CN107024482B - Defect imaging device and method, film manufacturing device and method, and defect inspection method - Google Patents

Defect imaging device and method, film manufacturing device and method, and defect inspection method Download PDF

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CN107024482B
CN107024482B CN201611142936.3A CN201611142936A CN107024482B CN 107024482 B CN107024482 B CN 107024482B CN 201611142936 A CN201611142936 A CN 201611142936A CN 107024482 B CN107024482 B CN 107024482B
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imaging
defect inspection
imaging region
region
film
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CN107024482A (en
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尾崎麻耶
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8861—Determining coordinates of flaws
    • G01N2021/8864—Mapping zones of defects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques

Abstract

The invention provides an imaging device for defect inspection, a defect inspection system, a film manufacturing device, an imaging method for defect inspection, a defect inspection method and a film manufacturing method, which can integrate different inspection series and reduce the number of inspection series. An imaging device for defect inspection according to an embodiment of the present invention is for inspecting a defect of a film having polarization characteristics, and includes: a light irradiation mechanism that irradiates light to an imaging region of the film; an imaging mechanism that images an imaging area of the film as a two-dimensional image; a first polarization filter disposed between the light irradiation mechanism and the imaging region of the film so as to be in a state of orthogonal polarization to the film; and a conveying mechanism for conveying the film relative to the light irradiation mechanism, the imaging mechanism and the polarization filter along a conveying direction Y, wherein the imaging area comprises a first imaging area and a second imaging area which are divided in the conveying direction, and the first polarization filter is arranged between the light irradiation mechanism and the first imaging area.

Description

Defect imaging device and method, film manufacturing device and method, and defect inspection method
Technical Field
The present invention relates to an imaging device for defect inspection, a defect inspection system, a film manufacturing device, an imaging method for defect inspection, a defect inspection method, and a film manufacturing method for inspecting a defect of a film.
Background
A defect inspection system for detecting defects in optical films such as polarizing films and retardation films, and films used for battery separators is known. In such a defect inspection system, a film is conveyed by a conveying mechanism, light is irradiated to an imaging area of the film by a light irradiation mechanism, the imaging area of the film is imaged by an imaging mechanism, and defect inspection is performed based on the imaged image. The types of defect inspection methods performed by such a defect inspection system are roughly classified into a transmission method and a reflection method. More specifically, the transmission method includes a normal transmission method, a cross-polarized (cross-polarized) transmission method, and a transmission scattering method, and the reflection method includes a normal reflection method, a cross-polarized reflection method, and a reflection scattering method. Patent document 1 discloses a defect inspection system using a forward transmission method and a transmission scattering method as a transmission method, a forward reflection method and a reflection scattering method as a reflection method, and patent document 2 discloses a defect inspection system using an orthogonal polarization transmission method as a transmission method.
For example, the normal transmission method is suitable for detecting black foreign matter due to mixing or adhesion in the film bonding step, the cross-polarization transmission method is suitable for detecting bright spots due to mixing or adhesion in the adhesive material coating step, and the transmission scattering method is suitable for detecting deformation due to scratch transfer due to adhesion of foreign matter in the film conveying step. On the other hand, the reflection method (regular reflection method, orthogonal polarization reflection method, reflection scattering method) is suitable for detecting bubbles caused by biting in the bonding step.
Prior art documents
Patent document
Patent document 1: japanese patent laid-open publication No. 2012-167975
Patent document 2: japanese laid-open patent publication No. 2007-212442
In order to detect different defects such as black foreign matter, bright spots, distortion, and bubbles, it is considered to use different inspection methods (inspection series). However, if the number of inspection lines is increased, the input cost and the management cost are increased, and therefore, it is desirable to reduce the number of inspection lines.
Disclosure of Invention
Problems to be solved by the invention
Accordingly, an object of the present invention is to provide a defect inspection imaging device, a defect inspection system, a film manufacturing device, a defect inspection imaging method, a defect inspection method, and a film manufacturing method, which can integrate different inspection series and reduce the number of inspection series.
Means for solving the problems
The defect inspection imaging device of the present invention is used for inspecting defects of a film having polarization characteristics, and comprises: a light irradiation mechanism that irradiates light to an imaging region of the film; an imaging mechanism that images an imaging area of the film as a two-dimensional image; a first polarization filter disposed between the light irradiation means and the imaging area of the film or between the imaging area of the film and the imaging means so as to form a polarization state orthogonal to the film or a first non-orthogonal polarization state; and a conveying mechanism that conveys the film relative to the light irradiation mechanism, the imaging mechanism, and the first polarization filter in a conveying direction, wherein the imaging area includes a first imaging area and a second imaging area divided in the conveying direction, and the first polarization filter is disposed between the light irradiation mechanism and the first imaging area or between the first imaging area and the imaging mechanism.
Further, the defect inspection imaging method of the present invention is a defect inspection imaging method for performing imaging for inspecting a defect of a film having polarization characteristics by using a defect inspection imaging device including a light irradiation mechanism, an imaging mechanism, a first polarization filter, and a conveyance mechanism, the defect inspection imaging method including the steps of: a first polarization filter arrangement step of arranging a first polarization filter between the light irradiation means and the imaging area of the film or between the imaging area of the film and the imaging means so as to form a polarization state orthogonal to the film or a first non-orthogonal polarization state; a conveying step of conveying the film in a conveying direction by a conveying mechanism relative to the light irradiation mechanism, the imaging mechanism, and the first polarization filter; a light irradiation step of irradiating a light onto an imaging region of the film by a light irradiation mechanism; and an imaging step of imaging an imaging area of the film as a two-dimensional image by the imaging means, the imaging area including a first imaging area and a second imaging area divided in the transport direction, wherein in the first polarization filter arrangement step, the first polarization filter is arranged between the light irradiation means and the first imaging area or between the first imaging area and the imaging means.
Here, the orthogonal polarization state refers to a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are substantially orthogonal, that is, a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film cross at an angle of substantially 90 degrees. On the other hand, the non-orthogonal polarization (japanese: ハ - フクロスニコル) state refers to a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are not substantially orthogonal but intersect, that is, a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film intersect at an angle other than substantially 90 degrees.
According to the defect inspection imaging device and the defect inspection imaging method, for example, the first polarization filter is disposed between the light irradiation means and the first imaging region or between the first imaging region and the imaging means so as to form a state of orthogonal polarization to the film, and the imaging means images the imaging region including the first imaging region and the second imaging region as a two-dimensional image, so that it is possible to simultaneously image an orthogonal polarization transmission inspection image (or an orthogonal polarization reflection inspection image) in the first imaging region and, for example, a normal transmission inspection image (or a normal reflection inspection image) in the second imaging region. That is, it is possible to integrate an imaging series for orthogonal polarization transmission inspection (or an imaging series for orthogonal polarization reflection inspection) and, for example, an imaging series for normal transmission inspection (or an imaging series for normal reflection inspection). As a result, the orthogonal polarization transmission inspection series (or orthogonal polarization reflection inspection series) and, for example, the normal transmission inspection series (or normal reflection inspection series) can be integrated, and the number of inspection series can be reduced.
In addition to the above-described image pickup apparatus for defect inspection, the first polarization filter may be disposed between the light irradiation mechanism and the first image pickup region. In addition to the above-described defect inspection imaging method, the first polarization filter may be disposed between the light irradiation means and the first imaging region in the first polarization filter disposing step.
However, the orthogonal polarization transmission inspection imaging series (or orthogonal polarization reflection inspection imaging series) and the orthogonal transmission inspection imaging series (or orthogonal reflection inspection imaging series) have different luminance values of appropriate light.
Therefore, the defect inspection imaging device described above may further include a luminance adjustment mechanism that adjusts a luminance value of light that is irradiated to at least one of the first imaging region and the second imaging region or light that is transmitted through or reflected by at least one of the first imaging region and the second imaging region.
Accordingly, the brightness value of the light applied to at least one of the first imaging region and the second imaging region, or the brightness value of the light transmitted through or transmitted to at least one of the first imaging region and the second imaging region can be adjusted by the brightness adjusting mechanism, and therefore, the brightness value of the light can be set appropriately in the imaging of the first imaging region and the second imaging region, and the inspection can be performed at the brightness value of the light corresponding to the orthogonal polarization transmission inspection imaging series (or orthogonal polarization reflection inspection imaging series) and the orthogonal transmission inspection imaging series (or orthogonal reflection inspection imaging series), for example.
The brightness adjustment mechanism may adjust the brightness value of light irradiated to the second imaging region or light transmitted through or reflected by the second imaging region.
In some cases, the luminance value of the appropriate light in the orthogonal polarization transmission inspection imaging series (or orthogonal polarization reflection inspection imaging series) is large, and the luminance value of the appropriate light in the normal transmission inspection imaging series (or normal reflection inspection imaging series) is small. In this case, as described above, by adjusting the luminance value of the light applied to the second imaging region or the light transmitted through or reflected from the second imaging region by the luminance adjusting means, for example, by outputting light having a large luminance value from the light irradiation means, the luminance value of the light applied to the first imaging region for performing the orthogonal polarization transmission inspection imaging series (or orthogonal polarization reflection inspection imaging series) can be made large, while the luminance value of the light applied to the second imaging region for performing the orthogonal transmission inspection imaging series (or orthogonal reflection inspection imaging series) or the luminance value of the light transmitted through or reflected from the second imaging region can be made small by the luminance adjusting means.
The brightness adjustment means may be an attenuation filter disposed between the light irradiation means and the second imaging region or between the second imaging region and the imaging means.
The brightness adjustment means may be disposed in the light irradiation means, and may individually adjust the brightness value of the light irradiated to the first imaging region and the brightness value of the light irradiated to the second imaging region.
In the above-described image pickup apparatus for defect inspection, the first polarization filter may be in an orthogonal polarization state with respect to the first image pickup area of the film, and the luminance adjustment mechanism may include a first luminance adjustment polarization filter disposed between the light irradiation mechanism and the second image pickup area or between the second image pickup area and the image pickup mechanism so as to be in a first non-orthogonal polarization state with respect to the second image pickup area of the film.
Here, the inventors of the present application have found that the normal transmission method is suitable for detecting a black foreign substance, and the cross polarization transmission method is suitable for detecting a bright spot, but it is difficult to detect a bright spot that is slightly weaker than a strong bright spot by the cross polarization transmission method. In this regard, the inventors of the present application have found that the non-orthogonal transmission method is used for detecting a black foreign substance or a slightly weak bright point which is difficult to detect by the orthogonal polarization transmission method.
In this regard, according to the defect inspection imaging device, since the first polarization filter for luminance adjustment (luminance adjustment mechanism) and the second imaging region of the film form the first non-orthogonal polarization state, it is possible to improve the detection of the black foreign matter and the slightly weak bright point.
In the above-described image pickup apparatus for defect inspection, the first polarization filter and the first image pickup region of the film may be in a first non-orthogonal polarization state, and the brightness adjustment means may be an attenuation filter disposed between the light irradiation means and the second image pickup region or between the second image pickup region and the image pickup means.
According to the defect inspection imaging device, the first polarization filter and the first imaging region of the film form the first non-orthogonal polarization state, so that detection of the black foreign matter and the weak bright point can be improved.
In the above-described image pickup apparatus for defect inspection, the first polarization filter and the first image pickup region of the film may be in a first non-orthogonal polarization state, and the luminance adjusting means may be disposed in the light irradiation means, and may individually adjust the luminance value of the light irradiated to the first image pickup region and the luminance value of the light irradiated to the second image pickup region.
In this defect inspection imaging device, since the first polarization filter and the first imaging region of the film are in the first non-orthogonal polarization state, detection of the black foreign matter and the slightly weak bright point can be improved.
In addition to the above-described defect inspection imaging device, the imaging region may include a third imaging region divided in the transport direction, and the luminance adjustment mechanism may include a second luminance adjustment polarization filter arranged between the light irradiation mechanism and the third imaging region or between the third imaging region and the imaging mechanism so as to form a second non-orthogonal polarization state with the third imaging region of the film and adjust the luminance value of the light irradiated to the third imaging region.
According to this defect inspection imaging device, the first polarization filter for luminance adjustment (luminance adjustment mechanism) and the second imaging region of the film form a first non-orthogonal polarization state, and the second polarization filter for luminance adjustment (luminance adjustment mechanism) and the third imaging region of the film form a second non-orthogonal polarization state, so that detection of the black foreign matter and the slightly weak bright point can be improved.
In addition to the above-described defect inspection imaging device, the imaging region may include a third imaging region divided in the transport direction, and the defect inspection imaging device may further include a second polarization filter disposed between the light irradiation means and the third imaging region or between the third imaging region and the imaging means and forming a second non-orthogonal polarization state with the third imaging region of the film.
According to the defect inspection imaging device, the first polarization filter and the first imaging region of the film are in the first non-orthogonal polarization state, and the second polarization filter and the third imaging region of the film are in the second non-orthogonal polarization state, so that detection of the black foreign matter and the slightly weak bright point can be improved.
In the above-described image pickup apparatus for defect inspection, the first polarization filter may be in a first non-orthogonal polarization state with respect to the first image pickup area of the film, and the luminance adjustment mechanism may include a first luminance adjustment polarization filter disposed between the light irradiation mechanism and the second image pickup area or between the second image pickup area and the image pickup mechanism so as to be in a second non-orthogonal polarization state with respect to the second image pickup area of the film.
According to this defect inspection imaging device, the first polarization filter and the first imaging area of the film form a first non-orthogonal polarization state, and the first brightness adjustment polarization filter (brightness adjustment mechanism) and the second imaging area of the film form a second non-orthogonal polarization state, so that detection of the black foreign matter and the slightly weak bright point can be improved.
Another defect inspection imaging device according to the present invention is an imaging device for inspecting a defect of a film having no polarization characteristic, the defect inspection imaging device including: a light irradiation mechanism that irradiates light to an imaging region of the film; an imaging mechanism that images an imaging area of the film as a two-dimensional image; a pair of first polarization filters which are respectively arranged between the light irradiation means and the imaging region of the film and between the imaging region of the film and the imaging means so as to form an orthogonal polarization state or a first non-orthogonal polarization state; and a conveying mechanism that conveys the film in a conveying direction relative to the light irradiation mechanism, the imaging mechanism, and the pair of first polarization filters, wherein the imaging area includes a first imaging area and a second imaging area divided in the conveying direction, and the pair of first polarization filters are disposed between the light irradiation mechanism and the first imaging area, and between the first imaging area and the imaging mechanism.
Another defect inspection imaging method according to the present invention is a defect inspection imaging method for performing imaging for inspecting a defect of a film having no polarization characteristics using an imaging device for defect inspection including a light irradiation mechanism, an imaging mechanism, a pair of first polarization filters, and a conveying mechanism, the defect inspection imaging method including the steps of: a first polarization filter arrangement step of arranging a pair of first polarization filters between the light irradiation means and the imaging area of the film and between the imaging area of the film and the imaging means so as to form an orthogonal polarization state or a first non-orthogonal polarization state; a conveying step of conveying the film in a conveying direction by a conveying mechanism relative to the light irradiation mechanism, the imaging mechanism, and the pair of first polarization filters; a light irradiation step of irradiating a light onto an imaging region of the film by a light irradiation mechanism; and an imaging step of imaging an imaging area of the film as a two-dimensional image by the imaging means, the imaging area including a first imaging area and a second imaging area divided in the transport direction, wherein in the first polarization filter arrangement step, the pair of first polarization filters are arranged between the light irradiation means and the first imaging area, and between the first imaging area and the imaging means, respectively.
