TWI480539B - Defect inspection apparatus and method for light transmittance material - Google Patents

Defect inspection apparatus and method for light transmittance material Download PDF

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TWI480539B
TWI480539B TW096147632A TW96147632A TWI480539B TW I480539 B TWI480539 B TW I480539B TW 096147632 A TW096147632 A TW 096147632A TW 96147632 A TW96147632 A TW 96147632A TW I480539 B TWI480539 B TW I480539B
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light
transmitting material
optical system
projector
noise
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TW096147632A
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Chinese (zh)
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TW200834060A (en
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Takeshi Nakajima
Takeshi Wakita
Ippei Takahashi
Manabu Higuchi
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Fujifilm Corp
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements

Description

光透過性材料之瑕疵檢出裝置及方法Device and method for detecting light-transmitting material

本發明,係有關使用偏光板檢出光透過性材料之瑕疵之瑕疵檢出裝置及瑕疵檢出方法。The present invention relates to a flaw detection device and a flaw detection method for detecting a light-transmitting material using a polarizing plate.

為了改善液晶顯示裝置的視角,有使用將具有光學異向性之液晶層形成於透明薄膜上的光學補償薄膜(以下稱為「相位差薄膜」)。相位差薄膜,係藉由於長尺狀透明薄膜形成配向膜的製程,與在此配向膜上塗布液晶並使其乾燥而形成液晶層之製程所製造(例如,參考日本專利特開平9-73081號公報)。該等製造製程雖在嚴格的管理下進行,但要完全去除由於異物的混入、附著而引起之分子配向不勻,或成為支撐體之透明薄膜厚度不勻、液晶層之塗布不勻等的瑕疵係有困難。In order to improve the viewing angle of the liquid crystal display device, an optical compensation film (hereinafter referred to as "phase difference film") in which a liquid crystal layer having optical anisotropy is formed on a transparent film is used. The retardation film is produced by a process of forming an alignment film by a long-length transparent film, and a process of coating a liquid crystal on the alignment film and drying it to form a liquid crystal layer (for example, refer to Japanese Patent Laid-Open No. Hei 9-73081) Bulletin). These manufacturing processes are carried out under strict management, but the molecular alignment unevenness caused by the incorporation or adhesion of foreign matter is completely removed, or the thickness of the transparent film which becomes the support is uneven, and the coating of the liquid crystal layer is uneven. There are difficulties.

一般為了檢出在帶狀薄膜之製造過程所產生的瑕疵,而進行在製造線上檢查薄膜,即所謂線上檢查。在線上檢查,首先從投光器將光照射於成為檢查對象之薄膜,透過薄膜的光以受光器檢出。而且,藉由解析檢出之光,掌握瑕疵的位置及大小等。例如,在日本專利特開平6-148095號公報所記載之透明瑕疵的檢出方法,於投光器與受光器之前面分別設置第1及第2偏光板,以使相互的偏光方向正交的方式配置該等偏光板。藉此,相對於通過薄膜之正常部分的光被第2偏光板遮蔽,而幾乎不會到達受光器,通過會影響偏光之瑕疵部分的光會通過第2偏光板而由受 光器受光。又,在日本專利特開平6-18445號公報所記載之針孔瑕疵的檢出方法,係於檢查對象之薄膜的投光器側與受光器側分別設置偏光板,使該等偏光板之偏光方向能相互平行的方式配置。薄膜無瑕疵時,因為離開投光器側之偏光板的光在通過薄膜時會散亂而於偏光方向發生紊亂,所以從受光器側之偏光板射出的光強度變弱。另一方面,於薄膜上有針孔瑕疵時,因為由投光器側之偏光板出來的光保持偏光方向的原狀而通過針孔瑕疵,所以從受光器側之偏光板射出的光強度不會變化。利用此種光的強度變化,可提高針孔瑕疵的檢出精度。In general, in order to detect flaws generated in the manufacturing process of the strip film, the film is inspected on the manufacturing line, that is, the so-called in-line inspection. On-line inspection, first, light is irradiated from the light projector to the film to be inspected, and light transmitted through the film is detected by the light receiver. Moreover, by analyzing the detected light, the position and size of the cymbal are grasped. For example, in the method of detecting a transparent crucible described in Japanese Laid-Open Patent Publication No. H6-1-48095, the first and second polarizing plates are provided on the front surface of the light projector and the light receiver, respectively, so that the mutually polarized directions are orthogonal to each other. The polarizing plates. Thereby, the light passing through the normal portion of the film is shielded by the second polarizing plate, and hardly reaches the photoreceiver, and the light that affects the ridge portion of the polarized light passes through the second polarizing plate. The light is received by light. In the method for detecting pinhole defects described in Japanese Laid-Open Patent Publication No. Hei 6-18445, a polarizing plate is provided on each of the light projector side and the light receiver side of the film to be inspected, so that the polarizing directions of the polarizing plates can be made. Configured in parallel with each other. When the film is not flawed, since the light leaving the polarizing plate on the light projector side is scattered when passing through the film and disordered in the polarizing direction, the intensity of light emitted from the polarizing plate on the light receiver side becomes weak. On the other hand, when there is a pinhole on the film, since the light emitted from the polarizer on the light projector side remains in the original direction of the polarized light and passes through the pinhole, the intensity of light emitted from the polarizer on the light receiver side does not change. By using such a change in the intensity of the light, the detection accuracy of the pinhole flaw can be improved.

