器、電容器、單極電路、互補電路(例如,反相電路)及類似物)中。
因此,本發明之一態樣係關於製造併入本發明半導體材料之有機場效應電晶體之方法。本發明之半導體材料可用於製造各類有機場效應電晶體,其包括頂閘極頂接點電容器結構、頂閘極底接點電容器結構、底閘極頂接點電容器結構及底閘極底接點電容器結構。
在某些實施例中,可利用SiO2作為介電材料,依照頂接點幾何形態製造其中在摻雜矽基板上具有本發明化合物之OTFT裝置。在特定實施例中,可藉由在室溫或高溫下之真空氣相沈積法沈積併入至少一
種本發明化合物之活性半導體層。在其他實施例中,可藉由溶液型方法(例如,旋塗或噴墨印刷)來施加併入至少一種本發明化合物之活性半導體層。就頂接點裝置而言,可利用遮蔽罩使金屬接點圖案化於薄膜頂部。
在某些實施例中,可利用聚合物作為介電材料,依照頂閘極底接點幾何形態製造其中在塑膠箔片上具有本發明化合物之OTFT裝置。在特定實施例中,可在室溫或高溫下沈積併入至少本發明化合物之活性半導體層。在其他實施例中,可藉由如本文中所描述之旋塗或印刷方法施加併入至少本發明化合物之活性半導體層。閘極及源極/汲極接點可由Au、其他金屬或導電聚合物製成及藉由氣相沈積及/或印刷來沈積。
其中可使用本發明化合物之其他製造物件為光伏打裝置或太陽能電池。本發明化合物可顯示寬光學吸收及/或極正性位移之還原電位,因此使其等適合該等應用。因此,本文中所描述之化合物可用作光伏打設計中之p型半導體,該設計包含鄰接的n型半導體材料,由此形成p-n接面。該等化合物可呈薄膜半導體之形式,其可為沈積在基板上之薄膜半導體之複合物。技術熟練者瞭解本發明化合物在此等裝置中之使用。
因此,本發明之另一態樣係關於製造併入本發明之一或多種半導體材料之有機發光電晶體、有機發光二極體(OLED)或有機光伏打裝置之方法。
提供以下實例以進一步說明及促進理解本發明且不意欲以任何方式限制本發明。
實例
藉由以下合成途徑製備2,9-二烷基-1,10-二硫雜二環五[a,i]聚并苯:
實例1
2,3-二溴-1,4-雙-三甲基矽烷基-苯之合成
在-78℃下,將LDA(2M,70mL,140mmol)滴加至1,2-二溴苯(15.0g,64mmol)及氯三甲基矽烷(20mL,153mmol)之THF(90mL)溶液中。將所得之棕色懸浮液在-78℃下攪拌30分鐘且隨後逐漸升溫至室溫。將反應混合物攪拌18小時且隨後再次冷卻至-78℃並添加氯三甲基矽烷(20mL,153mmol)。滴加LDA(2M,70
mL,140mmol)及將所得之棕色懸浮液在-78℃下攪拌30分鐘且隨後逐漸升溫至室溫。將反應混合物再攪拌18小時且隨後利用1N HCl(100mL)水解。利用乙醚(3×200mL)萃取所得之混合物並濃縮組合之有機層以提供棕色油,將其直接用於下一步驟而不進一步純化。1H NMR(400MHz,CDCl3)δ 7.34(s,2H),0.40(18H)。
實例2
2,3-二溴-1,4-二碘-苯之合成
在0℃下,將單氯化碘(1M,60mL,58mmol)添加至2,3-二溴-1,4-雙-三甲基矽烷基-苯(10.0g,26.3mmol)之二氯甲烷(105mL)溶液中。將所得之紫色溶液在室溫下攪拌1天。將反應冷卻至0℃並另外添加單氯化碘(1M,60mL,58mmol)。將反應混合物在室溫下再攪拌1天。將飽和硫代硫酸鈉溶液(150mL)添加至反應混合物中並用二氯甲烷(2×100mL)萃取。濃縮組合之有機層以提供棕色固體,且藉由管柱層析法,在矽膠上使用100%己烷進行純化以得到棕色固體(8g,69%)。產率:69%;棕色固體;1H NMR(400MHz,CDCl3)δ 7.47(s,2H)。
實例3
2-十四烷基-噻吩之合成
在-78℃下,將n-BuLi(1.6M,48mL,76mmol)滴加至噻吩(7.0g,83mmol)之THF(70mL)溶液中並攪拌45分鐘。將十四烷
基溴(23mL,76mmol)之THF(25mL)溶液滴加至所得之懸浮液中且隨後逐漸升溫至室溫並攪拌18小時。藉由水(60mL)淬滅反應混合物並用乙醚(2×100mL)萃取。在MgSO4上乾燥組合之有機萃取物並濃縮以提供棕色油(20.7g,97%),將其直接用於下一步驟而不進一步純化。1H NMR(400MHz,CDCl3)δ 7.10(d,1H,J=5.2Hz),6.91(dd,1H,J=5.7,4.4Hz),6.77(d,1H,J=3.2Hz),2.82(t,2H,J=7.6Hz),1.68(q,2H,J=6.8Hz),1.50-1.20(m,22H),0.88(t,3H,J=6.8Hz)。
實例4
三甲基-(5-十四烷基-噻吩-2-基)-錫烷之合成