According to the another defect inspection imaging device and the defect inspection imaging method, for example, since the pair of first polarization filters are respectively disposed between the light irradiation means and the first imaging region and between the first imaging region and the imaging means so as to form the orthogonal polarization state, and the imaging means images the imaging region including the first imaging region and the second imaging region as a two-dimensional image, it is possible to simultaneously image the orthogonal polarization transmission inspection image (or the orthogonal polarization reflection inspection image) in the first imaging region and, for example, the normal transmission inspection image (or the normal reflection inspection image) in the second imaging region. That is, it is possible to integrate an imaging series for orthogonal polarization transmission inspection (or an imaging series for orthogonal polarization reflection inspection) and, for example, an imaging series for normal transmission inspection (or an imaging series for normal reflection inspection). As a result, the orthogonal polarization transmission inspection series (or orthogonal polarization reflection inspection series) and, for example, the normal transmission inspection series (or normal reflection inspection series) can be integrated, and the number of inspection series can be reduced.
However, as described above, the appropriate light brightness value differs between the orthogonal polarization transmission inspection imaging series (or orthogonal polarization reflection inspection imaging series) and the normal transmission inspection imaging series (or normal reflection inspection imaging series), for example.
Therefore, the above-described another defect inspection imaging device may further include a luminance adjustment mechanism that adjusts a luminance value of light applied to at least one of the first imaging region and the second imaging region or light transmitted through or reflected by at least one of the first imaging region and the second imaging region.
Accordingly, the brightness value of the light applied to at least one of the first imaging region and the second imaging region, or the brightness value of the light transmitted through or transmitted to at least one of the first imaging region and the second imaging region can be adjusted by the brightness adjusting mechanism, and therefore, the brightness value of the light can be set appropriately in the imaging of the first imaging region and the second imaging region, and the inspection can be performed at the brightness value of the light corresponding to the orthogonal polarization transmission inspection imaging series (or orthogonal polarization reflection inspection imaging series) and the orthogonal transmission inspection imaging series (or orthogonal reflection inspection imaging series), for example.
The brightness adjustment mechanism may adjust the brightness value of light irradiated to the second imaging region or light transmitted through or reflected by the second imaging region.
As described above, the luminance value of the appropriate light in the orthogonal polarization transmission inspection image series (or orthogonal polarization reflection inspection image series) may be large, and the luminance value of the appropriate light in the normal transmission inspection image series (or normal reflection inspection image series) may be small. In this case, as described above, by adjusting the luminance value of the light applied to the second imaging region or the light transmitted through or reflected from the second imaging region by the luminance adjusting means, for example, by outputting light having a large luminance value from the light irradiation means, the luminance value of the light applied to the first imaging region for performing the orthogonal polarization transmission inspection imaging series (or orthogonal polarization reflection inspection imaging series) can be made large, while the luminance value of the light applied to the second imaging region for performing the orthogonal transmission inspection imaging series (or orthogonal reflection inspection imaging series) or the luminance value of the light transmitted through or reflected from the second imaging region can be made small by the luminance adjusting means.
The brightness adjustment means may be an attenuation filter disposed between the light irradiation means and the second imaging region or between the second imaging region and the imaging means.
The brightness adjustment means may be disposed in the light irradiation means, and may individually adjust the brightness value of the light irradiated to the first imaging region and the brightness value of the light irradiated to the second imaging region.
In addition to the above-described another defect inspection imaging apparatus, the pair of first polarization filters may be in an orthogonal polarization state, and the luminance adjustment mechanism may include a pair of first luminance adjustment polarization filters disposed between the light irradiation mechanism and the second imaging area and between the second imaging area and the imaging mechanism so as to be in a first non-orthogonal polarization state.
According to the another defect inspection imaging device, since the pair of first luminance adjusting polarization filters (luminance adjusting mechanisms) form the first non-orthogonal polarization state, it is possible to improve detection of the black foreign matter and the above-described slightly weak bright point.
In addition to the above-described another defect inspection imaging apparatus, a pair of first polarization filters may be in a first non-orthogonal polarization state, and the luminance adjusting means may be an attenuation filter disposed between the light irradiation means and the second imaging region or between the second imaging region and the imaging means.
According to the another defect inspection imaging device, since the pair of first polarization filters forms the first non-orthogonal polarization state, it is possible to improve detection of the black foreign matter and the above-described weak bright point.
In addition to the above-described another defect inspection imaging device, the pair of first polarization filters may be in a first non-orthogonal polarization state, and the luminance adjusting unit may be disposed in the light irradiation unit and may individually adjust the luminance value of the light irradiated to the first imaging area and the luminance value of the light irradiated to the second imaging area.
In the other defect inspection imaging device, since the pair of first polarization filters forms the first non-orthogonal polarization state, detection of the black foreign matter and the above-described weak bright point can be improved.
In addition to the above-described another defect inspection imaging device, the imaging region may include a third imaging region divided in the transport direction, and the luminance adjustment mechanism may include a pair of second luminance adjustment polarization filters arranged between the light irradiation mechanism and the third imaging region and between the third imaging region and the imaging mechanism so as to form a second non-orthogonal polarization state, and adjust the luminance value of the light irradiated to the third imaging region.
According to the another defect inspection imaging device, since the pair of first luminance adjusting polarization filters (luminance adjusting means) is in the first non-orthogonal polarization state and the pair of second luminance adjusting polarization filters (luminance adjusting means) is in the second non-orthogonal polarization state, detection of the black foreign matter and the weak bright point can be improved.
In addition to the above-described another image pickup apparatus for defect inspection, the image pickup region may include a third image pickup region divided in the transport direction, and the image pickup apparatus for defect inspection may further include a pair of second polarization filters respectively disposed between the light irradiation means and the third image pickup region and between the third image pickup region and the image pickup means so as to form a second non-orthogonal polarization state.
According to the another defect inspection imaging device, since the pair of first polarization filters are in the first non-orthogonal polarization state and the pair of second polarization filters are in the second non-orthogonal polarization state, detection of the black foreign matter and the weak bright point can be improved.
In addition to the above-described another defect inspection imaging apparatus, the pair of first polarization filters may be in a first non-orthogonal polarization state, and the luminance adjustment mechanism may include a pair of first luminance adjustment polarization filters disposed between the light irradiation mechanism and the second imaging area and between the second imaging area and the imaging mechanism so as to be in a second non-orthogonal polarization state.
According to the another defect inspection imaging device, since the pair of first polarization filters forms the first non-orthogonal polarization state and the pair of first luminance adjusting filters (luminance adjusting mechanism) forms the second non-orthogonal polarization state, it is possible to improve detection of the black foreign matter and the slightly weak bright point.
The defect inspection system of the present invention includes: the above-mentioned defect inspection imaging device or another defect inspection imaging device; and a detection section that detects a defect existing in the film based on the two-dimensional image captured by the defect inspection imaging device or another defect inspection imaging device. Further, the defect inspection method of the present invention includes the above-described image pickup method for defect inspection or another image pickup method for defect inspection, and the defect inspection method includes a defect detection step of detecting a defect existing in the film based on a two-dimensional image picked up by the image pickup method for defect inspection or another image pickup method for defect inspection.
The film manufacturing apparatus of the present invention includes the defect inspection system. The film manufacturing method of the present invention includes the above-described defect inspection method.
Effects of the invention
According to the present invention, different inspection series can be integrated in defect inspection of a film, thereby reducing the number of inspection series.
Drawings
Fig. 1 is a diagram illustrating a film manufacturing apparatus and a film manufacturing method according to an embodiment of the present invention.
Fig. 2 is a diagram illustrating a defect inspection system and a defect inspection method according to an embodiment of the present invention.
Fig. 3 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a first embodiment of the present invention.
Fig. 4 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a second embodiment of the present invention.
Fig. 5 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a third embodiment of the present invention.
Fig. 6 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a fourth embodiment of the present invention.
Fig. 7 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a fifth embodiment of the present invention.
Fig. 8 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a sixth embodiment of the present invention.
Fig. 9 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 10 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 11 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 12 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 13 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 14 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 15 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 16 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 17 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 18 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modification of the present invention.
Fig. 19 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 20 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 21 is a diagram showing verification results of the defect inspection imaging device and the defect inspection imaging method according to the second embodiment.
Fig. 22 is a diagram illustrating a defect inspection system and a defect inspection method according to an embodiment of the present invention.
Fig. 23 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a seventh embodiment of the present invention.
Fig. 24 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to an eighth embodiment of the present invention.
Fig. 25 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a ninth embodiment of the present invention.
Fig. 26 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a tenth embodiment of the present invention.
Fig. 27 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to an eleventh embodiment of the present invention.
Fig. 28 is a diagram illustrating a defect inspection imaging device and a defect inspection imaging method according to a twelfth embodiment of the present invention.
Fig. 29 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 30 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 31 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 32 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 33 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 34 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 35 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 36 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 37 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 38 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 39 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modification of the present invention.
Fig. 40 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 41 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 42 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 43 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modification of the present invention.
Fig. 44 is a diagram of a defect inspection imaging device and a defect inspection imaging method according to a modification of the present invention.
Fig. 45 is a diagram showing verification results of the defect inspection imaging device and the defect inspection imaging method according to the seventh embodiment.
Description of the reference numerals
10. 10A, 10B, 10C, 10D, 10e.. defect inspection system; 20. 20A, 20B, 20C, 20D, 20e.. the defect inspection imaging device; a light source (light irradiation means); a light source (brightness adjustment mechanism); an area sensor (camera); a CCD or CMOS; a lens; 231、241.., a first polarization filter; 232、242.., a second polarization filter; 251、253.., a first polarization filter for brightness adjustment (brightness adjustment mechanism); 252、254.., a second polarization filter for brightness adjustment (brightness adjustment mechanism); an attenuation filter (brightness adjustment mechanism); an image analysis section; marking means; a manufacturing apparatus (film manufacturing apparatus); 101. 102, 103.. a stock roll; 104. a laminating roller; a carry roller; a membrane; a polarizing film body; an adhesive with a release film; a surface protection film; r.. photographing an area; r0.. intermediate capture area; r1.. a first photographing region; r2.. second capture area; a third shot region.
Detailed Description
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the drawings, the same or corresponding portions are denoted by the same reference numerals.
The film production apparatus and the film production method according to the embodiment of the present invention are used for producing a polarizing film (optical film) having polarization characteristics, a retardation film (optical film) having no polarization characteristics, a battery separator, and the like. Fig. 1 shows an example of a manufacturing apparatus and a manufacturing method of a film (polarizing film) having polarization characteristics, and a description of a manufacturing apparatus and a manufacturing method of a retardation film, a battery separator, and the like having no polarization characteristics is omitted.
The manufacturing apparatus (film manufacturing apparatus) 100 shown in fig. 1 first bonds protective films on both sides of the principal surface of the polarizing plate to produce a polarizing film main body (optical film main body) 111. Next, the manufacturing apparatus 100 takes out the separator-attached pressure-sensitive adhesive sheet 112 having the separator (release film) attached thereto from the material roll 101, and attaches the separator-attached pressure-sensitive adhesive sheet 112 to one principal surface side of the polarizing film body 111 by the attaching roll 104. Next, the manufacturing apparatus 100 takes out the surface protection film 113 from the material roll 102, and bonds the surface protection film 113 to the other main surface side of the polarizing film main body 111 by the bonding roll 105, thereby producing the film 110 having polarization properties. Next, the manufacturing apparatus 100 conveys the generated film 110 by the conveying roller 106 and winds the film 110 by the stock roller 103.
Examples of the material of the polarizing plate in the polarizing film main body 111 include pva (polyvinyl alcohol), and examples of the material of the protective film in the polarizing film main body 111 include tac (triacetyl cellulose). The material of the release film and the surface protection film 113 in the release film-attached adhesive sheet 112 may be pet (polyethylene terephthalate), for example. By peeling the release film, the film 110 can be bonded to a liquid crystal panel, another optical film, or the like with an adhesive.
The manufacturing apparatus 100 further includes a defect inspection system 10 for inspecting defects of the film 110, and a defect inspection system 10 for inspecting defects of the polarizing film body 111. Since these defect inspection systems 10 are the same, the following description will be made of the defect inspection system 10 that performs defect inspection of the film 110.
[ first embodiment ]
The defect inspection system and the defect inspection method according to the first embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarization characteristics. Fig. 2 is a diagram showing a defect inspection system and a defect inspection method according to a first embodiment of the present invention, and fig. 3 is a diagram showing a defect inspection imaging device and a defect inspection imaging method according to a first embodiment of the present invention.
The defect inspection system 10 shown in fig. 2 includes a defect inspection imaging device 20, an image analysis unit (detection unit) 30, and a marking device 40, and the defect inspection imaging device 20 shown in fig. 3 includes a light source (light irradiation means) 21, a plurality of area sensors (imaging means) 22, and a first polarization filter 231. Fig. 2 and 3 show XYZ orthogonal coordinates, where the X direction represents the width direction of the polarizing film, and the Y direction represents the conveyance direction of the polarizing film.
In the present embodiment, mainly the conveyance rollers 106 and the material roller 103 shown in fig. 1 function as a conveyance mechanism. By these conveyance mechanisms, the light source 21, the area sensor 22, and the first polarization filter 23 are opposed to each other in the conveyance direction Y1The film 110 is relatively conveyed.
The light source 21 is provided on the other main surface side of the film 110, and irradiates light to the imaging region R of the film 110. For example, the light source 21 is a linear light source extending in the width direction X.
The area sensors 22 are arranged on one main surface side of the film 110 and arranged in the width direction X. The area sensor 22 includes a ccd (charge Coupled device) or CMOS (Complementary Metal-Oxide Semiconductor)22a and a lens 22b. The area sensor 22 receives the light transmitted through the film 110, and thereby temporally and continuously images the imaging area R of the film 110 as a two-dimensional image.
The length in the conveying direction Y of the two-dimensional image captured by each area sensor 22 is preferably at least 2 times or more the conveying distance by which the film 110 is conveyed from the time when the two-dimensional image is acquired by each area sensor 22 to the time when the next two-dimensional image is acquired. In other words, it is preferable to photograph the same area of the film 110 more than 2 times. In this way, by making the length of the two-dimensional image in the conveying direction Y larger than the conveying distance during image acquisition, the number of times of capturing the same portion of the film 110 is increased, and thus defects can be inspected with high accuracy.
Here, the imaging region R includes a first imaging region R1 and a second imaging region R2 divided in the conveying direction Y. In addition, the photographing region R includes an intermediate photographing region R0 between the first photographing region R1 and the second photographing region R2.
First polarization filter 231Is arranged between the light source 21 and the film 110. Specifically, the first polarization filter 231Is disposed between the light source 21 and the first photographing region R1 of the photographing region R. In the present embodiment, the first polarization filter 231The half of the imaging region R in the transport direction Y is blocked when viewed from the region sensor 22 (Japanese: ナイフエツジ). In addition, the first polarization filter 231Forming an orthogonal polarization state with the film 110. Here, the orthogonal polarization state refers to a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are substantially orthogonal, that is, a state in which the polarization axis of the polarization filter and the polarization axis of the film cross at an angle of substantially 90 degrees. The above-mentioned "substantially 90 degrees" means, for example, 85 degrees or more and less than 95 degrees, and more preferably 90 degrees.
This makes it possible to capture an orthogonal polarization transmission inspection image in the first imaging region R1, a normal transmission inspection image in the second imaging region R2, and a transmission scatterometry inspection image in the intermediate imaging region R0.
The image analysis section 30 detects a defect existing in the film 110 from the two-dimensional image from the area sensor 22. The image analysis unit 30 converts the coordinate position on the two-dimensional image into the coordinate position on the film 110 based on the pixel coordinates of the two-dimensional image and the distance the film is conveyed during image capturing, and generates defect position information. The image analysis unit 30 synthesizes images corresponding to the entire area of the film 110 based on the defect position information, and creates a defect map.
