JP7184954B2 - Defect inspection imaging device, defect inspection system, film manufacturing device, defect inspection imaging method, defect inspection method, and film manufacturing method - Google Patents

Description

The present invention relates to a defect inspection imaging apparatus, a defect inspection system, a film manufacturing apparatus, a defect inspection imaging method, a defect inspection method, and a film manufacturing method for inspecting film defects.

2. Description of the Related Art Defect inspection systems are known for detecting defects in optical films such as polarizing films and retardation films, and films used for battery separators. In this type of defect inspection system, the film is conveyed by conveying means, the imaging area of the film is irradiated by light irradiation means, the imaging area of the film is imaged by imaging means, and defect inspection is performed based on the imaged image. conduct. Defect inspection methods of this type of defect inspection system are roughly classified into a transmission method and a reflection method. More specifically, the transmission method includes a regular transmission method, a crossed Nicols transmission method, and a transmission scattering method, and the reflection method includes a regular reflection method, a crossed Nicols reflection method, and a reflection scattering method. Patent Document 1 discloses a defect inspection system using a specular transmission method and a transmission scattering method as transmission methods, and a defect inspection system using a specular reflection method and a reflection scattering method as reflection methods. 2 discloses a defect inspection system using a crossed Nicols transmission method as a transmission method.

For example, the specular transmission method is suitable for detecting black foreign matter due to contamination or adhesion in the film bonding process, and the crossed Nicol transmission method is suitable for detecting bright spots due to contamination or adhesion in the adhesive application process. , the transmission scattering method is suitable for detecting deformation due to scratch transfer caused by adhering foreign matter in the film conveying process. On the other hand, the reflection method (regular reflection method, crossed Nicols reflection method, reflection scattering method) is suitable for detecting air bubbles caused by entrapment in the bonding process.

JP 2012-167975 A JP 2007-212442 A

In order to detect a plurality of different defects such as black foreign matter, bright spots, deformations, and bubbles, it is conceivable to use a plurality of different types of inspection methods (inspection series). However, as the number of test sequences increases, the introduction cost and management cost increase, so it is desired to reduce the number of test sequences.

Therefore, the present invention provides a defect inspection imaging device, a defect inspection system, a film manufacturing apparatus, a defect inspection imaging method, a defect inspection method, and a film that can reduce the number of inspection sequences by integrating different inspection sequences. It aims at providing the manufacturing method of.

The image pickup apparatus for defect inspection of the present invention is an image pickup apparatus for inspecting defects of a film having polarization characteristics, and includes light irradiation means for irradiating an image pickup area of the film with light, and a two-dimensional image of the image pickup area of the film. An imaging means for imaging and between the light irradiation means and the imaging area of the film or between the imaging area of the film and the imaging means so as to form a crossed Nicols state or a first half-crossed Nicols state with the film A first polarizing filter to be arranged, and a transporting means for relatively transporting the film in the transporting direction with respect to the light irradiation means, the imaging means, and the first polarizing filter, and the imaging region is divided in the transporting direction. The first polarizing filter is arranged between the light irradiation means and the first imaging area or between the first imaging area and the imaging means be done.

Further, the imaging method for defect inspection of the present invention uses a defect inspection imaging device comprising light irradiation means, imaging means, a first polarizing filter, and conveying means to inspect defects of a film having polarization characteristics. wherein the first polarizing filter is positioned between the light irradiation means and the imaging area of the film so as to form a crossed Nicols state or a first half-crossed Nicols state with the film, Alternatively, a step of arranging the first polarizing filter between the imaging region of the film and the imaging means, and moving the film relative to the light irradiation means, the imaging means, and the first polarizing filter in the transport direction by the transporting means a transporting step of transporting the film, a light irradiation step of irradiating light onto the imaging region of the film by a light irradiation means, and an imaging step of imaging the imaging region of the film as a two-dimensional image by the imaging means, wherein the imaging region is in the transport direction In the first polarizing filter placement step, the first polarizing filter is positioned between the light irradiation means and the first imaging region, or between the first imaging region and the second imaging region. It is arranged between the imaging area of 1 and the imaging means.

Here, the crossed Nicols state is a state in which the polarization axis (polarization absorption axis) of the polarizing filter is substantially perpendicular to the polarization axis (polarization absorption axis) of the film, that is, the polarization axis (polarization absorption axis) of the polarizing filter and the It shows a state in which the polarization axis (polarization absorption axis) of the film crosses at an angle of substantially 90 degrees. On the other hand, the half-crossed Nicols state is a state in which the polarizing axis (polarization absorption axis) of the polarizing filter crosses the polarization axis (polarization absorption axis) of the film without being substantially orthogonal. absorption axis) and the polarization axis of the film (polarization absorption axis) substantially cross at an angle other than 90 degrees.

According to this defect inspection imaging apparatus and defect inspection imaging method, for example, the first polarizing filter is positioned between the light irradiation means and the first imaging area, or between the first imaging area and the imaging means. between the film and the film to form a crossed Nicols state, and the image capturing means captures the image capturing area including the first image capturing area and the second image capturing area as a two-dimensional image, so in the first image capturing area An image for crossed Nicols transmission inspection (or an image for crossed Nicols reflection inspection) and, for example, an image for regular transmission inspection (or an image for regular reflection inspection) in the second imaging region can be captured simultaneously. That is, the imaging series for crossed Nicols transmission inspection (or the imaging series for crossed Nicols reflection inspection) and, for example, the imaging series for specular transmission inspection (or the imaging series for specular reflection inspection) can be integrated. As a result, the crossed Nicols transmission test series (or crossed Nicols reflection test series) and, for example, the specular transmission test series (or specular reflection test series) can be integrated, and the number of test series can be reduced.

In the defect inspection imaging apparatus described above, the first polarizing filter may be disposed between the light irradiation means and the first imaging area. Further, in the defect inspection imaging method described above, the first polarizing filter may be arranged between the light irradiation means and the first imaging region in the first polarizing filter arrangement step.

By the way, the appropriate brightness value of light differs between the crossed Nicols transmission inspection imaging series (or the crossed Nicols reflection inspection imaging series) and, for example, the specular transmission inspection imaging series (or specular reflection inspection imaging series).

Therefore, in the defect inspection imaging apparatus described above, at least one of the first imaging area and the second imaging area is irradiated, or at least one of the first imaging area and the second imaging area is illuminated. or reflected by at least one of the first imaging area and the second imaging area.

According to this, the luminance adjusting means illuminates at least one of the first imaging region and the second imaging region, or illuminates at least one of the first imaging region and the second imaging region. Since it is possible to adjust the luminance value of the transmitted or reflected light in at least one of the first imaging region and the second imaging region, it is possible to obtain appropriate light in imaging the first imaging region and the second imaging region. can be set, and the inspection is performed with the brightness value of the light according to the imaging series for cross Nicol transmission inspection (or imaging series for cross Nicol reflection inspection) and, for example, the imaging series for specular transmission inspection (or imaging series for specular reflection inspection). can do

The above-described luminance adjusting means may adjust the luminance value of the light irradiated to the second imaging area, transmitted through the second imaging area, or reflected by the second imaging area.

The brightness value of the appropriate light in the cross Nicol transmission inspection imaging series (or the cross Nicol reflex inspection imaging series) is relatively large, and the appropriate light intensity in the specular transmission inspection imaging series (or the specular reflection inspection imaging series) is relatively large. Luminance values may be relatively small. Even in such a case, as described above, the luminance adjusting means adjusts the luminance value of the light irradiated to the second imaging region, transmitted through the second imaging region, or reflected by the second imaging region. In the form of adjustment, for example, by outputting light with a relatively large luminance value from the light irradiating means, the first imaging sequence for the crossed Nicols transmission inspection (or crossed Nicols reflex inspection imaging sequence) The luminance value of the light illuminating the imaging area can be made relatively large, while the luminance adjusting means illuminates the second imaging area for the specular transmission inspection imaging series (or specular reflection inspection imaging series). The luminance value of the light irradiated or transmitted through the second imaging area or reflected by the second imaging area can be made relatively small.

Further, the luminance adjusting means described above may be an attenuation filter arranged between the light irradiation means and the second imaging area or between the second imaging area and the imaging means.

Further, the luminance adjusting means may be arranged in the light irradiating means, and may individually adjust the luminance value of the light irradiated to the first imaging region and the luminance value of the light irradiated to the second imaging region. .

In the defect inspection imaging apparatus described above, the first polarizing filter forms a crossed Nicols state with the first imaging area of the film, and the brightness adjustment means is positioned between the light irradiation means and the second imaging area, or and a first luminance adjusting polarizing filter disposed between the second imaging area and the imaging means so as to form a first half-crossed Nicols state with the second imaging area of the film. may

Here, the inventors of the present application have obtained knowledge that the specular transmission method is suitable for detecting black foreign matter, and the crossed Nicols transmission method is suitable for detecting bright spots. It was found that some faint bright spots are harder to detect than dots. In this regard, the inventors of the present application have found that the half-cross transmission method can be used to detect black foreign matter and some weak bright spots that are difficult to detect with the crossed Nicols transmission method.

In this regard, according to this defect inspection imaging apparatus, the first luminance adjusting polarizing filter (luminance adjusting means) forms the first half-crossed Nicols state with the second imaging area of the film, so that black The detection of foreign objects and weak bright spots on the part can be enhanced.

Further, in the defect inspection image pickup apparatus described above, the first polarizing filter forms a first half-crossed Nicols state with the first image pickup area of the film, and the luminance adjustment means operates with the light irradiation means and the second image pickup. area, or between the second imaging area and the imaging means.

According to this defect inspection imaging apparatus, the first polarizing filter forms the first half-crossed Nicols state with the first imaging area of the film, so that the detection of black foreign matter and weak bright spots in the above part can be performed. can be enhanced.

Further, in the defect inspection imaging apparatus described above, the first polarizing filter forms a first half-crossed Nicols state with the first imaging area of the film, the brightness adjustment means is arranged in the light irradiation means, and the second A configuration in which the luminance value of the light irradiated to the first imaging region and the luminance value of the light irradiated to the second imaging region may be separately adjusted may be employed.

Also in this defect inspection imaging device, the first polarizing filter forms the first half-crossed Nicols state with the first imaging region of the film, so that the detection of black foreign matter and weak bright spots in the above part can be enhanced. can be done.

Further, in the defect inspection imaging apparatus described above, the imaging area includes a third imaging area divided in the transport direction, and the brightness adjustment means is located between the light irradiation means and the third imaging area, or between the third imaging area. a second luminance adjusting polarizing filter disposed between the imaging area of 3 and the imaging means so as to form a second half-crossed Nicols state with the third imaging area of the film; It is also possible to adjust the luminance value of the light that is irradiated to the .

According to this defect inspection imaging apparatus, the first luminance adjusting polarizing filter (luminance adjusting means) forms the first half-crossed Nicols state with the second imaging region of the film, and the second luminance adjusting A polarizing filter (brightness adjustment means) forms a second half-crossed Nicols state with the third imaging area of the film, thus enhancing the detection of black foreign matter and weak bright spots in the above portion.

Further, in the defect inspection imaging apparatus described above, the imaging area includes the third imaging area divided in the transport direction, and is between the light irradiation means and the third imaging area, or between the third imaging area. It may further include a second polarizing filter disposed between the imaging means and forming a second half-crossed Nicols state with the third imaging region of the film.

According to this defect inspection imaging device, the first polarizing filter forms the first half-crossed Nicols state with the first imaging region of the film, and the second polarizing filter forms the third imaging region of the film. and the second half-crossed Nicols state, the detection of black foreign matter and weak bright spots in the above portion can be enhanced.

Further, in the defect inspection image pickup apparatus described above, the first polarizing filter forms a first half-crossed Nicols state with the first image pickup area of the film, and the luminance adjustment means operates with the light irradiation means and the second image pickup. region, or between the second imaging region and the imaging means, a first luminance adjusting polarizing filter arranged to form a second half-crossed Nicols state with the second imaging region of the film. It may be a form containing.

According to this defect inspection imaging apparatus, the first polarizing filter forms the first half-crossed Nicols state with the first imaging region of the film, and the first luminance adjusting polarizing filter (luminance adjusting means) is , forms a second half-crossed Nicols state with the second imaging area of the film, thus enhancing the detection of black foreign matter and weak bright spots in the above portion.

Another imaging apparatus for defect inspection of the present invention is an imaging apparatus for inspecting defects of a film that does not have polarization characteristics, and comprises light irradiation means for irradiating an imaging area of the film with light, and an imaging area of the film. An imaging means for imaging a two-dimensional image, and between the light irradiation means and the imaging area of the film and between the imaging area of the film and the imaging means so as to form a crossed Nicols state or a first half-crossed Nicols state. An imaging region comprising a pair of first polarizing filters respectively arranged between them, and transporting means for relatively transporting the film in the transport direction with respect to the light irradiation means, the imaging means, and the pair of first polarizing filters; includes a first imaging region and a second imaging region divided in the transport direction, and a pair of first polarizing filters are provided between the light irradiation means and the first imaging region and between the first imaging region Each is arranged between the area and the imaging means.

Further, another imaging method for defect inspection of the present invention uses a defect inspection imaging device having light irradiation means, imaging means, a pair of first polarizing filters, and transport means, and uses a defect inspection imaging device having polarization characteristics. An imaging method for performing imaging for defect inspection of a film that does not include a pair of first polarizing filters so as to form a crossed Nicols state or a first half-crossed Nicols state between a light irradiation means and a film. a step of arranging the first polarizing filters between the imaging area and between the imaging area of the film and the imaging means; a conveying step of relatively conveying the film in the conveying direction by means of a light irradiating means; a light irradiation step of irradiating light onto an imaging region of the film; and an imaging step of imaging the imaging region of the film as a two-dimensional image by the imaging means. and the imaging region includes a first imaging region and a second imaging region divided in the transport direction, and in the first polarizing filter placement step, the pair of first polarizing filters are combined with the light irradiation means and the second 1 imaging area and between the first imaging area and the imaging means.