然而,在習知之使用偏光板的瑕疵檢出方法,對於檢出微小的瑕疵有困難。因此,本發明者藉由再度檢討習知的瑕疵檢出方法,得到以下的知識。首先,碘系的偏光過濾器,在400nm的波長區域有小透過率的波峰,此波長區域之光會影響瑕疵檢出的精度。又,碘系的偏光過濾器,在超過700nm之波長區域的光幾乎都不會被偏光。另一方面,作為受光器使用之CCD等的固體攝影元件,係在400nm以下及700nm以上的波長區域也具有敏感度。因此,400nm以下及700nm以上之波長區域的光殘留於用以判斷瑕疵之受光訊號中而成為雜訊成分,使瑕疵檢出的精度降低。However, the conventional method of detecting the use of a polarizing plate has difficulty in detecting minute defects. Therefore, the inventors obtained the following knowledge by reviewing the conventional flaw detection method again. First, an iodine-based polarizing filter has a small transmittance peak in a wavelength region of 400 nm, and light in this wavelength region affects the accuracy of detection of defects. Further, in the iodine-based polarizing filter, light in a wavelength region exceeding 700 nm is hardly polarized. On the other hand, a solid-state imaging device such as a CCD used as a light receiver has sensitivity in a wavelength region of 400 nm or less and 700 nm or more. Therefore, light in a wavelength region of 400 nm or less and 700 nm or more remains in the light-receiving signal for judging 瑕疵, and becomes a noise component, and the accuracy of detection of flaws is lowered.

瑕疵微小時,被檢出之光也微弱。因此,為了提高微小瑕疵的檢出精度,抑制減低進入受光器的雜訊成分,必需使在薄膜有瑕疵的情况與無瑕疵的情况到達受光器的光量之差異變大。When the time is small, the light that is detected is also weak. Therefore, in order to improve the detection accuracy of the minute flaws and suppress the noise component entering the light receiver, it is necessary to increase the difference in the amount of light reaching the light receiver in the case where the film is flawed and in the case of no flaw.

本發明之目的,在於提供一種瑕疵檢出裝置及瑕疵檢出方法,其係能使用偏光板而精度良好地檢出光透過性材料的瑕疵。An object of the present invention is to provide a flaw detection device and a flaw detection method which can accurately detect flaws of a light-transmitting material using a polarizing plate.

為了達成上述目的、其他的目的,本發明之光透過性材料之瑕疵檢出裝置,係包含投光器、受光器、第1偏光板、第2偏光板、瑕疵判斷部、以及除去光學系。該投光器,係將光照射於光透過性構件。該受光器,係檢出從該光透過性構件射出的光。該第1偏光板,係被設置於該投光器與該光透過性構件之間。該第2偏光板,係被設置於該光透過性材料與該受光器之間,相對於該第1偏光板以正交尼可爾式(cross Nicol)予以配置。該瑕疵判斷部,係根據該受光器之受光訊號而判斷該光透過性構件的瑕疵。該除去光學系,係被設置於該投光器與該受光器之間,除去該光之中該第1及第2偏光板之正交透過率高的波長區域。In order to achieve the above object and other objects, the apparatus for detecting light-transmitting material of the present invention includes a light projector, a light receiver, a first polarizing plate, a second polarizing plate, a defect determining unit, and a removal optical system. The light projector is configured to irradiate light to the light transmissive member. The light receiver detects light emitted from the light transmissive member. The first polarizing plate is provided between the light projector and the light transmissive member. The second polarizing plate is disposed between the light transmissive material and the photodetector, and is disposed in a cross Nicol with respect to the first polarizing plate. The 瑕疵 determining unit determines the 瑕疵 of the light transmissive member based on the received light signal of the photodetector. The removal optical system is provided between the light projector and the light receiver, and removes a wavelength region in which the first and second polarizing plates have high orthogonal transmittance.

該除去光學系,係除去400nm以下的波長區域為較佳。又,該除去光學系,係除去700nm以上的波長區域為較佳。It is preferable to remove the optical system by removing the wavelength region of 400 nm or less. Further, it is preferable to remove the optical system by removing the wavelength region of 700 nm or more.