The marking device 40 marks the film based on the defect map from the image analysis unit 30.
Next, a defect inspection method and a defect inspection imaging method according to a first embodiment of the present invention will be described.
First, the first polarization filter 23 is put in place1Is disposed between the light source 21 and the first photographing region R1 of the film 110 so as to be in a state of orthogonal polarization to the film 110 (first polarization)Filter arrangement process).
Next, the light source 21, the area sensor 22, and the first polarization filter 23 are subjected to the conveyance mechanism1The film 110 is relatively conveyed in the conveying direction Y (conveying step), light is irradiated to the imaging region R of the film 110 by the light source 21 (light irradiation step), and the imaging region R of the film 110 is imaged as a two-dimensional image by the area sensor 22 (imaging step).
Next, the image analysis unit 30 detects a defect present in the film 110 from the two-dimensional image from the area sensor 22, and creates a defect map from the defect position information (defect detection step). Next, the film 110 is marked by the marking device 40 based on the defect map from the image analysis unit 30 (marking step).
According to the defect inspection imaging device 20 and the defect inspection imaging method of the first embodiment, the first polarization filter 23 is used1The area sensor (imaging means) 22 images the imaging region R including the first imaging region R1, the second imaging region R2, and the intermediate imaging region R0 as a two-dimensional image, and thus can simultaneously image an orthogonal polarization transmission inspection image of the first imaging region R1, a normal transmission inspection image of the second imaging region R2, and a transmission scattering inspection image of the intermediate imaging region R0. That is, the orthogonal polarization transmission inspection imaging series, the normal transmission inspection imaging series, and the transmission scattering inspection imaging series can be integrated.
As a result, according to the defect inspection system 10 and the defect inspection method of the first embodiment, the orthogonal polarization transmission inspection series, the normal transmission inspection series, and the transmission scattering inspection series can be integrated.
Therefore, according to the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the first embodiment, the number of inspection lines can be reduced.
[ second embodiment ]
The defect inspection system and the defect inspection method according to the second embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarization characteristics.
A defect inspection system 10A according to a second embodiment of the present invention is different from the first embodiment in that a defect inspection imaging device 20A is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in fig. 2. The defect inspection imaging device 20A shown in fig. 4 is different from the first embodiment in that the defect inspection imaging device 20 shown in fig. 3 further includes an attenuation filter (brightness adjustment means) 26.
The attenuation filter 26 is disposed between the light source 21 and the second photographing region R2. Thereby, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second photographing region R2. The attenuation filter 26 may be disposed between the second imaging region R2 and the area sensor 22 to reduce the brightness of the light passing through the second imaging region R2.
Next, a defect inspection method and a defect inspection imaging method according to a second embodiment of the present invention will be described.
First, the first polarization filter arrangement step is performed. Next, the attenuation filter 26 is disposed between the light source 21 and the second photographing region R2. This can reduce the luminance value of the light irradiated to the second imaging region R2 (luminance adjustment step). The attenuation filter 26 may be disposed between the second imaging region R2 and the area sensor 22 to reduce the brightness of the light passing through the second imaging region R2.
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the second embodiment, the same advantages as those of the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the first embodiment can be obtained.
However, the orthogonal polarization transmission inspection imaging series and the normal transmission inspection imaging series differ in the luminance value of the appropriate light. More specifically, the luminance value of the light suitable for the orthogonal polarization transmission inspection imaging series is large, and the luminance value of the light suitable for the normal transmission inspection imaging series is small.
In this regard, according to the defect inspection imaging device 20A and the defect inspection imaging method of the second embodiment, since the luminance value of the light irradiated to the second imaging region R2 can be adjusted by the attenuation filter (luminance adjusting means) 26, for example, by outputting light having a large luminance value from the light source (light irradiating means) 21, the luminance value of the light irradiated toward the first imaging region R1 for performing the orthogonal polarization transmission inspection imaging series can be made large, while the luminance value of the light irradiated toward the second imaging region R2 for performing the normal transmission inspection imaging series can be made small by the attenuation filter (luminance adjusting means) 26. As described above, the same effect can be expected even when the attenuation filter 26 is disposed between the second imaging region R2 and the area sensor 22 and the luminance value of the light having passed through the second imaging region R2 is adjusted.
The above effects were verified as follows. Fig. 21 (a) shows detection images of various defects (black foreign matter, weak bright spots, strong bright spots) when the light source light amount is changed in the orthogonal polarization transmission method and the normal transmission method. Fig. 21 (b) shows a graph in which the defect signal of the detection image obtained by the cross-polarization transmission method of fig. 21 (a) is plotted, and fig. 21 (c) shows a graph in which the defect signal of the detection image obtained by the normal transmission method of fig. 21 (a) is plotted. The light source light amount is 1 to 40 times the light source light amount (the optimal light amount in the normal transmission) when the luminance value on the image is 128.
According to fig. 21 (a) and 21 (c), in the forward transmission method, the light source light amount is preferably about 1 time, and if the light source light amount is 2 times or more, the brightness on the image becomes excessively high, and the entire image becomes white. On the other hand, as is clear from fig. 21 (a) and 21 (b), in the cross polarization transmission method, when the light source light amount is about 1 time, the luminance on the screen is too low to recognize the defect, and the light source light amount is preferably 20 times or more, and more preferably 40 times or more.
In the verification described above, the luminance value on the image is adjusted by adjusting the light amount of the light source that irradiates the imaging area, but the same effect can be achieved by using an attenuation filter as described above as the luminance adjustment method.
[ third embodiment ]
The defect inspection system and the defect inspection method according to the third embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarization characteristics.
A defect inspection system 10B according to a third embodiment of the present invention is different from the first embodiment in that a defect inspection imaging device 20B is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in fig. 2. The defect inspection imaging device 20B shown in fig. 5 differs from the first embodiment in that the defect inspection imaging device 20 shown in fig. 3 includes a light source 21A instead of the light source 21.
The light source 21A has a luminance adjusting function of individually adjusting the luminance value of light irradiated to the first photographing region R1 and the luminance value of light irradiated to the second photographing region R2. This makes it possible to increase the luminance value of the light irradiated to the first imaging region R1 and decrease the luminance value of the light irradiated to the second imaging region R2.
Next, a defect inspection method and a defect inspection imaging method according to a third embodiment of the present invention will be described.
First, the first polarization filter arrangement step is performed. Next, the luminance value of light irradiated to the first photographing region R1 and the luminance value of light irradiated to the second photographing region R2 are individually adjusted by the light source 21A. This makes it possible to increase the luminance value of the light irradiated to the first imaging region R1 and decrease the luminance value of the light irradiated to the second imaging region R2 (luminance adjustment step).
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20B, the defect inspection imaging method, the defect inspection system 10B, and the defect inspection method of the third embodiment, the same advantages as those of the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the first embodiment can be obtained.
In addition, according to the defect inspection imaging device 20B and the defect inspection imaging method of the third embodiment, since the luminance value of the light irradiated to the first imaging region R1 and the luminance value of the light irradiated to the second imaging region R2 can be individually adjusted by the light source 21A, the luminance value of the light irradiated toward the first imaging region R1 for performing the orthogonal polarization transmission inspection imaging series can be made large, and the luminance value of the light irradiated toward the second imaging region R2 for performing the normal transmission inspection imaging series can be made small.
[ fourth embodiment ]
A defect inspection system and a defect inspection method according to a fourth embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the retardation film, the battery separator, and the like that do not have polarization characteristics. The defect inspection system and the defect inspection method according to the fourth embodiment can be applied to a manufacturing apparatus and a manufacturing method of a retardation film, a battery separator, or the like having no polarization characteristics. In the manufacturing apparatus and manufacturing method of the retardation film, the battery separator, and the like having no polarization characteristics, the contents other than the defect inspection system and the defect inspection method described in the fourth embodiment are known, and therefore, as described above, the description thereof is omitted. In other embodiments and modifications relating to a defect inspection system and a defect inspection method for inspecting defects of a retardation film, a battery separator, and the like having no polarization characteristics, explanations of a manufacturing apparatus and a manufacturing method for a retardation film, a battery separator, and the like having no polarization characteristics are omitted from the same viewpoint. In the fourth embodiment, the film 110 is a film having no polarization characteristics.
A defect inspection system 10C according to a fourth embodiment of the present invention is different from the first embodiment in that a defect inspection imaging device 20C is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in fig. 2. The defect inspection imaging device 20C shown in fig. 6 is different from the first embodiment in that the defect inspection imaging device 20 shown in fig. 3 replaces the first polarization filter 231And a pair of first polarization filters 231、241。
First polarization filter 231As in the first embodiment, the light source 21 is disposed between the film 110. Specifically, the first polarization filter 231Is disposed between the light source 21 and the first photographing region R1 of the photographing region R. In the present embodiment, the first polarization filter 231The half of the imaging region R in the conveyance direction Y is blocked when viewed from the region sensor 22.
On the other hand, the first polarization filter 241Is disposed between the membrane 110 and the area sensor 22. In particular, the first polarization filter 241Is disposed between the first photographing region R1 of the photographing region R and the region sensor 22. In the present embodiment, the first polarization filter 241The half of the imaging region R in the conveyance direction Y is blocked when viewed from the region sensor 22.
In addition, the first polarization filter 231And a first polarization filter 241Forming orthogonal polarization states. This makes it possible to capture an orthogonal polarization transmission inspection image in the first imaging region R1, a normal transmission inspection image in the second imaging region R2, and a transmission scatterometry inspection image in the intermediate imaging region R0.
Next, a defect inspection method and a defect inspection imaging method according to a fourth embodiment of the present invention will be described.
First, the first polarization filter 23 is put in place1A first photographing region arranged between the light source 21 and the film 110Between R1, the first polarization filter 241Is disposed between the first photographing region R1 of the film 110 and the area sensor 22. At this time, the first polarization filter 23 is set1And a first polarization filter 241Is arranged to form orthogonal polarization states (first polarization filter arranging process).
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20C and the defect inspection imaging method according to the fourth embodiment, the pair of first polarization filters 23 are used1、241The light source (light irradiation means) 21 and the first imaging region R1, and the first imaging region R1 and the area sensor (imaging means) 22 are disposed so as to form orthogonal polarization states, and the area sensor (imaging means) 22 images the imaging region R including the first imaging region R1, the second imaging region R2, and the intermediate imaging region R0 as a two-dimensional image, so that it is possible to simultaneously image an orthogonal polarization transmission inspection image of the first imaging region R1, a normal transmission inspection image of the second imaging region R2, and a transmission/scattering inspection image of the intermediate imaging region R0. That is, the orthogonal polarization transmission inspection imaging series, the normal transmission inspection imaging series, and the transmission scattering inspection imaging series can be integrated.
As a result, according to the defect inspection system 10C and the defect inspection method of the fourth embodiment, the orthogonal polarization transmission inspection series, the normal transmission inspection series, and the transmission scattering inspection series can be integrated.
Therefore, according to the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the fourth embodiment, the number of inspection lines can be reduced.
[ fifth embodiment ]
A defect inspection system and a defect inspection method according to a fifth embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the retardation film, the battery separator, and the like that do not have polarization characteristics. In the fifth embodiment, the film 110 is a film having no polarization characteristics.
A defect inspection system 10D according to a fifth embodiment of the present invention is different from the fourth embodiment in that a defect inspection imaging device 20D is provided in place of the defect inspection imaging device 20C in the defect inspection system 10C shown in fig. 2. The defect inspection imaging device 20D shown in fig. 7 is different from the fourth embodiment in that an attenuation filter (brightness adjustment means) 26 is further provided in the defect inspection imaging device 20C shown in fig. 6.
The attenuation filter 26 is disposed between the light source 21 and the second photographing region R2. Thereby, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second photographing region R2. The attenuation filter 26 may be disposed between the second imaging region R2 and the area sensor (imaging means) 22 to reduce the luminance of light passing through the second imaging region R2.
Next, a defect inspection method and a defect inspection imaging method according to a fifth embodiment of the present invention will be described.
First, the first polarization filter arrangement step is performed. Next, the attenuation filter 26 is disposed between the light source 21 and the second photographing region R2. This can reduce the luminance value of the light irradiated to the second imaging region R2 (luminance adjustment step). The attenuation filter 26 may be disposed between the second imaging region R2 and the area sensor (imaging means) 22 to reduce the luminance of light passing through the second imaging region R2.
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the image pickup device for defect inspection 20D, the image pickup method for defect inspection, the defect inspection system 10D, and the defect inspection method of the fifth embodiment, the same advantages as those of the image pickup device for defect inspection 20C, the image pickup method for defect inspection, the defect inspection system 10C, and the defect inspection method of the fourth embodiment can be obtained.
Further, according to the defect inspection imaging device 20D and the defect inspection imaging method of the fifth embodiment, since the attenuation filter (brightness adjustment means) 26 can adjust the brightness value of the light irradiated to the second imaging region R2, for example, by outputting light having a large brightness value from the light source (light irradiation means) 21, the brightness value of the light irradiated toward the first imaging region R1 for performing the orthogonal polarization transmission inspection imaging series can be made large, while the brightness value of the light irradiated toward the second imaging region R2 for performing the orthogonal transmission inspection imaging series can be made small by the attenuation filter (brightness adjustment means) 26. Further, the same effect can be achieved even when the attenuation filter 26 is disposed between the second imaging region R2 and the area sensor (imaging means) 22 and the luminance value of the light having passed through the second imaging region R2 is adjusted.
[ sixth embodiment ]
A defect inspection system and a defect inspection method according to a sixth embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the retardation film, the battery separator, and the like that do not have polarization characteristics. In the sixth embodiment, the film 110 is a film having no polarization characteristics.
A defect inspection system 10E according to a sixth embodiment of the present invention is different from the fourth embodiment in that a defect inspection imaging device 20E is provided in place of the defect inspection imaging device 20C in the defect inspection system 10C shown in fig. 2. The defect inspection imaging device 20E shown in fig. 8 differs from the fourth embodiment in that a light source 21A is provided in place of the light source 21 in the defect inspection imaging device 20C shown in fig. 6.
The light source 21A has a luminance adjusting function of individually adjusting the luminance value of light irradiated to the first photographing region R1 and the luminance value of light irradiated to the second photographing region R2. This makes it possible to increase the luminance value of the light irradiated to the first imaging region R1 and decrease the luminance value of the light irradiated to the second imaging region R2.
Next, a defect inspection method and a defect inspection imaging method according to a sixth embodiment of the present invention will be described.
First, the first polarization filter arrangement step is performed. Next, the luminance value of light irradiated to the first photographing region R1 and the luminance value of light irradiated to the second photographing region R2 are individually adjusted by the light source 21A. This makes it possible to increase the luminance value of the light irradiated to the first imaging region R1 and decrease the luminance value of the light irradiated to the second imaging region R2 (luminance adjustment step).
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20E, the defect inspection imaging method, the defect inspection system 10E, and the defect inspection method of the sixth embodiment, the same advantages as those of the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the fourth embodiment can be obtained.
In addition, according to the defect inspection imaging device 20E and the defect inspection imaging method of the sixth embodiment, since the luminance value of the light irradiated to the first imaging region R1 and the luminance value of the light irradiated to the second imaging region R2 can be individually adjusted by the light source 21A, the luminance value of the light irradiated toward the first imaging region R1 for performing the orthogonal polarization transmission inspection imaging series can be made large, and the luminance value of the light irradiated toward the second imaging region R2 for performing the normal transmission inspection imaging series can be made small.