在-78℃下,將n-BuLi(1.6M,42mL,67mmol)緩慢添加至2-十四烷基-噻吩(17.0g,237mmol)之THF(150mL)溶液中並攪拌30分鐘。將氯化三甲基錫(13.3g,67mmol)之THF(30mL)溶液滴加至所得之懸浮液中且隨後逐漸升溫至室溫。將反應混合物攪拌18小時並藉由飽和氯化銨溶液(100mL)淬滅。利用乙醚(2×100mL)萃取混合物並用鹽水(100mL)清洗組合之有機萃取物。乾燥有機相並濃縮以提供棕色油(26.8g,99%),將其直接用於下一步驟而不進一步純化。1H NMR(400MHz,CDCl3)δ 7.02(d,1H,J=3.2Hz),6.90(d,1H,J=3.2Hz),2.85(t,2H,J=8Hz),1.68(q,2H,J=7.6Hz),1.50-1.20(m,22H),0.88(t,3H,J=6.8Hz),0.344(s,9H)。
實例5
2,3-二溴-1,4-雙(三甲基-(5-十四烷基-噻吩-2-基)-錫烷)-苯之合成
將肆(三苯基膦)鈀(0)(3.55g,3.07mmol)添加至2,3-二溴-1,4-二碘-苯(15.0g,30.7mmol)及三甲基-(5-十四烷基-噻吩-2-基)-錫烷(35.0g,78.9mmol)之DMF(100mL)溶液中並在120℃下攪拌6小時。將反應混合物冷卻至室溫並用水(100mL)稀釋。用二氯甲烷(2×150mL)萃取該混合物。乾燥組合之有機相並濃縮以提供棕色油,藉由管柱層析法純化該棕色油以得到白色固體(15.0g,61%)。1H NMR(400MHz,CDCl3)δ 7.37(s,2H),7.07(d,2H,J=3.6Hz),6.77(d,2H,J=3.6Hz),2.83(t,4H,J=7.6Hz),1.71(q,4H,J=6.8Hz,7.6Hz),1.50-1.20(m,44H),0.88(s,6H)。
實例6
三甲基-三丁基錫烷基乙炔基-矽烷之合成
在-78℃下,將n-BuLi(1.6M,24.4mL,39mmol)滴加至乙炔基三甲基矽烷(4.0g,41mmol)之THF(40mL)溶液中並歷時30分鐘逐漸升溫至0℃。將反應混合物再冷卻至-78℃並將氯化三丁基錫(11.4mL,39mmol)之THF(30mL)溶液滴加至所得之混合物中。將反應混合物在室溫下攪拌18小時並用水(20mL)淬滅。用乙醚(2×100mL)萃取混合物並用鹽水(50mL)清洗組合之有機萃取物。乾燥有機相並濃縮以提供黃色油(15.0g,95%),將其直接用於下一步驟而不進一步純化。1H NMR(400MHz,CDCl3)δ 1.67-1.45(m,6H),1.45-1.20(m,6H),0.98(t,6H,J=8.4Hz),0.90(t,9H,J=7.2Hz),
0.16(s,9H)。
實例7
2,3-雙(乙炔基三甲基矽烷)-1,4-雙(三甲基-(5-十四烷基-噻吩-2-基)-錫烷)-苯之合成
將肆(三苯基膦)鈀(0)(2.9g,2.52mmol)添加至2,3-二溴-1,4-雙(三甲基-(5-十四烷基-噻吩-2-基)-錫烷)-苯(10.0g,12.6mmol)及三甲基-三丁基錫烷基乙炔基-矽烷(14.6g,37.8mmol)之甲苯(250mL)溶液中並在120℃下攪拌5小時。將反應混合物冷卻至室溫並用水(100mL)稀釋。用二氯甲烷(2×100mL)萃取混合物。乾燥組合之有機相並濃縮以提供棕色油,藉由急驟管柱層析法純化該棕色油以得到定量產率之黃色固體(14.5g)作為粗產物。將該粗產物直接用於下一步驟而不進一步純化。1H NMR(400MHz,CDCl3)δ 7.49(d,2H,J=3.6Hz),7.42(s,2H),6.74(d,2H,J=3.6Hz),2.82(t,4H,J=7.6Hz),1.80-1.60(m,4H),1.50-1.20(m,44H),0.92(t,6H,J=7.6Hz),0.27(s,18H)。
實例8
2,3-二乙炔基-1,4-雙(三甲基-(5-十四烷基-噻吩-2-基)-錫烷)-苯之合成
在室溫下,將氟化四丁基銨之THF溶液(1M,83mL,83mmol)滴加至2,3-雙(乙炔基三甲基矽烷)-1,4-雙(三甲基-(5-十四烷基-噻吩-2-基)-錫烷)-苯(20.9g,25mmol)之THF(240mL)溶液中並攪拌3小時。藉由飽和氯化銨溶液(200mL)淬滅反應混合物並用THF(3×100mL)萃取。乾燥組合之有機相並濃縮以提供棕色固體,藉由急驟管柱層析法純化該棕色固體以得到淺黃色固體(9.5g,兩個步驟共55%)。1H NMR(400MHz,CDCl3)δ 7.48(d,2H,J=3.6Hz),7.45(s,2H),6.77(d,2H,J=3,6Hz),3.54(s,2H),2.82(t,4H,J=7.6Hz),1.80-1.60(m,4H),1.50-1.20(m,44H),0.91(t,6H,J=7.6Hz)。
實例9
2,9-雙十四烷基-1,10-二硫雜-二環戊[a,i]菲之合成