在本發明之較佳實施例,該第1及第2偏光板係碘系偏光板,該受光器為固體攝影裝置。而且,該除去光學系為除去420nm以下及700nm以上的波長區域。該除去光學系較佳為介電質多層膜濾波器或單色儀。而且,該除去光學系,係被設置於該投光器與該第1偏光板之間為較佳。In a preferred embodiment of the present invention, the first and second polarizing plates are iodine-based polarizing plates, and the light-receiving device is a solid-state imaging device. Further, the removal optical system is a wavelength region in which 420 nm or less and 700 nm or more are removed. The removal optical system is preferably a dielectric multilayer film filter or a monochromator. Further, it is preferable that the optical removal system is provided between the light projector and the first polarizing plate.

該投光器,係內裝有金屬鹵化物燈(metal halide lamp) 與該除去光學系為較佳。又,該光透過性材料較佳為相位差薄膜。The light projector is equipped with a metal halide lamp This removal optics is preferred. Further, the light transmissive material is preferably a retardation film.

本發明之光透過性材料之瑕疵檢出方法,係包含有:將來自投光器通過第1偏光板的光照射於光透過性材料之步驟;將已透過該光透過性材料之光,引進相對於該第1偏光板以正交尼可爾式配置的第2偏光板之步驟;以受光器檢出透過該第2偏光板的光以檢出該光透過性材料之瑕疵;以及在該投光器與該第1偏光板之間,將該光引進除去光學系,以除去該光之中該第1及第2偏光板之正交透過率高的波長區域。The method for detecting a light-transmitting material according to the present invention includes a step of irradiating light from a light projector through a first polarizing plate to a light-transmitting material, and introducing light having passed through the light-transmitting material into relation to a step of arranging the second polarizing plate in a crossed Nikon style; detecting light passing through the second polarizing plate by the photodetector to detect the light transmissive material; and in the light projector Between the first polarizers, the light is introduced into the optical system to remove a wavelength region in which the first and second polarizers have a high orthogonal transmittance.

根據本發明時,第1及第2偏光板之正交透過率高的波長區域的光係藉由除去光學系而被除去。因此,雜訊不會混入瑕疵檢出用的光,可精度良好地檢出光透過性構件的瑕疵。According to the invention, the light of the wavelength region having the high orthogonal transmittance of the first and second polarizing plates is removed by removing the optical system. Therefore, the noise is not mixed into the light for detection, and the flaw of the light-transmitting member can be accurately detected.

較佳實施例之詳細說明Detailed description of the preferred embodiment

在第1圖中,相位差薄膜製造線10,係具備:配向膜形成裝置11、液晶層形成裝置12、瑕疵檢出裝置13、以及捲取裝置14。藉由捲取裝置14之捲取,透明樹脂薄膜15及相位差薄膜16,係朝圖中之X方向行進。In the first embodiment, the retardation film producing line 10 includes an alignment film forming device 11, a liquid crystal layer forming device 12, a flaw detecting device 13, and a winding device 14. By the winding of the winding device 14, the transparent resin film 15 and the retardation film 16 travel in the X direction in the drawing.

配向膜形成裝置11,係在從薄膜滾筒18被送出之長尺的透明樹脂薄膜15的表面上,塗布含有配向膜形成用樹脂之塗布液進行加熱乾燥。藉此,在透明樹脂薄膜15的表面上形成配向膜形成用樹脂層。而且,配向膜形成裝置11, 係對於透明樹脂薄膜15之配向膜形成用樹脂層施以磨刷(rubbing)處理而形成配向膜。The alignment film forming apparatus 11 is coated with a coating liquid containing a resin for forming an alignment film on the surface of the long transparent resin film 15 which is sent out from the film roll 18, and dried by heating. Thereby, a resin layer for forming an alignment film is formed on the surface of the transparent resin film 15. Moreover, the alignment film forming device 11, The resin film for forming an alignment film of the transparent resin film 15 is subjected to a rubbing treatment to form an alignment film.

液晶層形成裝置12,係於透明樹脂薄膜15之配向膜上塗布含有液晶化合物的塗布液,使溶劑蒸發之後加熱而形成液晶層。而且,藉由照射紫外線於此液晶層而進行交聯,獲得透明的相位差薄膜16(以下稱為「薄膜」)。In the liquid crystal layer forming apparatus 12, a coating liquid containing a liquid crystal compound is applied onto an alignment film of the transparent resin film 15, and the solvent is evaporated and then heated to form a liquid crystal layer. Further, crosslinking is carried out by irradiating ultraviolet rays on the liquid crystal layer to obtain a transparent retardation film 16 (hereinafter referred to as "thin film").