According to this another imaging device for defect inspection and imaging method for defect inspection, for example, a pair of first polarizing filters are provided between the light irradiation means and the first imaging area and between the first imaging area. and the imaging means are arranged so as to form a crossed Nicols state, and the imaging means images the imaging regions including the first imaging region and the second imaging region as a two-dimensional image. An image for crossed Nicols transmission inspection (or an image for crossed Nicols reflection inspection) in the imaging area and, for example, an image for regular transmission inspection (or an image for regular reflection inspection) in the second imaging area can be captured simultaneously. That is, the imaging series for crossed Nicols transmission inspection (or the imaging series for crossed Nicols reflection inspection) and, for example, the imaging series for specular transmission inspection (or the imaging series for specular reflection inspection) can be integrated. As a result, the crossed Nicols transmission test series (or crossed Nicols reflection test series) and, for example, the specular transmission test series (or specular reflection test series) can be integrated, and the number of test series can be reduced.

By the way, as described above, an imaging series for crossed Nicols transmission inspection (or an imaging series for crossed Nicols reflection inspection) and, for example, an imaging series for specular transmission inspection (or an imaging series for specular reflection inspection) have an appropriate luminance value of light. is different.

Therefore, the above-described another imaging device for defect inspection irradiates at least one of the first imaging region and the second imaging region, or A configuration may further include luminance adjusting means for adjusting the luminance value of light that is transmitted through at least one of or reflected from at least one of the first imaging region and the second imaging region.

According to this, the luminance adjusting means illuminates at least one of the first imaging region and the second imaging region, or illuminates at least one of the first imaging region and the second imaging region. Since it is possible to adjust the luminance value of the transmitted or reflected light in at least one of the first imaging region and the second imaging region, it is possible to obtain appropriate light in imaging the first imaging region and the second imaging region. can be set, and the inspection is performed with the brightness value of the light according to the imaging series for cross Nicol transmission inspection (or imaging series for cross Nicol reflection inspection) and, for example, the imaging series for specular transmission inspection (or imaging series for specular reflection inspection). can do

The above-described luminance adjusting means may adjust the luminance value of the light irradiated to the second imaging area, transmitted through the second imaging area, or reflected by the second imaging area.

As described above, the appropriate light intensity value in the crossed Nicol transmission inspection imaging sequence (or crossed Nicol reflection inspection imaging sequence) is relatively large, and the specular transmission inspection imaging sequence (or specular reflection inspection imaging sequence) A suitable light intensity value in may be relatively small. Even in such a case, as described above, the luminance adjusting means adjusts the luminance value of the light irradiated to the second imaging region, transmitted through the second imaging region, or reflected by the second imaging region. In the form of adjustment, for example, by outputting light with a relatively large luminance value from the light irradiating means, the first imaging sequence for the crossed Nicols transmission inspection (or crossed Nicols reflex inspection imaging sequence) The luminance value of the light illuminating the imaging area can be made relatively large, while the luminance adjusting means illuminates the second imaging area for the specular transmission inspection imaging series (or specular reflection inspection imaging series). The luminance value of the light irradiated or transmitted through the second imaging area or reflected by the second imaging area can be made relatively small.

Further, the luminance adjusting means described above may be an attenuation filter arranged between the light irradiation means and the second imaging area or between the second imaging area and the imaging means.

Further, the luminance adjusting means may be arranged in the light irradiating means, and may individually adjust the luminance value of the light irradiated to the first imaging region and the luminance value of the light irradiated to the second imaging region. .

In the above-described another image pickup device for defect inspection, the pair of first polarizing filters form a crossed Nicols state, and the brightness adjustment means forms a first half-crossed Nicols state. 2, and between the second imaging region and the imaging means.

According to this another image pickup device for defect inspection, since the pair of first luminance adjusting polarizing filters (luminance adjusting means) form the first half-crossed Nicols state, the black foreign matter and the weak luminance of the above-mentioned part are detected. Spot detection can be enhanced.

Further, in the above-described another image pickup device for defect inspection, the pair of first polarizing filters form a first half-crossed Nicols state, and the brightness adjustment means is arranged between the light irradiation means and the second image pickup area. Alternatively, it may be in the form of an attenuation filter arranged between the second imaging region and the imaging means.

According to this another imaging apparatus for defect inspection, the pair of first polarizing filters forms the first half-crossed Nicols state with the first imaging area of the film, so that the black foreign matter and the weak brightness of the above part are detected. Spot detection can be enhanced.

Further, in the above-described another imaging device for defect inspection, the pair of first polarizing filters form the first half-crossed Nicols state, the brightness adjustment means is arranged in the light irradiation means, and the first imaging region The luminance value of the light irradiated to the second imaging region and the luminance value of the light irradiated to the second imaging region may be separately adjusted.

Also in this another defect inspection image pickup device, the pair of first polarizing filters forms the first half-crossed Nicols state, so detection of black foreign matter and weak bright spots in the above portion can be enhanced.

Further, in the above-described another imaging apparatus for defect inspection, the imaging area includes a third imaging area divided in the transport direction, and the brightness adjustment means adjusts the light so as to form the second half-crossed Nicols state. including a pair of second luminance adjusting polarizing filters arranged between the irradiation means and the third imaging area and between the third imaging area and the imaging means, and irradiating the third imaging area It may be in the form of adjusting the luminance value of light.

According to this another imaging device for defect inspection, the pair of first luminance adjusting polarizing filters (luminance adjusting means) form the first half-crossed Nicols state with the second imaging region of the film, and the pair of A second brightness adjusting polarizing filter (brightness adjusting means) forms a second half-crossed Nicols state with the third imaging area of the film, thus enhancing detection of black foreign matter and weak bright spots in the above portion. can be done.

Further, in the above-described another image pickup apparatus for defect inspection, the image pickup area includes a third image pickup area divided in the transport direction, and the light irradiation means and the third and a pair of second polarizing filters arranged between the third imaging region and the imaging means.

According to this another imaging device for defect inspection, the pair of first polarizing filters forms a first half-crossed Nicols state, and the pair of second polarizing filters forms a second half-crossed Nicols state. Therefore, it is possible to enhance the detection of the black foreign matter and the partial weak bright spots.

Further, in the above-described another image pickup device for defect inspection, the pair of first polarizing filters forms a first half-crossed Nicols state, and the luminance adjustment means forms a second half-crossed Nicols state. , a pair of first luminance adjusting polarizing filters arranged between the light irradiating means and the second imaging area and between the second imaging area and the imaging means.

According to this another imaging device for defect inspection, the pair of first polarizing filters form the first half-crossed Nicols state, and the pair of first luminance adjusting polarizing filters (luminance adjusting means) 2 half-crossed Nicols states are formed, the detection of black foreign matter and weak bright spots in the above portion can be enhanced.

The defect inspection system of the present invention is a film inspection system based on a two-dimensional image captured by the defect inspection image pickup device or another defect inspection image pickup device and the defect inspection image pickup device or another defect inspection image pickup device. and a detection unit that detects defects present in the Further, a defect inspection method of the present invention includes the defect inspection imaging method or another defect inspection imaging method, and based on a two-dimensional image captured by the defect inspection imaging method or another defect inspection imaging method , includes a defect detection step for detecting defects present in the film.

A film manufacturing apparatus of the present invention includes the defect inspection system described above. Further, the film manufacturing method of the present invention includes the defect inspection method described above.

According to the present invention, in film defect inspection, different inspection sequences can be integrated to reduce the number of inspection sequences.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the manufacturing apparatus and manufacturing method of the film which concern on one Embodiment of this invention. BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the defect inspection system and defect inspection method which concern on embodiment of this invention. BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 1st Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 2nd Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 3rd Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 4th Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 5th Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 6th Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the verification result of the imaging device for defect inspections of 2nd Embodiment, and the imaging method for defect inspections. BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the defect inspection system and defect inspection method which concern on embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 7th Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 8th Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 9th Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 10th Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 11th Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the 12th Embodiment of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the imaging device for defect inspections and the imaging method for defect inspections which concern on the modification of this invention. It is a figure which shows the verification result of the imaging device for defect inspections of 7th Embodiment, and the imaging method for defect inspections.

Preferred embodiments of the present invention will be described in detail below with reference to the drawings. In addition, suppose that the same code|symbol is attached|subjected to the part which is the same or equivalent in each drawing.

The film manufacturing apparatus and manufacturing method according to the embodiment of the present invention manufacture a polarizing film (optical film) having polarizing properties, a retardation film (optical film) having no polarizing properties, a battery separator film, and the like. It is for FIG. 1 shows an example of a manufacturing apparatus and manufacturing method for a film having polarizing properties (polarizing film), but the description of the manufacturing apparatus and manufacturing method for retardation films, battery separator films, etc. that do not have polarizing properties is omitted. do.

The manufacturing apparatus (film manufacturing apparatus) 100 shown in FIG. 1 first creates a polarizing film body (optical film body) 111 by attaching protective films to both sides of the main surface of a polarizer. Next, the manufacturing apparatus 100 removes the adhesive material 112 with a separate film in which a separate film (release film) is bonded to the adhesive material from the original roll 101, and the adhesive material 112 with the separate film is removed by the bonding roller 104 from the polarizing film body. It is attached to one main surface side of the portion 111 . Next, the manufacturing apparatus 100 removes the surface protective film 113 from the original fabric roll 102, and bonds the surface protective film 113 to the other main surface side of the polarizing film main body 111 by the bonding roller 105, thereby obtaining a film having polarizing properties. 110 is generated. Next, the manufacturing apparatus 100 transports the produced film 110 by the transport roller 106 and winds it by the original fabric roll 103 .

Examples of the material of the polarizer in the polarizing film body 111 include PVA (PolyvinylAlcohol), and examples of the material of the protective film in the polarizing film body 111 include TAC (Triacetylcellulose). Materials for the separate film and the surface protection film 113 in the adhesive material 112 with a separate film include PET (polyethylene terephthalate) and the like. By peeling off the separate film, the film 110 can be attached to a liquid crystal panel, other optical film, or the like using an adhesive.

The manufacturing apparatus 100 also includes a defect inspection system 10 that inspects the film 110 for defects, and a defect inspection system 10 that inspects the polarizing film body 111 for defects. Since these defect inspection systems 10 are the same, the defect inspection system 10 that inspects the film 110 for defects will be described below.
[First Embodiment]

The defect inspection system and the defect inspection method according to the first embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarization characteristics described above. FIG. 2 is a diagram showing a defect inspection system and a defect inspection method according to the first embodiment of the present invention, and FIG. It is a figure which shows the imaging method.

The defect inspection system 10 shown in FIG. 2 includes a defect inspection imaging device 20, an image analysis unit (detection unit) 30, and a marking device 40. The defect inspection imaging device 20 shown in FIG. illuminating means) 21 , a plurality of area sensors (imaging means) 22 , and a first polarizing filter 23 ₁ . 2 and 3 show XYZ orthogonal coordinates, the X direction indicates the width direction of the polarizing film, and the Y direction indicates the transport direction of the polarizing film.

In this embodiment, the conveying roller 106 and the original fabric roll 103 shown in FIG. 1 mainly function as conveying means. These transport means transport the film 110 in the transport direction Y relative to the light source 21 , the area sensor 22 and the first polarizing filter ₂₃₁ .

The light source 21 is provided on the other main surface side of the film 110 and irradiates the imaging region R of the film 110 with light. For example, the light source 21 is a linear light source extending in the width direction X. As shown in FIG.

The area sensors 22 are arranged on one main surface side of the film 110 and arranged in the width direction X. As shown in FIG. The area sensor 22 includes a CCD (Charge Coupled Device) or CMOS (Complementary Metal-Oxide Semiconductor) 22a and a lens 22b. By receiving light transmitted through the film 110, the area sensor 22 captures the imaging region R of the film 110 as a two-dimensional image continuously in time.

The length of the two-dimensional image picked up by each area sensor 22 in the transport direction Y is the transport distance over which the film 110 is transported in the section from when each area sensor 22 captures a two-dimensional image until when it captures the next two-dimensional image. is preferably at least two times. That is, it is preferable to image the same area of the film 110 twice or more. In this way, by making the length of the two-dimensional image in the transport direction Y larger than the transport distance in the image capture section and increasing the number of images of the same portion of the film 110, defects can be inspected with high accuracy. It becomes possible.

Here, the imaging region R includes a first imaging region R1 and a second imaging region R2 divided in the transport direction Y. As shown in FIG. The imaging region R also includes an intermediate imaging region R0 between the first imaging region R1 and the second imaging region R2.

A first polarizing filter ₂₃₁ is placed between the light source 21 and the film 110 . Specifically, the first polarizing filter _23-1 is arranged between the light source 21 and the first imaging region R1 in the imaging region R. In this embodiment, the first polarizing filter ₂₃₁ is arranged so that half of the imaging region R in the transport direction Y is hidden from the area sensor 22 (knife edge). Also, the first polarizing filter ₂₃₁ forms a crossed Nicols state with the film 110 . Here, the crossed Nicols state is a state in which the polarizing axis (polarization absorption axis) of the polarizing filter is substantially orthogonal to the polarizing axis (polarization absorption axis) of the film, that is, the polarizing axis of the polarizing filter and the polarizing axis of the film. cross at an angle of substantially 90 degrees. The above "substantially 90 degrees" is, for example, 85 degrees or more and less than 95 degrees, more preferably 90 degrees.

As a result, an image for crossed Nicols transmission inspection can be captured in the first imaging region R1, an image for regular transmission inspection can be captured in the second imaging region R2, and an image for transmission scattering inspection can be captured in the intermediate imaging region R0.

The image analysis unit 30 detects defects existing in the film 110 based on the two-dimensional image from the area sensor 22 . Further, the image analysis unit 30 converts the coordinate position on the two-dimensional image into the coordinate position on the film 110 based on the pixel coordinates of the two-dimensional image and the distance that the film is conveyed during the image capturing interval to identify the defect. Generate location information. The image analysis unit 30 creates a defect map by synthesizing images corresponding to the entire area of the film 110 based on the defect position information.

