TWI487156B - 相位變化記憶體結構 - Google Patents
相位變化記憶體結構 Download PDFInfo
- Publication number
- TWI487156B TWI487156B TW097131951A TW97131951A TWI487156B TW I487156 B TWI487156 B TW I487156B TW 097131951 A TW097131951 A TW 097131951A TW 97131951 A TW97131951 A TW 97131951A TW I487156 B TWI487156 B TW I487156B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- phase change
- electrode
- columns
- heater
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/011—Manufacture or treatment of multistable switching devices
- H10N70/061—Shaping switching materials
- H10N70/063—Shaping switching materials by etching of pre-deposited switching material layers, e.g. lithography
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/841—Electrodes
- H10N70/8413—Electrodes adapted for resistive heating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/841—Electrodes
- H10N70/8418—Electrodes adapted for focusing electric field or current, e.g. tip-shaped
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
- H10N70/8825—Selenides, e.g. GeSe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
- H10N70/8828—Tellurides, e.g. GeSbTe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/884—Switching materials based on at least one element of group IIIA, IVA or VA, e.g. elemental or compound semiconductors
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/864,246 US7811851B2 (en) | 2007-09-28 | 2007-09-28 | Phase change memory structures |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200929632A TW200929632A (en) | 2009-07-01 |
| TWI487156B true TWI487156B (zh) | 2015-06-01 |
Family
ID=40507136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097131951A TWI487156B (zh) | 2007-09-28 | 2008-08-21 | 相位變化記憶體結構 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US7811851B2 (enExample) |
| JP (1) | JP5429644B2 (enExample) |
| TW (1) | TWI487156B (enExample) |
| WO (1) | WO2009045635A2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2664018B1 (fr) | 1990-06-29 | 1993-08-13 | Gen Electric | Systeme de vanne de derivation. |
| KR101343362B1 (ko) * | 2007-12-20 | 2013-12-20 | 삼성전자주식회사 | 메모리 유닛의 제조 방법, 이에 따라 제조된 메모리 유닛,메모리 장치의 제조 방법 및 이에 따라 제조된 메모리 장치 |
| US8563355B2 (en) * | 2008-01-18 | 2013-10-22 | Freescale Semiconductor, Inc. | Method of making a phase change memory cell having a silicide heater in conjunction with a FinFET |
| US8043888B2 (en) * | 2008-01-18 | 2011-10-25 | Freescale Semiconductor, Inc. | Phase change memory cell with heater and method therefor |
| US8233317B2 (en) * | 2009-11-16 | 2012-07-31 | International Business Machines Corporation | Phase change memory device suitable for high temperature operation |
| US8637847B2 (en) * | 2011-12-09 | 2014-01-28 | Micron Technology, Inc. | Memory cells having a plurality of heaters |
| CN103296202B (zh) * | 2012-03-02 | 2015-04-29 | 中芯国际集成电路制造(上海)有限公司 | 相变存储器及其制作方法 |
| CN103378288B (zh) * | 2012-04-28 | 2015-01-21 | 中芯国际集成电路制造(上海)有限公司 | 相变存储器的形成方法 |
| US8951892B2 (en) | 2012-06-29 | 2015-02-10 | Freescale Semiconductor, Inc. | Applications for nanopillar structures |
| US10937961B2 (en) | 2018-11-06 | 2021-03-02 | International Business Machines Corporation | Structure and method to form bi-layer composite phase-change-memory cell |
| US12615969B2 (en) | 2023-01-06 | 2026-04-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Phase-change memory device with tapered thermal transfer layer |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040164290A1 (en) * | 2003-02-24 | 2004-08-26 | Ji-Hye Yi | Phase-change memory devices with a self-heater structure |
| TW200625705A (en) * | 2004-09-27 | 2006-07-16 | Koninkl Philips Electronics Nv | Electric device with nanowires comprising a phase change material |
| US20070096071A1 (en) * | 2005-11-03 | 2007-05-03 | Cswitch Corporation | Multi-terminal phase change devices |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9421138D0 (en) * | 1994-10-20 | 1994-12-07 | Hitachi Europ Ltd | Memory device |
| JP3861197B2 (ja) * | 2001-03-22 | 2006-12-20 | 株式会社東芝 | 記録媒体の製造方法 |
| US6917532B2 (en) * | 2002-06-21 | 2005-07-12 | Hewlett-Packard Development Company, L.P. | Memory storage device with segmented column line array |
| US7149155B2 (en) * | 2002-09-20 | 2006-12-12 | Hewlett-Packard Development Company, L.P. | Channeled dielectric re-recordable data storage medium |
| EP1576670B1 (en) * | 2002-12-19 | 2007-02-21 | Koninklijke Philips Electronics N.V. | Electric device with phase change material and parallel heater |
| US20040197947A1 (en) * | 2003-04-07 | 2004-10-07 | Fricke Peter J. | Memory-cell filament electrodes and methods |