瑕疵檢出裝置13,係檢出在薄膜16上發生的瑕疵。所謂瑕疵,係例如,傷痕、厚度不勻、塗布不勻、分子配向不勻等。此外,檢查對象不限於相位差薄膜,例如,防止反射薄膜等,只要為透明或半透明之透過光的構件即可。The flaw detection device 13 detects flaws occurring on the film 16. The so-called sputum is, for example, a flaw, a thickness unevenness, a coating unevenness, a molecular misalignment, and the like. Further, the object to be inspected is not limited to a retardation film, for example, a reflection preventing film or the like, and may be a member that transmits light transparently or translucently.

瑕疵檢出裝置13係具備:導引輥子20、21;投光器22;光量調整部23;受光器24;第1及第2偏光板25、26;除去光學系27;以及判斷部28。導引輥子20、21,係以既定的間隔配置在薄膜16之運送路徑上,隨著薄膜16的運送而旋轉。薄膜16,被跨掛在導引輥子20、21,而被保持為平面狀。又,在導引輥子21,連接有編碼器30。編碼器30,係薄膜16每被運送一定長度即會發生編碼器脈波訊號。此編碼器脈波訊號被送到判斷部28,用以特定在X方向的瑕疵位置。The flaw detection device 13 includes guide rollers 20 and 21, a light projector 22, a light amount adjustment unit 23, a light receiver 24, first and second polarizing plates 25 and 26, an optical system 27, and a determination unit 28. The guide rollers 20, 21 are disposed at a predetermined interval on the transport path of the film 16, and are rotated as the film 16 is transported. The film 16, which is hung across the guide rolls 20, 21, is held in a planar shape. Further, an encoder 30 is connected to the guide roller 21. The encoder 30, which is a film 16 that transmits a certain length, generates an encoder pulse signal. The encoder pulse signal is sent to the judging section 28 for specifying the 瑕疵 position in the X direction.

投光器22,例如為金屬鹵化物燈,被配置在薄膜16之運送路徑的下方。又,在投光器22連接有光量調整部23。光量調整部23,係根據被設置在投光器22附近之感測器(未圖示)的光量檢出訊號,控制投光器22而使光量能成為一定。藉此,使照射於薄膜16之光可成為均勻的光 量,而經常可以同樣的敏感度檢出瑕疵。此外,投光器22只要輝度高者即可,亦可使用高頻率螢光燈或鹵素燈(Halogen lamp)、水銀燈,雷射等。The light projector 22, for example, a metal halide lamp, is disposed below the transport path of the film 16. Further, the light amount adjusting unit 23 is connected to the light projector 22. The light amount adjustment unit 23 controls the light projector 22 based on the light amount detection signal of a sensor (not shown) provided in the vicinity of the light projector 22 to make the light amount constant. Thereby, the light irradiated to the film 16 can be made uniform light Quantity, and often the same sensitivity can be detected. Further, the light projector 22 may be a high-intensity fluorescent lamp, a halogen lamp, a mercury lamp, a laser, or the like as long as the luminance is high.

受光器24,例如為CCD照相機,被配置於薄膜16運送路徑的上方。受光器24,係在薄膜16的寬度方向排列成線狀之具有多數個受光元件。藉由此構成,涵蓋薄膜16的全寬度可檢出瑕疵,同時可提高對瑕疵的分解能力。又,受光器24的驅動頻率數,係以即使在薄膜16以最高速度行進的情況,亦充分確保分解能力的方式予以設定。受光器24,係薄膜16每被運送一定長度便進行一條線的攝影,而把攝影訊號送到判斷部28。此外,受光器24亦可有2台以上。The photodetector 24 is, for example, a CCD camera, and is disposed above the transport path of the film 16. The light receiver 24 has a plurality of light receiving elements arranged in a line shape in the width direction of the film 16. By this configuration, the full width of the film 16 can be detected to detect defects, and at the same time, the ability to decompose the crucible can be improved. Further, the number of driving frequencies of the photodetector 24 is set so as to sufficiently ensure the decomposition ability even when the film 16 travels at the highest speed. The light receiver 24 picks up a line for each length of the film 16 to be conveyed, and sends the photographing signal to the judging section 28. Further, there may be two or more light receivers 24.

