TWI560799B - - Google Patents

Info

Publication number
TWI560799B
TWI560799B TW104107924A TW104107924A TWI560799B TW I560799 B TWI560799 B TW I560799B TW 104107924 A TW104107924 A TW 104107924A TW 104107924 A TW104107924 A TW 104107924A TW I560799 B TWI560799 B TW I560799B
Authority
TW
Taiwan
Application number
TW104107924A
Other versions
TW201526149A (zh
Inventor
Nobuaki Matsuoka
Akira Miyata
Shinichi Hayashi
Suguru Enokida
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW201526149A publication Critical patent/TW201526149A/zh
Application granted granted Critical
Publication of TWI560799B publication Critical patent/TWI560799B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
TW104107924A 2010-07-09 2011-07-08 基板處理裝置 TW201526149A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010156563 2010-07-09
JP2011053370A JP5397399B2 (ja) 2010-07-09 2011-03-10 塗布、現像装置

Publications (2)

Publication Number Publication Date
TW201526149A TW201526149A (zh) 2015-07-01
TWI560799B true TWI560799B (zh) 2016-12-01

Family

ID=44370620

Family Applications (3)

Application Number Title Priority Date Filing Date
TW104107894A TWI566322B (zh) 2010-07-09 2011-07-08 Coating device
TW100124221A TWI487056B (zh) 2010-07-09 2011-07-08 Coating device
TW104107924A TW201526149A (zh) 2010-07-09 2011-07-08 基板處理裝置

Family Applications Before (2)

Application Number Title Priority Date Filing Date
TW104107894A TWI566322B (zh) 2010-07-09 2011-07-08 Coating device
TW100124221A TWI487056B (zh) 2010-07-09 2011-07-08 Coating device

Country Status (7)

Country Link
US (2) US8534936B2 (zh)
EP (1) EP2405478B1 (zh)
JP (1) JP5397399B2 (zh)
KR (2) KR101657721B1 (zh)
CN (3) CN104966685B (zh)
SG (2) SG196814A1 (zh)
TW (3) TWI566322B (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5397399B2 (ja) * 2010-07-09 2014-01-22 東京エレクトロン株式会社 塗布、現像装置
JP5338777B2 (ja) * 2010-09-02 2013-11-13 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5779168B2 (ja) * 2012-12-04 2015-09-16 東京エレクトロン株式会社 周縁部塗布装置、周縁部塗布方法及び周縁部塗布用記録媒体
JP6077311B2 (ja) * 2013-01-11 2017-02-08 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ ネガティブ現像処理方法およびネガティブ現像処理装置
JP5793527B2 (ja) * 2013-03-26 2015-10-14 東京エレクトロン株式会社 搬送装置制御システム及び搬送装置のアクセス位置を調整する方法
JP5867473B2 (ja) * 2013-09-19 2016-02-24 東京エレクトロン株式会社 塗布、現像装置、塗布、現像装置の運転方法及び記憶媒体
US9685357B2 (en) 2013-10-31 2017-06-20 Semes Co., Ltd. Apparatus for treating substrate
JP6243784B2 (ja) 2014-03-31 2017-12-06 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ 基板処理装置
US10514685B2 (en) * 2014-06-13 2019-12-24 KLA—Tencor Corp. Automatic recipe stability monitoring and reporting
CN106292204A (zh) * 2015-05-28 2017-01-04 沈阳芯源微电子设备有限公司 一种匀胶显影装置
DE102016005324A1 (de) * 2016-05-02 2017-11-02 Drägerwerk AG & Co. KGaA Erweiterungskabel für einen medizinischen Sensor und Datennetzwerkgerät
KR102225957B1 (ko) 2018-09-12 2021-03-11 세메스 주식회사 기판 처리 장치
JP7190979B2 (ja) * 2018-09-21 2022-12-16 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN110943018A (zh) 2018-09-21 2020-03-31 株式会社斯库林集团 衬底处理装置及衬底处理方法
JP7273499B2 (ja) * 2018-12-25 2023-05-15 株式会社ディスコ タッチパネル
JP6994489B2 (ja) * 2019-10-02 2022-01-14 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080299502A1 (en) * 2007-05-29 2008-12-04 Tokyo Electron Limited Coating and developing apparatus, operating method for same, and storage medium for the method
JP2009135294A (ja) * 2007-11-30 2009-06-18 Sokudo:Kk 基板処理装置
JP2010045207A (ja) * 2008-08-13 2010-02-25 Tokyo Electron Ltd 塗布、現像装置、及び塗布、現像装置の搬送アーム洗浄方法、並びに記憶媒体