The present invention is not limited to the above-described embodiment, and various modifications can be made. For example, in the first, second, and third embodiments, the defect inspection imaging devices 20, 20A, and 20B and the defect inspection imaging method using the transmission method are exemplified, but the features of the present invention can also be applied to the defect inspection imaging devices 20, 20A, and 20B and the defect inspection imaging method using the reflection method as shown in fig. 9, 10, and 11.
According to the defect inspection imaging devices 20, 20A, and 20B and the defect inspection imaging method shown in fig. 9, 10, and 11, the first polarization filter 23 is used1To be combined with a filmThe region sensor (imaging means) 22 images the imaging region R including the first imaging region R1, the second imaging region R2, and the intermediate imaging region R0 as a two-dimensional image, and therefore can simultaneously image an orthogonal polarization reflective inspection image of the first imaging region R1, a regular reflective inspection image of the second imaging region R2, and a reflective scattering inspection image of the intermediate imaging region R0. That is, the orthogonal polarization reflection inspection imaging series, the regular reflection inspection imaging series, and the reflection scattering inspection imaging series can be integrated. As a result, in the defect inspection systems 10, 10A, and 10B and the defect inspection method, the orthogonal polarization reflection inspection series, the regular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced.
However, the orthogonal polarization reflection inspection imaging series and the specular reflection inspection imaging series differ in the luminance value of the appropriate light. More specifically, the luminance value of the light suitable for the orthogonal polarization reflection inspection imaging series is large, and the luminance value of the light suitable for the regular reflection inspection imaging series is small.
In this regard, according to the defect inspection imaging devices 20A and 20B and the defect inspection imaging method shown in fig. 10 and 11, since the luminance value of the light irradiated to the second imaging region R2 can be adjusted by the attenuation filter (luminance adjusting means) 26 and the light source (luminance adjusting means) 21A, the luminance value of the light irradiated toward the first imaging region R1 for performing the orthogonal polarization reflection inspection imaging series can be made large by outputting light having a large luminance value from the light source (light irradiating means) 21 and the light source (light irradiating means) 21A, for example, and the luminance value of the light irradiated toward the second imaging region R2 for performing the regular reflection inspection imaging series can be made small by the attenuation filter (luminance adjusting means) 26 and the light source (luminance adjusting means) 21A. When the attenuation filter (luminance adjusting means) 26 is used (for example, in the mode illustrated in fig. 10), the attenuation filter 26 may be disposed between the second imaging region R2 and the area sensor (imaging means) 22, and the luminance value of the reflected light may be adjusted in the second imaging region R2.
Similarly, in the fourth, fifth, and sixth embodiments, the defect inspection imaging devices 20C, 20D, and 20E and the defect inspection imaging method using the transmission method are exemplified, but the feature of the present invention can also be applied to the defect inspection imaging devices 20C, 20D, and 20E and the defect inspection imaging method using the reflection method as shown in fig. 12, 13, and 14.
According to the defect inspection imaging devices 20C, 20D, and 20E and the defect inspection imaging method shown in fig. 12, 13, and 14, the pair of first polarization filters 23 are used1、241The light source (light irradiation means) 21 and the first imaging region R1, and the first imaging region R1 and the area sensor (imaging means) 22 are disposed so as to form orthogonal polarization states, and the area sensor (imaging means) 22 images the imaging region R including the first imaging region R1, the second imaging region R2, and the intermediate imaging region R0 as a two-dimensional image, so that it is possible to simultaneously image an orthogonal polarization image for reflection inspection of the first imaging region R1, a regular reflection image for the second imaging region R2, and a reflection/scattering inspection image for the intermediate imaging region R0. That is, the orthogonal polarization reflection inspection imaging series, the regular reflection inspection imaging series, and the reflection scattering inspection imaging series can be integrated. As a result, in the defect inspection systems 10C, 10D, and 10E and the defect inspection method, the orthogonal polarization reflection inspection series, the regular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced.
Further, according to the defect inspection imaging devices 20D and 20E and the defect inspection imaging method shown in fig. 13 and 14, since the brightness value of the light irradiated to the second imaging region R2 can be adjusted by the attenuation filter (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A, for example, by outputting light having a large brightness value from the light source (light irradiation means) 21 and the light source (light irradiation means) 21A, the brightness value of the light irradiated toward the first imaging region R1 for performing the orthogonal polarization reflection inspection imaging series can be made large, while the brightness value of the light irradiated toward the second imaging region R2 for performing the regular reflection inspection imaging series can be made small by the attenuation filter (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A. When the attenuation filter (luminance adjusting means) 26 is used (for example, in the mode illustrated in fig. 13), the attenuation filter 26 may be disposed between the second imaging region R2 and the area sensor (imaging means) 22, and the luminance value of the reflected light may be adjusted in the second imaging region R2.
In the first, second, and third embodiments and the embodiments shown in fig. 9, 10, and 11, the first polarization filter 23 is exemplified1The first polarization filter 23 may be provided between the light source (light irradiation means) 21 and the first imaging region R1 of the film 110, as shown in fig. 15, 16, 17, 18, 19, and 201And is disposed between the first imaging region R1 of the film 110 and the area sensor (imaging means) 22.
[ seventh embodiment ]
A defect inspection system and a defect inspection method according to a seventh embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing defect inspection of the film 110 having polarization characteristics described above. Fig. 22 is a diagram showing a defect inspection system and a defect inspection method according to a seventh embodiment of the present invention, and fig. 23 is a diagram showing a defect inspection imaging device and a defect inspection imaging method according to the seventh embodiment of the present invention.
The defect inspection system 10 shown in fig. 22 includes a defect inspection imaging device 20, an image analysis unit (detection unit) 30, and a marking device 40, and the defect inspection imaging device 20 shown in fig. 23 includes a light source (light irradiation means) 21, a plurality of area sensors (imaging means) 22, and a first polarization filter 231And a first polarization filter (brightness adjusting mechanism) 25 for brightness adjustment1. Fig. 22 and 23 show XYZ orthogonal coordinates, where the X direction represents the width direction of the polarizing film, and the Y direction represents the conveyance direction of the polarizing film.
In the present embodiment, the main point is as shown in FIG. 1The illustrated conveyance roller 106 and the material roller 103 function as a conveyance mechanism. By these conveyance mechanisms, the light source 21, the area sensor 22, and the first polarization filter 23 are opposed to each other in the conveyance direction Y1The film 110 is relatively conveyed.
The light source 21 is provided on the other main surface side of the film 110, and irradiates light to the imaging region R of the film 110. For example, the light source 21 is a linear light source extending in the width direction X.
The area sensors 22 are arranged on one main surface side of the film 110 and arranged in the width direction X. The area sensor 22 includes a ccd (charge Coupled device) or CMOS (Complementary Metal-Oxide Semiconductor)22a and a lens 22b. The area sensor 22 receives the light transmitted through the film 110, and thereby temporally and continuously captures an imaging area R of the film 110 as a two-dimensional image.
The length in the conveying direction Y of the two-dimensional image captured by each area sensor 22 is preferably at least 2 times or more the conveying distance by which the film 110 is conveyed from the time when the two-dimensional image is acquired by each area sensor 22 to the time when the next two-dimensional image is acquired. In other words, it is preferable to photograph the same area of the film 110 more than 2 times. In this way, by making the length of the two-dimensional image in the conveying direction Y larger than the conveying distance during image acquisition, the number of times of capturing the same portion of the film 110 is increased, and thus defects can be inspected with high accuracy.
Here, the imaging region R includes a first imaging region R1 and a second imaging region R2 divided in the conveying direction Y. In addition, the photographing region R includes an intermediate photographing region R0 between the first photographing region R1 and the second photographing region R2.
First polarization filter 231Is arranged between the light source 21 and the film 110. Specifically, the first polarization filter 231Is disposed between the light source 21 and the first photographing region R1 of the photographing region R. In the present embodiment, the first polarization filter 231The half of the imaging region R in the conveyance direction Y is blocked when viewed from the region sensor 22. In addition, the first polarization filter 231Forming an orthogonal polarization state with the film 110. Here, the orthogonal polarization state means a polarization axis (polarization absorption axis) of the polarization filterA state substantially orthogonal to the polarization axis (polarization absorption axis) of the film, that is, a state in which the polarization axis of the polarization filter crosses the polarization axis of the film at an angle of substantially 90 degrees. The above-mentioned "substantially 90 degrees" means, for example, 85 degrees or more and less than 95 degrees, and more preferably 90 degrees.
First polarization filter 231The first polarizing filter 23 may be formed in a state of orthogonal polarization to the film 1101May be disposed between the first photographing region R1 and the region sensor 22.
First brightness adjustment polarizing filter 251Arranged between the light source 21 and the first polarization filter 23 in such a way as to form a first non-orthogonal polarization (half cross polarized) state with the film 1101And between the light source 21 and the second photographing region R2. Here, the non-orthogonal polarization state refers to a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are not substantially orthogonal but intersect, that is, a state in which the polarization axis of the polarization filter and the polarization axis of the film intersect at an angle other than substantially 90 degrees. The angle between the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film in the non-orthogonal polarization state differs depending on the transmittance of the film as an imaging target of the imaging means, the luminance value of light emitted from the light source, and the like, and is, for example, an angle at which the luminance value on the image when the predetermined region (the second imaging region R2 in the example of fig. 23) of the imaging region R is transmitted by the area sensor 22 is 200 or less, and preferably an angle at which the luminance value on the image is 130 or less. The first polarization filter 25 for luminance adjustment, for example, as described later1The cross angle between the polarization axis of (b) and the polarization axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. Thus, the first polarization filter 25 for luminance adjustment1The luminance value of the light irradiated to the second photographing region R2 can be reduced. In this specification, the "luminance value" is a value that each pixel on the 8-bit grayscale image has.
In addition, the first polarization filter for luminance adjustment 251The light source 21 may be disposed only between the light source and the second imaging region R2 to adjust the brightness of the light to be irradiated, or may be disposedBetween the film 110 and the area sensor 22, the brightness of the light transmitted through the second photographing area R2 is adjusted.
Thus, the orthogonal polarization transmission inspection image can be captured in the first imaging region R1, the non-orthogonal polarization (first non-orthogonal polarization) transmission inspection image can be captured in the second imaging region R2, and the transmission scatterometry inspection image can be captured in the intermediate imaging region R0.
The image analysis section 30 detects a defect existing in the film 110 from the two-dimensional image from the area sensor 22. The image analysis unit 30 converts the coordinate position on the two-dimensional image into the coordinate position on the film 110 based on the pixel coordinates of the two-dimensional image and the distance the film is conveyed during image capturing, and generates defect position information. The image analysis unit 30 synthesizes images corresponding to the entire area of the film 110 based on the defect position information, and creates a defect map.
The marking device 40 marks the film based on the defect map from the image analysis unit 30.
Next, a defect inspection method and a defect inspection imaging method according to a seventh embodiment of the present invention will be described.
First, the first polarization filter 23 is put in place1The light source 21 and the first imaging region R1 of the film 110 are arranged so as to be in a state of orthogonal polarization to the film 110 (first polarization filter arranging step). The first polarization filter 23 may also be used1Is disposed between the first photographing region R1 and the region sensor 22. Next, the first polarization filter for luminance adjustment 25 is set1Arranged between the light source 21 and the first polarization filter 23 so as to form a first non-orthogonal polarization state with the film 1101And between the light source 21 and the second photographing region R2. This can reduce the luminance value of the light irradiated to the second imaging region R2 (luminance adjustment step). The first brightness adjusting polarization filter 251The light source 21 may be disposed only between the light source and the second imaging region R2, or may be disposed between the film 110 and the area sensor 22.
Next, the light source 21, the area sensor 22, and the first polarization filter 23 are subjected to the conveyance mechanism1The film 110 is relatively conveyed in the conveying direction Y (conveying step), light is irradiated to the imaging region R of the film 110 by the light source 21 (light irradiation step), and the imaging region R of the film 110 is imaged as a two-dimensional image by the area sensor 22 (imaging step).
Next, the image analysis unit 30 detects a defect existing in the film 110 from the two-dimensional image from the area sensor 22, and creates a defect map from the defect position information (defect detection step). Next, the film 110 is marked by the marking device 40 based on the defect map from the image analysis unit 30 (marking step).
According to the defect inspection imaging device 20 and the defect inspection imaging method of the first embodiment, the first polarization filter 23 is used1The area sensor (imaging means) 22 images the imaging area R including the first imaging area R1, the second imaging area R2, and the intermediate imaging area R0 as a two-dimensional image, and thus can simultaneously image an orthogonally polarized transmission inspection image of the first imaging area R1, a non-orthogonally polarized (first non-orthogonally polarized) transmission inspection image of the second imaging area R2, and a transmission scatter inspection image of the intermediate imaging area R0, because the area sensor (imaging means) is disposed between the light source (light irradiation means) 21 and the first imaging area R1 so as to form an orthogonally polarized state with the film 110. That is, the orthogonal polarization transmission inspection imaging series, the non-orthogonal polarization transmission inspection imaging series, and the transmission scattering inspection imaging series can be integrated.
As a result, according to the defect inspection system 10 and the defect inspection method of the seventh embodiment, the orthogonal polarization transmission inspection series, the non-orthogonal polarization transmission inspection series, and the transmission scattering inspection series can be integrated.
Therefore, according to the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the seventh embodiment, the number of inspection lines can be reduced.
According to the defect inspection imaging device 20 and the defect inspection imaging method of the seventh embodiment, the first brightness adjustment polarization filter (brightness adjustment mechanism) 25 can be used1The luminance value of the light irradiated to the second photographing region R2 is adjusted. Therefore, for example, by outputting light having a large luminance value from the light source (light irradiation means) 21, the luminance value of light irradiated toward the first imaging region R1 for performing the orthogonal polarization transmission inspection imaging series can be made large, while the first polarization filter for luminance adjustment (luminance adjustment means) 25 can be used1The luminance value of light irradiated toward the second photographing region R2 for performing the non-orthogonal polarization (first non-orthogonal polarization) transmission inspection photographing series is made small.
However, the inventors of the present application have found that the normal transmission method is suitable for detecting a black foreign substance, and the cross polarization transmission method is suitable for detecting a bright spot, but it is difficult to detect a bright spot that is slightly weaker than a strong bright spot. In this regard, the inventors of the present application have found that the non-orthogonal transmission method is used for detecting a black foreign substance or a slightly weak bright point which is difficult to detect by the orthogonal polarization transmission method.
In this regard, according to the defect inspection imaging device 20 and the defect inspection imaging method of the seventh embodiment, the first polarization filter (luminance adjusting mechanism) 25 for luminance adjustment is used1The first non-orthogonal polarization state is formed with the second photographing region R2 of the film 110, and thus detection of a black foreign substance and a weak bright spot (including the above-described weak bright spot) can be improved. In the present specification, hereinafter, a weak bright point includes the above-described concept of "a weak bright point".
The above effects were verified as follows. Fig. 45 (a) shows detection images of various defects (black foreign matter, weak bright spots, and strong bright spots) when the intersection angle of the polarizing filter with respect to the film is changed at 40 times the light source light amount, and fig. 45 (b) shows a graph in which the luminance values of the detection images of fig. 45 (a) are plotted. Similarly, fig. 45 (c) shows a graph in which the brightness values of the detection images of the various defects (black foreign matter, weak bright point, strong bright point) when the angle of intersection of the polarizing filter with respect to the film is changed when the light source light amount is 20 times, and fig. 45(d) shows a graph in which the brightness values of the detection images of the various defects (black foreign matter, weak bright point, strong bright point) when the angle of intersection of the polarizing filter with respect to the film is changed when the light source light amount is 10 times. Note that, as for the light source light amount of 40 times, 20 times, and 10 times, the light source light amount (the optimal light amount in normal transmission) when the luminance value on the image is 128 is shown as 1 time.