將2,3-二乙炔基-1,4-雙(三甲基-(5-十四烷基-噻吩-2-基)-錫烷)-苯(8.9g,13mmol)及二氯化鉑(1.4g,5.21mmol)之甲苯(40mL)溶液在90℃下攪拌18小時。將反應混合物冷卻至室溫並過濾。濃縮濾液並用己烷(50mL)處理殘餘物。過濾所得之棕色懸浮液並單離呈棕色殘餘物之粗產物。使該棕色殘餘物自熱己烷再結晶以得到灰白色固體(1.6g,18%)。1H NMR(400MHz,CDCl3)δ 8.61(d,2H,J=8.8Hz),8.08(s,2H),7.88(d,2H,J=8.8Hz),7.17(s,2H),2.99(t,4H,J=7.2Hz),1.85-1.75(m,4H),1.50-1.20(m,44H),0.87(t,6H,J=7.2Hz)。
實例10
底閘極頂接點OFET之裝置製造之一般製程
使用具有200nm厚熱生長二氧化矽(SiO2)之高摻雜p型矽
(100)晶圓作為基板。藉由溶液或真空沈積(<1×10-3Pa)技術製造半導體層。隨後藉由遮蔽罩沈積50nm厚之源極及汲極用Au層以提供頂接點OFET裝置。通常,通道寬度(W)為50μm且通道長度(L)為1000μm。
在Keithley 4200 SCS上測量該等電晶體之電學特性。所有測量係於室溫空氣中實施。基於聚并苯衍生物之所有OFET均顯示典型的p型特性。為獲得轉移曲線,將汲極-源極電壓(Vd)維持在-60V。利用以下等式,在飽和區域中自(Id)1/2對Vg之斜率及臨界電壓(Vth)提取針對電洞之電荷載子遷移率(μ):μ=2Id/{(W/L)C1(Vg-Vth)2}。
該等OFET之性能係匯總於表1及圖1及2中。
圖1A及B顯示溶液沈積型OFET之輸出及轉移特性。在圖1A中,繪製汲極電流與汲極電壓之關係曲線。在圖1B中,繪製汲極電流與閘極-源極電壓之關係曲線。
圖2顯示真空沈積型OFET之轉移特性。繪製汲極電流與閘極-源極電壓之關係曲線。
圖1A及B顯示溶液沈積型OFET之輸出及轉移特性。
圖2顯示真空沈積型OFET之轉移特性。
Claims (12)
- 一種如下式I之聚并苯化合物,
- 如請求項1之聚并苯化合物,其具有式Ia至If:
- 如請求項1或2之聚并苯化合物,其中X係S。
- 如請求項1之聚并苯化合物,其中R7至R10係氫。
- 如請求項1之聚并苯化合物,其中R3及R4係氫。
- 如請求項1之聚并苯化合物,其中R1、R2、R5及R6彼此獨立地為氫或C1-20烷基。
- 如請求項2之式Ia聚并苯化合物,其中X係S,R1及R5為C1-20烷基且R2至R4及R6至R10為氫。
- 一種薄膜半導體,其包含一或多種如請求項1至7中任一項之化合物。
- 一種場效應電晶體裝置,其包含如請求項8之薄膜半導體。
- 一種光伏打裝置,其包含如請求項8之薄膜半導體。
- 一種有機發光二極體裝置,其包含如請求項8之薄膜半導體。
- 一種單極或互補電路裝置,其包含如請求項8之薄膜半導體。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261643358P | 2012-05-07 | 2012-05-07 | |
EP12166922 | 2012-05-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201406764A TW201406764A (zh) | 2014-02-16 |
TWI589580B true TWI589580B (zh) | 2017-07-01 |
Family
ID=49550249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102116265A TWI589580B (zh) | 2012-05-07 | 2013-05-07 | 用於有機電子裝置之聚并苯(phenacene)化合物 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9231215B2 (zh) |
EP (1) | EP2847166B1 (zh) |
JP (1) | JP6338572B2 (zh) |
KR (1) | KR102072538B1 (zh) |
CN (1) | CN104302622B (zh) |
TW (1) | TWI589580B (zh) |
WO (1) | WO2013168048A1 (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6284822B2 (ja) * | 2013-05-13 | 2018-02-28 | 株式会社Adeka | ピセン誘導体、光電変換材料及び光電変換素子 |
JP2015122437A (ja) * | 2013-12-24 | 2015-07-02 | 富士フイルム株式会社 | 有機薄膜トランジスタ、有機半導体薄膜および有機半導体材料 |
JP6474276B2 (ja) * | 2014-02-27 | 2019-02-27 | 株式会社Adeka | ピセノジチオフェン化合物、有機半導体材料、有機半導体層、有機半導体素子 |