The marking device 40 marks the film based on the defect map from the image analysis section 30 .

Next, a defect inspection method and an imaging method for defect inspection according to the first embodiment of the present invention will be described.

First, the first polarizing filter ₂₃₁ is arranged between the light source 21 and the first imaging region R1 of the film 110 so as to form a crossed Nicols state with the film 110 (first polarizing filter arrangement step). .

Next, the transport means transports the film 110 in the transport direction Y relative to the light source 21, the area sensor 22, and the first polarizing filter ₂₃₁ (transporting step), and the light source 21 picks up the image of the film 110. The region R is irradiated with light (light irradiation step), and the imaging region R of the film 110 is imaged as a two-dimensional image by the area sensor 22 (imaging step).

Next, the image analysis unit 30 detects defects existing in the film 110 based on the two-dimensional image from the area sensor 22, and creates a defect map based on the defect position information (defect detection step). Next, the marking device 40 marks the film 110 based on the defect map from the image analysis unit 30 (marking process).

According to the defect inspection imaging apparatus 20 and the defect inspection imaging method according to the first embodiment, the first polarizing filter ₂₃₁ is positioned between the light source (light irradiation means) 21 and the first imaging region R1. 2, an area sensor (imaging means) 22 is arranged to form a crossed Nicols state with the film 110, and an area sensor (imaging means) 22 selects two imaging regions R including a first imaging region R1, a second imaging region R2 and an intermediate imaging region R0. Since the images are captured as dimensional images, an image for crossed Nicols transmission inspection in the first imaging region R1, an image for regular transmission inspection in the second imaging region R2, and an image for transmission scattering inspection in the intermediate imaging region R0 are simultaneously captured. can do. That is, it is possible to integrate the imaging series for cross Nicol transmission inspection, the imaging series for direct transmission inspection, and the imaging series for transmission scattering inspection.

As a result, according to the defect inspection system 10 and the defect inspection method of the first embodiment, the crossed Nicols transmission inspection series, the regular transmission inspection series, and the transmission scattering inspection series can be integrated.

Therefore, according to the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the first embodiment, the number of inspection sequences can be reduced.
[Second embodiment]

The defect inspection system and the defect inspection method according to the second embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarization characteristics described above.

A defect inspection system 10A according to the second embodiment of the present invention has a configuration in which a defect inspection imaging device 20A is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. different. A defect inspection imaging apparatus 20A shown in FIG. 4 differs from the first embodiment in that it further includes an attenuation filter (brightness adjusting means) 26 in the defect inspection imaging apparatus 20 shown in FIG.

The attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the attenuation filter 26 can reduce the luminance value of the light with which the second imaging region R2 is irradiated. The attenuation filter 26 may be arranged between the second imaging region R2 and the area sensor 22 to reduce the brightness of light transmitted through the second imaging region R2.

Next, a defect inspection method and an imaging method for defect inspection according to a second embodiment of the present invention will be described.

First, the above-described first polarizing filter placement step is performed. An attenuation filter 26 is then placed between the light source 21 and the second imaging region R2. This makes it possible to reduce the luminance value of the light with which the second imaging region R2 is irradiated (luminance adjustment step). The attenuation filter 26 may be arranged between the second imaging region R2 and the area sensor 22 to reduce the brightness of light transmitted through the second imaging region R2.

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the second embodiment are also the same as the defect inspection imaging device 20 and the defect inspection imaging method of the first embodiment. , defect inspection system 10, and defect inspection method.

By the way, an appropriate luminance value of light differs between an imaging series for crossed Nicol transmission inspection and an imaging series for regular transmission inspection. More specifically, suitable light intensity values in the crossed Nicol transmission inspection imaging series are relatively large, and suitable light intensity values in the specular transmission inspection imaging series are relatively small.

Regarding this point, according to the defect inspection imaging apparatus 20A and the defect inspection imaging method of the second embodiment, the attenuation filter (brightness adjusting means) 26 causes the luminance of the light irradiated onto the second imaging region R2 to be Since the value can be adjusted, for example, by outputting light with a relatively large luminance value from the light source (light irradiation means) 21, the first imaging region R1 for the crossed Nicol transmission inspection imaging series The brightness value of the illuminating light can be made relatively large, while the attenuation filter (brightness adjusting means) 26 reduces the brightness value of the light illuminating the second imaging region R2 for the imaging sequence for the specular transmission inspection. can be relatively small. As described above, the same effect can be expected by arranging the attenuation filter 26 between the second imaging region R2 and the area sensor 22 and adjusting the luminance value of the light transmitted through the second imaging region R2.

The above effects are verified below. FIG. 21A shows detected images of various defects (black foreign matter, weak bright spots, strong bright spots) when the light intensity of the light source is changed in the crossed Nicols transmission method and the specular transmission method. Further, FIG. 21(b) shows a graph of the defect signal of the detected image by the crossed Nicols transmission method of FIG. 21(a), and FIG. FIG. 4 shows a graphical representation of a defect signal of a detected image; FIG. The amount of light from the light source is expressed as 1 to 40 times the amount of light from the light source when the luminance value on the image is 128 (the optimum amount of light for specular transmission).

According to FIGS. 21(a) and 21(c), in the specular transmission method, the light source light amount is preferably about 1 time, and if the light source light amount is doubled or more, the brightness on the image is too high, and the entire image becomes white. On the other hand, according to FIGS. 21A and 21B, in the crossed Nicols transmission method, when the light source light intensity is about 1, the brightness on the screen is too low to recognize defects, and the light source light intensity is It can be seen that 20 times or more is preferable, and 40 times or more is more preferable.

In the above verification, the luminance value on the image was adjusted by adjusting the amount of light emitted from the light source that irradiates the imaging area. However, as a luminance adjustment method, a method using an attenuation filter, as described above, has the same effect. I can expect it.
[Third Embodiment]

A defect inspection system and a defect inspection method according to a third embodiment of the present invention are a defect inspection system 10 and a defect inspection method for performing defect inspection of the film 110 having the polarization characteristics described above.

A defect inspection system 10B according to the third embodiment of the present invention has a configuration in which a defect inspection imaging device 20B is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. different. A defect inspection imaging apparatus 20B shown in FIG. 5 differs from the first embodiment in that it includes a light source 21A instead of the light source 21 in the defect inspection imaging apparatus 20 shown in FIG.

The light source 21A has a luminance adjustment function that individually adjusts the luminance value of light applied to the first imaging region R1 and the luminance value of light applied to the second imaging region R2. As a result, the luminance value of the light applied to the first imaging region R1 can be made relatively large, and the luminance value of the light applied to the second imaging region R2 can be made relatively small. .

Next, a defect inspection method and an imaging method for defect inspection according to a third embodiment of the present invention will be described.

First, the above-described first polarizing filter placement step is performed. Next, the light source 21A individually adjusts the luminance value of the light applied to the first imaging region R1 and the luminance value of the light applied to the second imaging region R2. This makes it possible to relatively increase the luminance value of the light irradiated to the first imaging region R1, and relatively decrease the luminance value of the light irradiated to the second imaging region R2. becomes possible (brightness adjustment process).

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20B, the defect inspection imaging method, the defect inspection system 10B, and the defect inspection method of the third embodiment are also the defect inspection imaging device 20 and the defect inspection imaging method of the first embodiment. , defect inspection system 10, and defect inspection method.

Further, according to the defect inspection imaging apparatus 20B and the defect inspection imaging method of the third embodiment, the brightness value of the light irradiated to the first imaging region R1 and the second imaging region R2 by the light source 21A are Since the brightness value of the light to be irradiated can be adjusted individually, the brightness value of the light to be irradiated to the first imaging region R1 for the crossed Nicol transmission inspection imaging series can be made relatively large, On the other hand, it is possible to make the luminance value of the light irradiated to the second imaging region R2 for the imaging series for regular transmission inspection relatively small.
[Fourth embodiment]

A defect inspection system and a defect inspection method according to the fourth embodiment of the present invention are a defect inspection system and a defect inspection method for inspecting defects such as retardation films and battery separator films that do not have the above-described polarization characteristics. . The defect inspection system and defect inspection method according to the fourth embodiment can be applied to manufacturing apparatuses and manufacturing methods for retardation films, battery separator films, and the like that do not have polarization properties. In the production apparatus and production method of a retardation film having no polarization properties, a battery separator film, etc., points other than the defect inspection system and defect inspection method described in the fourth embodiment are known, so as described above. description is omitted. Other embodiments and modifications of the defect inspection system and defect inspection method for inspecting defects such as retardation films and battery separator films that do not have polarizing properties from the same viewpoint Retardation films that do not have polarizing properties The description of the manufacturing apparatus and manufacturing method for the battery separator film and the like is omitted. In a fourth embodiment, film 110 is a film that does not have polarizing properties.

A defect inspection system 10C according to the fourth embodiment of the present invention has a configuration in which a defect inspection imaging device 20C is provided instead of the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. different. Further, the defect inspection imaging device 20C shown in FIG. 6 includes a pair of first polarizing filters 23 ₁ and 24 ₁ instead of the first polarizing filter 23 ₁ in the defect inspection imaging device 20 shown in FIG. is different from the first embodiment.

A first polarizing filter ₂₃₁ is arranged between the light source 21 and the film 110 as in the first embodiment. Specifically, the first polarizing filter _23-1 is arranged between the light source 21 and the first imaging region R1 in the imaging region R. In this embodiment, the first polarizing filter ₂₃₁ is arranged so that half of the imaging region R in the transport direction Y is hidden from the area sensor 22 (knife edge).

On the other hand, the first polarizing filter ₂₄₁ is arranged between the film 110 and the area sensor 22 . Specifically, the first polarizing filter _24-1 is arranged between the first imaging region R1 and the area sensor 22 in the imaging region R. As shown in FIG. In this embodiment, the first polarizing filter ₂₄₁ is arranged so that half of the imaging region R in the transport direction Y is hidden from the area sensor 22 (knife edge).

Also, the first polarizing filter _23-1 and the first polarizing filter _24-1 form a crossed Nicols state. As a result, an image for crossed Nicols transmission inspection can be captured in the first imaging region R1, an image for regular transmission inspection can be captured in the second imaging region R2, and an image for transmission scattering inspection can be captured in the intermediate imaging region R0.

Next, a defect inspection method and an imaging method for defect inspection according to a fourth embodiment of the present invention will be described.

First, the first polarizing filter _23-1 is placed between the light source 21 and the first imaging region R1 of the film 110, and the first polarizing filter _24-1 is placed between the first imaging region R1 of the film 110 and the area sensor 22. be placed between At that time, the first polarizing filter _23-1 and the first polarizing filter _24-1 are arranged so as to form a crossed Nicols state (first polarizing filter arrangement step).

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

According to the imaging device 20C for defect inspection and the imaging method for defect inspection according to the fourth embodiment, the pair of first polarizing filters 23 ₁ and 24 ₁ are connected to the light source (light irradiation means) 21 and the first imaging method. and between the area R1 and between the first imaging area R1 and the area sensor (imaging means) 22 so as to form a crossed Nicols state. Since the imaging region R including the imaging region R1, the second imaging region R2, and the intermediate imaging region R0 is captured as a two-dimensional image, the crossed Nicol transmission inspection image in the first imaging region R1 and the second imaging region A specular transmission inspection image in R2 and a transmission scattering inspection image in intermediate imaging region R0 can be captured simultaneously. That is, it is possible to integrate the imaging series for cross Nicol transmission inspection, the imaging series for direct transmission inspection, and the imaging series for transmission scattering inspection.

As a result, according to the defect inspection system 10C and the defect inspection method of the fourth embodiment, the crossed Nicols transmission inspection series, the regular transmission inspection series, and the transmission scattering inspection series can be integrated.

Therefore, according to the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the fourth embodiment, the number of inspection sequences can be reduced.
[Fifth Embodiment]

A defect inspection system and a defect inspection method according to the fifth embodiment of the present invention are a defect inspection system and a defect inspection method for inspecting defects such as retardation films and battery separator films that do not have the above-described polarization characteristics. . In a fifth embodiment, the film 110 is a film with no polarizing properties.

A defect inspection system 10D according to the fifth embodiment of the present invention has a configuration in which a defect inspection imaging device 20D is provided instead of the defect inspection imaging device 20C in the defect inspection system 10C shown in FIG. different. A defect inspection imaging apparatus 20D shown in FIG. 7 differs from the fourth embodiment in that the defect inspection imaging apparatus 20C shown in FIG. 6 further includes an attenuation filter (luminance adjusting means) 26.

The attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the attenuation filter 26 can reduce the luminance value of the light with which the second imaging region R2 is irradiated. The attenuation filter 26 may be arranged between the second imaging region R2 and the area sensor (imaging means) 22 to reduce the brightness of light transmitted through the second imaging region R2.

Next, a defect inspection method and an imaging method for defect inspection according to a fifth embodiment of the present invention will be described.

First, the above-described first polarizing filter placement step is performed. An attenuation filter 26 is then placed between the light source 21 and the second imaging region R2. This makes it possible to reduce the luminance value of the light with which the second imaging region R2 is irradiated (luminance adjustment step). The attenuation filter 26 may be arranged between the second imaging region R2 and the area sensor (imaging means) 22 to reduce the brightness of light transmitted through the second imaging region R2.

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20D, the defect inspection imaging method, the defect inspection system 10D, and the defect inspection method of the fifth embodiment are also applied to the defect inspection imaging device 20C and the defect inspection imaging method of the fourth embodiment. , defect inspection system 10C, and defect inspection method.

