TWI494691B - 具有可調節之機械模數Ｇｕｖ的光聚合物配製物 - Google Patents

具有可調節之機械模數Ｇｕｖ的光聚合物配製物 Download PDF

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Publication number
TWI494691B
TWI494691B TW099137568A TW99137568A TWI494691B TW I494691 B TWI494691 B TW I494691B TW 099137568 A TW099137568 A TW 099137568A TW 99137568 A TW99137568 A TW 99137568A TW I494691 B TWI494691 B TW I494691B
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TW
Taiwan
Prior art keywords
refractive index
photopolymer formulation
monomer
writing
group
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TW099137568A
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English (en)
Chinese (zh)
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TW201135361A (en
Inventor
Marc-Stephan Weiser
Thomas Roelle
Friedrich-Karl Bruder
Thomas Faecke
Dennis Hoenel
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Bayer Materialscience Ag
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Publication of TW201135361A publication Critical patent/TW201135361A/zh
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Publication of TWI494691B publication Critical patent/TWI494691B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78—Nitrogen
    • C08G18/79—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/08—Polyurethanes from polyethers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N11/00—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties
    • G01N11/10—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material
    • G01N11/16—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material by measuring damping effect upon oscillatory body
    • G01N11/162—Oscillations being torsional, e.g. produced by rotating bodies
    • G01N11/165—Sample held between two members substantially perpendicular to axis of rotation, e.g. parallel plate viscometer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
    • G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions [3D], e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Holo Graphy (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Polymerisation Methods In General (AREA)
TW099137568A 2009-11-03 2010-11-02 具有可調節之機械模數Ｇｕｖ的光聚合物配製物 TWI494691B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20090013771 EP2317511B1 (de) 2009-11-03 2009-11-03 Photopolymerformulierungen mit einstellbarem mechanischem Modul Guv

Publications (2)

Publication Number Publication Date
TW201135361A TW201135361A (en) 2011-10-16
TWI494691B true TWI494691B (zh) 2015-08-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW099137568A TWI494691B (zh) 2009-11-03 2010-11-02 具有可調節之機械模數Ｇｕｖ的光聚合物配製物

Country Status (12)