As can be seen from fig. 45 (a) and (b), when the light source light amount is 40 times, the cross angle is substantially 90 degrees, that is, the cross polarization transmission method is suitable for detecting a defect of a strong bright point, and the cross angle is 105 degrees, that is, the non-cross polarization transmission method is suitable for detecting a defect of a weak bright point. When the intersection angle is 70 degrees or less and 110 degrees or more, the brightness on the image becomes too high, and the entire image becomes white. In the case of detecting a defect of a black foreign matter, it is known that the normal transmission method is suitable, but in the case of using a polarization filter for brightness adjustment in the normal transmission method, it is known that the cross angle is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less, that is, the non-orthogonal polarization transmission method is suitable.
As is clear from fig. 45 (b), (c), and (d), the optimum intersection angle in the non-orthogonal polarization transmission method differs depending on the light source light amount for detecting a weak bright point defect and detecting a black foreign object defect.
Thus, when the polarization filter is used for brightness adjustment in the normal transmission method, that is, when the non-orthogonal polarization transmission method is used, it is advantageous to detect a defect, such as a weak bright point or a black foreign object, in which a defect signal becomes high when the crossing angle is substantially 90 degrees or more.
In addition, the inspection under two intersection angles can be comprehensively considered, and the strength of the defect grade can be judged. For example, when a defect signal is observed by both the cross-polarization transmission method in which the cross angle is substantially 90 degrees and the non-cross-polarization transmission method in which the cross angle is 75 degrees or more and less than 85 degrees or 95 degrees or more and less than 105 degrees, in other words, when a defect signal is observed in a wide angle range, the defect level may be determined to be high, and when a defect signal is observed only by the cross-polarization transmission method in which the cross angle is substantially 90 degrees, the defect level may be determined to be low.
In the above verification, the polarization filter is disposed between the light source and the imaging region, and the brightness of the light irradiated to the imaging region is adjusted, but the same effect can be achieved by adjusting the brightness of the light transmitted through the imaging region by the non-orthogonal polarization transmission method using the polarization filter.
[ modified example of the seventh embodiment ]
In the seventh embodiment, the defect inspection imaging device 20 and the defect inspection imaging method in which the orthogonal polarization transmission method and the non-orthogonal polarization transmission method are combined are exemplified, but the orthogonal polarization transmission method may be combined with two or more different non-orthogonal polarization transmission methods. Hereinafter, as a modification of the seventh embodiment, the defect inspection imaging device 20 and the defect inspection imaging method in which the orthogonal polarization transmission method and two different non-orthogonal polarization transmission methods are combined are exemplified.
The defect inspection imaging device 20 of the modification shown in fig. 39 differs from the seventh embodiment in that the defect inspection imaging device 20 shown in fig. 23 further includes a second polarization filter (luminance adjustment mechanism) 25 for adjusting luminance2。
Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the second imaging region R2.
Second polarization filter for luminance adjustment (luminance adjusting mechanism) 252To match the first brightness adjusting polarization filter 251The third photographing region R3 is disposed between the light source 21 and the film 110 so as to be adjacent to each other and form a second non-orthogonal polarization state with the film. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the intersection angle of the polarization axis of the polarization filter in the second non-orthogonal polarization state with the polarization axis of the film and the intersection angle of the polarization axis of the polarization filter in the first non-orthogonal polarization state with the polarization axis of the film are different. Thereby, the second polarization filter 25 for luminance adjustment2The luminance value of the light irradiated to the third photographing region R3 can be reduced. Second brightness adjusting polarization filter 252The second non-orthogonal polarization state may be formed with the film 110, and the brightness value of the light transmitted through the third imaging region R3 may be adjusted between the third imaging region R3 and the region sensor 22.
Next, a defect inspection method and a defect inspection imaging method according to a modification of the seventh embodiment will be described.
First, the first polarization filter arrangement step is performed. Next, as described above, the first polarization filter for luminance adjustment 25 is set1Arranged between the light source 21 and the first polarization filter 23 so as to form a first non-orthogonal polarization state with the film 1101And between the light source 21 and the second photographing region R2. Next, the second polarization filter for luminance adjustment 252Is disposed between the light source 21 and the third photographing region R3 so as to form a second non-orthogonal polarization state with the film 110. This can reduce the luminance value of light irradiated to the second imaging region R2 and the third imaging region R3 (luminance adjustment step). The second polarization filter 25 for brightness adjustment may be used2Is arranged between the third photographing region R3 and the region sensor 22. Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the modification example of the seventh embodiment, the same advantages as those of the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the seventh embodiment can be obtained.
[ eighth embodiment ]
The defect inspection system and the defect inspection method according to the eighth embodiment of the present invention are the defect inspection system 10A and the defect inspection method for performing the defect inspection of the film 110 having the polarization characteristics.
A defect inspection system 10A according to an eighth embodiment of the present invention is different from the seventh embodiment in that the defect inspection system 10 shown in fig. 22 replaces the defect inspection imaging device20, a defect inspection imaging device 20A is provided. The defect inspection imaging device 20A shown in fig. 24 is different from the seventh embodiment in that the defect inspection imaging device 20 shown in fig. 23 replaces the first polarization filter for luminance adjustment (luminance adjustment mechanism) 251And is provided with an attenuation filter (brightness adjustment mechanism) 26. The defect inspection imaging device 20A differs from the seventh embodiment in that the defect inspection imaging device 20 includes the first polarization filter 231With different crossing angles of the polarization axes with respect to the polarization axis (polarization absorption axis) of the film 110.
First polarization filter 231A first non-orthogonal polarization state is formed with the first photographing region R1 of the film 110. For example, as described later, the first polarization filter 231The cross angle between the polarization axis of (b) and the polarization axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. In addition, the first polarization filter 231The first polarization filter 23 may be formed in a first non-orthogonal polarization state with respect to the first photographing region R1 of the film 1101The imaging device may be disposed between the first imaging region R1 and the area sensor 22 (see fig. 35).
The attenuation filter 26 is disposed between the light source 21 and the second photographing region R2. Thereby, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second photographing region R2. The attenuation filter 26 may be disposed between the second imaging region R2 and the area sensor 22 to reduce the luminance value of light passing through the second imaging region R2.
Next, a defect inspection method and a defect inspection imaging method according to an eighth embodiment of the present invention will be described.
First, the first polarization filter 23 is put in place1The first polarization filter is disposed between the light source 21 and the first imaging region R1 of the film 110 so as to be in a first non-orthogonal polarization state with respect to the film 110 (first polarization filter disposing step). The first polarization filter 23 may also be used1Is disposed between the first photographing region R1 and the region sensor 22. Next, the attenuation filter 26 is disposed between the light source 21 and the second photographing region R2. Thereby, the irradiation to the second stage can be reducedThe luminance value of the light in the image pickup region R2 (luminance adjustment step). The attenuation filter 26 may be disposed between the second photographing region R2 and the region sensor 22.
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the eighth embodiment, the same advantages as those of the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the seventh embodiment can be obtained.
[ first modification of eighth embodiment ]
In the eighth embodiment, the defect inspection imaging device 20A and the defect inspection imaging method in which the non-orthogonal polarization transmission method and the normal transmission method are combined are exemplified, but two or more different non-orthogonal polarization transmission methods and normal transmission methods may be combined. Hereinafter, as a first modification of the eighth embodiment, the defect inspection imaging device 20A and the defect inspection imaging method in which two different non-orthogonal polarization transmission methods and a normal transmission method are combined are exemplified.
The defect inspection imaging device 20A of the first modification shown in fig. 40 differs from the eighth embodiment in that the defect inspection imaging device 20A shown in fig. 24 further includes a second polarization filter 232。
Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.
Second polarization filter 232To interact with the first polarization filter 231The third photographing region R3 is disposed between the light source 21 and the film 110 so as to be adjacent to each other and form a second non-orthogonal polarization state with the film. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the angle of intersection of the polarization axis of the polarization filter in the second non-orthogonal polarization state with the polarization axis of the film and the polarization of the polarization filter in the first non-orthogonal polarization stateThe axes intersect the polarization axis of the film at different angles. Second polarization filter 232The second non-orthogonal polarization state may be arranged to the third photographing region R3, or may be arranged to the first polarization filter 231Independently arranged between the third photographing region R3 and the region sensor 22.
Next, a defect inspection method and a defect inspection imaging method according to a first modification of the eighth embodiment will be described.
First, as described above, the first polarization filter 23 is used1The first polarization filter is disposed between the light source 21 and the first imaging region R1 of the film 110 so as to be in a first non-orthogonal polarization state with respect to the film 110 (first polarization filter disposing step). Next, the second polarization filter 23 is applied2And a third polarization filter arrangement step of arranging the light source 21 and the third imaging region R3 of the film 110 so as to have a second non-orthogonal polarization state with respect to the film 110 (second polarization filter arrangement step). The second polarization filter 23 may also be used2With respect to the first polarization filter 231Independently arranged between the third photographing region R3 and the region sensor 22. Next, the above-described brightness adjustment step, conveyance step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the first modification example of the eighth embodiment, the same advantages as those of the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the seventh embodiment can be obtained.
[ second modification of eighth embodiment ]
In the eighth embodiment, the defect inspection imaging device 20A and the defect inspection imaging method in which the non-orthogonal polarization transmission method and the normal transmission method are combined are exemplified, but two or more different non-orthogonal polarization transmission methods may be combined. Hereinafter, as a second modification of the eighth embodiment, the defect inspection imaging device 20A and the defect inspection imaging method, which are a combination of two different non-orthogonal polarization transmission methods, are exemplified.
The defect inspection imaging device 20A of the second modification differs from the eighth embodiment in that a first brightness adjustment polarization filter (brightness adjustment means) 25 is provided in place of an attenuation filter (brightness adjustment means) 26 in the defect inspection imaging device 20A shown in fig. 241。
First polarization filter for luminance adjustment (luminance adjustment mechanism) 251And is disposed between the light source 21 and the second photographing region R2 so as to form a second non-orthogonal polarization state with the film 110. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the intersection angle of the polarization axis of the polarization filter in the second non-orthogonal polarization state with the polarization axis of the film and the intersection angle of the polarization axis of the polarization filter in the first non-orthogonal polarization state with the polarization axis of the film are different. Thus, the first polarization filter 25 for luminance adjustment1The luminance value of the light irradiated to the second photographing region R2 can be reduced.
First brightness adjustment polarizing filter 251The first polarization filter 25 for brightness adjustment may be in a second non-orthogonal polarization state with the film 1101The light intensity value of the light passing through the second imaging region R2 may be adjusted by being disposed between the second imaging region R2 and the region sensor 22.
Next, a defect inspection method and a defect inspection imaging method according to a second modification of the eighth embodiment will be described.
First, as described above, the first polarization filter 23 is used1The first polarization filter is disposed between the light source 21 and the first imaging region R1 of the film 110 so as to be in a first non-orthogonal polarization state with respect to the film 110 (first polarization filter disposing step). Next, the first polarization filter for luminance adjustment 25 is set1Arranged between the light source 21 and the first polarization filter 23 so as to form a second non-orthogonal polarization state with the film 1101And between the light source 21 and the second photographing region R2. This can reduce the luminance value of the light irradiated to the second imaging region R2 (luminance adjustment step). The first brightness adjusting polarization filter 25 may be used1Is arranged in the second shooting region R2 and the region sensor22, the luminance value of the light passing through the second photographing region R2 is adjusted. Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the second modification example of the eighth embodiment, the same advantages as those of the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the seventh embodiment can be obtained.
[ ninth embodiment ]
The defect inspection system and the defect inspection method according to the ninth embodiment of the present invention are the defect inspection system 10B and the defect inspection method for performing the defect inspection of the film 110 having the polarization characteristics.
A defect inspection system 10B according to a ninth embodiment of the present invention is different from the seventh embodiment in that a defect inspection imaging device 20B is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in fig. 22. The defect inspection imaging device 20B shown in fig. 25 differs from the seventh embodiment in that the defect inspection imaging device 20 shown in fig. 23 replaces the light source 21 and the first polarization filter for luminance adjustment (luminance adjustment mechanism) 251And includes a light source 21A. The defect inspection imaging device 20B is different from the seventh embodiment in that the first polarization filter 23 is provided in the defect inspection imaging device 201With different crossing angles of the polarization axes with respect to the polarization axis (polarization absorption axis) of the film 110.
First polarization filter 231A first non-orthogonal polarization state is formed with the first photographing region R1 of the film 110. For example, as described later, the first polarization filter 231The cross angle between the polarization axis of (b) and the polarization axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. First polarization filter 231The first polarization filter 23 may be formed in a first non-orthogonal polarization state with respect to the first photographing region R1 of the film 1101Also can be used forThe light source 21A is disposed between the first imaging region R1 (see fig. 25), or between the first imaging region R1 and the area sensor 22 (see fig. 36).
The light source 21A has a luminance adjusting function of individually adjusting the luminance value of light irradiated to the first photographing region R1 and the luminance value of light irradiated to the second photographing region R2. This makes it possible to increase the luminance value of the light irradiated to the first imaging region R1 and decrease the luminance value of the light irradiated to the second imaging region R2.
Next, a defect inspection method and a defect inspection imaging method according to a ninth embodiment of the present invention will be described.
First, the first polarization filter 23 is put in place1The first polarization filter is disposed between the light source 21 and the first imaging region R1 of the film 110 so as to be in a first non-orthogonal polarization state with respect to the film 110 (first polarization filter disposing step). The first polarization filter 23 may also be used1Is disposed between the first photographing region R1 and the region sensor 22. Next, the luminance value of light irradiated to the first photographing region R1 and the luminance value of light irradiated to the second photographing region R2 are individually adjusted by the light source 21A. This makes it possible to increase the luminance value of the light irradiated to the first imaging region R1 and decrease the luminance value of the light irradiated to the second imaging region R2 (luminance adjustment step).
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the image pickup device 20B for defect inspection, the image pickup method for defect inspection, the defect inspection system 10B, and the defect inspection method of the ninth embodiment, the same advantages as those of the image pickup device 20 for defect inspection, the image pickup method for defect inspection, the defect inspection system 10, and the defect inspection method of the seventh embodiment can be obtained.
[ modified example of the ninth embodiment ]
In the ninth embodiment, the defect inspection imaging device 20B and the defect inspection imaging method in which the non-orthogonal polarization transmission method and the normal transmission method are combined are exemplified, but two or more different non-orthogonal polarization transmission methods and normal transmission methods may be combined. Hereinafter, as a modification of the ninth embodiment, the defect inspection imaging device 20B and the defect inspection imaging method in which two different non-orthogonal polarization transmission methods and a normal transmission method are combined are exemplified.
The defect inspection imaging device 20B shown in fig. 41 differs from the ninth embodiment in that the defect inspection imaging device 20B shown in fig. 25 further includes a second polarization filter 232。
Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.
Second polarization filter 232To interact with the first polarization filter 231The third photographing region R3 is disposed between the light source 21 and the film 110 so as to be adjacent to each other and form a second non-orthogonal polarization state with the film. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the intersection angle of the polarization axis of the polarization filter in the second non-orthogonal polarization state with the polarization axis of the film and the intersection angle of the polarization axis of the polarization filter in the first non-orthogonal polarization state with the polarization axis of the film are different. Second polarization filter 232A second polarization filter 23 having a second non-orthogonal polarization state with the film 1102It may be disposed between the third photographing region R3 and the region sensor 22.
Next, a defect inspection method and a defect inspection imaging method according to a modification of the ninth embodiment will be described.