JP6110802B2 (ja) * | 2014-03-07 | 2017-04-05 | 富士フイルム株式会社 | 薄膜トランジスタ |
JP6239457B2 (ja) * | 2014-07-18 | 2017-11-29 | 富士フイルム株式会社 | 有機半導体膜形成用組成物、及び、有機半導体素子の製造方法 |
WO2016027218A1 (en) | 2014-08-18 | 2016-02-25 | Basf Se | Process for preparing crystalline organic semiconductor material |
EP3210986A4 (en) * | 2014-10-21 | 2018-03-28 | Adeka Corporation | Picene derivative, photoelectric conversion material and photoelectric conversion element |
WO2016071140A1 (en) * | 2014-11-04 | 2016-05-12 | Basf Se | Phenacene compounds for organic electronics |
JP6363732B2 (ja) | 2014-11-25 | 2018-07-25 | 富士フイルム株式会社 | 有機半導体素子及びその製造方法、有機半導体膜形成用組成物、化合物、並びに、有機半導体膜 |
WO2016147773A1 (ja) | 2015-03-13 | 2016-09-22 | 富士フイルム株式会社 | 有機半導体膜形成用組成物、有機薄膜トランジスタ、電子ペーパー、および、ディスプレイデバイス |
WO2017002643A1 (ja) * | 2015-06-30 | 2017-01-05 | 富士フイルム株式会社 | 光電変換素子、およびこれを用いた太陽電池 |
CN109776568B (zh) * | 2019-03-20 | 2020-07-28 | 湖南科技大学 | 一种轴对称的六元桥环萘核小分子受体材料及其制备方法和应用 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE302853B (zh) * | 1963-12-12 | 1968-08-05 | Dow Corning | |
EP1839339A2 (en) | 2004-12-23 | 2007-10-03 | Northwestern University | Siloxane-polymer dielectric compositions and related organic field-effect transistors |
WO2007075748A2 (en) | 2005-12-20 | 2007-07-05 | Northwestern University | Intercalated superlattice compositions and related methods for modulating dielectric property |
JP4499770B2 (ja) | 2007-09-06 | 2010-07-07 | 富士フイルム株式会社 | 偏光制御システム及びプロジェクタ |
JPWO2010024388A1 (ja) * | 2008-08-29 | 2012-01-26 | 出光興産株式会社 | 有機薄膜トランジスタ用化合物及びそれを用いた有機薄膜トランジスタ |
KR20100074081A (ko) * | 2008-12-23 | 2010-07-01 | (주)루미나노 | 신규 유기 반도체 화합물, 그의 제조 방법, 상기를 포함하는 유기 반도체 조성물, 유기 반도체 박막 및 소자 |
JP2010177637A (ja) * | 2009-02-02 | 2010-08-12 | Mitsui Chemicals Inc | 有機トランジスタ |
JP2010205983A (ja) * | 2009-03-04 | 2010-09-16 | Mitsui Chemicals Inc | 有機トランジスタ |
KR101117722B1 (ko) * | 2009-08-28 | 2012-03-07 | 삼성모바일디스플레이주식회사 | 유기 발광 소자 |
-
2013
- 2013-04-29 WO PCT/IB2013/053379 patent/WO2013168048A1/en active Application Filing
- 2013-04-29 JP JP2015510912A patent/JP6338572B2/ja active Active
- 2013-04-29 CN CN201380023973.0A patent/CN104302622B/zh active Active