Further, according to the defect inspection imaging apparatus 20D and the defect inspection imaging method of the fifth embodiment, the attenuation filter (brightness adjusting means) 26 adjusts the luminance value of the light irradiated to the second imaging region R2 to For example, by outputting light with a relatively large luminance value from the light source (light irradiation means) 21, the first imaging region R1 for the crossed Nicol transmission inspection imaging series is irradiated. The brightness value of the light can be made relatively large, while the attenuation filter (brightness adjustment means) 26 compares the brightness value of the light illuminating the second imaging region R2 for the imaging sequence for the specular transmission inspection. can be significantly smaller. A similar effect can be expected by arranging the attenuation filter 26 between the second imaging region R2 and the area sensor (imaging means) 22 and adjusting the luminance value of the light transmitted through the second imaging region R2. .
[Sixth Embodiment]

A defect inspection system and a defect inspection method according to the sixth embodiment of the present invention are a defect inspection system and a defect inspection method for inspecting defects such as retardation films and battery separator films that do not have the above-described polarization characteristics. . In a sixth embodiment, film 110 is a film that does not have polarizing properties.

A defect inspection system 10E according to the sixth embodiment of the present invention has a configuration in which a defect inspection imaging device 20E is provided in place of the defect inspection imaging device 20C in the defect inspection system 10C shown in FIG. different. A defect inspection imaging apparatus 20E shown in FIG. 8 is different from the fourth embodiment in that it includes a light source 21A instead of the light source 21 in the defect inspection imaging apparatus 20C shown in FIG.

The light source 21A has a luminance adjustment function that individually adjusts the luminance value of light applied to the first imaging region R1 and the luminance value of light applied to the second imaging region R2. As a result, the luminance value of the light applied to the first imaging region R1 can be made relatively large, and the luminance value of the light applied to the second imaging region R2 can be made relatively small. .

Next, a defect inspection method and an imaging method for defect inspection according to a sixth embodiment of the present invention will be described.

First, the above-described first polarizing filter placement step is performed. Next, the light source 21A individually adjusts the luminance value of the light applied to the first imaging region R1 and the luminance value of the light applied to the second imaging region R2. This makes it possible to relatively increase the luminance value of the light irradiated to the first imaging region R1, and relatively decrease the luminance value of the light irradiated to the second imaging region R2. becomes possible (brightness adjustment process).

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20E, the defect inspection imaging method, the defect inspection system 10E, and the defect inspection method of the sixth embodiment are also applied to the defect inspection imaging device 20C and the defect inspection imaging method of the fourth embodiment. , defect inspection system 10C, and defect inspection method.

Further, according to the defect inspection imaging apparatus 20E and the defect inspection imaging method of the sixth embodiment, the brightness value of the light irradiated to the first imaging region R1 and the second imaging region R2 are changed by the light source 21A. Since the brightness value of the light to be irradiated can be adjusted individually, the brightness value of the light to be irradiated to the first imaging region R1 for the crossed Nicol transmission inspection imaging series can be made relatively large, On the other hand, it is possible to make the luminance value of the light irradiated to the second imaging region R2 for the imaging series for regular transmission inspection relatively small.

It should be noted that the present invention is not limited to the above-described embodiment, and various modifications are possible. For example, in the first, second, and third embodiments, the defect inspection imaging apparatuses 20, 20A, and 20B and the defect inspection imaging method using the transmission method were illustrated, but the features of the present invention are as shown in FIGS. As shown in FIGS. 10 and 11, it is also applicable to defect inspection imaging apparatuses 20, 20A, and 20B and a defect inspection imaging method using a reflection method.

According to the defect inspection imaging apparatuses 20, 20A, and _20B and the defect inspection imaging method shown in FIGS. An area sensor (imaging means) 22 is arranged between the imaging region R1 and the film 110 so as to form a crossed Nicols state, and the area sensor (imaging means) 22 divides the first imaging region R1, the second imaging region R2, and the intermediate imaging region R0. Since the imaging region R including the image can be captured at the same time. That is, it is possible to integrate the imaging series for crossed Nicol reflex inspection, the imaging series for specular reflection inspection, and the imaging series for reflection scattering inspection. As a result, in the defect inspection systems 10, 10A, 10B and the defect inspection method, the crossed Nicol reflection inspection series, the specular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced. can.

By the way, the appropriate luminance value of light differs between the imaging series for crossed Nicol reflection inspection and the imaging series for specular reflection inspection. More specifically, the appropriate light intensity values in the crossed Nicol test imaging series are relatively large, and the appropriate light intensity values in the specular test imaging series are relatively small.

In this respect, according to the defect inspection imaging apparatuses 20A and 20B and the defect inspection imaging method shown in FIGS. 10 and 11, the second Since it is possible to adjust the luminance value of the light irradiated to the imaging region R2, for example, by outputting light with a relatively large luminance value from the light source (light irradiation means) 21 and the light source (luminance adjusting means) 21A, , the luminance value of the light illuminating the first imaging region R1 for the crossed Nicol reflex inspection imaging series can be made relatively large, while the attenuation filter (luminance adjusting means) 26 and the light source (luminance adjusting means ) 21A makes it possible to make the luminance value of the light illuminating the second imaging region R2 for the specular reflection inspection imaging series relatively small. When using the attenuation filter (brightness adjustment means) 26 (for example, the form illustrated in FIG. 10), the attenuation filter 26 is arranged between the second imaging region R2 and the area sensor (imaging means) 22, 2, the brightness value of the reflected light may be adjusted in the imaging region R2.

Similarly, in the fourth, fifth, and sixth embodiments, the defect inspection imaging apparatuses 20C, 20D, and 20E and the defect inspection imaging method using the transmission method were exemplified. , as shown in FIGS. 13 and 14, the present invention can also be applied to defect inspection imaging apparatuses 20C, 20D, and 20E using a reflection method and to a defect inspection imaging method.

According to the defect inspection imaging apparatuses _20C , 20D, and _20E and the defect inspection imaging method shown in FIGS. 21 and the first imaging region R1 and between the first imaging region R1 and the area sensor (imaging means) 22 are arranged so as to form a crossed Nicols state, and the area sensor (imaging means) ) 22 captures the imaging region R including the first imaging region R1, the second imaging region R2, and the intermediate imaging region R0 as a two-dimensional image. , the specular reflection inspection image in the second imaging region R2 and the reflection/scattering inspection image in the intermediate imaging region R0 can be simultaneously captured. That is, it is possible to integrate the imaging series for crossed Nicol reflex inspection, the imaging series for specular reflection inspection, and the imaging series for reflection scattering inspection. As a result, in the defect inspection systems 10C, 10D, and 10E and the defect inspection method, the crossed Nicol reflection inspection series, the specular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced. can.

Further, according to the defect inspection imaging apparatuses 20D and 20E and the defect inspection imaging method shown in FIGS. Since the luminance value of the light irradiated to R2 can be adjusted, for example, by outputting light with a relatively large luminance value from the light source (light irradiation means) 21 and the light source (luminance adjusting means) 21A, cross The brightness value of the light illuminating the first imaging region R1 for the Nicol reflex inspection imaging sequence can be made relatively large, while the attenuation filter (brightness adjusting means) 26 and the light source (brightness adjusting means) 21A Thus, the luminance value of the light that irradiates the second imaging region R2 for the specular reflection inspection imaging series can be made relatively small. When using the attenuation filter (brightness adjusting means) 26 (for example, the form illustrated in FIG. 13), the attenuation filter 26 is arranged between the second imaging region R2 and the area sensor (imaging means) 22, and the second 2, the brightness value of the reflected light may be adjusted in the imaging region R2.

In addition, in the first, second and third _embodiments and in the forms shown in FIGS. 15, 16, 17, 18, 19 and 20, the first polarizing filter _23-1 of the film 110 It may be arranged between the first imaging region R<b>1 and the area sensor (imaging means) 22 .
[Seventh Embodiment]

The defect inspection system and the defect inspection method according to the seventh embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarization characteristics described above. FIG. 22 is a diagram showing a defect inspection system and a defect inspection method according to a seventh embodiment of the present invention, and FIG. It is a figure which shows the imaging method.

The defect inspection system 10 shown in FIG. 22 includes a defect inspection imaging device 20, an image analysis unit (detection unit) 30, and a marking device 40. The defect inspection imaging device 20 shown in FIG. 21, a plurality of area sensors (imaging means) 22, a first polarizing filter _23-1 , and a first luminance adjusting polarizing filter (luminance adjusting means) _25-1 . 22 and 23 show XYZ orthogonal coordinates, the X direction indicates the width direction of the polarizing film, and the Y direction indicates the transport direction of the polarizing film.

In this embodiment, the conveying roller 106 and the original fabric roll 103 shown in FIG. 1 mainly function as conveying means. These transport means transport the film 110 in the transport direction Y relative to the light source 21 , the area sensor 22 and the first polarizing filter ₂₃₁ .

The light source 21 is provided on the other main surface side of the film 110 and irradiates the imaging region R of the film 110 with light. For example, the light source 21 is a linear light source extending in the width direction X. As shown in FIG.

The area sensors 22 are arranged on one main surface side of the film 110 and arranged in the width direction X. As shown in FIG. The area sensor 22 includes a CCD (Charge Coupled Device) or CMOS (Complementary Metal-Oxide Semiconductor) 22a and a lens 22b. By receiving light transmitted through the film 110, the area sensor 22 captures the imaging region R of the film 110 as a two-dimensional image continuously in time.

The length of the two-dimensional image picked up by each area sensor 22 in the transport direction Y is the transport distance over which the film 110 is transported in the section from when each area sensor 22 captures a two-dimensional image until when it captures the next two-dimensional image. is preferably at least two times. That is, it is preferable to image the same area of the film 110 twice or more. In this way, by making the length of the two-dimensional image in the transport direction Y larger than the transport distance in the image capture section and increasing the number of images of the same portion of the film 110, defects can be inspected with high accuracy. It becomes possible.

Here, the imaging region R includes a first imaging region R1 and a second imaging region R2 divided in the transport direction Y. As shown in FIG. The imaging region R also includes an intermediate imaging region R0 between the first imaging region R1 and the second imaging region R2.

A first polarizing filter ₂₃₁ is placed between the light source 21 and the film 110 . Specifically, the first polarizing filter _23-1 is arranged between the light source 21 and the first imaging region R1 in the imaging region R. In this embodiment, the first polarizing filter ₂₃₁ is arranged so that half of the imaging region R in the transport direction Y is hidden from the area sensor 22 (knife edge). Also, the first polarizing filter ₂₃₁ forms a crossed Nicols state with the film 110 . Here, the crossed Nicols state is a state in which the polarizing axis (polarization absorption axis) of the polarizing filter is substantially orthogonal to the polarizing axis (polarization absorption axis) of the film, that is, the polarizing axis of the polarizing filter and the polarizing axis of the film. cross at an angle of substantially 90 degrees. The above "substantially 90 degrees" is, for example, 85 degrees or more and less than 95 degrees, more preferably 90 degrees.

The first polarizing filter ₂₃₁ may be arranged between the first imaging region R1 and the area sensor 22 as long as it forms a crossed Nicols state with the film 110 .

The first luminance adjusting polarizing filter _25-1 is arranged between the light source 21 and the first polarizing filter _23-1 and between the light source 21 and the second imaging region R2, between the film 110 and the first half-cross filter. arranged to form a Nicol state. Here, the half-crossed Nicols state refers to a state in which the polarization axis (polarization absorption axis) of the polarizing filter crosses the polarization axis (polarization absorption axis) of the film without being substantially orthogonal, that is, the polarization axis of the polarizing filter and the It shows a state in which the polarizing axes of the film substantially cross at an angle other than 90 degrees. The angle between the polarization axis (polarization absorption axis) of the polarizing filter and the polarization axis (polarization absorption axis) of the film in the half-cross Nicols state is the transmittance of the film to be imaged by the imaging means and the luminance value of the light emitted from the light source. For example, the brightness value of the image captured by the area sensor 22 through a predetermined area of the imaging area R (the second imaging area R2 in the example of FIG. 23) is 200 or less. It is preferable that the angle is such that the luminance value on the image is 130 or less. For example, as will be described later, the cross angle between the polarizing axis of the first luminance adjusting polarizing filter ₂₅₁ and the polarizing axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. As a result, the first luminance adjusting polarizing filter ₂₅₁ can reduce the luminance value of the light with which the second imaging region R2 is irradiated. In this specification, a "luminance value" is a value of each pixel on an 8-bit grayscale image.

Further, the first luminance adjusting polarizing filter ₂₅₁ may be arranged only between the light source 21 and the second imaging region R2 to adjust the luminance of the irradiated light. 22, and the brightness of the light transmitted through the second imaging region R2 may be adjusted.

As a result, a crossed Nicols transmission inspection image is obtained in the first imaging region R1, a half crossed Nicols (first half crossed Nicols) transmission inspection image is obtained in the second imaging region R2, and a transmission scattering inspection image is obtained in the intermediate imaging region R0. image can be captured.

The image analysis unit 30 detects defects existing in the film 110 based on the two-dimensional image from the area sensor 22 . Further, the image analysis unit 30 converts the coordinate position on the two-dimensional image into the coordinate position on the film 110 based on the pixel coordinates of the two-dimensional image and the distance that the film is conveyed during the image capturing interval to identify the defect. Generate location information. The image analysis unit 30 creates a defect map by synthesizing images corresponding to the entire area of the film 110 based on the defect position information.

The marking device 40 marks the film based on the defect map from the image analysis section 30 .

Next, a defect inspection method and an imaging method for defect inspection according to the seventh embodiment of the present invention will be described.

First, the first polarizing filter ₂₃₁ is arranged between the light source 21 and the first imaging region R1 of the film 110 so as to form a crossed Nicols state with the film 110 (first polarizing filter arrangement step). . A first polarizing filter ₂₃₁ may be arranged between the first imaging region R1 and the area sensor 22 . Next, the first luminance adjusting polarizing filter _25-1 is placed between the light source 21 and the first polarizing filter _23-1 , and between the light source 21 and the second imaging region R2, between the film 110 and the first polarizing filter 23-1. are arranged to form a half-crossed Nicols state of . This makes it possible to reduce the luminance value of the light with which the second imaging region R2 is irradiated (luminance adjustment step). The first luminance adjusting polarizing filter ₂₅₁ may be arranged only between the light source 21 and the second imaging region R2, or may be arranged between the film 110 and the area sensor 22. FIG.