Country Link
US (2) US8921012B2 (https=)
EP (1) EP2317511B1 (https=)
JP (1) JP5886751B2 (https=)
KR (1) KR101727352B1 (https=)
CN (1) CN102792377B (https=)
AT (1) ATE548730T1 (https=)
BR (1) BR112012010468A2 (https=)
ES (1) ES2381808T3 (https=)
PL (1) PL2317511T3 (https=)
RU (1) RU2542975C9 (https=)
TW (1) TWI494691B (https=)
WO (1) WO2011054749A1 (https=)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL200996A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
CA2738835A1 (en) * 2008-10-01 2010-04-08 Bayer Materialscience Ag Prepolymer-based polyurethane formulations for producing holographic media
EP2218742A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2497084B1 (de) * 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Auswahlverfahren für additive in photopolymeren
US8877408B2 (en) * 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation
EP2317511B1 (de) * 2009-11-03 2012-03-07 Bayer MaterialScience AG Photopolymerformulierungen mit einstellbarem mechanischem Modul Guv
JP5925687B2 (ja) * 2009-11-03 2016-05-25 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ ホログラフィック媒体の製造方法
ES2433235T3 (es) * 2009-11-03 2013-12-10 Bayer Intellectual Property Gmbh Fluorouretanos como aditivos en una formulación de fotopolímero
TWI506049B (zh) * 2009-11-03 2015-11-01 Bayer Materialscience Ag 具有高折射率和降低之雙鍵密度的丙烯酸胺基甲酸酯
KR101782182B1 (ko) * 2009-11-03 2017-09-26 코베스트로 도이칠란드 아게 상이한 기록 공단량체를 갖는 광중합체 제제
ES2446344T3 (es) * 2009-11-03 2014-03-07 Bayer Intellectual Property Gmbh Procedimiento para la producción de una película holográfica
PT2497085E (pt) * 2009-11-03 2014-03-27 Bayer Ip Gmbh Processo para a produção de um filme holográfico
US9057950B2 (en) * 2010-02-02 2015-06-16 Bayer Intellectual Property Gmbh Photopolymer formulation having ester-based writing monomers
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
EP2613319A1 (de) * 2012-01-05 2013-07-10 Bayer MaterialScience AG Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht
US20140302425A1 (en) * 2012-04-30 2014-10-09 Bayer Intellectual Property Gmbh Method for producing holographic media
WO2014026923A1 (de) 2012-08-13 2014-02-20 Bayer Materialscience Ag Lichtführungsplatte mit auskoppelelementen
EP2700510B1 (de) * 2012-08-23 2015-09-16 Bayer MaterialScience AG Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper
CN104540685B (zh) * 2012-08-23 2017-09-26 科思创德国股份有限公司 含有具有全息图的视觉可变窗口的安全文件和/或有价文件
KR102382218B1 (ko) * 2014-04-25 2022-04-05 코베스트로 도이칠란트 아게 홀로그래픽 광중합체 배합물에서의 기록 단량체로서의 방향족 글리콜 에테르
KR102583200B1 (ko) * 2014-12-12 2023-09-27 코베스트로 도이칠란트 아게 광중합체에 대한 기록 단량체로서의 나프틸 아크릴레이트
WO2016096641A1 (de) * 2014-12-19 2016-06-23 Covestro Deutschland Ag Feuchtigkeitsstabile holographische medien
US10915066B2 (en) 2015-12-22 2021-02-09 Covestro Deutschland Ag Device and method for the industrial production of volume reflection holograms with substrate-guided reconstruction beams
US11427656B2 (en) * 2016-08-30 2022-08-30 Sony Corporation Photosensitive composition for hologram recording, hologram recording medium, and hologram
KR102009421B1 (ko) * 2017-04-25 2019-08-12 주식회사 엘지화학 포토폴리머 조성물
TW201906730A (zh) * 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜
EP3435156A1 (de) * 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer
KR102156872B1 (ko) * 2017-09-27 2020-09-16 주식회사 엘지화학 포토폴리머 조성물
KR102244648B1 (ko) * 2017-12-08 2021-04-26 주식회사 엘지화학 포토폴리머 조성물
KR102166846B1 (ko) * 2017-12-11 2020-10-16 주식회사 엘지화학 포토폴리머 조성물
KR102157366B1 (ko) * 2017-12-15 2021-03-29 주식회사 엘지화학 염료 화합물 및 포토폴리머 조성물
CN108645336B (zh) * 2018-05-11 2020-06-09 赣南师范大学 一种无参考光数字全息相机及标定方法
KR102228538B1 (ko) 2018-06-01 2021-03-15 주식회사 엘지화학 염료 화합물 및 포토폴리머 조성물
KR102239212B1 (ko) * 2018-12-14 2021-04-12 주식회사 엘지화학 포토폴리머 조성물
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US11137603B2 (en) 2019-06-20 2021-10-05 Facebook Technologies, Llc Surface-relief grating with patterned refractive index modulation
JP7371699B2 (ja) * 2019-11-19 2023-10-31 三菱ケミカル株式会社 化合物、重合性組成物、重合体、ホログラム記録媒体、光学材料、及び光学部品
US20210155639A1 (en) * 2019-11-27 2021-05-27 Facebook Technologies, Llc Thiophosphate and phosphine sulfide derivatized monomers and polymers for volume bragg gratings
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en) 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography
US20220153693A1 (en) * 2020-11-13 2022-05-19 Facebook Technologies, Llc Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings
US20260085188A1 (en) 2022-09-07 2026-03-26 Covestro Deutschland Ag Specific Benzopyrylium Salts as Dyestuffs for Photopolymer Compositions

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1564834A (zh) * 2001-08-07 2005-01-12 英法塞技术公司 用于快速大规模生产全息记录制品的方法和组合物
TW200909451A (en) * 2007-04-11 2009-03-01 Bayer Materialscience Ag Aromatic urethane acrylates having a high refractive index