- 2013-04-29 US US14/399,756 patent/US9231215B2/en active Active
- 2013-04-29 EP EP13786971.5A patent/EP2847166B1/en active Active
- 2013-04-29 KR KR1020147030967A patent/KR102072538B1/ko active IP Right Grant
- 2013-05-07 TW TW102116265A patent/TWI589580B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP6338572B2 (ja) | 2018-06-06 |
CN104302622B (zh) | 2016-10-12 |
US9231215B2 (en) | 2016-01-05 |
KR20150013489A (ko) | 2015-02-05 |
CN104302622A (zh) | 2015-01-21 |
EP2847166A1 (en) | 2015-03-18 |
EP2847166B1 (en) | 2021-03-24 |
WO2013168048A1 (en) | 2013-11-14 |
KR102072538B1 (ko) | 2020-02-03 |
TW201406764A (zh) | 2014-02-16 |
EP2847166A4 (en) | 2016-01-06 |
JP2015518492A (ja) | 2015-07-02 |
US20150126751A1 (en) | 2015-05-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI589580B (zh) | 用於有機電子裝置之聚并苯(phenacene)化合物 | |
JP5562652B2 (ja) | シリルエチニル化されたヘテロアセン類およびそれで作製された電子装置 | |
TWI508991B (zh) | 雙極性聚合性半導體材料及有機電子元件 | |
KR20070106976A (ko) | 카르보닐-관능화 티오펜 화합물 및 관련 장치 구조물 | |
CN101889016A (zh) | 吡咯并吡咯衍生物、其制备及用途 | |
JP6275118B2 (ja) | 芳香族複素環化合物、その製造方法、有機半導体材料及び有機半導体デバイス | |
JP5733553B2 (ja) | 置換基脱離化合物および有機半導体材料およびその膜およびそれを用いた有機トランジスタ | |
JP5708980B2 (ja) | 有機電子デバイスの製造方法および有機電子デバイス | |
JP5664897B2 (ja) | ベンゼン環を有するπ電子共役系化合物を含有する膜状体の製法、及び該π電子共役系化合物の製法。 | |
JP5978228B2 (ja) | 有機半導体材料及び有機電子デバイス | |
JP2015199716A (ja) | 多環縮環化合物、有機半導体材料、有機半導体デバイス及び有機トランジスタ | |
CN106967045B (zh) | 杂并苯化合物的中间体、使用其的杂并苯化合物的合成方法 | |
JP5650107B2 (ja) | チエノピラジン化合物、およびそれを含有した電界効果トランジスタ | |
JP6043226B2 (ja) | 芳香族複素環化合物とその製造方法、有機半導体材料及び有機半導体デバイス | |
JP5590491B2 (ja) | 高分子化合物、高分子有機半導体材料及び有機半導体デバイス | |
JP6986692B2 (ja) | 含窒素複素環アルケニル化合物、有機半導体材料及び有機半導体デバイス | |
TW201623311A (zh) | 用於有機電子裝置之聚并苯(phenacene)化合物 | |
KR20110104218A (ko) | 용액공정용 펜타센 유도체 및 이들의 제조방법과 이를 이용한 유기박막 트렌지스터 | |
WO2015111605A1 (ja) | 有機トランジスタ、化合物、非発光性有機半導体デバイス用有機半導体材料、有機トランジスタ用材料、非発光性有機半導体デバイス用塗布溶液、非発光性有機半導体デバイス用有機半導体膜 | |
JP5578414B2 (ja) | テトラチアフルバレン誘導体を用いた有機トランジスタ及びその製造方法 | |
TW201529580A (zh) | 新穎縮合多環芳香族化合物及其用途 | |
US20160049594A1 (en) | Organic semiconductor material for organic transistor, and organic transistor element |