First, as described above, the first polarization filter 23 is used1The first polarization filter is disposed between the light source 21 and the first imaging region R1 of the film 110 so as to be in a first non-orthogonal polarization state with respect to the film 110 (first polarization filter disposing step). Next, the second polarization filter 23 is applied2And a third polarization filter arrangement step of arranging the light source 21 and the third imaging region R3 of the film 110 so as to have a second non-orthogonal polarization state with respect to the film 110 (second polarization filter arrangement step). The second polarization filter 23 may also be used2Is arranged between the third photographing region R3 and the region sensor 22. Next, the above-mentioned brightness adjustment is performedThe method comprises the steps of a process, a conveying process, a light irradiation process, an imaging process, a defect detection process and a marking process.
According to the defect inspection imaging device 20B, the defect inspection imaging method, the defect inspection system 10B, and the defect inspection method of the modification example of the ninth embodiment, the same advantages as those of the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the seventh embodiment can be obtained.
[ tenth embodiment ]
A defect inspection system and a defect inspection method according to a tenth embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the retardation film, the battery separator, and the like having no polarization characteristic. The defect inspection system and the defect inspection method according to the tenth embodiment can be applied to a manufacturing apparatus and a manufacturing method of a retardation film, a battery separator, or the like having no polarization characteristics. In the manufacturing apparatus and manufacturing method of the retardation film, the battery separator, and the like having no polarization characteristics, the contents other than the defect inspection system and the defect inspection method described in the tenth embodiment are known, and therefore, as described above, the description thereof is omitted. In other embodiments and modifications relating to a defect inspection system and a defect inspection method for inspecting defects of a retardation film, a battery separator, and the like having no polarization characteristics, explanations of a manufacturing apparatus and a manufacturing method for a retardation film, a battery separator, and the like having no polarization characteristics are omitted from the same viewpoint. In the description of the tenth embodiment and its modified examples, the film 110 is a film having no polarization characteristics.
A defect inspection system 10C according to a tenth embodiment of the present invention is different from the seventh embodiment in that a defect inspection imaging device 20C is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in fig. 22. The defect inspection imaging device 20C shown in fig. 26 is different from the seventh embodiment in that the defect inspection imaging device 20 shown in fig. 23 replaces the first polarization filterWave filter 231And a pair of first polarization filters 231、241In the first brightness adjusting polarization filter 251And a first polarization filter 25 for brightness adjustment1Paired first polarization filters 25 for luminance adjustment3。
First polarization filter 231As in the seventh embodiment, the light source 21 is disposed between the film 110. Specifically, the first polarization filter 231Is disposed between the light source 21 and the first photographing region R1 of the photographing region R. In the present embodiment, the first polarization filter 231The half of the imaging region R in the conveyance direction Y is blocked when viewed from the region sensor 22.
On the other hand, the first polarization filter 241Is disposed between the membrane 110 and the area sensor 22. In particular, the first polarization filter 241Is disposed between the first photographing region R1 of the photographing region R and the region sensor 22. In the present embodiment, the first polarization filter 241The half of the imaging region R in the conveyance direction Y is blocked when viewed from the region sensor 22.
In addition, a pair of first polarization filters 25 for brightness adjustment1、253The first polarization filter for luminance adjustment 25 in (1)1As in the seventh embodiment, the light source 21 is disposed between the film 110. On the other hand, the first polarization filter for luminance adjustment 253Is disposed between the membrane 110 and the area sensor 22. Specifically, the first polarization filter for luminance adjustment 253Is disposed between the second photographing region R2 of the photographing region R and the region sensor 22. In the tenth embodiment, the first polarization filter for luminance adjustment 253The half of the imaging region R in the conveyance direction Y (the portion on the second imaging region R2 side in the example of fig. 26) is arranged to be blocked when viewed from the region sensor 22.
In addition, the first polarization filter 231And a first polarization filter 241Forming orthogonal polarization states. On the other hand, the first polarization filter for luminance adjustment 251For the first brightness adjustmentPolarization filter 253A first non-orthogonal polarization state is formed. For example, the first polarization filter 25 for brightness adjustment1And the first polarization filter 25 for luminance adjustment3The cross angle of the polarization axis of (b) is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. Thus, the orthogonal polarization transmission inspection image can be captured in the first imaging region R1, the non-orthogonal polarization transmission inspection image can be captured in the second imaging region R2, and the transmission scattering inspection image can be captured in the intermediate imaging region R0.
Next, a defect inspection method and a defect inspection imaging method according to a tenth embodiment of the present invention will be described.
First, the first polarization filter 23 is put in place1A first polarization filter 24 arranged between the light source 21 and the first photographing region R1 of the film 1101Is disposed between the first photographing region R1 of the film 110 and the area sensor 22. At this time, the first polarization filter 23 is set1And a first polarization filter 241Is arranged to form orthogonal polarization states (first polarization filter arranging process).
Next, the first polarization filter for luminance adjustment 25 is set1Is arranged between the light source 21 and the first polarization filter 231And between the light source 21 and the second imaging region R2, the first luminance adjusting polarization filter 253Is disposed between the second photographing region R2 of the film 110 and the area sensor 22. At this time, the first polarization filter for luminance adjustment 251And a first brightness adjusting polarization filter 253Configured to form a first non-orthogonal polarization state. This can reduce the luminance value of the light that is observed by the area sensor 22 through the second imaging area R2 (luminance adjustment step). The first brightness adjusting polarization filter 25 may be used1Is disposed only between the light source 21 and the second photographing region R2.
In addition, the first polarization filter for luminance adjustment 25 may be replaced3So that the first polarization filter 241Extended to the second photographing region R2, in which case the first polarization filter for brightness adjustment 25 is used1Is configured to be offset from the firstVibration filter 241A first non-orthogonal polarization state may be formed.
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20C and the defect inspection imaging method according to the tenth embodiment, the pair of first polarization filters 23 are used1、241The light source (light irradiation means) 21 and the first imaging region R1 and the first imaging region R1 and the area sensor (imaging means) 22 are arranged so as to form orthogonal polarization states, and the area sensor (imaging means) 22 images the imaging region R including the first imaging region R1, the second imaging region R2, and the intermediate imaging region R0 as a two-dimensional image, so that it is possible to simultaneously image an orthogonal polarization transmission inspection image of the first imaging region R1, a non-orthogonal polarization (first non-orthogonal polarization) transmission inspection image of the second imaging region R2, and a transmission scattering inspection image of the intermediate imaging region R0. That is, the orthogonal polarization transmission inspection imaging series, the non-orthogonal polarization (first non-orthogonal polarization) transmission inspection imaging series, and the transmission scattering inspection imaging series can be integrated.
As a result, according to the defect inspection system 10C and the defect inspection method of the tenth embodiment, the orthogonal polarization transmission inspection series, the non-orthogonal polarization transmission inspection series, and the transmission scattering inspection series can be integrated.
Therefore, according to the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the tenth embodiment, the number of inspection lines can be reduced.
In addition, according to the defect inspection imaging device 20C and the defect inspection imaging method of the tenth embodiment, the pair of first polarization filters (luminance adjusting mechanisms) 25 for luminance adjustment can be used1、253The brightness value of the light observed by the area sensor 22 through the second photographing area R2 is adjusted. Therefore, for example, by outputting light having a large luminance value from the light source (light irradiation means) 21, the direction can be made to be orthogonal polarizationThe first imaging region R1 of the imaging series for the transmission inspection has a large luminance value of the light irradiated thereto, and a pair of first polarization filters (luminance adjusting mechanisms) 25 for luminance adjustment can be used1、253The brightness value of light observed by the area sensor through the second imaging region R2 for performing the imaging series for non-orthogonal polarization transmission inspection is made small.
In addition, according to the defect inspection imaging device 20C and the defect inspection imaging method of the tenth embodiment, the pair of first polarization filters (luminance adjusting mechanisms) 25 for luminance adjustment are provided1、 253The first non-orthogonal polarization state is formed, and thus detection of a black foreign substance and a weak bright point can be improved.
[ modified example of the tenth embodiment ]
In the tenth embodiment, the defect inspection imaging device 20 and the defect inspection imaging method in which the orthogonal polarization transmission method and the non-orthogonal polarization transmission method are combined are exemplified, but the orthogonal polarization transmission method may be combined with two or more different non-orthogonal polarization transmission methods. Hereinafter, as a modification of the tenth embodiment, the defect inspection imaging device 20C and the defect inspection imaging method in which the orthogonal polarization transmission method and two different non-orthogonal polarization transmission methods are combined are exemplified.
The defect inspection imaging device 20C of the modification shown in fig. 42 differs from the tenth embodiment in that the defect inspection imaging device 20C shown in fig. 26 further includes a pair of second polarization filters (luminance adjusting mechanisms) 25 for luminance adjustment2、254。
Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the second imaging region R2.
Second polarization filter for luminance adjustment (luminance adjusting mechanism) 252To match the first brightness adjusting polarization filter 251A second polarization filter 25 for adjusting brightness, disposed between the light source 21 and the third photographing region R34To match the first brightness adjusting polarization filter 253The third photographing region R3 and the region sensor 22 are disposed adjacent to each other. A pair of second polarization filters (luminance adjusting means) 25 for luminance adjustment2、254Configured to form a second non-orthogonal polarization state. Here, a pair of second polarization filters (luminance adjusting means) 25 for luminance adjustment2、 254The second non-orthogonal polarization state is formed to be different from the first non-orthogonal polarization state. That is, the second polarization filter for luminance adjustment 25 is configured such that the angle of intersection of the polarization axes of the polarization filters in the second non-orthogonal polarization state is different from the angle of intersection of the polarization axes of the polarization filters in the first non-orthogonal polarization state2、254The luminance value of the light transmitted through the third imaging region R3 and observed by the area sensor 22 can be reduced.
Next, a defect inspection method and a defect inspection imaging method according to a modification of the tenth embodiment will be described.
First, the first polarization filter arrangement step is performed. Next, the first polarization filter for luminance adjustment 25 is set as described above1Is arranged between the light source 21 and the first polarization filter 231And between the light source 21 and the second photographing region R2, and the first polarization filter for luminance adjustment 253Is disposed between the second photographing region R2 of the film 110 and the area sensor 22. At this time, the first polarization filter for luminance adjustment 251、253Configured to form a first non-orthogonal polarization state. Next, the second polarization filter for luminance adjustment 252A second luminance adjusting polarization filter 25 disposed between the light source 21 and the third photographing region R34Is disposed between the third photographing region R3 of the film 110 and the area sensor 22. At this time, the second polarization filter for luminance adjustment 252、254Configured to form a second non-orthogonal polarization state. This can reduce the brightness value of the light that is observed by the area sensor 22 through the second imaging area R2 and the third imaging area R3 (brightness adjustment step). The first brightness adjusting polarization filter 25 may be used1Is disposed only between the light source 21 and the second photographing region R2.
In addition, the first polarization filter for luminance adjustment 25 may be replaced3Make the first polarization filter 241Extended to the second photographing region R2, in which case the first polarization filter for brightness adjustment 25 is used1Is arranged to interact with the first polarisation filter 241A first non-orthogonal polarization state may be formed. Alternatively, the second polarization filter for luminance adjustment 25 may be replaced4The first brightness adjusting polarization filter 253In this case, the second luminance adjusting polarization filter 25 is extended to the third photographing region R32A polarization filter 25 for adjusting brightness relative to the first brightness3A second non-orthogonal polarization state may be formed.
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the modification example of the tenth embodiment, the same advantages as those of the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the tenth embodiment can be obtained.
[ eleventh embodiment ]
A defect inspection system and a defect inspection method according to an eleventh embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the retardation film, the battery separator, and the like having no polarization characteristic. In the description of the eleventh embodiment and its modified examples, the film 110 is a film having no polarization characteristics.
A defect inspection system 10D according to an eleventh embodiment of the present invention is different from the tenth embodiment in that a defect inspection imaging device 20D is provided in place of the defect inspection imaging device 20C in the defect inspection system 10C shown in fig. 22. The defect inspection imaging device 20D shown in fig. 27 differs from the tenth embodiment in that the defect inspection imaging device 20C shown in fig. 26 replaces the first polarization filter for brightness adjustmentWave filter (brightness adjusting mechanism) 251And is provided with an attenuation filter (brightness adjustment mechanism) 26. The defect inspection imaging device 20D is different from the tenth embodiment in that the defect inspection imaging device 20C includes a pair of first polarization filters 231、241The cross angle of the polarization axis (polarization absorption axis) of (b) is different.
First polarization filter 231And a first polarization filter 241A first non-orthogonal polarization state is formed. For example, the first polarization filter 231And the first polarization filter 241The cross angle of the polarization axis of (b) is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less.
The attenuation filter 26 is disposed between the light source 21 and the second photographing region R2. Thereby, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second photographing region R2.
Next, a defect inspection method and a defect inspection imaging method according to an eleventh embodiment of the present invention will be described.
First, the first polarization filter 23 is put in place1A first polarization filter 24 arranged between the light source 21 and the first photographing region R1 of the film 1101Is disposed between the first photographing region R1 of the film 110 and the area sensor 22. At this time, the first polarization filter 23 is set1And a first polarization filter 241Is configured to form a first non-orthogonal polarization state (first polarization filter configuration process). Next, the attenuation filter 26 is disposed between the light source 21 and the second photographing region R2. This can reduce the luminance value of the light irradiated to the second imaging region R2 (luminance adjustment step). The attenuation filter 26 may be disposed between the second imaging region R2 of the film 110 and the area sensor 22 to reduce the luminance value of light passing through the second imaging region R2.
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20D, the defect inspection imaging method, the defect inspection system 10D, and the defect inspection method of the eleventh embodiment, the same advantages as those of the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the tenth embodiment can be obtained.
[ first modification of the eleventh embodiment ]
In the eleventh embodiment, the defect inspection imaging device 20D and the defect inspection imaging method in which the non-orthogonal polarization transmission method and the normal transmission method are combined are exemplified, but two or more different non-orthogonal polarization transmission methods and the normal transmission method may be combined. Hereinafter, as a first modification of the eleventh embodiment, the defect inspection imaging device 20D and the defect inspection imaging method in which two different non-orthogonal polarization transmission methods and a normal transmission method are combined are exemplified.
The defect inspection imaging device 20D of the first modification shown in fig. 43 differs from the eleventh embodiment in that the defect inspection imaging device 20D shown in fig. 27 further includes a pair of second polarization filters 232、242。
Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.
Second polarization filter 232To interact with the first polarization filter 231A second polarization filter 24 disposed between the light source 21 and the third photographing region R32To interact with the first polarization filter 241The third photographing region R3 and the region sensor 22 are disposed adjacent to each other. A pair of second polarization filters 232、242Forming a second non-orthogonal polarization state. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the crossing angle of the polarization axes of the polarization filters in the second non-orthogonal polarization state is different from the crossing angle of the polarization axes of the polarization filters in the first non-orthogonal polarization state.
Next, a defect inspection method and a defect inspection imaging method according to a first modification of the eleventh embodiment will be described.
First, as described above, the first polarization filter 23 is used1A first polarization filter 24 arranged between the light source 21 and the first photographing region R1 of the film 1101Is disposed between the first photographing region R1 of the film 110 and the area sensor 22. At this time, the first polarization filter 23 is set1And a first polarization filter 241Is configured to form a first non-orthogonal polarization state (first polarization filter configuration process). Next, the second polarization filter 23 is applied2A second polarization filter 24 disposed between the light source 21 and the third photographing region R3 of the film 1102Is disposed between the third photographing region R3 of the film 110 and the area sensor 22. At this time, the second polarization filter 23 is set2And a second polarization filter 242Is configured to form a second non-orthogonal polarization state (second polarization filter configuration process). Next, the above-described brightness adjustment step, conveyance step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20D, the defect inspection imaging method, the defect inspection system 10D, and the defect inspection method of the first modification example of the eleventh embodiment, the same advantages as those of the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the tenth embodiment can be obtained.
