TWI547756B - A photosensitive conductive thin film, a method for forming a conductive film, and a method for forming a conductive pattern - Google Patents

A photosensitive conductive thin film, a method for forming a conductive film, and a method for forming a conductive pattern Download PDF

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Publication number
TWI547756B
TWI547756B TW100116765A TW100116765A TWI547756B TW I547756 B TWI547756 B TW I547756B TW 100116765 A TW100116765 A TW 100116765A TW 100116765 A TW100116765 A TW 100116765A TW I547756 B TWI547756 B TW I547756B
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TW
Taiwan
Prior art keywords
conductive
conductive film
film
substrate
photosensitive resin
Prior art date
Application number
TW100116765A
Other languages
English (en)
Chinese (zh)
Other versions
TW201214032A (en
Inventor
Hiroshi Yamazaki
Yoshimi Igarashi
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of TW201214032A publication Critical patent/TW201214032A/zh
Application granted granted Critical
Publication of TWI547756B publication Critical patent/TWI547756B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/093—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antistatic means, e.g. for charge depletion

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing & Machinery (AREA)
  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
TW100116765A 2010-05-13 2011-05-13 A photosensitive conductive thin film, a method for forming a conductive film, and a method for forming a conductive pattern TWI547756B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010111064 2010-05-13

Publications (2)

Publication Number Publication Date
TW201214032A TW201214032A (en) 2012-04-01
TWI547756B true TWI547756B (zh) 2016-09-01

Family

ID=44914415

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100116765A TWI547756B (zh) 2010-05-13 2011-05-13 A photosensitive conductive thin film, a method for forming a conductive film, and a method for forming a conductive pattern

Country Status (5)

Country Link
JP (2) JP5582189B2 (ko)
KR (4) KR20120120372A (ko)
CN (2) CN108008602A (ko)
TW (1) TWI547756B (ko)
WO (1) WO2011142360A1 (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9253892B2 (en) * 2012-04-13 2016-02-02 Wistron Corporation Peripheral circuit of touch panel and manufacturing method thereof
WO2014199802A1 (ja) * 2013-06-11 2014-12-18 コニカミノルタ株式会社 有機エレクトロルミネッセンス素子の製造方法
CN103433189A (zh) * 2013-09-02 2013-12-11 中环高科（天津）股份有限公司 一种采用导电高分子涂料在pet基材表面的成膜工艺
CN104375382A (zh) * 2014-03-31 2015-02-25 中能柔性光电（滁州）有限公司 一种柔性导电膜图形化制造方法
KR20170041809A (ko) * 2014-08-07 2017-04-17 사빅 글로벌 테크놀러지스 비.브이. 열성형 어플리케이션용 도전성 다층 시트
JP6027633B2 (ja) * 2015-01-13 2016-11-16 日本写真印刷株式会社 タッチ入力センサの製造方法及び感光性導電フィルム
CN107430336B (zh) 2015-04-21 2019-06-11 东丽株式会社 导电图案形成部件的制造方法
CN107093494B (zh) * 2017-03-22 2021-07-13 中山大学 一种可转移图案化的导电薄膜及其制备与图案化的方法

Citations (2)

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JP2003346575A (ja) * 2002-05-29 2003-12-05 Konica Minolta Holdings Inc 導電性パターンの形成方法
CN1940723A (zh) * 2005-09-28 2007-04-04 旭化成电子材料元件株式会社 感光性树脂组合物及其层合体

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JP4122889B2 (ja) * 2002-08-08 2008-07-23 コニカミノルタホールディングス株式会社 導電路又は電極、およびそれらの形成方法
JP4281324B2 (ja) * 2002-10-23 2009-06-17 コニカミノルタホールディングス株式会社 有機薄膜トランジスタ素子、その製造方法及び有機薄膜トランジスタシート
JP4666961B2 (ja) * 2004-06-29 2011-04-06 Ｔｄｋ株式会社 透明導電層が付与された物体、及び転写用導電性フィルム
CN101297242A (zh) * 2005-10-25 2008-10-29 日立化成工业株式会社 感光性树脂组合物、使用其的感光性元件、抗蚀剂图案的形成方法及印刷电路板的制造方法
CN101075090A (zh) * 2006-05-19 2007-11-21 旭化成电子材料元件株式会社 干膜抗蚀剂
JP4258532B2 (ja) * 2006-06-30 2009-04-30 カシオ計算機株式会社 薄膜デバイス基板とその製造方法
JP4826803B2 (ja) * 2007-03-20 2011-11-30 Ｊｓｒ株式会社 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
JP5588597B2 (ja) * 2007-03-23 2014-09-10 富士フイルム株式会社 導電性材料の製造方法及び製造装置
JP5277679B2 (ja) * 2007-03-30 2013-08-28 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
CN101486837A (zh) * 2008-01-18 2009-07-22 郑州泰达电子材料科技有限公司 导电性高分子溶液、导电性高分子涂膜以及固体电解质
CN102124529B (zh) * 2008-08-22 2014-11-05 日立化成株式会社 感光性导电膜、导电膜的形成方法、导电图形的形成方法以及导电膜基板
JP5569144B2 (ja) * 2010-02-24 2014-08-13 日立化成株式会社 感光性導電フィルム、導電膜の形成方法及び導電パターンの形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003346575A (ja) * 2002-05-29 2003-12-05 Konica Minolta Holdings Inc 導電性パターンの形成方法
CN1940723A (zh) * 2005-09-28 2007-04-04 旭化成电子材料元件株式会社 感光性树脂组合物及其层合体

Also Published As

Publication number Publication date
WO2011142360A1 (ja) 2011-11-17
TW201214032A (en) 2012-04-01
JP2014199814A (ja) 2014-10-23
KR20160052754A (ko) 2016-05-12
KR20150061006A (ko) 2015-06-03
JP5871029B2 (ja) 2016-03-01
JP5582189B2 (ja) 2014-09-03
KR20120120372A (ko) 2012-11-01
JPWO2011142360A1 (ja) 2013-07-22
CN108008602A (zh) 2018-05-08
KR101847364B1 (ko) 2018-04-09
KR20170084345A (ko) 2017-07-19
CN102859612A (zh) 2013-01-02

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