Next, the transport means transports the film 110 in the transport direction Y relative to the light source 21, the area sensor 22, and the first polarizing filter ₂₃₁ (transporting step), and the light source 21 picks up the image of the film 110. The region R is irradiated with light (light irradiation step), and the imaging region R of the film 110 is imaged as a two-dimensional image by the area sensor 22 (imaging step).

Next, the image analysis unit 30 detects defects existing in the film 110 based on the two-dimensional image from the area sensor 22, and creates a defect map based on the defect position information (defect detection step). Next, the marking device 40 marks the film 110 based on the defect map from the image analysis unit 30 (marking process).

According to the defect inspection imaging apparatus 20 and the defect inspection imaging method according to the seventh embodiment, the first polarizing filter ₂₃₁ is positioned between the light source (light irradiation means) 21 and the first imaging region R1. 2, an area sensor (imaging means) 22 is arranged to form a crossed Nicols state with the film 110, and an area sensor (imaging means) 22 selects two imaging regions R including a first imaging region R1, a second imaging region R2 and an intermediate imaging region R0. Since the image is captured as a dimensional image, the crossed Nicols transmission inspection image in the first imaging region R1, the half-crossed Nicols (first half-crossed Nicols transmission) inspection image in the second imaging region R2, and the intermediate imaging region R0 can be captured simultaneously with the image for transmission scattering inspection in . That is, the crossed Nicols transmission inspection imaging series, the half crossed Nicols transmission inspection imaging series, and the transmission scattering inspection imaging series can be integrated.

As a result, according to the defect inspection system 10 and the defect inspection method of the seventh embodiment, the crossed Nicols transmission inspection series, the half-crossed Nicols transmission inspection series, and the transmission scattering inspection series can be integrated.

Therefore, according to the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the seventh embodiment, the number of inspection sequences can be reduced.

According to the defect inspection imaging apparatus 20 and the defect inspection imaging method of the seventh embodiment, the first luminance adjusting polarization filter (luminance adjusting means) ₂₅₁ irradiates the second imaging region R2 with light. brightness value can be adjusted. Therefore, for example, by outputting light with a relatively large luminance value from the light source (light irradiation means) 21, the luminance value of the light irradiated to the first imaging region R1 for the crossed Nicol transmission inspection imaging series is increased. can be relatively large, while the first luminance adjusting polarizing filter (brightness adjusting means) ₂₅₁ provides a half-crossed Nicols (first half-crossed Nicols) second The luminance value of the light that irradiates the imaging region R2 can be made relatively small.

By the way, the inventors of the present application have obtained knowledge that the specular transmission method is suitable for detecting black foreign matter, and the crossed Nicols transmission method is suitable for detecting bright spots. It was found that it is difficult to detect some weak bright spots compared to . In this regard, the inventors of the present application have found that the half-cross transmission method can be used to detect black foreign matter and some weak bright spots that are difficult to detect with the crossed Nicols transmission method.

Regarding this point, according to the defect inspection imaging apparatus 20 and the defect inspection imaging method of the seventh embodiment, the first brightness adjustment polarizing filter (brightness adjustment means) 25 ₁ is used for the second imaging of the film 110 . Since the region R2 and the first half-crossed Nicols state are formed, the detection of black foreign matter and weak bright spots (including the part of the weak bright spots described above) can be enhanced. In this specification, hereinafter, weak bright spots are a concept including the above-mentioned "partial weak bright spots".

The above effects are verified below. FIG. 45(a) shows detection images of various defects (black foreign matter, weak bright spots, strong bright spots) when changing the cross angle of the polarizing filter with respect to the film when the light source light intensity is 40 times. b) shows a graph of luminance values of the detected image in FIG. 45(a). Similarly, FIG. 45(c) shows the luminance values of detected images of various defects (black foreign matter, weak bright spots, strong bright spots) when the cross angle of the polarizing filter with respect to the film is changed when the light source light intensity is 20 times. , and FIG. 45(d) shows various defects (black foreign matter, weak bright spots, strong bright spots) when changing the cross angle of the polarizing filter with respect to the film when the light intensity of the light source is 10 times. FIG. 4 shows a graph of luminance values of a detected image; FIG. The 40 times, 20 times, and 10 times the amount of light from the light source indicate that the amount of light from the light source when the luminance value on the image is 128 (the optimum amount of light for specular transmission) is 1 time.

According to FIGS. 45(a) and 45(b), when the light source light intensity is 40 times, the cross angle is substantially 90 degrees, that is, the cross Nicols transmission method is suitable for detecting defects of strong bright spots. It can be seen that the cross angle of 105 degrees, that is, the half-cross Nicol transmission method is suitable for detecting weak bright spot defects. When the cross angle is 70 degrees or less and 110 degrees or more, the luminance on the image is too high and the entire image becomes white. In addition, we have found that the specular transmission method is suitable for detecting black foreign matter defects. 95 degrees or more and 105 degrees or less, that is, the half-cross Nicol transmission method is suitable.

45B, 45C, and 45D, the optimal cross in the half-cross Nicol transmission method for the detection of weak bright spot defects and the detection of black foreign matter defects depends on the amount of light from the light source. You can see that the angles are different.

From this, when using a polarizing filter for luminance adjustment in the specular transmission method, that is, when using the half-cross Nicol transmission method, defects that cause a high defect signal at a cross angle other than substantially 90 degrees, such as weak bright spots and black foreign matter is advantageous for the detection of

Moreover, the strength of the defect level can be determined by comprehensively considering the inspection at the two cross angles. For example, defect signals are confirmed in both the crossed Nicol transmission method with a cross angle of substantially 90 degrees and the half-crossed Nicol transmission method with a cross angle of 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. In other words, if the defect signal is confirmed in a wide angle range, it is determined that the defect level is strong. , it may be determined that the defect level is weak.

In the above verification, a polarizing filter was placed between the light source and the imaging area to adjust the brightness of the light irradiated to the imaging area. A similar effect can be expected even if the luminance is adjusted by the transmission method.
[Modification of the seventh embodiment]

In the seventh embodiment, the defect inspection imaging apparatus 20 and the defect inspection imaging method that combine the crossed Nicols transmission method and the half-crossed Nicols transmission method are illustrated. A Nicol transmission method may be combined. A defect inspection imaging apparatus 20 and a defect inspection imaging method combining the crossed Nicols transmission method and two different half-crossed Nicols transmission methods will be exemplified below as modifications of the seventh embodiment.

The defect inspection imaging apparatus 20 of the modified example shown in FIG. 39 has a configuration in which the defect inspection imaging apparatus ₂₀ shown in FIG. Different from the embodiment.

Here, the imaging region R is a third imaging region R3 divided in the transport direction Y and further includes a third imaging region R3 adjacent to the second imaging region R2.

The second brightness adjusting polarizing filter (brightness adjusting means) _25-2 is arranged between the light source 21 and the third imaging region R3, adjacent to the first brightness adjusting polarizing filter _25-1 , and between the film 110 and the third polarizing filter 25-1. are arranged to form two half-crossed Nicol states. Here, the second half-crossed Nicols state is different from the first half-crossed Nicols state. That is, the cross angle between the polarization axes of the polarizing filter and the film in the second half-crossed Nicols state is different from the crossing angle between the polarization axes of the polarizing filter and the film in the first half-crossed Nicols state. . As a result, the second luminance adjusting polarizing filter ₂₅₂ can reduce the luminance value of the light with which the third imaging region R3 is irradiated. The second luminance adjusting polarizing filter ₂₅₂ may form a second half-crossed Nicols state with the film 110, and the third imaging region R3 is defined between the third imaging region R3 and the area sensor 22. The luminance value of transmitted light may be adjusted.

Next, a defect inspection method and an imaging method for defect inspection according to a modification of the seventh embodiment will be described.

First, the above-described first polarizing filter placement step is performed. Next, as described above, the first luminance adjusting polarizing filter _25-1 is placed between the light source 21 and the first polarizing filter _23-1 and between the light source 21 and the second imaging region R2. It is arranged to form a first half-crossed Nicols state with the film 110 . Next, the second brightness adjusting polarizing filter ₂₅₂ is arranged between the light source 21 and the third imaging region R3 so as to form a second half-crossed Nicols state with the film 110 . Thereby, it becomes possible to reduce the luminance value of the light irradiated to the second imaging region R2 and the third imaging region R3 (luminance adjustment step). A second luminance adjusting polarizing filter ₂₅₂ may be arranged between the third imaging region R3 and the area sensor 22 . Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

In the defect inspection imaging device 20, the defect inspection imaging method, the defect inspection system 10, and the defect inspection method of the modification of the seventh embodiment, the defect inspection imaging device 20, the defect inspection, and the defect inspection imaging device 20 of the seventh embodiment Advantages similar to those of the imaging method, defect inspection system 10, and defect inspection method can be obtained.
[Eighth Embodiment]

The defect inspection system and the defect inspection method according to the eighth embodiment of the present invention are the defect inspection system 10 and the defect inspection method for inspecting the film 110 having the polarization characteristics described above.

A defect inspection system 10A according to the eighth embodiment of the present invention has a configuration in which a defect inspection imaging device 20A is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. different. Further, the defect inspection imaging apparatus 20A shown in FIG. 24 has an attenuation filter (brightness adjustment means) instead of the first brightness adjustment polarizing filter (brightness adjustment means) ₂₅₁ in the defect inspection imaging apparatus 20 shown in FIG. 26 is different from the seventh embodiment. Also, the defect inspection imaging apparatus 20A differs from the seventh embodiment in that the cross angle of the polarization axis (polarization absorption axis) of the first polarizing filter ₂₃₁ with respect to the film 110 in the defect inspection imaging apparatus 20 is different.

The first polarizing filter ₂₃₁ forms a first half-crossed Nicols state with the first imaging area R1 of the film 110 . For example, as will be described later, the cross angle between the polarizing axis of the first polarizing filter ₂₃₁ and the polarizing axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. Also, the first polarizing filter ₂₃₁ is arranged between the first imaging region R1 of the film 110 and the area sensor 22 if the first half-crossed Nicols state is formed with the first imaging region R1. (See FIG. 35).

The attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the attenuation filter 26 can reduce the luminance value of the light with which the second imaging region R2 is irradiated. Also, the attenuation filter 26 may be arranged between the second imaging region R2 and the area sensor 22 to reduce the luminance value of light transmitted through the second imaging region R2.

Next, a defect inspection method and an imaging method for defect inspection according to the eighth embodiment of the present invention will be described.

First, the first polarizing filter ₂₃₁ is placed between the light source 21 and the first imaging region R1 of the film 110 so as to form a first half-crossed Nicols state with the film 110 (first polarization filter 231). filter placement step). A first polarizing filter ₂₃₁ may be arranged between the first imaging region R1 and the area sensor 22 . An attenuation filter 26 is then placed between the light source 21 and the second imaging region R2. This makes it possible to reduce the luminance value of the light with which the second imaging region R2 is irradiated (luminance adjustment step). An attenuation filter 26 may be arranged between the second imaging region R2 and the area sensor 22 .

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the eighth embodiment are also the defect inspection imaging device 20 and the defect inspection imaging method of the seventh embodiment. , defect inspection system 10, and defect inspection method.
[First Modification of Eighth Embodiment]

In the eighth embodiment, the defect inspection imaging apparatus 20A and the defect inspection imaging method that combine the half-crossed Nicols transmission method and the regular transmission method are exemplified. can be combined with law. A defect inspection imaging apparatus 20A and a defect inspection imaging method combining two different half-cross Nicol transmission methods and regular transmission methods will be exemplified below as a first modification of the eighth embodiment.

The defect inspection imaging apparatus 20A of the first modified example shown in FIG. 40 differs from the seventh embodiment in that the defect inspection imaging apparatus 20A shown in FIG. 24 further includes a second polarizing filter ₂₃₂ .

Here, the imaging region R is a third imaging region R3 divided in the transport direction Y and further includes a third imaging region R3 adjacent to the first imaging region R1.

A second polarizing filter _{23_2} is positioned adjacent to the first polarizing filter _{23_1} between the light source 21 and the third imaging region R3 to form a second half-crossed Nicols state with the film 110. are placed. Here, the second half-crossed Nicols state is different from the first half-crossed Nicols state. That is, the cross angle between the polarization axes of the polarizing filter and the film in the second half-crossed Nicols state is different from the crossing angle between the polarization axes of the polarizing filter and the film in the first half-crossed Nicols state. . The second polarizing filter _23-2 performs the third imaging independently of the first polarizing filter _23-1 if it is arranged to form a second half-crossed Nicols state with the third imaging region R3. It may be arranged between the region R3 and the area sensor 22 .

Next, a defect inspection method and an imaging method for defect inspection according to the first modification of the eighth embodiment will be described.

First, as described above, the first polarizing filter ₂₃₁ is arranged between the light source 21 and the first imaging region R1 of the film 110 so as to form the first half-crossed Nicols state with the film 110. (First polarizing filter placement step). Next, a second polarizing filter ₂₃₂ is placed between the light source 21 and the third imaging region R3 of the film 110 so as to form a second half-crossed Nicols state with the film 110 (second polarizing filter placement step). A second polarizing filter _23-2 may be arranged between the third imaging region R3 and the area sensor ₂₂ independently of the first polarizing filter 23-1. Next, the brightness adjustment process, the transport process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging apparatus 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the first modification of the eighth embodiment are also the defect inspection imaging apparatus 20 of the seventh embodiment. , defect inspection imaging method, defect inspection system 10, and defect inspection method.
[Second Modification of Eighth Embodiment]

In the eighth embodiment, the defect inspection imaging apparatus 20A and the defect inspection imaging method that combine the half-crossed Nicols transmission method and the regular transmission method are exemplified. good too. A defect inspection imaging apparatus 20A and a defect inspection imaging method combining two different half-cross Nicol transmission methods will be exemplified below as a second modification of the eighth embodiment.