第1及第2偏光板25、26,例如為碘系偏光板。分別配置第1偏光板25於投光器22與薄膜16之間,第2偏光板26於薄膜16與受光器24之間。又,第1及第2偏光板25、26,係以相互之偏光方向正交的方式,以正交尼可爾式予以設置。因此,薄膜16無瑕疵的情况,由於在第1偏光板25偏光為特定之偏光面之光係保持其偏光面的原狀通過薄膜16,而由第2偏光板26所遮蔽,所以光幾乎不會進入受光器24。即,受光器24成為暗視野狀態。另一方面,薄膜16有瑕疵的情况,在第1偏光板25偏光為特定之偏光面的光在薄膜16之瑕疵部分發生散亂、擴散,使其偏光面發生變化。偏光面變化之光,因為會通過第2偏光板26,所以受光器24成為受光狀態。此外,從性能與價格之觀點 雖然使用碘系偏光板,但亦可使用染料系偏光板,或由金屬膜偏光子、方解石等所形成的偏光板。The first and second polarizing plates 25 and 26 are, for example, iodine-based polarizing plates. The first polarizing plate 25 is disposed between the light projector 22 and the film 16, and the second polarizing plate 26 is disposed between the film 16 and the light receiver 24. Further, the first and second polarizing plates 25 and 26 are provided in a crossed Nichol style so as to be orthogonal to each other in the polarization direction. Therefore, in the case where the film 16 is not flawed, the light which is polarized to the specific polarizing surface of the first polarizing plate 25 retains the polarizing surface as it passes through the film 16 and is shielded by the second polarizing plate 26, so that the light hardly passes. Enter the light receiver 24. That is, the light receiver 24 is in a dark field state. On the other hand, when the film 16 has flaws, the light which is polarized to the specific polarizing surface by the first polarizing plate 25 is scattered and diffused in the meandering portion of the film 16, and the polarizing surface is changed. Since the light whose polarizing surface changes passes through the second polarizing plate 26, the photodetector 24 is in a light receiving state. In addition, from the perspective of performance and price Although an iodine-based polarizing plate is used, a dye-based polarizing plate or a polarizing plate formed of a metal film polarizer or calcite may be used.

除去光學系27,係由介電質多層膜所形成的帶通濾波器,被配置於投光器22與第1偏光板25之間。除去光學系27,係從投光器22的光之中,除去波長區域420nm以下及700nm以上之光。在第1及第2偏光板25、26因為僅會射入波長區域大於420nm及小於700nm之光,所以檢查上不必要之波長帶區域的雜訊光不會進入受光器24。因此,可精度良好地檢出瑕疵。The optical system 27 is removed by a band pass filter formed of a dielectric multilayer film, and is disposed between the light projector 22 and the first polarizing plate 25. The optical system 27 is removed, and light having a wavelength region of 420 nm or less and 700 nm or more is removed from the light of the light projector 22. Since the first and second polarizing plates 25 and 26 are only incident on light having a wavelength region of more than 420 nm and less than 700 nm, the noise light in the unnecessary wavelength band region is not detected to enter the photoreceiver 24. Therefore, flaws can be detected accurately.

將碘系偏光板以正交尼可爾式予以配置的情况,依據波長區域也會有光透過偏光板的情况。如第2圖所顯示,使成為正交尼可爾式之第1及第2偏光板25、26重疊時的透過率(正交透過率),係在400nm附近及超過700nm附近會上升。另一方面,當作受光器24使用之CCD照相機,因為在400nm以下及700nm以上之波長區域的光亦具有敏感度。所以若此區域之光如照原狀被檢出時將成為雜訊。因此,在本發明,係藉由使用帶通濾波器之除去光學系27把420nm以下及700nm以上之波長區域(斜線區域)A1、A2的光去除,而僅將大於420nm小於700nm之波長區域的光射入薄膜16。藉此,因為在受光訊號不會含有雜訊,而可提高瑕疵的檢出精度。When the iodine-based polarizing plate is disposed in a crossed Nichol style, light may be transmitted through the polarizing plate depending on the wavelength region. As shown in Fig. 2, the transmittance (orthogonal transmittance) when the first and second polarizing plates 25 and 26 which are orthogonal Nikol type are overlapped is increased in the vicinity of 400 nm and in the vicinity of 700 nm. On the other hand, as a CCD camera used as the light receiver 24, light in a wavelength region of 400 nm or less and 700 nm or more is also sensitive. Therefore, if the light in this area is detected as it is, it will become a noise. Therefore, in the present invention, the light of the wavelength region (hatched region) A1 and A2 of 420 nm or less and 700 nm or more is removed by the removal optical system 27 using the band pass filter, and only the wavelength region of more than 420 nm and less than 700 nm is removed. Light is incident on the film 16. Therefore, since the received light signal does not contain noise, the detection accuracy of the flaw can be improved.