Family Cites Families (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0223587B1 (en) 1985-11-20 1991-02-13 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US5470813A (en) 1993-11-23 1995-11-28 Arco Chemical Technology, L.P. Double metal cyanide complex catalysts
US5712216A (en) 1995-05-15 1998-01-27 Arco Chemical Technology, L.P. Highly active double metal cyanide complex catalysts
US5482908A (en) 1994-09-08 1996-01-09 Arco Chemical Technology, L.P. Highly active double metal cyanide catalysts
US5725970A (en) * 1994-11-07 1998-03-10 E. I. Du Pont De Nemours And Company Broad band reflection holograms and a dry process for making same
US5545601A (en) 1995-08-22 1996-08-13 Arco Chemical Technology, L.P. Polyether-containing double metal cyanide catalysts
US5627120A (en) 1996-04-19 1997-05-06 Arco Chemical Technology, L.P. Highly active double metal cyanide catalysts
US5714428A (en) 1996-10-16 1998-02-03 Arco Chemical Technology, L.P. Double metal cyanide catalysts containing functionalized polymers
US6482551B1 (en) * 1998-03-24 2002-11-19 Inphase Technologies Optical article and process for forming article
US6432498B1 (en) * 1998-04-10 2002-08-13 Dai Nippon Printing Co., Ltd. Volume hologram laminate
US6450642B1 (en) * 1999-01-12 2002-09-17 California Institute Of Technology Lenses capable of post-fabrication power modification
DE19905611A1 (de) 1999-02-11 2000-08-17 Bayer Ag Doppelmetallcyanid-Katalysatoren für die Herstellung von Polyetherpolyolen
ES2286005T3 (es) 1999-02-11 2007-12-01 Bayer Materialscience Ag Catalizadores de cianuro bimetalico para la preparacion de polioleteres.
US6627354B1 (en) * 1999-03-01 2003-09-30 Lucent Technologies Inc. Photorecording medium, process for fabricating medium, and process for holography using medium
UA41239C2 (uk) * 2000-05-24 2003-06-16 Юрій Викторович Жваколюк Спосіб виготовлення печаток та штемпелів
US7014988B2 (en) * 2000-06-15 2006-03-21 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
WO2004011522A1 (ja) * 2002-07-30 2004-02-05 Toagosei Co., Ltd. ホログラム記録用組成物およびその硬化方法ならびに硬化物
US20070172742A1 (en) * 2004-02-13 2007-07-26 Kentarou Yachi Volume hologram recording material and volume hologram recording medium
EP1720079A1 (en) * 2005-05-06 2006-11-08 Neopack, Sl Coloured composition comprising a hologram and preparation process
US8941904B2 (en) * 2005-07-04 2015-01-27 Dai Nippon Printing Co., Ltd. Hologram sheet and hologram observation sheet using same, and blinding device
TW200702954A (en) * 2005-07-11 2007-01-16 Toagosei Co Ltd Volume hologram recording material, the method of processing thereof and the recording medium
JP2007279585A (ja) * 2006-04-11 2007-10-25 Fujifilm Corp 感光性組成物、並びに光記録媒体、光記録方法及び光記録装置
JP2008081726A (ja) * 2006-08-30 2008-04-10 Sanyo Electric Co Ltd 有機無機複合体形成用材料及び有機無機複合体並びにそれを用いた光学素子
RU2331095C1 (ru) * 2006-12-08 2008-08-10 Самсунг Электроникс Ко., Лтд "живые" полимеризационноспособные пленки для записи голограмм
WO2008096712A1 (ja) * 2007-02-05 2008-08-14 Nippon Steel Chemical Co., Ltd. 体積位相型ホログラム記録材料及び光情報記録媒体
CA2683905A1 (en) 2007-04-11 2008-10-23 Bayer Materialscience Ag Advantageous recording media for holographic applications
US20090012202A1 (en) * 2007-07-03 2009-01-08 Henkel Corporation Acrylated Urethanes, Processes for Making the Same and Curable Compositions Including the Same
WO2009067788A1 (en) * 2007-11-27 2009-06-04 Southbourne Investments Ltd. Holographic recording medium
JP2010037541A (ja) * 2008-07-10 2010-02-18 Fujifilm Corp インプリント用硬化性組成物、パターン形成方法およびパターン
ATE493383T1 (de) 2008-08-08 2011-01-15 Bayer Materialscience Ag Phenylisocyanat-basierte urethanacrylate mit hohem brechungsindex