[ second modification of the eleventh embodiment ]
In the eleventh embodiment, the defect inspection imaging device 20D and the defect inspection imaging method in which the non-orthogonal polarization transmission method and the normal transmission method are combined are exemplified, but two or more different non-orthogonal polarization transmission methods may be combined. Hereinafter, as a second modification of the eleventh embodiment, the defect inspection imaging device 20D and the defect inspection imaging method in which two different non-orthogonal polarization transmission methods are combined are exemplified.
The defect inspection imaging device 20D of the second modification differs from the eleventh embodiment in that the defect inspection imaging device 20D shown in fig. 27 includes a pair of first lights in place of the attenuation filter (brightness adjustment mechanism) 26Polarization filter (brightness adjusting mechanism) 25 for degree adjustment1、253。
First polarization filter for luminance adjustment (luminance adjustment mechanism) 251A first brightness adjusting polarization filter 25 arranged between the light source 21 and the second photographing region R23Is disposed between the second photographing region R2 of the film 110 and the area sensor 22. At this time, the pair of first polarization filters 25 for luminance adjustment1、253Configured to form a second non-orthogonal polarization state. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the angle of intersection of the polarization axes of the polarization filters in the second non-orthogonal polarization state and the angle of intersection of the polarization axes of the polarization filters in the first non-orthogonal polarization state. Thereby, the pair of first polarization filters 25 for luminance adjustment1、253The luminance value of the light transmitted through the second photographing region R2 can be reduced.
Next, a defect inspection method and a defect inspection imaging method according to a second modification of the eleventh embodiment will be described.
First, as described above, the first polarization filter 23 is used1A first polarization filter 24 arranged between the light source 21 and the first photographing region R1 of the film 1101Is disposed between the first photographing region R1 of the film 110 and the area sensor 22. At this time, the first polarization filter 23 is set1And a first polarization filter 241Is configured to form a first non-orthogonal polarization state (first polarization filter configuration process). Next, the first polarization filter for luminance adjustment 25 is set1A first brightness adjusting polarization filter 25 arranged between the light source 21 and the second imaging region R23Is disposed between the second photographing region R2 of the film 110 and the area sensor 22. At this time, a pair of first polarization filters 25 for brightness adjustment are provided1、253Configured to form a second non-orthogonal polarization state. This can reduce the luminance value of the light passing through the second imaging region R2 (luminance adjustment step). Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20D, the defect inspection imaging method, the defect inspection system 10D, and the defect inspection method of the second modification example of the eleventh embodiment, the same advantages as those of the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the tenth embodiment can be obtained.
[ twelfth embodiment ]
A defect inspection system and a defect inspection method according to a twelfth embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the retardation film, the battery separator, and the like having no polarization characteristic. In the description of the twelfth embodiment and its modified examples, the film 110 is a film having no polarization characteristics.
A defect inspection system 10E according to a twelfth embodiment of the present invention is different from the tenth embodiment in that a defect inspection imaging device 20E is provided in place of the defect inspection imaging device 20C in the defect inspection system 10C shown in fig. 22. The defect inspection imaging device 20E shown in fig. 28 differs from the tenth embodiment in that the defect inspection imaging device 20C shown in fig. 26 replaces the light source 21 and the first polarization filter for luminance adjustment (luminance adjustment mechanism) 251And includes a light source 21A. The defect inspection imaging device 20E differs from the tenth embodiment in that the defect inspection imaging device 20C includes a pair of first polarization filters 231、241The cross angle of the polarization axis (polarization absorption axis) of (b) is different.
First polarization filter 231And a first polarization filter 241A first non-orthogonal polarization state is formed. For example, the first polarization filter 231And the first polarization filter 241The cross angle of the polarization axis of (b) is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less.
The light source 21A has a luminance adjusting function of individually adjusting the luminance value of light irradiated to the first photographing region R1 and the luminance value of light irradiated to the second photographing region R2. This makes it possible to increase the luminance value of the light irradiated to the first imaging region R1 and decrease the luminance value of the light irradiated to the second imaging region R2.
Next, a defect inspection method and a defect inspection imaging method according to a twelfth embodiment of the present invention will be described.
First, the first polarization filter 23 is put in place1A first polarization filter 24 arranged between the light source 21 and the first photographing region R1 of the film 1101Is disposed between the first photographing region R1 of the film 110 and the area sensor 22. At this time, the first polarization filter 23 is set1And a first polarization filter 241Is configured to form a first non-orthogonal polarization state (first polarization filter configuration process). Next, the luminance value of light irradiated to the first photographing region R1 and the luminance value of light irradiated to the second photographing region R2 are individually adjusted by the light source 21A. This makes it possible to increase the luminance value of the light irradiated to the first imaging region R1 and decrease the luminance value of the light irradiated to the second imaging region R2 (luminance adjustment step).
Next, the above-described carrying step, light irradiation step, imaging step, defect detection step, and marking step are performed.
According to the defect inspection imaging device 20E, the defect inspection imaging method, the defect inspection system 10E, and the defect inspection method of the twelfth embodiment, the same advantages as those of the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the tenth embodiment can be obtained.
[ modified example of the twelfth embodiment ]
In the twelfth embodiment, the defect inspection imaging device 20E and the defect inspection imaging method in which the non-orthogonal polarization transmission method and the normal transmission method are combined are exemplified, but two or more different non-orthogonal polarization transmission methods and normal transmission methods may be combined. Hereinafter, as a modification of the twelfth embodiment, the defect inspection imaging device 20E and the defect inspection imaging method in which two different non-orthogonal polarization transmission methods and the normal transmission method are combined are exemplified.
The defect inspection imaging device 20E shown in fig. 44 differs from the twelfth embodiment in that the defect inspection imaging device 20E shown in fig. 28 further includes a pair of second polarization filters 232、242。
Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.
Second polarization filter 232To interact with the first polarization filter 231A second polarization filter 24 disposed between the light source 21 and the third photographing region R32To interact with the first polarization filter 241The third photographing region R3 and the region sensor 22 are disposed adjacent to each other. A pair of second polarization filters 232、242Forming a second non-orthogonal polarization state. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the angle of intersection of the polarization axes of the polarization filters in the second non-orthogonal polarization state and the angle of intersection of the polarization axes of the polarization filters in the first non-orthogonal polarization state.
Next, a defect inspection method and a defect inspection imaging method according to a modification of the twelfth embodiment will be described.
First, as described above, the first polarization filter 23 is used1A first polarization filter 24 arranged between the light source 21 and the first photographing region R1 of the film 1101Is disposed between the first photographing region R1 of the film 110 and the area sensor 22. At this time, the first polarization filter 23 is set1And a first polarization filter 241Is configured to form a first non-orthogonal polarization state (first polarization filter configuration process). Next, the second polarization filter 23 is applied2A second polarization filter 24 disposed between the light source 21 and the third photographing region R3 of the film 1102Is disposed between the third photographing region R3 of the film 110 and the area sensor 22. At this time, the second polarization filter 23 is set2And a second polarization filter 242Is configured to form a second non-orthogonal polarization state (second polarization filter configuration process). Next, proceed toThe brightness adjusting step, the carrying step, the light irradiating step, the photographing step, the defect detecting step, and the marking step.
According to the defect inspection imaging device 20E, the defect inspection imaging method, the defect inspection system 10E, and the defect inspection method of the modification example of the twelfth embodiment, the same advantages as those of the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the tenth embodiment can be obtained.
The present invention is not limited to the above-described embodiment, and various modifications may be made. For example, although the imaging devices 20, 20A, and 20B for defect inspection and the imaging method for defect inspection using the transmission method are exemplified in the seventh, eighth, and ninth embodiments, the features of the present invention can also be applied to the imaging devices 20, 20A, and 20B for defect inspection and the imaging method for defect inspection using the reflection method as shown in fig. 29, 30, and 31.
In addition, although the defect inspection imaging device 20 and the defect inspection imaging method in which the orthogonal polarization reflection method and the non-orthogonal polarization reflection method are combined are illustrated in fig. 29, the orthogonal polarization reflection method may be combined with two or more different non-orthogonal polarization reflection methods as in fig. 39. In addition, although the defect inspection imaging device 20A and the defect inspection imaging method in which the non-orthogonal polarization reflection method and the regular reflection method are combined are illustrated in fig. 30, two or more different non-orthogonal polarization reflection methods and the regular reflection method may be combined, or two or more different non-orthogonal polarization reflection methods may be combined, as in fig. 40. In addition, although the defect inspection imaging device 20B and the defect inspection imaging method in which the non-orthogonal polarization reflection method and the regular reflection method are combined are illustrated in fig. 31, two or more different non-orthogonal polarization reflection methods and regular reflection methods may be combined as in fig. 41.
According to the defect inspection imaging devices 20, 20A, and 20B and the defect inspection imaging method shown in fig. 29, 30, and 31, for example, the first polarization filter 231To form orthogonal polarization with the film 110The area sensor (imaging means) 22 is disposed between the light source (light irradiation means) 21 and the first imaging area R1, and images the imaging area R including the first imaging area R1, the second imaging area R2, and the intermediate imaging area R0 as a two-dimensional image, and therefore can simultaneously image an orthogonal polarization reflective inspection image of the first imaging area R1, a regular reflective (or non-orthogonal polarization emissive) inspection image of the second imaging area R2, and a reflective scattering inspection image of the intermediate imaging area R0. That is, the orthogonal polarization reflection inspection imaging series, the non-orthogonal polarization reflection inspection imaging series (see fig. 29), the specular reflection inspection imaging series (see fig. 30 and 31), and the reflection scattering inspection imaging series can be integrated. As a result, in the defect inspection systems 10, 10A, and 10B and the defect inspection method, the orthogonal polarization reflection inspection series, the non-orthogonal polarization reflection inspection series, the regular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced.
However, the orthogonal polarization reflection inspection imaging series differs from, for example, the regular reflection inspection imaging series in the luminance value of appropriate light. More specifically, the luminance value of the light suitable for the orthogonal polarization reflection inspection imaging series is large, and the luminance value of the light suitable for the specular reflection inspection imaging series is small, for example.
In this regard, according to the defect inspection imaging devices 20, 20A, and 20B and the defect inspection imaging method shown in fig. 29, 30, and 31, the polarization filter (brightness adjustment mechanism) 25 can be used1The attenuation filter (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A adjust the brightness value of the light irradiated to the second imaging region R2. Therefore, for example, by outputting light having a large luminance value from the light source (light irradiation means) 21 and the light source (luminance adjustment means) 21A, the luminance value of light irradiated to the first imaging region R1 for performing the imaging series for cross polarization reflective inspection can be made large, while the polarization filter (luminance adjustment means) 25 can be used1An attenuation filter (brightness adjusting mechanism) 26 and a light source (brightness adjusting mechanism) 21A, the directions of which are used for non-orthogonal polarizationThe second imaging region R2 in the imaging series for reflection inspection (see fig. 29) or the imaging series for specular reflection inspection (see fig. 30 and 31) has a small luminance value of the light to be irradiated.
Similarly, in the tenth, eleventh, and twelfth embodiments, the defect inspection imaging devices 20C, 20D, and 20E and the defect inspection imaging method using the transmission method are exemplified, but the features of the present invention can also be applied to the defect inspection imaging devices 20C, 20D, and 20E and the defect inspection imaging method using the reflection method as shown in fig. 32, 33, and 34.
In addition, although the defect inspection imaging device 20C and the defect inspection imaging method in which the orthogonal polarization reflection method and the non-orthogonal polarization reflection method are combined are illustrated in fig. 32, the orthogonal polarization reflection method may be combined with two or more different non-orthogonal polarization reflection methods as in fig. 42. In this case, the second polarization filter for luminance adjustment (luminance adjustment mechanism) 25 is provided for the third photographing region R3 illustrated in fig. 422To match the first brightness adjusting polarization filter 251Disposed adjacent to each other between the light source 21 and the third photographing region R3, and connected to the second polarization filter for luminance adjustment (luminance adjustment mechanism) 252Paired second polarization filters 25 for luminance adjustment4To match the first brightness adjusting polarization filter 253The adjacent arrangement may be provided between the third imaging region R3 and the region sensor 22.
In addition, although the defect inspection imaging device 20D and the defect inspection imaging method in which the non-orthogonal polarization reflection method and the regular reflection method are combined are illustrated in fig. 33, two or more different non-orthogonal polarization reflection methods and the regular reflection method may be combined, or two or more different non-orthogonal polarization reflection methods may be combined, as in fig. 43. In this case, the second polarization filter 23 may be used as described in the first modification of the eleventh embodiment with respect to the third imaging region R3 illustrated in fig. 432To interact with the first polarization filter 231Is disposed adjacent to the second polarization filter 23 between the light source 21 and the third photographing region R32A pair of second polarization filters 242To interact with the first polarization filter 241Disposed adjacent to each other between the third imaging region R3 and the region sensor 22, a pair of first polarization filters (brightness adjustment mechanisms) 25 for brightness adjustment may be provided instead of the attenuation filters (brightness adjustment mechanisms) 26 as described in the second modification of the eleventh embodiment1、253Configured to form a second non-orthogonal polarization state. A pair of first polarization filters (brightness adjusting mechanisms) 25 for brightness adjustment are used1、253In the case of (1), the first polarization filter for luminance adjustment (luminance adjusting mechanism) 25 is used1A first brightness adjusting polarization filter 25 arranged between the light source 21 and the second imaging region R23It is sufficient that the film 110 is disposed between the second imaging region R2 and the area sensor 22.
In addition, although the defect inspection imaging device 20E and the defect inspection imaging method in which the non-orthogonal polarization reflection method and the regular reflection method are combined are illustrated in fig. 34, two or more different non-orthogonal polarization reflection methods and regular reflection methods may be combined as in fig. 44. In this case, the second polarization filter 23 is provided for the third photographing region R3 illustrated in fig. 442To interact with the first polarization filter 231Is disposed adjacent to the second polarization filter 23 between the light source 21 and the third photographing region R32A pair of second polarization filters 242To interact with the first polarization filter 241The third imaging region R3 and the region sensor 22 may be arranged adjacent to each other.
According to the defect inspection imaging devices 20C, 20D, and 20E and the defect inspection imaging method shown in fig. 32, 33, and 34, for example, the pair of first polarization filters 23 are used1、241Are arranged between the light source (light irradiation means) 21 and the first imaging region R1 and between the first imaging region R1 and the area sensor (imaging means) 22 so as to form orthogonal polarization states, respectively, the area sensor (imaging means) 22 images an imaging region R including the first imaging region R1, the second imaging region R2, and the intermediate imaging region R0 as a two-dimensional image,therefore, it is possible to simultaneously capture an orthogonal polarization reflection inspection image of the first imaging region R1, a regular reflection (or non-orthogonal polarization emission) inspection image of the second imaging region R2, and a reflection scattering inspection image of the intermediate imaging region R0. That is, the orthogonal polarization reflection inspection imaging series, the non-orthogonal polarization reflection imaging series (see fig. 32), the specular reflection inspection imaging series (see fig. 33 and 34), and the reflection scattering inspection imaging series can be integrated. As a result, in the defect inspection systems 10C, 10D, and 10E and the defect inspection method, the orthogonal polarization reflection inspection series, the non-orthogonal polarization reflection inspection series, the regular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced.