除去光學系27,除了使用介電質多層膜的帶通過濾器之外,亦可為單色儀或除去波長過濾器、彩色玻璃過濾器或繞射光柵等。又,由除去光學系27所產生之除去波長區 域並不限於420nm以下及700nm以上,可依照所使用之偏光板種類適當的決定。即,將使用之偏光板以正交尼可爾式予以配置而照射來自投光器,使正交透過率高的波長區域能被除去。因此,例如,正交透過率在400nm以下及700nm以上之波長區域為高時,把該等波長區域之光以除去光學系27除去。The optical system 27 is removed, and may be a monochromator or a wavelength removing filter, a colored glass filter, a diffraction grating, or the like, in addition to a belt passing filter using a dielectric multilayer film. Also, the removal wavelength region generated by the removal of the optical system 27 The domain is not limited to 420 nm or less and 700 nm or more, and can be appropriately determined depending on the type of polarizing plate used. That is, the polarizing plate to be used is arranged in a crossed Nikon style and irradiated from the light projector to remove a wavelength region having a high orthogonal transmittance. Therefore, for example, when the orthogonal transmittance is 400 nm or less and the wavelength region of 700 nm or more is high, light in the wavelength regions is removed by the removal optical system 27.

又,作為除去光學系27的設置位置,投光器22與第1偏光板25之間以外,可考慮以下的6個位置。第1個位置為受光器24的正前面,第2個位置為受光器24與第2偏光板26之間,第3個位置為第2偏光板26與薄膜16之間,第4個位置為薄膜16與第1偏光板25之間,第5個位置為投光器22的內部,第6個位置為與投光器22之整體型。Further, as the position where the optical system 27 is removed, between the light projector 22 and the first polarizing plate 25, the following six positions can be considered. The first position is the front side of the photodetector 24, the second position is between the photoreceptor 24 and the second polarizing plate 26, and the third position is between the second polarizing plate 26 and the film 16, and the fourth position is Between the film 16 and the first polarizing plate 25, the fifth position is inside the light projector 22, and the sixth position is integral with the light projector 22.

一般偏光板因對於光或熱較弱,所以第1~第4個位置不佳。又,因為受光器24會對焦於薄膜16,所以除去光學系27離開薄膜16較佳。因此,第3及第4個位置亦不佳。又,在第6個位置,每次更換投光器22則瑕疵的檢出精度會改變故不佳。另一方面,若配置於投光器22的內部時,除去光學系27為小的即可,價廉。因此,第5個位置較佳。Generally, the polarizing plate is weak for light or heat, so the first to fourth positions are not good. Further, since the light receiver 24 focuses on the film 16, it is preferable to remove the optical system 27 away from the film 16. Therefore, the 3rd and 4th positions are also not good. Further, in the sixth position, each time the light projector 22 is replaced, the detection accuracy of the flaw is changed, which is not preferable. On the other hand, when disposed inside the light projector 22, the optical system 27 is small, and it is inexpensive. Therefore, the fifth position is preferred.

判斷部28,係對於來自受光器24的攝影訊號施以微分處理等的強調處理。而且,判斷部28,係根據施以強調處理的攝影訊號,判斷有無瑕疵。又,判斷部28,係根據在1線分的攝影訊號之中對應於瑕疵部位的訊號,與來自編碼器30之編碼器脈波訊號,把薄膜16的瑕疵位置特別指 定在XY平面座標上。The determination unit 28 applies emphasis processing such as differential processing to the imaging signal from the photodetector 24. Further, the determination unit 28 determines whether or not there is a flaw based on the photographing signal to which the emphasis processing is performed. Further, the judging unit 28 specifies the 瑕疵 position of the film 16 based on the signal corresponding to the 瑕疵 portion among the one-line photographic signals and the encoder pulse signal from the encoder 30. Set on the XY plane coordinates.

其次,說明關於瑕疵檢出裝置13的作用。透過配向膜形成裝置11及液晶層形成裝置12製造之薄膜16,係被送至瑕疵檢出裝置13。在瑕疵檢出裝置13,把來自投光器22的光照射於以一定速度行進之薄膜16。其時,420nm以下及700nm以上之波長區域的光藉由除去光學系27除去。另一方面,大於420nm、小於700nm之波長區域的光,係以第1偏光板25偏光為特定的偏光面之後,射入薄膜16。在此,薄膜16無瑕疵的情况,光照原狀透過薄膜16,而藉由第2偏光板26遮蔽。另一方面,薄膜16有瑕疵的情况,因為光的偏光面會藉由瑕疵而變化,所以光的一部分會穿過第2偏光板26。受光器24,係檢出從該第2偏光板26射出之光。Next, the action of the flaw detection device 13 will be described. The film 16 produced by the alignment film forming device 11 and the liquid crystal layer forming device 12 is sent to the flaw detection device 13. At the flaw detection device 13, the light from the light projector 22 is irradiated onto the film 16 that travels at a constant speed. At this time, light in a wavelength region of 420 nm or less and 700 nm or more is removed by the removal optical system 27. On the other hand, light having a wavelength region of more than 420 nm and less than 700 nm is incident on the film 16 after the first polarizing plate 25 is polarized to a specific polarizing surface. Here, in the case where the film 16 is flawless, the light is transmitted through the film 16 as it is, and is shielded by the second polarizing plate 26. On the other hand, the film 16 has a flaw, and since the polarizing surface of the light changes by the flaw, a part of the light passes through the second polarizing plate 26. The light receiver 24 detects the light emitted from the second polarizing plate 26.