| US20060006472A1 (en) * | 2003-06-03 | 2006-01-12 | Hai Jiang | Phase change memory with extra-small resistors |
| JP2005051122A (ja) * | 2003-07-30 | 2005-02-24 | Renesas Technology Corp | 半導体記憶装置およびその製造方法 |
| US7086167B2 (en) * | 2004-04-16 | 2006-08-08 | Empire Level Mfg. Corp. | Overmolded vial for use with a level |
| US20060034116A1 (en) * | 2004-08-13 | 2006-02-16 | Lam Chung H | Cross point array cell with series connected semiconductor diode and phase change storage media |
| KR100687709B1 (ko) * | 2004-11-04 | 2007-02-27 | 한국전자통신연구원 | 멀티비트형 상변화 메모리 소자 및 그 구동 방법 |
| US7465951B2 (en) * | 2005-01-19 | 2008-12-16 | Sandisk Corporation | Write-once nonvolatile phase change memory array |
| KR100682937B1 (ko) * | 2005-02-17 | 2007-02-15 | 삼성전자주식회사 | 상전이 메모리 소자 및 제조방법 |
| US7488967B2 (en) * | 2005-04-06 | 2009-02-10 | International Business Machines Corporation | Structure for confining the switching current in phase memory (PCM) cells |
| CN100358132C (zh) * | 2005-04-14 | 2007-12-26 | 清华大学 | 热界面材料制备方法 |
| KR100707190B1 (ko) * | 2005-05-07 | 2007-04-13 | 삼성전자주식회사 | 나노 와이어를 포함하는 상변환 메모리 소자 및 그 제조방법 |
| US20060273298A1 (en) * | 2005-06-02 | 2006-12-07 | Matrix Semiconductor, Inc. | Rewriteable memory cell comprising a transistor and resistance-switching material in series |
| US7420199B2 (en) * | 2005-07-14 | 2008-09-02 | Infineon Technologies Ag | Resistivity changing memory cell having nanowire electrode |
| US7927948B2 (en) * | 2005-07-20 | 2011-04-19 | Micron Technology, Inc. | Devices with nanocrystals and methods of formation |
| KR100687747B1 (ko) * | 2005-07-29 | 2007-02-27 | 한국전자통신연구원 | 상변화 메모리소자 및 그 제조방법 |
| KR100723839B1 (ko) | 2005-09-01 | 2007-05-31 | 한국전자통신연구원 | 관통전극 구조를 포함하는 상변화 메모리 소자 및 그제조방법 |
| US20070052009A1 (en) * | 2005-09-07 | 2007-03-08 | The Regents Of The University Of California | Phase change memory device and method of making same |
| US7241695B2 (en) * | 2005-10-06 | 2007-07-10 | Freescale Semiconductor, Inc. | Semiconductor device having nano-pillars and method therefor |
| US20070132049A1 (en) * | 2005-12-12 | 2007-06-14 | Stipe Barry C | Unipolar resistance random access memory (RRAM) device and vertically stacked architecture |
| KR100674144B1 (ko) * | 2006-01-05 | 2007-01-29 | 한국과학기술원 | 탄소 나노 튜브를 이용한 상변화 메모리 및 이의 제조 방법 |
| US7626190B2 (en) * | 2006-06-02 | 2009-12-01 | Infineon Technologies Ag | Memory device, in particular phase change random access memory device with transistor, and method for fabricating a memory device |
| KR100739000B1 (ko) * | 2006-09-11 | 2007-07-12 | 삼성전자주식회사 | 상변화 기억 소자의 형성 방법 |
| US8426967B2 (en) * | 2007-01-05 | 2013-04-23 | International Business Machines Corporation | Scaled-down phase change memory cell in recessed heater |
| US8008643B2 (en) * | 2007-02-21 | 2011-08-30 | Macronix International Co., Ltd. | Phase change memory cell with heater and method for fabricating the same |
| US7705424B2 (en) * | 2007-05-15 | 2010-04-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Phase change memory |
| US7545668B2 (en) * | 2007-06-22 | 2009-06-09 | Qimonda North America Corp. | Mushroom phase change memory having a multilayer electrode |
| US7687794B2 (en) * | 2007-07-23 | 2010-03-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and structure for uniform contact area between heater and phase change material in PCRAM device |
| US7719039B2 (en) * | 2007-09-28 | 2010-05-18 | Freescale Semiconductor, Inc. | Phase change memory structures including pillars |
-
2007
- 2007-09-28 US US11/864,246 patent/US7811851B2/en active Active
-
2008
- 2008-08-08 WO PCT/US2008/072547 patent/WO2009045635A2/en not_active Ceased
- 2008-08-08 JP JP2010526985A patent/JP5429644B2/ja active Active
- 2008-08-21 TW TW097131951A patent/TWI487156B/zh active
-
2010
- 2010-09-14 US US12/881,678 patent/US8097873B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040164290A1 (en) * | 2003-02-24 | 2004-08-26 | Ji-Hye Yi | Phase-change memory devices with a self-heater structure |
| TW200625705A (en) * | 2004-09-27 | 2006-07-16 | Koninkl Philips Electronics Nv | Electric device with nanowires comprising a phase change material |
| US20070096071A1 (en) * | 2005-11-03 | 2007-05-03 | Cswitch Corporation | Multi-terminal phase change devices |
Also Published As
| Publication number | Publication date |
|---|---|
| US8097873B2 (en) | 2012-01-17 |
| US20110001113A1 (en) | 2011-01-06 |
| JP2010541246A (ja) | 2010-12-24 |
| WO2009045635A3 (en) | 2009-05-22 |
| JP5429644B2 (ja) | 2014-02-26 |
| WO2009045635A2 (en) | 2009-04-09 |
| US20090085024A1 (en) | 2009-04-02 |
| TW200929632A (en) | 2009-07-01 |
| US7811851B2 (en) | 2010-10-12 |
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