TWI573844B - 塡隙方法 - Google Patents

塡隙方法 Download PDF

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Publication number
TWI573844B
TWI573844B TW103144924A TW103144924A TWI573844B TW I573844 B TWI573844 B TW I573844B TW 103144924 A TW103144924 A TW 103144924A TW 103144924 A TW103144924 A TW 103144924A TW I573844 B TWI573844 B TW I573844B
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TW
Taiwan
Prior art keywords
group
composition
interstitial
unit
polymer
Prior art date
Application number
TW103144924A
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English (en)
Chinese (zh)
Other versions
TW201536880A (zh
Inventor
沈載桓
朴璡洪
林載峰
趙廷奎
承柏 徐
朴鐘根
李銘啓
菲利普Ｄ 赫斯塔德
Original Assignee
羅門哈斯電子材料有限公司
陶氏全球科技責任有限公司
羅門哈斯電子材料韓國公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 羅門哈斯電子材料有限公司, 陶氏全球科技責任有限公司, 羅門哈斯電子材料韓國公司 filed Critical 羅門哈斯電子材料有限公司
Publication of TW201536880A publication Critical patent/TW201536880A/zh
Application granted granted Critical
Publication of TWI573844B publication Critical patent/TWI573844B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02—Homopolymers or copolymers of hydrocarbons
    • C08L25/04—Homopolymers or copolymers of styrene
    • C08L25/06—Polystyrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/31058—After-treatment of organic layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00—Applications
    • C08L2203/20—Applications use in electrical or conductive gadgets

Landscapes

  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Formation Of Insulating Films (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW103144924A 2013-12-23 2014-12-23 塡隙方法 TWI573844B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201361920344P 2013-12-23 2013-12-23

Publications (2)

Publication Number Publication Date
TW201536880A TW201536880A (zh) 2015-10-01
TWI573844B true TWI573844B (zh) 2017-03-11

Family

ID=53533840

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103144924A TWI573844B (zh) 2013-12-23 2014-12-23 塡隙方法

Country Status (5)

Country Link
US (1) US9558987B2 (enExample)
JP (1) JP6014110B2 (enExample)
KR (2) KR20150075046A (enExample)
CN (1) CN105304550B (enExample)
TW (1) TWI573844B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10163632B2 (en) 2016-12-15 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Material composition and process for substrate modification
KR20210145986A (ko) * 2020-05-26 2021-12-03 에스케이하이닉스 주식회사 평탄화층 형성 방법 및 이를 이용한 패턴 형성 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200641533A (en) * 2005-02-05 2006-12-01 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
CN101107569B (zh) * 2005-01-21 2011-06-15 日产化学工业株式会社 含有具有被保护的羧基的化合物的形成光刻用下层膜的组合物
TW201235787A (en) * 2011-02-17 2012-09-01 Fujifilm Corp Gap embedding composition, method of embedding gap and method of producing semiconductor device by using the composition

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW299475B (enExample) 1993-03-30 1997-03-01 Siemens Ag
JP3807587B2 (ja) * 1999-07-12 2006-08-09 協和化学工業株式会社 難燃性熱可塑性樹脂組成物及びその成形品
US6461717B1 (en) 2000-04-24 2002-10-08 Shipley Company, L.L.C. Aperture fill
JP4654544B2 (ja) 2000-07-12 2011-03-23 日産化学工業株式会社 リソグラフィー用ギャップフィル材形成組成物
EP1398831A3 (en) 2002-09-13 2008-02-20 Shipley Co. L.L.C. Air gaps formation
KR101158297B1 (ko) 2002-12-26 2012-06-26 닛산 가가쿠 고교 가부시키 가이샤 알칼리 용해형 리소그라피용 갭 필링재 형성조성물
TWI310484B (en) * 2003-02-21 2009-06-01 Nissan Chemical Ind Ltd Composition containing acrylic polymer for forming gap-filling material for lithography
EP1762895B1 (en) * 2005-08-29 2016-02-24 Rohm and Haas Electronic Materials, L.L.C. Antireflective Hard Mask Compositions
CN101459106B (zh) * 2007-12-13 2011-01-12 中芯国际集成电路制造(上海)有限公司 浅沟槽隔离结构的形成方法
JP5040839B2 (ja) * 2008-07-18 2012-10-03 Ｊｓｒ株式会社 レジスト下層膜形成組成物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101107569B (zh) * 2005-01-21 2011-06-15 日产化学工业株式会社 含有具有被保护的羧基的化合物的形成光刻用下层膜的组合物
TW200641533A (en) * 2005-02-05 2006-12-01 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
TW201235787A (en) * 2011-02-17 2012-09-01 Fujifilm Corp Gap embedding composition, method of embedding gap and method of producing semiconductor device by using the composition

Also Published As

Publication number Publication date
CN105304550A (zh) 2016-02-03
KR20150075046A (ko) 2015-07-02
CN105304550B (zh) 2018-05-08
KR20160119011A (ko) 2016-10-12
US20150348828A1 (en) 2015-12-03
US9558987B2 (en) 2017-01-31
TW201536880A (zh) 2015-10-01
JP6014110B2 (ja) 2016-10-25
JP2015122504A (ja) 2015-07-02

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