IL200995A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
IL200997A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
IL200996A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
CA2738835A1 (en) * 2008-10-01 2010-04-08 Bayer Materialscience Ag Prepolymer-based polyurethane formulations for producing holographic media
IL200722A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
US20110207029A1 (en) * 2008-10-01 2011-08-25 Bayer Materialscience Ag Media for volume-holographic recording based on self-developing polymer
EP2218742A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2218743A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2218744A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Methode zur Herstellung von holografischen Photopolymeren auf Polymerfolien
EP2219073B1 (de) * 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
JP2010230911A (ja) * 2009-03-26 2010-10-14 Tdk Corp 光学デバイス
TWI506049B (zh) * 2009-11-03 2015-11-01 Bayer Materialscience Ag 具有高折射率和降低之雙鍵密度的丙烯酸胺基甲酸酯
ES2433235T3 (es) * 2009-11-03 2013-12-10 Bayer Intellectual Property Gmbh Fluorouretanos como aditivos en una formulación de fotopolímero
PT2497085E (pt) * 2009-11-03 2014-03-27 Bayer Ip Gmbh Processo para a produção de um filme holográfico
WO2011054818A2 (de) * 2009-11-03 2011-05-12 Bayer Materialscience Ag Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
EP2317511B1 (de) * 2009-11-03 2012-03-07 Bayer MaterialScience AG Photopolymerformulierungen mit einstellbarem mechanischem Modul Guv
US8877408B2 (en) * 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation
ES2446344T3 (es) * 2009-11-03 2014-03-07 Bayer Intellectual Property Gmbh Procedimiento para la producción de una película holográfica
KR101782182B1 (ko) * 2009-11-03 2017-09-26 코베스트로 도이칠란드 아게 상이한 기록 공단량체를 갖는 광중합체 제제
EP2497084B1 (de) * 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Auswahlverfahren für additive in photopolymeren
JP5925687B2 (ja) * 2009-11-03 2016-05-25 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ ホログラフィック媒体の製造方法
US9057950B2 (en) * 2010-02-02 2015-06-16 Bayer Intellectual Property Gmbh Photopolymer formulation having ester-based writing monomers
KR20120125270A (ko) * 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
JP5313401B2 (ja) * 2010-04-09 2013-10-09 Ｈｏｙａ株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスク
KR20130099932A (ko) * 2010-08-11 2013-09-06 바이엘 인텔렉쳐 프로퍼티 게엠베하 이관능성 (메트)아크릴레이트 기록 단량체
EP2450387A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
EP2450893A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
US20140255824A1 (en) * 2011-10-12 2014-09-11 Bayer Intellectual Property Gmbh Sulphur-containing chain transfer reagents in polyurethane-based photopolymer formulations
WO2013053792A1 (de) * 2011-10-12 2013-04-18 Bayer Intellectual Property Gmbh Kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen
US9195215B2 (en) * 2011-11-29 2015-11-24 Bayer Intellectual Property Gmbh Holographic medium having a protective layer
PL2613318T3 (pl) * 2012-01-05 2014-12-31 Bayer Ip Gmbh Struktura warstwowa z warstwą ochronną i naświetloną warstwą fotopolimerową
EP2613319A1 (de) * 2012-01-05 2013-07-10 Bayer MaterialScience AG Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht
US20140302425A1 (en) * 2012-04-30 2014-10-09 Bayer Intellectual Property Gmbh Method for producing holographic media
TWI557187B (zh) * 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1564834A (zh) * 2001-08-07 2005-01-12 英法塞技术公司 用于快速大规模生产全息记录制品的方法和组合物
TW200909451A (en) * 2007-04-11 2009-03-01 Bayer Materialscience Ag Aromatic urethane acrylates having a high refractive index

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