In the defect inspection imaging device 20A of the second modified example, in the defect inspection imaging device 20A shown in FIG. ₂₅₁ is different from the eighth embodiment.

The first brightness adjusting polarizing filter (brightness adjusting means) ₂₅₁ is arranged between the light source 21 and the second imaging region R2 so as to form a second half-crossed Nicols state with the film 110. . Here, the second half-crossed Nicols state is different from the first half-crossed Nicols state. That is, the cross angle between the polarization axes of the polarizing filter and the film in the second half-crossed Nicols state is different from the crossing angle between the polarization axes of the polarizing filter and the film in the first half-crossed Nicols state. . As a result, the first luminance adjusting polarizing filter ₂₅₁ can reduce the luminance value of the light with which the second imaging region R2 is irradiated.

The first luminance adjusting polarizing filter ₂₅₁ may form a second half-crossed Nicols state with the film 110, is arranged between the second imaging region R2 and the area sensor 22, and is positioned between the second imaging region R2 and the area sensor 22. The luminance value of light transmitted through R2 may be adjusted.

Next, a defect inspection method and an imaging method for defect inspection according to a second modification of the eighth embodiment will be described.

First, as described above, the first polarizing filter ₂₃₁ is arranged between the light source 21 and the first imaging region R1 of the film 110 so as to form the first half-crossed Nicols state with the film 110. (First polarizing filter placement step). Next, the first luminance adjusting polarizing filter _25-1 is placed between the light source 21 and the first polarizing filter _23-1 , and between the light source 21 and the second imaging region R2, between the film 110 and the second imaging region R2. are arranged to form a half-crossed Nicols state of . This makes it possible to reduce the luminance value of the light with which the second imaging region R2 is irradiated (luminance adjustment step). A first luminance adjusting polarizing filter ₂₅₁ may be arranged between the second imaging region R2 and the area sensor 22 to adjust the luminance value of light transmitted through the second imaging region R2. Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the second modification of the eighth embodiment are also the defect inspection imaging device 20 of the seventh embodiment. , defect inspection imaging method, defect inspection system 10, and defect inspection method.
[Ninth Embodiment]

The defect inspection system and the defect inspection method according to the ninth embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarization characteristics described above.

A defect inspection system 10B according to the ninth embodiment of the present invention has a configuration in which a defect inspection imaging device 20B is provided instead of the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. different. 25 includes a light source 21A in place of the light source 21 and the first luminance adjusting polarization filter (luminance adjusting means) ₂₅₁ in the defect inspection imaging device 20 shown in FIG. The configuration is different from that of the seventh embodiment. Further, the defect inspection imaging apparatus 20B differs from the seventh embodiment in that the cross angle of the polarization axis (polarization absorption axis) of the first polarizing filter ₂₃₁ with respect to the film 110 in the defect inspection imaging apparatus 20 is different.

The first polarizing filter ₂₃₁ forms a first half-crossed Nicols state with the first imaging area R1 of the film 110 . For example, as will be described later, the cross angle between the polarizing axis of the first polarizing filter ₂₃₁ and the polarizing axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. The first polarizing filter ₂₃₁ may form a first half-crossed Nicols state with the first imaging region R1 of the film 110, and may be arranged between the light source 21A and the first imaging region R1. Alternatively, it may be arranged between the first imaging region R1 and the area sensor 22 (see FIG. 36).

The light source 21A has a luminance adjustment function that individually adjusts the luminance value of light applied to the first imaging region R1 and the luminance value of light applied to the second imaging region R2. As a result, the luminance value of the light applied to the first imaging region R1 can be made relatively large, and the luminance value of the light applied to the second imaging region R2 can be made relatively small. .

Next, a defect inspection method and an imaging method for defect inspection according to the ninth embodiment of the present invention will be described.

First, the first polarizing filter ₂₃₁ is placed between the light source 21 and the first imaging region R1 of the film 110 so as to form a first half-crossed Nicols state with the film 110 (first polarization filter 231). filter placement step). A first polarizing filter ₂₃₁ may be arranged between the first imaging region R1 and the area sensor 22 . Next, the light source 21A individually adjusts the luminance value of the light applied to the first imaging region R1 and the luminance value of the light applied to the second imaging region R2. This makes it possible to relatively increase the luminance value of the light irradiated to the first imaging region R1, and relatively decrease the luminance value of the light irradiated to the second imaging region R2. becomes possible (brightness adjustment process).

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20B, the defect inspection imaging method, the defect inspection system 10B, and the defect inspection method of the ninth embodiment are also the defect inspection imaging device 20 and the defect inspection imaging method of the seventh embodiment. , defect inspection system 10, and defect inspection method.
[Modification of the ninth embodiment]

In the ninth embodiment, the defect inspection imaging apparatus 20B and the defect inspection imaging method that combine the half-crossed Nicols transmission method and the regular transmission method are exemplified. can be combined with law. A defect inspection imaging apparatus 20B and a defect inspection imaging method combining two different half-crossed Nicol transmission methods and regular transmission methods will be exemplified below as modifications of the ninth embodiment.

The defect inspection image pickup apparatus 20B shown in FIG. 41 differs from the seventh embodiment in that the defect inspection image pickup apparatus 20B shown in FIG. 25 further includes a second polarizing filter ₂₃₂ .

Here, the imaging region R is a third imaging region R3 divided in the transport direction Y and further includes a third imaging region R3 adjacent to the first imaging region R1.

A second polarizing filter _{23_2} is positioned adjacent to the first polarizing filter _{23_1} between the light source 21 and the third imaging region R3 to form a second half-crossed Nicols state with the film 110. are placed. Here, the second half-crossed Nicols state is different from the first half-crossed Nicols state. That is, the cross angle between the polarization axes of the polarizing filter and the film in the second half-crossed Nicols state is different from the crossing angle between the polarization axes of the polarizing filter and the film in the first half-crossed Nicols state. . The second polarizing filter ₂₃₂ may form a second half-crossed Nicols state with the film 110 and may be arranged between the third imaging region R3 and the area sensor 22 .

Next, a defect inspection method and a defect inspection imaging method according to a modification of the ninth embodiment will be described.

First, as described above, the first polarizing filter ₂₃₁ is arranged between the light source 21 and the first imaging region R1 of the film 110 so as to form the first half-crossed Nicols state with the film 110. (First polarizing filter placement step). Next, a second polarizing filter ₂₃₂ is placed between the light source 21 and the third imaging region R3 of the film 110 so as to form a second half-crossed Nicols state with the film 110 (second polarizing filter placement step). A second polarizing filter ₂₃₂ may be arranged between the third imaging region R3 and the area sensor 22 . Next, the brightness adjustment process, the transport process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20B, the defect inspection imaging method, the defect inspection system 10B, and the defect inspection method of the modification of the ninth embodiment are also the defect inspection imaging device 20 and the defect inspection of the seventh embodiment. Advantages similar to those of the imaging method, defect inspection system 10, and defect inspection method can be obtained.
[Tenth embodiment]

A defect inspection system and a defect inspection method according to the tenth embodiment of the present invention are a defect inspection system and a defect inspection method for inspecting defects such as retardation films and battery separator films that do not have the above-described polarization characteristics. . The defect inspection system and defect inspection method according to the tenth embodiment can be applied to manufacturing apparatuses and manufacturing methods for retardation films, battery separator films, and the like that do not have polarization properties. In the production apparatus and production method of a retardation film having no polarization properties, a battery separator film, etc., points other than the defect inspection system and defect inspection method described in the tenth embodiment are known, so as described above. description is omitted. Other embodiments and modifications of the defect inspection system and defect inspection method for inspecting defects such as retardation films and battery separator films that do not have polarizing properties from the same viewpoint Retardation films that do not have polarizing properties The description of the manufacturing apparatus and manufacturing method for the battery separator film and the like is omitted. In the description of the tenth embodiment and its modifications, film 110 is a film that does not have polarizing properties.

A defect inspection system 10C according to the tenth embodiment of the present invention has a configuration in which a defect inspection imaging device 20C is provided instead of the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. different. 26 includes a pair of first polarizing filters _{23 1} and 24 ₁ instead of the first polarizing filter 23 ₁ in the defect inspection imaging device 20 shown in FIG. In addition to the first luminance adjusting polarizing filter 25 - ₁ , a first luminance adjusting polarizing filter 25 _{- 3} paired with the first luminance adjusting polarizing filter 25 - ₁ is provided, which is different from the seventh embodiment.

A first polarizing filter ₂₃₁ is placed between the light source 21 and the film 110, as in the seventh embodiment. Specifically, the first polarizing filter _23-1 is arranged between the light source 21 and the first imaging region R1 in the imaging region R. In this embodiment, the first polarizing filter ₂₃₁ is arranged so that half of the imaging region R in the transport direction Y is hidden from the area sensor 22 (knife edge).

On the other hand, the first polarizing filter ₂₄₁ is arranged between the film 110 and the area sensor 22 . Specifically, the first polarizing filter _24-1 is arranged between the first imaging region R1 and the area sensor 22 in the imaging region R. As shown in FIG. In this embodiment, the first polarizing filter ₂₄₁ is arranged so that half of the imaging region R in the transport direction Y is hidden from the area sensor 22 (knife edge).

Further, the first _luminance adjusting polarizing filter 25 1 of the pair of first luminance adjusting polarizing filters 25 ₁ and 25 ₃ is arranged between the light source 21 and the film 110 as in the seventh embodiment. It is On the other hand, the first luminance adjusting polarizing filter ₂₅₃ is arranged between the film 110 and the area sensor 22 . Specifically, the first luminance adjusting polarizing filter ₂₅₃ is arranged in the imaging region R between the second imaging region R2 and the area sensor 22 . In the tenth embodiment, the first luminance adjusting polarizing filter ₂₅₃ is half of the imaging region R in the transport direction Y (in the example of FIG. ) is hidden.

Also, the first polarizing filter _23-1 and the first polarizing filter _24-1 form a crossed Nicols state. On the other hand, the first luminance adjusting polarizing filter _25-1 forms a first half-crossed Nicols state with the first luminance adjusting polarizing filter _25-3 . For example, the cross angle of the polarization axes of the first luminance adjusting polarizing filter _25-1 and the first luminance adjusting polarizing filter _25-3 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. As a result, an image for crossed Nicols transmission inspection can be captured in the first imaging region R1, an image for half-crossed Nicols transmission inspection can be captured in the second imaging region R2, and an image for transmission scattering inspection can be captured in the intermediate imaging region R0. .

Next, a defect inspection method and an imaging method for defect inspection according to the tenth embodiment of the present invention will be described.

First, the first polarizing filter _23-1 is placed between the light source 21 and the first imaging region R1 of the film 110, and the first polarizing filter _24-1 is placed between the first imaging region R1 of the film 110 and the area sensor 22. be placed between At that time, the first polarizing filter _23-1 and the first polarizing filter _24-1 are arranged so as to form a crossed Nicols state (first polarizing filter arrangement step).

Next, the first luminance adjusting polarizing filter _25-1 is placed between the light source 21 and the first polarizing filter _23-1 and between the light source 21 and the second imaging region R2 for the first luminance adjusting. A polarizing filter ₂₅₃ is placed between the second imaging region R 2 of the film 110 and the area sensor 22 . At that time, the first luminance adjusting polarizing filter _25-1 and the first luminance adjusting polarizing filter _25-3 are arranged to form a first half-crossed Nicols state. As a result, it is possible to reduce the luminance value of the light that passes through the second imaging region R2 and is observed by the area sensor 22 (luminance adjustment step). The first luminance adjusting polarizing filter ₂₅₁ may be arranged only between the light source 21 and the second imaging region R2.

Also, instead of the first luminance adjusting polarizing filter _25-3 , the first polarizing filter _24-1 may be extended to the second imaging region R2. In that case, the first luminance adjusting polarizing filter _25-1 to the first polarizing filter _24-1 to form the first half-crossed Nicols state.

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

According to the defect inspection imaging apparatus 20C and the defect inspection imaging method according to the tenth embodiment, the pair of first polarizing filters 23 ₁ and 24 ₁ are connected to the light source (light irradiation means) 21 and the first imaging method. and between the area R1 and between the first imaging area R1 and the area sensor (imaging means) 22 so as to form a crossed Nicols state. Since the imaging region R including the imaging region R1, the second imaging region R2, and the intermediate imaging region R0 is captured as a two-dimensional image, the crossed Nicol transmission inspection image in the first imaging region R1 and the second imaging region A half-crossed Nicols (first half-crossed Nicols transmission) inspection image in R2 and a transmission scattering inspection image in the intermediate imaging region R0 can be captured simultaneously. That is, the crossed Nicols transmission inspection imaging series, the half-crossed Nicols (first half-crossed Nicols) transmission inspection imaging series, and the transmission scattering inspection imaging series can be integrated.

As a result, according to the defect inspection system 10C and the defect inspection method of the tenth embodiment, the crossed Nicols transmission inspection series, the half-crossed Nicols transmission inspection series, and the transmission scattering inspection series can be integrated.

Therefore, according to the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the tenth embodiment, the number of inspection sequences can be reduced.

Further, according to the defect inspection imaging apparatus 20C and the defect inspection imaging method of the tenth embodiment, the pair of first brightness adjustment polarization filters (brightness adjustment means) 25 ₁ and 25 ₃ allows the second It is possible to adjust the luminance value of the light that passes through the imaging region R2 and is observed by the area sensor 22 . Therefore, for example, by outputting light with a relatively large luminance value from the light source (light irradiation means) 21, the luminance value of the light irradiated to the first imaging region R1 for the crossed Nicol transmission inspection imaging series is increased. can be relatively large, while a pair of first luminance adjusting polarizing filters (luminance adjusting means) 25 ₁ and 25 ₃ provide a second imaging region R2 for the half-crossed Nicol transmission inspection imaging series. , and the luminance value of the light observed by the area sensor 22 can be made relatively small.