受光器24,係薄膜16每被運送一定長度即進行1線分的攝影,而把攝影訊號送到判斷部28。判斷部28檢出有無瑕疵,同時特別指定瑕疵的位置。而關於瑕疵的資訊表示在顯示器上(未圖示)。In the light receiver 24, the film 16 is photographed by one line for a predetermined length, and the photographing signal is sent to the judging unit 28. The judging unit 28 detects the presence or absence of defects and specifies the position of the crucible. The information about 瑕疵 is displayed on the display (not shown).

本發明在不脫離發明之精神的範圍內,可做種種的變形及變更,即使在此種情况,亦應解釋為包含在本發明之保護範圍。The present invention can be variously modified and changed without departing from the spirit of the invention, and even in this case, it should be construed as being included in the scope of the present invention.

10‧‧‧相位差薄膜製造線10‧‧‧ phase difference film manufacturing line

11‧‧‧配向膜形成裝置11‧‧‧Alignment film forming device

12‧‧‧液晶層形成裝置12‧‧‧Liquid layer forming device

13‧‧‧瑕疵檢出裝置13‧‧‧瑕疵detection device

14‧‧‧捲取裝置14‧‧‧Winding device

15‧‧‧透明樹脂薄膜15‧‧‧Transparent resin film

16‧‧‧相位差薄膜16‧‧‧ phase difference film

18‧‧‧薄膜輥子18‧‧‧ Film Roller

20、21‧‧‧導引輥子20, 21‧‧‧ Guide rollers

22‧‧‧投光器22‧‧‧Light projector

23‧‧‧光量調整部23‧‧‧Light Adjustment Department

24‧‧‧受光器24‧‧‧Receiver

25‧‧‧第1偏光板25‧‧‧1st polarizer

26‧‧‧第2偏光板26‧‧‧2nd polarizer

27‧‧‧除去光學系27‧‧‧Removal of the optical system

28‧‧‧判斷部28‧‧‧Decision Department

30‧‧‧編碼器30‧‧‧Encoder

上述目的及優點,參考附上之圖面,並藉由閱讀本發明之最佳實施例,對該業者當可明瞭吧:The above objects and advantages are referred to the attached drawings, and by reading the preferred embodiment of the present invention, it will be clear to the practitioner:

第1圖係顯示導入本發明之光透過性構件的瑕疵檢出 裝置之相位差薄膜製造線的概略圖。Fig. 1 is a view showing the detection of flaws introduced into the light-transmitting member of the present invention. A schematic diagram of a phase difference film manufacturing line of the device.

第2圖係顯示偏光板之正交透過率的圖表。Fig. 2 is a graph showing the orthogonal transmittance of the polarizing plate.

10‧‧‧相位差薄膜製造線10‧‧‧ phase difference film manufacturing line

11‧‧‧配向膜形成裝置11‧‧‧Alignment film forming device

12‧‧‧液晶層形成裝置12‧‧‧Liquid layer forming device

13‧‧‧瑕疵檢出裝置13‧‧‧瑕疵detection device

14‧‧‧捲取裝置14‧‧‧Winding device

15‧‧‧透明樹脂薄膜15‧‧‧Transparent resin film

16‧‧‧相位差薄膜16‧‧‧ phase difference film

18‧‧‧薄膜輥子18‧‧‧ Film Roller

20、21‧‧‧導引輥子20, 21‧‧‧ Guide rollers

22‧‧‧投光器22‧‧‧Light projector

23‧‧‧光量調整部23‧‧‧Light Adjustment Department

24‧‧‧受光器24‧‧‧Receiver

25‧‧‧第1偏光板25‧‧‧1st polarizer

26‧‧‧第2偏光板26‧‧‧2nd polarizer

27‧‧‧除去光學系27‧‧‧Removal of the optical system

28‧‧‧判斷部28‧‧‧Decision Department

30‧‧‧編碼器30‧‧‧Encoder

Claims (9)

