TWI538743B - 液體供給裝置 - Google Patents
液體供給裝置 Download PDFInfo
- Publication number
- TWI538743B TWI538743B TW103106567A TW103106567A TWI538743B TW I538743 B TWI538743 B TW I538743B TW 103106567 A TW103106567 A TW 103106567A TW 103106567 A TW103106567 A TW 103106567A TW I538743 B TWI538743 B TW I538743B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid supply
- liquid
- supply path
- nozzle
- valve
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013040814A JP5853971B2 (ja) | 2013-03-01 | 2013-03-01 | 液供給装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201440897A TW201440897A (zh) | 2014-11-01 |
TWI538743B true TWI538743B (zh) | 2016-06-21 |
Family
ID=51691579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103106567A TWI538743B (zh) | 2013-03-01 | 2014-02-26 | 液體供給裝置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5853971B2 (ko) |
KR (1) | KR101998894B1 (ko) |
TW (1) | TWI538743B (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6319117B2 (ja) * | 2015-01-26 | 2018-05-09 | 東京エレクトロン株式会社 | 処理液供給装置、処理液供給方法及び記憶媒体 |
JP6512894B2 (ja) * | 2015-03-27 | 2019-05-15 | 株式会社Screenホールディングス | 処理液供給装置および処理液供給装置の制御方法 |
JP6925872B2 (ja) * | 2017-05-31 | 2021-08-25 | 東京エレクトロン株式会社 | 基板液処理装置、処理液供給方法及び記憶媒体 |
CN110159928B (zh) * | 2018-02-13 | 2021-04-20 | 辛耘企业股份有限公司 | 流体控制装置 |
JP6789271B2 (ja) * | 2018-09-18 | 2020-11-25 | 株式会社Screenホールディングス | 基板処理装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03115267U (ko) * | 1990-03-09 | 1991-11-28 | ||
JP2766253B2 (ja) * | 1996-06-27 | 1998-06-18 | 山形日本電気株式会社 | 液体の流量安定化装置 |
JPH1133471A (ja) * | 1997-07-23 | 1999-02-09 | Tokyo Electron Ltd | 塗布装置 |
JP3490320B2 (ja) | 1999-02-02 | 2004-01-26 | 東京エレクトロン株式会社 | 塗布膜形成方法および塗布処理装置 |
JP3990567B2 (ja) * | 2001-12-18 | 2007-10-17 | 大日本スクリーン製造株式会社 | ダイヤフラムバルブ、基板処理ユニットおよび基板処理装置 |
JP4668027B2 (ja) * | 2005-10-17 | 2011-04-13 | シーケーディ株式会社 | 薬液供給システム |
JP5045741B2 (ja) * | 2009-12-25 | 2012-10-10 | 東京エレクトロン株式会社 | 薬液供給ノズル及び薬液供給方法 |
-
2013
- 2013-03-01 JP JP2013040814A patent/JP5853971B2/ja active Active
-
2014
- 2014-02-17 KR KR1020140017654A patent/KR101998894B1/ko active IP Right Grant
- 2014-02-26 TW TW103106567A patent/TWI538743B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP2014168734A (ja) | 2014-09-18 |
KR20140109258A (ko) | 2014-09-15 |
KR101998894B1 (ko) | 2019-07-10 |
TW201440897A (zh) | 2014-11-01 |
JP5853971B2 (ja) | 2016-02-09 |
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