Further, according to the defect inspection imaging apparatus 20C and the defect inspection imaging method of the tenth embodiment, the pair of first luminance adjusting polarizing filters (luminance adjusting means) 25 ₁ and 25 ₃ are arranged in the first half Since a crossed Nicols state is formed, the detection of black foreign matter and weak bright spots can be enhanced.
[Modification of the tenth embodiment]

In the tenth embodiment, the imaging apparatus 20 for defect inspection and the imaging method for defect inspection that combine the crossed Nicols transmission method and the half-crossed Nicols transmission method are illustrated. A Nicol transmission method may be combined. A defect inspection imaging apparatus 20C and a defect inspection imaging method combining the crossed Nicols transmission method and two different half-crossed Nicols transmission methods will be exemplified below as modifications of the tenth embodiment.

A defect inspection imaging device 20C of a modified example shown in FIG. 42 further includes a pair of second luminance adjustment polarizing filters (luminance adjustment means) 25 ₂ and 25 ₄ in the defect inspection imaging device 20C shown in FIG. The configuration is different from that of the seventh embodiment.

Here, the imaging region R is a third imaging region R3 divided in the transport direction Y and further includes a third imaging region R3 adjacent to the second imaging region R2.

The second brightness adjusting polarizing filter (brightness adjusting means) _25-2 is arranged adjacent to the first brightness adjusting polarizing filter _25-1 between the light source 21 and the third imaging region R3, The second luminance adjusting polarizing filter _25-4 is arranged between the third imaging region R3 and the area sensor 22 and adjacent to the first luminance adjusting polarizing filter _25-3 . A pair of second luminance adjusting polarizing filters (luminance adjusting means) 25 ₂ and 25 ₄ are arranged to form a second half-crossed Nicols state. Here, the second half-crossed Nicols state formed by the pair of second luminance adjusting polarization filters (luminance adjusting means) 25 ₂ and 25 ₄ is different from the first half-crossed Nicols state. That is, the cross angle of the polarizing axes of the polarizing filter in the second half-crossed Nicols state is different from the crossing angle of the polarizing axes of the polarizing filter in the first half-crossed Nicols state. The filters 25 ₂ and 25 ₄ can reduce the luminance value of light observed by the area sensor 22 through the third imaging region R3.

Next, a defect inspection method and an imaging method for defect inspection according to a modification of the tenth embodiment will be described.

First, the above-described first polarizing filter placement step is performed. Next, as described above, the first luminance adjusting polarizing filter _25-1 is arranged between the light source 21 and the first polarizing filter _23-1 and between the light source 21 and the second imaging region R2. At the same time, the first luminance adjusting polarizing filter ₂₅₃ is arranged between the second imaging region R2 of the film 110 and the area sensor 22 . At that time, the first luminance adjusting polarizing filters 25 ₁ and 25 ₃ are arranged so as to form the first half-crossed Nicols state. Next, the second luminance adjusting polarizing filter 25 ₂ is arranged between the light source 21 and the third imaging region R 3 , and the second luminance adjusting polarizing filter 25 ₄ is used for the third imaging of the film 110 . It is arranged between the area R3 and the area sensor 22 . At that time, the second luminance adjusting polarizing filters 25 ₂ and 25 ₄ are arranged so as to form the second half-crossed Nicols state. This makes it possible to reduce the luminance value of light observed by the area sensor 22 through the second imaging region R2 and the third imaging region R3 (luminance adjustment step). The first luminance adjusting polarizing filter ₂₅₁ may be arranged only between the light source 21 and the second imaging region R2.

Also, instead of the first luminance adjusting polarizing filter _25-3 , the first polarizing filter _24-1 may be extended to the second imaging region R2. In that case, the first luminance adjusting polarizing filter _25-1 to the first polarizing filter _24-1 to form the first half-crossed Nicols state. Alternatively, instead of the second luminance adjusting polarizing filter ₂₅₄ , the first luminance adjusting polarizing filter ₂₅₃ may be extended to the third imaging region R3. The filter _25-2 may be arranged so as to form the second half-crossed Nicols state with respect to the first luminance adjusting polarizing filter _25-3 .

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

In the defect inspection imaging device 20C, the defect inspection imaging method, the defect inspection system 10C, and the defect inspection method of the modification of the tenth embodiment, the defect inspection imaging device 20C, the defect inspection, and the defect inspection imaging device 20C of the tenth embodiment Advantages similar to those of the imaging method, the defect inspection system 10C, and the defect inspection method can be obtained.
[Eleventh embodiment]

A defect inspection system and a defect inspection method according to the eleventh embodiment of the present invention are a defect inspection system and a defect inspection method for inspecting defects such as retardation films and battery separator films that do not have the above-described polarization characteristics. . In the description of the eleventh embodiment and its modifications, the film 110 is a film that does not have polarizing properties.

A defect inspection system 10D according to the eleventh embodiment of the present invention has a configuration in which a defect inspection imaging device 20D is provided instead of the defect inspection imaging device 20C in the defect inspection system 10C shown in FIG. different. Further, the defect inspection imaging device 20D shown in FIG. 27 has an attenuation filter (brightness adjustment means) instead of the first brightness adjustment polarization filter (brightness adjustment means) ₂₅₁ in the defect inspection imaging device 20C shown in FIG. 26 is different from the tenth embodiment. Further, the defect inspection imaging device 20D differs from the tenth embodiment in that the cross angle of the polarization axes (polarization absorption axes) of the pair of first polarizing filters 23 ₁ and 24 ₁ differs from the defect inspection imaging device 20C. different.

The first polarizing filter _23-1 and the first polarizing filter _24-1 form a first half-crossed Nicols state. For example, the cross angle between the polarizing axis of the first polarizing filter _23-1 and the polarizing axis of the first polarizing filter _24-1 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less.

The attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the attenuation filter 26 can reduce the luminance value of the light with which the second imaging region R2 is irradiated.

Next, a defect inspection method and an imaging method for defect inspection according to the eleventh embodiment of the present invention will be described.

First, the first polarizing filter _23-1 is placed between the light source 21 and the first imaging region R1 of the film 110, and the first polarizing filter _24-1 is placed between the first imaging region R1 of the film 110 and the area sensor 22. be placed between At that time, the first polarizing filter _23-1 and the first polarizing filter _24-1 are arranged so as to form a first half-crossed Nicols state (first polarizing filter arrangement step). An attenuation filter 26 is then placed between the light source 21 and the second imaging region R2. This makes it possible to reduce the luminance value of the light with which the second imaging region R2 is irradiated (luminance adjustment step). An attenuation filter 26 may be placed between the second imaging region R2 of the film 110 and the area sensor 22 to reduce the luminance value of light passing through the second imaging region R2.

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20D, the defect inspection imaging method, the defect inspection system 10D, and the defect inspection method of the eleventh embodiment are also the defect inspection imaging device 20C and the defect inspection imaging method of the tenth embodiment. , defect inspection system 10C, and defect inspection method.
[First Modification of Eleventh Embodiment]

In the eleventh embodiment, the defect inspection imaging apparatus 20D and the defect inspection imaging method that combine the half-crossed Nicols transmission method and the regular transmission method are exemplified. can be combined with law. A defect inspection imaging apparatus 20D and a defect inspection imaging method combining two different half-cross Nicol transmission methods and regular transmission methods will be exemplified below as a first modification of the eleventh embodiment.

The defect inspection imaging device 20D of the first modified example shown in FIG _. 43 is the same as the defect inspection imaging device _20D shown in FIG. Different from the embodiment.

Here, the imaging region R is a third imaging region R3 divided in the transport direction Y and further includes a third imaging region R3 adjacent to the first imaging region R1.

The second polarizing filter _23-2 is arranged adjacent to the first polarizing filter 23-1 between the light source 21 and the third _{imaging region R3, and the second polarizing filter 24-2 is} positioned adjacent to the third polarizing filter 23-1. and the area sensor 22 and adjacent to the first polarizing filter 24 ₁ . A pair of second polarizing filters 23 ₂ , 24 ₂ form a second half-crossed Nicols state. Here, the second half-crossed Nicols state is different from the first half-crossed Nicols state. That is, the cross angle of the polarizing axes of the polarizing filter in the second half-crossed Nicols state is different from the crossing angle of the polarizing axes of the polarizing filter in the first half-crossed Nicols state.

Next, a defect inspection method and an imaging method for defect inspection according to the first modification of the eleventh embodiment will be described.

First, as described above, the first polarizing filter _23-1 is placed between the light source 21 and the first imaging region R1 of the film 110, and the first polarizing filter _24-1 is placed in the first imaging region R1 of the film 110. It is arranged between R1 and the area sensor 22 . At that time, the first polarizing filter _23-1 and the first polarizing filter _24-1 are arranged so as to form a first half-crossed Nicols state (first polarizing filter arrangement step). Next, the second polarizing filter _23-2 is placed between the light source 21 and the third imaging region R3 of the film 110, and the second polarizing filter _24-2 is placed between the third imaging region R3 of the film 110 and the area sensor. 22. At that time, the second polarizing filters _{23_2} and _{24_2} are arranged so as to form a second half-crossed Nicols state (second polarizing filter arrangement step). Next, the brightness adjustment process, the transport process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20D, the defect inspection imaging method, the defect inspection system 10D, and the defect inspection method of the first modification of the eleventh embodiment are also the defect inspection imaging device 20C of the tenth embodiment. , defect inspection imaging method, defect inspection system 10C, and defect inspection method.
[Second Modification of Eleventh Embodiment]

In the eleventh embodiment, the defect inspection imaging apparatus 20D and the defect inspection imaging method that combine the half-crossed Nicols transmission method and the regular transmission method are exemplified. good too. A defect inspection imaging apparatus 20D and a defect inspection imaging method combining two different half-cross Nicol transmission methods will be exemplified below as a second modification of the eleventh embodiment.

In the defect inspection imaging device 20D of the second modified example, in the defect inspection imaging device 20D shown in FIG. Means) 25 ₁ and 25 ₃ differ from the eleventh embodiment.

The first brightness adjusting polarizing filter (brightness adjusting means) 25 - ₁ is arranged between the light source 21 and the second imaging region R 2 , and the first brightness adjusting polarizing filter 25 - ₃ is the second brightness adjusting means of the film 110 . is arranged between the imaging region R2 and the area sensor 22 . At that time, the pair of first luminance adjusting polarizing filters 25 ₁ and 25 ₃ are arranged so as to form the second half-crossed Nicols state. Here, the second half-crossed Nicols state is different from the first half-crossed Nicols state. That is, the cross angle of the polarizing axes of the polarizing filter in the second half-crossed Nicols state is different from the crossing angle of the polarizing axes of the polarizing filter in the first half-crossed Nicols state. Thus, the pair of first luminance adjusting polarizing filters 25 ₁ and 25 ₃ can reduce the luminance value of light passing through the second imaging region R2.

Next, a defect inspection method and an imaging method for defect inspection according to the second modification of the eleventh embodiment will be described.

First, as described above, the first polarizing filter _23-1 is placed between the light source 21 and the first imaging region R1 of the film 110, and the first polarizing filter _24-1 is placed in the first imaging region R1 of the film 110. It is arranged between R1 and the area sensor 22 . At that time, the first polarizing filter _23-1 and the first polarizing filter _24-1 are arranged so as to form a first half-crossed Nicols state (first polarizing filter arrangement step). Next, the first luminance adjusting polarizing filter _25-1 is placed between the light source 21 and the second imaging region R2, and the first luminance adjusting polarizing filter _25-3 is placed in the second imaging region of the film 110. It is arranged between R2 and the area sensor 22 . At that time, the pair of first luminance adjusting polarizing filters 25 ₁ and 25 ₃ are arranged so as to form the second half-crossed Nicols state. Thereby, it becomes possible to reduce the brightness value of the light transmitted through the second imaging region R2 (brightness adjustment step). Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20D, the defect inspection imaging method, the defect inspection system 10D, and the defect inspection method of the second modification of the eleventh embodiment are also the defect inspection imaging device 20C of the tenth embodiment. , defect inspection imaging method, defect inspection system 10C, and defect inspection method.
[Twelfth Embodiment]

A defect inspection system and a defect inspection method according to the twelfth embodiment of the present invention are a defect inspection system and a defect inspection method for inspecting defects such as retardation films and battery separator films that do not have the above-described polarization characteristics. . In the description of the twelfth embodiment and its modifications, film 110 is a film that does not have polarizing properties.

A defect inspection system 10E according to the twelfth embodiment of the present invention has a configuration in which a defect inspection imaging device 20E is provided instead of the defect inspection imaging device 20C in the defect inspection system 10C shown in FIG. different. 28 includes a light source 21A in place of the light source 21 and the first luminance adjusting polarization filter (luminance adjusting means) ₂₅₁ in the defect inspection imaging device 20C shown in FIG. The configuration is different from that of the tenth embodiment. Further, the defect inspection imaging device 20E differs from the tenth embodiment in that the cross angle of the polarization axes (polarization absorption axes) of the pair of first polarizing filters 23 ₁ and 24 ₁ differs from the defect inspection imaging device 20C. different.

The first polarizing filter _23-1 and the first polarizing filter _24-1 form a first half-crossed Nicols state. For example, the cross angle between the polarizing axis of the first polarizing filter _23-1 and the polarizing axis of the first polarizing filter _24-1 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less.

The light source 21A has a luminance adjustment function that individually adjusts the luminance value of light applied to the first imaging region R1 and the luminance value of light applied to the second imaging region R2. As a result, the luminance value of the light applied to the first imaging region R1 can be made relatively large, and the luminance value of the light applied to the second imaging region R2 can be made relatively small. .

Next, a defect inspection method and an imaging method for defect inspection according to the twelfth embodiment of the present invention will be described.