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW353777B (en) * 1996-11-08 1999-03-01 Tokyo Electron Ltd Treatment device
JP3645492B2 (ja) * 2000-02-01 2005-05-11 東京エレクトロン株式会社 基板処理装置
JP3943828B2 (ja) * 2000-12-08 2007-07-11 東京エレクトロン株式会社 塗布、現像装置及びパターン形成方法
AU2003280854A1 (en) 2002-11-28 2004-06-18 Tokyo Electron Limited Wafer processing system, coating/developing apparatus, and wafer processing apparatus
KR101069821B1 (ko) * 2004-10-15 2011-10-04 세메스 주식회사 반도체 기판 제조에 사용되는 포토 리소그래피 장치
JP4955976B2 (ja) * 2005-01-21 2012-06-20 東京エレクトロン株式会社 塗布、現像装置及びその方法
US7245348B2 (en) * 2005-01-21 2007-07-17 Tokyo Electron Limited Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning
US7267497B2 (en) * 2005-01-21 2007-09-11 Tokyo Electron Limited Coating and developing system and coating and developing method
JP4459831B2 (ja) * 2005-02-01 2010-04-28 東京エレクトロン株式会社 塗布、現像装置
JP4414921B2 (ja) * 2005-03-23 2010-02-17 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP4450784B2 (ja) 2005-10-19 2010-04-14 東京エレクトロン株式会社 塗布、現像装置及びその方法
JP4654119B2 (ja) * 2005-11-29 2011-03-16 東京エレクトロン株式会社 塗布・現像装置及び塗布・現像方法
JP4816217B2 (ja) 2006-04-14 2011-11-16 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP4983565B2 (ja) * 2006-12-20 2012-07-25 東京エレクトロン株式会社 基板洗浄装置、基板洗浄方法及び記憶媒体
JP2008288447A (ja) * 2007-05-18 2008-11-27 Sokudo:Kk 基板処理装置
TW200919117A (en) 2007-08-28 2009-05-01 Tokyo Electron Ltd Coating-developing apparatus, coating-developing method and storage medium
JP5338757B2 (ja) * 2010-07-09 2013-11-13 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5397399B2 (ja) * 2010-07-09 2014-01-22 東京エレクトロン株式会社 塗布、現像装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080299502A1 (en) * 2007-05-29 2008-12-04 Tokyo Electron Limited Coating and developing apparatus, operating method for same, and storage medium for the method
JP2009135294A (ja) * 2007-11-30 2009-06-18 Sokudo:Kk 基板処理装置
JP2010045207A (ja) * 2008-08-13 2010-02-25 Tokyo Electron Ltd 塗布、現像装置、及び塗布、現像装置の搬送アーム洗浄方法、並びに記憶媒体

Also Published As

Publication number Publication date
KR101657721B1 (ko) 2016-09-19
TW201523780A (zh) 2015-06-16
KR20160110335A (ko) 2016-09-21
EP2405478B1 (en) 2018-09-05
TWI487056B (zh) 2015-06-01
CN104966686A (zh) 2015-10-07
TW201526149A (zh) 2015-07-01
US20130329199A1 (en) 2013-12-12
EP2405478A3 (en) 2015-04-01
CN104966686B (zh) 2016-12-14
TWI566322B (zh) 2017-01-11
CN102315090B (zh) 2015-07-22
JP5397399B2 (ja) 2014-01-22
CN102315090A (zh) 2012-01-11
KR101692679B1 (ko) 2017-01-03
EP2405478A2 (en) 2012-01-11
CN104966685B (zh) 2018-07-10
US8534936B2 (en) 2013-09-17
US8740481B2 (en) 2014-06-03
TW201222701A (en) 2012-06-01
US20120008936A1 (en) 2012-01-12
CN104966685A (zh) 2015-10-07
JP2012033863A (ja) 2012-02-16
SG196814A1 (en) 2014-02-13
SG177841A1 (en) 2012-02-28
KR20120005946A (ko) 2012-01-17

Similar Documents

Publication Publication Date Title
BR112013008959A2 (zh)
BR112012031500A2 (zh)
BR112012029986A2 (zh)
BR112012030039A2 (zh)
BR112012028408A2 (zh)
BR112012026492A2 (zh)
BR112012027808A2 (zh)
BR112012025307A2 (zh)
BR112012026946A2 (zh)
BR112012025482A2 (zh)
BR112013006400A2 (zh)
BR112012031826A2 (zh)
BR112012028186A2 (zh)
BR112012025577A2 (zh)
BR112012027015A2 (zh)
BR112012025308A2 (zh)
TWI560799B (zh)
BR112012027945A2 (zh)
BR112013010949A2 (zh)
BR112013003284A2 (zh)
BR112013002646A2 (zh)
BR112012026403A2 (zh)
BR112012023446A2 (zh)
BR112013006825A2 (zh)
BR112012028859A2 (zh)