Further, according to the defect inspection imaging devices 20C, 20D, and 20E and the defect inspection imaging method shown in fig. 32, 33, and 34, the pair of first polarization filters (luminance adjusting mechanisms) 25 for luminance adjustment can be used1、253The attenuation filter (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A adjust the brightness value of the light irradiated to the second imaging region R2. Therefore, for example, by outputting light having a large luminance value from the light source (light irradiation means) 21 and the light source (luminance adjustment means) 21A, the luminance value of light irradiated to the first imaging region R1 for performing the orthogonal polarization reflection inspection imaging series can be made large, while the pair of first luminance adjustment polarization filters (luminance adjustment means) 25 can be used1、253The attenuation filter (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A are configured to reduce the brightness value of the light irradiated toward the second imaging region R2 for performing the non-orthogonal polarization reflection imaging series (see fig. 32) or the regular reflection inspection imaging series (see fig. 33 and 34).
In the eighth and ninth embodiments and the embodiments shown in fig. 30 and 31, the first polarization filter 23 is exemplified1The first polarization filter 23 may be provided between the light source (light irradiation means) 21 and the first imaging region R1 of the film 110, as shown in fig. 35, 36, 37, and 381And is disposed between the first imaging region R1 of the film 110 and the area sensor (imaging means) 22.
In fig. 35, the defect inspection imaging device 20A and the defect inspection imaging method in which the non-orthogonal polarization transmission method and the normal transmission method are combined are illustrated, but two or more different non-orthogonal polarization transmission methods and the normal transmission method may be combined, or two or more different non-orthogonal polarization transmission methods may be combined, as in fig. 40. In addition, fig. 36 illustrates the defect inspection imaging device 20B and the defect inspection imaging method in which the non-orthogonal polarization transmission method and the normal transmission method are combined, and two or more different non-orthogonal polarization transmission methods and the normal transmission method may be combined as in fig. 41.
In addition, although the defect inspection imaging device 20A and the defect inspection imaging method in which the non-orthogonal polarization reflection method and the regular reflection method are combined are illustrated in fig. 37, two or more different non-orthogonal polarization reflection methods and the regular reflection method may be combined, or two or more different non-orthogonal polarization reflection methods may be combined, as in fig. 40. In addition, although the defect inspection imaging device 20B and the defect inspection imaging method in which the non-orthogonal polarization reflection method and the regular reflection method are combined are illustrated in fig. 38, two or more different non-orthogonal polarization reflection methods and regular reflection methods may be combined as in fig. 41.
In the above description, in the case where the luminance adjustment mechanism is separately provided from the light irradiation mechanism, the luminance adjustment mechanism is configured to adjust the luminance of the light irradiated to the second imaging region R2 or the light transmitted through or reflected by the second imaging region R2. However, in the embodiment in which the luminance adjustment mechanism is separately provided to the light irradiation mechanism, the luminance adjustment mechanism may be provided to adjust the luminance of the light irradiated to at least one of the first and second imaging regions R1 and R2, or the luminance of the light transmitted through at least one of the first and second imaging regions R1 and R2 or reflected by at least one of the first and second imaging regions R1 and R2. In the embodiment in which the brightness adjustment mechanism is provided in the light irradiation mechanism, the brightness adjustment mechanism may be provided separately from the brightness adjustment mechanism disposed in the light irradiation mechanism.

Claims (37)

1. An imaging device for defect inspection for inspecting a defect of a film having polarization characteristics,
the imaging device for defect inspection includes:
a light irradiation mechanism that irradiates light to an imaging region of the film;
an imaging mechanism that images the imaging area of the film as a two-dimensional image;
a first polarization filter disposed between the light irradiation means and the imaging region of the film or between the imaging region of the film and the imaging means so as to form an orthogonal polarization state or a first non-orthogonal polarization state with respect to the film; and
a conveying mechanism that conveys the film in a conveying direction relative to the light irradiation mechanism, the imaging mechanism, and the first polarization filter,
the imaging region includes a first imaging region and a second imaging region divided in the conveying direction, an intermediate imaging region is formed between the first imaging region and the second imaging region,
the imaging means is disposed at least one in a direction orthogonal to the conveying direction, i.e., in a width direction of the film,
the imaging range of each imaging means includes the first imaging region, the intermediate imaging region, and the second imaging region in the transport direction,
the first polarization filter is disposed between the light irradiation mechanism and the first imaging region, or between the first imaging region and the imaging mechanism.
2. The defect inspection camera according to claim 1,
the first polarization filter forms an orthogonal polarization state with the film.
3. The defect inspection camera according to claim 2,
the defect inspection imaging device further includes a luminance adjustment mechanism that adjusts a luminance value of light applied to at least one of the first imaging region and the second imaging region or light transmitted through or reflected by at least one of the first imaging region and the second imaging region.
4. The defect inspection camera according to claim 3,
the brightness adjustment mechanism adjusts the brightness value of light irradiated to the second imaging region or light transmitted through or reflected by the second imaging region.
5. The defect inspection camera according to claim 4,
the brightness adjustment means is an attenuation filter disposed between the light irradiation means and the second imaging region or between the second imaging region and the imaging means.
6. The defect inspection camera according to claim 3 or 4,
the brightness adjustment means is disposed in the light irradiation means, and individually adjusts a brightness value of the light irradiated to the first imaging region and a brightness value of the light irradiated to the second imaging region.
7. The defect inspection camera according to claim 1,
the first polarization filter is disposed between the light irradiation mechanism and the first photographing region.
8. The defect inspection camera according to claim 1,
the defect inspection imaging device further includes a luminance adjustment mechanism that adjusts a luminance value of light applied to at least one of the first imaging region and the second imaging region or light transmitted through or reflected by at least one of the first imaging region and the second imaging region.
9. The defect inspection camera according to claim 8,
the first polarization filter forms an orthogonal polarization state with the first photographing region of the film,
the brightness adjustment mechanism includes a first brightness adjustment polarization filter disposed between the light irradiation mechanism and the second imaging region or between the second imaging region and the imaging mechanism so as to form a first non-orthogonal polarization state with the second imaging region of the film.
10. The defect inspection camera according to claim 8,
the first polarization filter forms a first non-orthogonal polarization state with the first capture area of the film,
the brightness adjustment means is an attenuation filter disposed between the light irradiation means and the second imaging region or between the second imaging region and the imaging means.
11. The defect inspection camera according to claim 8,
the first polarization filter forms a first non-orthogonal polarization state with the first capture area of the film,
the brightness adjustment means is disposed in the light irradiation means, and individually adjusts a brightness value of the light irradiated to the first imaging region and a brightness value of the light irradiated to the second imaging region.
12. The defect inspection camera according to claim 9,
the shooting region includes a third shooting region divided in the conveying direction,
the brightness adjustment mechanism includes a second brightness adjustment polarization filter that is disposed between the light irradiation mechanism and the third imaging region or between the third imaging region and the imaging mechanism so as to form a second non-orthogonal polarization state with the third imaging region of the film, and adjusts a brightness value of light irradiated to the third imaging region.
13. The defect inspection camera according to claim 10 or 11,
the shooting region includes a third shooting region divided in the conveying direction,
the defect inspection imaging device further includes a second polarization filter that is disposed between the light irradiation means and the third imaging region or between the third imaging region and the imaging means, and that forms a second non-orthogonal polarization state with the third imaging region of the film.
14. The defect inspection camera according to claim 8,
the first polarization filter forms a first non-orthogonal polarization state with the first capture area of the film,
the brightness adjustment mechanism includes a first brightness adjustment polarization filter disposed between the light irradiation mechanism and the second imaging region or between the second imaging region and the imaging mechanism so as to form a second non-orthogonal polarization state with the second imaging region of the film.
15. An imaging device for defect inspection for inspecting a defect of a film having no polarization characteristic,
the imaging device for defect inspection includes:
a light irradiation mechanism that irradiates light to an imaging region of the film;
an imaging mechanism that images the imaging area of the film as a two-dimensional image;
a pair of first polarization filters arranged between the light irradiation means and the imaging region of the film and between the imaging region of the film and the imaging means, respectively, so as to form an orthogonal polarization state or a first non-orthogonal polarization state; and
a conveying mechanism that conveys the film in a conveying direction relative to the light irradiation mechanism, the imaging mechanism, and the pair of first polarization filters,
the imaging region includes a first imaging region and a second imaging region divided in the conveying direction, an intermediate imaging region is formed between the first imaging region and the second imaging region,
the imaging means is disposed at least one in a direction orthogonal to the conveying direction, i.e., in a width direction of the film,
the imaging range of each imaging means includes the first imaging region, the intermediate imaging region, and the second imaging region in the transport direction,
the pair of first polarization filters is disposed between the light irradiation mechanism and the first imaging region, and between the first imaging region and the imaging mechanism, respectively.
16. The defect inspection camera according to claim 15,
a pair of the first polarization filters form orthogonal polarization states.
17. The defect inspection camera according to claim 16,
the defect inspection imaging device further includes a luminance adjustment mechanism that adjusts a luminance value of light applied to at least one of the first imaging region and the second imaging region or light transmitted through or reflected by at least one of the first imaging region and the second imaging region.
18. The defect inspection camera according to claim 17,
the brightness adjustment mechanism adjusts the brightness value of light irradiated to the second imaging region or light transmitted through or reflected by the second imaging region.
19. The defect inspection camera according to claim 18,
the brightness adjustment means is an attenuation filter disposed between the light irradiation means and the second imaging region or between the second imaging region and the imaging means.
20. The defect inspection camera according to claim 17 or 18,
the brightness adjustment means is disposed in the light irradiation means, and individually adjusts a brightness value of the light irradiated to the first imaging region and a brightness value of the light irradiated to the second imaging region.
21. The defect inspection camera according to claim 15,
the defect inspection imaging device further includes a luminance adjustment mechanism that adjusts a luminance value of light applied to at least one of the first imaging region and the second imaging region or light transmitted through or reflected by at least one of the first imaging region and the second imaging region.
22. The defect inspection camera according to claim 21, wherein,
a pair of said first polarization filters form orthogonal polarization states,
the luminance adjustment mechanism includes a pair of first luminance adjustment polarization filters disposed between the light irradiation mechanism and the second imaging region and between the second imaging region and the imaging mechanism so as to form a first non-orthogonal polarization state.
23. The defect inspection camera according to claim 21, wherein,
a pair of said first polarization filters forming a first non-orthogonal polarization state,
the brightness adjustment means is an attenuation filter disposed between the light irradiation means and the second imaging region or between the second imaging region and the imaging means.
24. The defect inspection camera according to claim 21, wherein,
a pair of said first polarization filters forming a first non-orthogonal polarization state,
the brightness adjustment means is disposed in the light irradiation means, and individually adjusts a brightness value of the light irradiated to the first imaging region and a brightness value of the light irradiated to the second imaging region.
25. The defect inspection camera according to claim 22, wherein,
the shooting region includes a third shooting region divided in the conveying direction,
the luminance adjustment mechanism includes a pair of second luminance adjustment polarization filters arranged between the light irradiation mechanism and the third imaging region and between the third imaging region and the imaging mechanism so as to form a second non-orthogonal polarization state, and adjusts a luminance value of light irradiated to the third imaging region.
26. The defect inspection camera according to claim 23 or 24,
the shooting region includes a third shooting region divided in the conveying direction,
the defect inspection imaging device further includes a pair of second polarization filters which are respectively disposed between the light irradiation means and the third imaging region and between the third imaging region and the imaging means so as to form a second non-orthogonal polarization state.
27. The defect inspection camera according to claim 21, wherein,
a pair of said first polarization filters forming a first non-orthogonal polarization state,
the luminance adjustment mechanism includes a pair of first luminance adjustment polarization filters disposed between the light irradiation mechanism and the second imaging region and between the second imaging region and the imaging mechanism so as to form a second non-orthogonal polarization state.
28. A defect inspection system includes:
the imaging device for defect inspection according to any one of claims 1 to 27; and
a detection unit that detects a defect existing in the film based on the two-dimensional image captured by the defect inspection imaging device.
29. A film manufacturing apparatus provided with the defect inspection system according to claim 28.
30. An imaging method for defect inspection, which uses an imaging device for defect inspection comprising a light irradiation means, an imaging means, a first polarization filter, and a conveyance means to perform imaging for inspecting defects of a film having polarization characteristics,
the imaging method for defect inspection includes the steps of:
a first polarization filter arrangement step of arranging the first polarization filter between the light irradiation means and the imaging area of the film or between the imaging area of the film and the imaging means so as to form an orthogonal polarization state or a first non-orthogonal polarization state with respect to the film;
a conveying step of conveying the film in a conveying direction by the conveying mechanism relative to the light irradiation mechanism, the imaging mechanism, and the first polarization filter;
a light irradiation step of irradiating the imaging region of the film with light by the light irradiation mechanism; and
an imaging step of imaging the imaging area of the film as a two-dimensional image by the imaging means,
the imaging region includes a first imaging region and a second imaging region divided in the conveying direction, an intermediate imaging region is formed between the first imaging region and the second imaging region,
the imaging means is disposed at least one in a direction orthogonal to the conveying direction, i.e., in a width direction of the film,
the imaging range of each imaging means includes the first imaging region, the intermediate imaging region, and the second imaging region in the transport direction,
in the first polarization filter arranging step, the first polarization filter is arranged between the light irradiation means and the first imaging region or between the first imaging region and the imaging means.
31. The photographing method for defect inspection according to claim 30, wherein,
the first polarization filter forms an orthogonal polarization state with the film.
32. The photographing method for defect inspection according to claim 30, wherein,
the defect inspection imaging method further includes a brightness adjustment step of adjusting, by a brightness adjustment mechanism, a brightness value of light applied to at least one of the first imaging region and the second imaging region, or light transmitted through or reflected by at least one of the first imaging region and the second imaging region.
33. An imaging method for defect inspection, which uses an imaging device for defect inspection comprising a light irradiation means, an imaging means, a pair of first polarization filters, and a conveying means to perform imaging for inspecting defects of a film having no polarization characteristics,
the imaging method for defect inspection includes the steps of:
a first polarization filter arrangement step of arranging a pair of the first polarization filters between the light irradiation means and the imaging area of the film and between the imaging area of the film and the imaging means so as to form an orthogonal polarization state or a first non-orthogonal polarization state;
a conveying step of conveying the film in a conveying direction by the conveying mechanism relative to the light irradiation mechanism, the imaging mechanism, and the pair of first polarization filters;
a light irradiation step of irradiating the imaging region of the film with light by the light irradiation mechanism; and
an imaging step of imaging the imaging area of the film as a two-dimensional image by the imaging means,
the imaging region includes a first imaging region and a second imaging region divided in the conveying direction, an intermediate imaging region is formed between the first imaging region and the second imaging region,
the imaging means is disposed at least one in a direction orthogonal to the conveying direction, i.e., in a width direction of the film,
the imaging range of each imaging means includes the first imaging region, the intermediate imaging region, and the second imaging region in the transport direction,
in the first polarization filter arrangement step, a pair of the first polarization filters is arranged between the light irradiation means and the first imaging region, and between the first imaging region and the imaging means, respectively.
34. The photographing method for defect inspection according to claim 33, wherein,
a pair of the first polarization filters form orthogonal polarization states.
35. The photographing method for defect inspection according to claim 33, wherein,
the defect inspection imaging method further includes a brightness adjustment step of adjusting, by a brightness adjustment mechanism, a brightness value of light applied to at least one of the first imaging region and the second imaging region, or light transmitted through or reflected by at least one of the first imaging region and the second imaging region.
36. A defect inspection method comprising the defect inspection photographing method of any one of claims 30 to 35,
the defect inspection method includes a defect detection step of detecting a defect existing in the film based on the two-dimensional image captured by the defect inspection imaging method.
37. A method of manufacturing a film, comprising the defect inspection method of claim 36.
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