一種光透過性材料之瑕疵檢出裝置,其具有:投光器,係對光透過性材料照射光;受光器,係接受從被該投光器照明的該光透過性材料出來的光;碘系第1偏光板,係設置於該投光器與該光透過性材料之間;碘系第2偏光板,係設置於該光透過性材料與該受光器之間;以及瑕疵判斷部,係根據該受光器之受光訊號而判斷該光透過性材料的瑕疵,其特徵為:於該投光器與該受光器之間設置雜訊光除去光學系,該雜訊光除去光學系係當將該第1及第2偏光板配置成正交尼可爾式(cross Nicol)而包夾該光透過性材料時,除去會妨礙檢出該瑕疵的400nm以下的雜訊光,該雜訊光除去光學系,係除了除去波長區域400nm以下的光以外,還除去420nm以下的光。 A light-transmitting material detecting device comprising: a light projector that emits light to a light-transmitting material; and a light-receiving device that receives light emitted from the light-transmitting material illuminated by the light projector; the iodine-based first polarized light a plate is disposed between the light projector and the light transmissive material; an iodine-based second polarizing plate is disposed between the light-transmitting material and the light-receiving device; and a 瑕疵 determining portion is received by the light-receiving device Determining the flaw of the light transmissive material by a signal, wherein a noise light removing optical system is disposed between the light projector and the light receiver, and the noise light removing optical system is used to form the first and second polarizing plates When the light transmissive material is sandwiched by a cross Nicol, the noise light of 400 nm or less which hinders the detection of the germanium is removed, and the optical light is removed except for the wavelength region. In addition to light of 400 nm or less, light of 420 nm or less is also removed. 如申請專利範圍第1項之光透過性材料之瑕疵檢出裝置,其中,該雜訊光除去光學系,係除了除去波長區域400nm以下的光以外,還除去700nm以上的光。 The apparatus for detecting a light-transmitting material according to the first aspect of the invention, wherein the noise-removing optical system removes light of 700 nm or more in addition to light having a wavelength region of 400 nm or less. 如申請專利範圍第1項之光透過性材料之瑕疵檢出裝置,其中,該雜訊光除去光學系為除了除去波長區域400nm以下的光以外,還除去420nm以下的光及700nm 以上的光。 The apparatus for detecting a light-transmitting material according to the first aspect of the invention, wherein the noise-removing optical system removes light of 420 nm or less and 700 nm except for removing light having a wavelength region of 400 nm or less. Above the light. 如申請專利範圍第1項之光透過性材料之瑕疵檢出裝置,其中,該投光器係金屬鹵化物燈(metal halide lamp)。 The apparatus for detecting a light-transmitting material according to claim 1, wherein the light-emitting device is a metal halide lamp. 如申請專利範圍第1項之光透過性材料之瑕疵檢出裝置,其中,該光透過性材料為相位差薄膜。 A flaw detection device for a light-transmitting material according to the first aspect of the invention, wherein the light-transmitting material is a retardation film. 如申請專利範圍第1項之光透過性材料之瑕疵檢出裝置,其中,該雜訊光除去光學系為介電質多層膜濾波器或單色儀(monochromator)。 The apparatus for detecting a light-transmitting material according to claim 1, wherein the noise-removing optical system is a dielectric multilayer film filter or a monochromator. 如申請專利範圍第1項之光透過性材料之瑕疵檢出裝置,其中,該雜訊光除去光學系係設置於該投光器與該第1偏光板之間。 The apparatus for detecting a light-transmitting material according to the first aspect of the invention, wherein the noise-removing optical system is provided between the light projector and the first polarizing plate. 如申請專利範圍第1項之光透過性材料之瑕疵檢出裝置,其中,該雜訊光除去光學系係內裝在該投光器。 The apparatus for detecting a light-transmitting material according to the first aspect of the invention, wherein the noise-removing optical system is incorporated in the light projector. 一種光透過性材料之瑕疵檢出方法,係使用:投光器,係對光透過性材料照射光;受光器,係接受從被該投光器照明的該光透過性材料出來的光;碘系第1偏光板,係配置於該投光器與該光透過性材料之間;碘系第2偏光板,係配置於該光透過性材料與該受光器之間;以及瑕疵判斷部,係根據該受光器之受光訊號而判斷該光透過性材料的瑕疵,其特徵為:藉由設置於該投光器與該受光器之間的 雜訊光除去光學系,來當將該第1及第2偏光板配置成正交尼可爾式而包夾該光透過性材料時,除去會妨礙檢出該瑕疵的400nm以下的雜訊光,該雜訊光除去光學系,係除了除去波長區域400nm以下的光以外,還除去420nm以下的光。 A method for detecting a light-transmitting material is: a light projector that emits light to a light-transmitting material; and a light receiver that receives light from the light-transmitting material illuminated by the light projector; the first polarized light of iodine a plate disposed between the light projector and the light transmissive material; an iodine-based second polarizing plate disposed between the light-transmitting material and the light-receiving device; and a 瑕疵 determining portion configured to receive light according to the light-receiving device Determining the flaw of the light transmissive material by a signal, characterized by: being disposed between the light projector and the light receiver When the optical light is removed from the optical system, when the first and second polarizing plates are arranged in a crossed Nikon type and the light transmissive material is sandwiched, the noise light of 400 nm or less which hinders the detection of the flaw is removed. The noise light removal optical system removes light of 420 nm or less in addition to light having a wavelength region of 400 nm or less.
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