First, the first polarizing filter _23-1 is placed between the light source 21 and the first imaging region R1 of the film 110, and the first polarizing filter _24-1 is placed between the first imaging region R1 of the film 110 and the area sensor 22. be placed between At that time, the first polarizing filter _23-1 and the first polarizing filter _24-1 are arranged so as to form a first half-crossed Nicols state (first polarizing filter arrangement step). Next, the light source 21A individually adjusts the luminance value of the light applied to the first imaging region R1 and the luminance value of the light applied to the second imaging region R2. This makes it possible to relatively increase the luminance value of the light irradiated to the first imaging region R1, and relatively decrease the luminance value of the light irradiated to the second imaging region R2. becomes possible (brightness adjustment process).

Next, the carrying process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20E, the defect inspection imaging method, the defect inspection system 10E, and the defect inspection method of the twelfth embodiment are also the defect inspection imaging device 20C and the defect inspection imaging method of the tenth embodiment. , defect inspection system 10C, and defect inspection method.
[Modification of the twelfth embodiment]

In the twelfth embodiment, the defect inspection imaging apparatus 20E and the defect inspection imaging method that combine the half-crossed Nicols transmission method and the regular transmission method are exemplified. can be combined with law. A defect inspection imaging apparatus 20E and a defect inspection imaging method combining two different half-crossed Nicol transmission methods and regular transmission methods will be exemplified below as modifications of the twelfth embodiment.

The defect inspection imaging apparatus 20E shown in FIG. 44 differs from the tenth embodiment in that the defect inspection imaging apparatus 20E shown in FIG. 28 further includes a pair of second polarizing filters 23 ₂ and 24 ₂ .

Here, the imaging region R is a third imaging region R3 divided in the transport direction Y and further includes a third imaging region R3 adjacent to the first imaging region R1.

The second polarizing filter _23-2 is arranged adjacent to the first polarizing filter 23-1 between the light source 21 and the third imaging region R3, and the second polarizing filter _24-2 is _positioned adjacent to the third polarizing filter 23-1. and the area sensor 22 and adjacent to the first polarizing filter 24 ₁ . A pair of second polarizing filters 23 ₂ , 24 ₂ form a second half-crossed Nicols state. Here, the second half-crossed Nicols state is different from the first half-crossed Nicols state. That is, the cross angle of the polarizing axes of the polarizing filter in the second half-crossed Nicols state is different from the crossing angle of the polarizing axes of the polarizing filter in the first half-crossed Nicols state.

Next, a defect inspection method and an imaging method for defect inspection according to a modification of the twelfth embodiment will be described.

First, as described above, the first polarizing filter _23-1 is placed between the light source 21 and the first imaging region R1 of the film 110, and the first polarizing filter _24-1 is placed in the first imaging region R1 of the film 110. It is arranged between R1 and the area sensor 22 . At that time, the first polarizing filter _23-1 and the first polarizing filter _24-1 are arranged so as to form a first half-crossed Nicols state (first polarizing filter arrangement step). Next, the second polarizing filter _23-2 is placed between the light source 21 and the third imaging region R3 of the film 110, and the second polarizing filter _24-2 is placed between the third imaging region R3 of the film 110 and the area sensor. 22. At that time, the second polarizing filters _{23_2} and _{24_2} are arranged so as to form a second half-crossed Nicols state (second polarizing filter arrangement step). Next, the brightness adjustment process, the transport process, the light irradiation process, the imaging process, the defect detection process, and the marking process described above are performed.

The defect inspection imaging device 20E, the defect inspection imaging method, the defect inspection system 10E, and the defect inspection method of the modification of the twelfth embodiment are also the defect inspection imaging device 20C and the defect inspection of the tenth embodiment. Advantages similar to those of the imaging method, the defect inspection system 10C, and the defect inspection method can be obtained.

It should be noted that the present invention is not limited to the above-described embodiment, and various modifications are possible. For example, in the seventh, eighth, and ninth embodiments, the defect inspection imaging apparatuses 20, 20A, and 20B and the defect inspection imaging method using the transmission method were illustrated, but the features of the present invention are as shown in FIGS. As shown in FIGS. 30 and 31, it is also applicable to defect inspection imaging apparatuses 20, 20A, and 20B and a defect inspection imaging method using a reflection method.

29 illustrates the defect inspection imaging apparatus 20 and the defect inspection imaging method that combine the crossed Nicols reflection method and the half-crossed Nicols reflection method. The different half-crossed Nicol reflection methods described above may be combined. Further, FIG. 30 illustrates the defect inspection imaging apparatus 20A and the defect inspection imaging method that combine the half-crossed Nicol reflection method and the specular reflection method. A reflection method and a specular reflection method may be combined, or two or more different half-crossed Nicol reflection methods may be combined. 31 illustrates the defect inspection imaging apparatus 20B and the defect inspection imaging method that combine the half-crossed Nicol reflection method and the specular reflection method. A reflection method and a specular reflection method may be combined.

According to the defect inspection imaging apparatuses 20, 20A, _20B and the defect inspection imaging method shown in FIGS. 1 imaging region R1 and the film 110 so as to form a crossed Nicols state, and an area sensor (imaging means) 22 includes a first imaging region R1, a second imaging region R2, and an intermediate imaging region. Since the imaging region R including R0 is captured as a two-dimensional image, the crossed Nicols reflection inspection image in the first imaging region R1 and the regular reflection (or half crossed Nicols reflection) inspection image in the second imaging region R2. , and an image for reflection/scattering inspection in the intermediate imaging region R0 can be simultaneously captured. That is, the imaging series for crossed Nicol reflex inspection, the imaging series for half crossed Nicol reflex inspection (see FIG. 29) or the imaging series for specular reflection inspection (see FIGS. 30 and 31), and the imaging series for reflection scattering inspection are integrated. be able to. As a result, in the defect inspection systems 10, 10A, 10B and defect inspection methods, the crossed Nicols reflection inspection sequence, the half-crossed Nicols reflection inspection sequence or the specular reflection inspection sequence, and the reflection scattering inspection sequence can be integrated. The number of series can be reduced.

By the way, an appropriate luminance value of light differs between an imaging series for crossed Nicol reflection inspection and, for example, an imaging series for specular reflection inspection. More specifically, suitable light intensity values in the crossed Nicol test imaging series are relatively large, and suitable light intensity values in the specular reflection test imaging series, for example, are relatively small.

Regarding this point, according to the defect inspection imaging apparatuses 20, 20A, _20B and the defect inspection imaging method shown in FIGS. ) 26 and the light source (brightness adjusting means) 21A, the brightness value of the light applied to the second imaging region R2 can be adjusted. Therefore, for example, by outputting light having a relatively large luminance value from the light source (light irradiation means) 21 and the light source (luminance adjustment means) 21A, the first imaging region R1 for the crossed Nicol reflex inspection imaging series can relatively increase the brightness value of the light irradiating it, while the half _- cross Nicols The luminance value of the light illuminating the second imaging region R2 for the reflex test imaging series (see FIG. 29) or specular reflex testing imaging series (see FIGS. 30 and 31) can be made relatively small.

Similarly, in the tenth, eleventh, and twelfth embodiments, the defect inspection imaging apparatuses 20C, 20D, and 20E and the defect inspection imaging method using the transmission method were exemplified. , as shown in FIGS. 33 and 34, the present invention can also be applied to defect inspection imaging apparatuses 20C, 20D, and 20E and defect inspection imaging methods using the reflection method.

32 illustrates the defect inspection imaging apparatus 20C and the defect inspection imaging method that combine the crossed Nicols reflection method and the half-crossed Nicols reflection method. The different half-crossed Nicol reflection methods described above may be combined. In this case, for the third imaging region R3 illustrated in FIG. 42, the second luminance adjusting polarizing filter (luminance adjusting means) ₂₅₂ is placed between the light source 21 and the third imaging region R3. The second luminance adjusting polarizing filter _25-4 , which is arranged adjacent to the first luminance adjusting polarizing filter 25-1 and is paired with the second luminance adjusting polarizing filter (luminance adjusting means) _25-2 , is placed in the third luminance adjusting polarizing filter _25-4 . may be arranged adjacent to the first luminance adjusting polarizing filter ₂₅₃ between the imaging region R3 and the area sensor 22 .

Further, FIG. 33 illustrates the defect inspection imaging device 20D and the defect inspection imaging method that combine the half-crossed Nicol reflection method and the specular reflection method. A reflection method and a specular reflection method may be combined, or two or more different half-crossed Nicol reflection methods may be combined. In this case, for the third imaging region R3 illustrated in FIG. 43, as described in the first modification of the eleventh embodiment, the second polarizing filter ₂₃₂ is combined with the light source 21 and the third A second polarizing filter _24-2 , which is arranged adjacent to the first polarizing filter 23-1 and forms a pair with the second polarizing filter _23-2 , is placed between the imaging region R3 and the third _imaging region R3. It may be arranged adjacent to the first polarizing filter ₂₄₁ between the sensor 22, or an attenuation filter (brightness adjusting means) 26 as described in the second modification of the eleventh embodiment. Alternatively, a pair of first luminance adjusting polarizing filters (luminance adjusting means) 25 ₁ and 25 ₃ may be arranged so that they form the second half-crossed Nicols state. When a pair of first brightness adjusting polarizing filters (brightness adjusting means) 25 ₁ and 25 ₃ are employed, the first brightness adjusting polarizing filters (brightness adjusting means) 25 ₁ are arranged between the light source 21 and the second brightness adjusting means. The first brightness adjusting polarizing filter ₂₅₃ may be placed between the second imaging region R2 of the film 110 and the area sensor 22 .

Further, FIG. 34 illustrates the defect inspection imaging apparatus 20E and the defect inspection imaging method that combine the half-crossed Nicol reflection method and the specular reflection method. A reflection method and a specular reflection method may be combined. In this case, for the third imaging region R3 illustrated in FIG. 44, the second polarizing filter _23-2 is placed between the light source 21 and the third imaging region R3 and adjacent to the first polarizing filter _23-1 . and a second polarizing filter _24-2 paired with the second polarizing filter _23-2 is arranged between the third imaging region R3 and the area sensor 22 and adjacent to the first polarizing filter _24-1 . can be placed

According to the defect inspection imaging apparatuses _20C , 20D, and _20E and the defect inspection imaging method shown in FIGS. The area sensors ( Since the imaging means) 22 images the imaging region R including the first imaging region R1, the second imaging region R2 and the intermediate imaging region R0 as a two-dimensional image, the crossed Nicol reflex inspection in the first imaging region R1 is possible. An image, a specular reflection (or half-crossed Nicols reflection) inspection image in the second imaging region R2, and a reflection scattering inspection image in the intermediate imaging region R0 can be simultaneously captured. That is, the imaging series for crossed Nicols reflection inspection, the imaging series for half-crossed Nicols reflection (see FIG. 32) or the imaging series for specular reflection inspection (see FIGS. 33 and 34), and the imaging series for reflection scattering inspection are integrated. can be done. As a result, in the defect inspection systems 10C, 10D, and 10E and the defect inspection method, the crossed Nicols reflection inspection sequence, the half-crossed Nicols reflection inspection sequence or the specular reflection inspection sequence, and the reflection scattering inspection sequence can be integrated. The number of series can be reduced.

Further, according to the defect inspection imaging apparatuses 20C, 20D, and 20E and the defect inspection imaging method shown in _FIGS . 25 ₃ , the attenuation filter (brightness adjusting means) 26 and the light source (brightness adjusting means) 21A can adjust the brightness value of the light applied to the second imaging region R2. Therefore, for example, by outputting light having a relatively large luminance value from the light source (light irradiation means) 21 and the light source (luminance adjustment means) 21A, the first imaging region R1 for the crossed Nicol reflex inspection imaging series The luminance value of the light irradiated to the light source can be made relatively large, while the pair of first luminance adjusting polarizing filters (luminance adjusting means) 25 ₁ and 25 ₃ , the attenuation filter (luminance adjusting means) 26 and the light source (Brightness adjusting means) 21A sets the luminance value of the light irradiated to the second imaging region R2 for the half-crossed Nicol reflection imaging series (see FIG. 32) or specular reflection inspection imaging series (see FIGS. 33 and 34). can be relatively small.

In addition, in the eighth and ninth _embodiments and the forms shown in FIGS. 35, 36, 37 and 38, the first polarizing filter ₂₃₁ is connected to the first imaging region R1 of the film 110 and the area sensor (imaging means). 22 may be arranged.

FIG. 35 illustrates the defect inspection imaging apparatus 20A and the defect inspection imaging method that combine the half-crossed Nicols transmission method and the regular transmission method. and the specular transmission method, or two or more different half-crossed Nicol transmission methods may be combined. Further, FIG. 36 illustrates the defect inspection imaging apparatus 20B and the defect inspection imaging method that combine the half-crossed Nicols transmission method and the regular transmission method. A transmission method and a specular transmission method may be combined.

Further, FIG. 37 illustrates the defect inspection imaging apparatus 20A and the defect inspection imaging method that combine the half-crossed Nicol reflection method and the specular reflection method. A reflection method and a specular reflection method may be combined, or two or more different half-crossed Nicol reflection methods may be combined. Further, FIG. 38 illustrates the defect inspection imaging apparatus 20B and the defect inspection imaging method that combine the half-crossed Nicol reflection method and the specular reflection method. A reflection method and a specular reflection method may be combined.

In the description so far, when the luminance adjusting means is arranged separately from the light irradiating means, the luminance adjusting means is used to irradiate the second imaging region R2, to transmit the light to the second imaging region, or to transmit the second imaging region. were arranged so as to adjust the brightness of the light reflected by the imaging region R2. However, in a mode in which the brightness adjustment means is arranged separately from the light irradiation means, the light irradiated to at least one of the first and second imaging regions R1 and R2 or the light emitted to the first and second imaging regions R1 and R2 or reflected by at least one of the first and second imaging regions R1 and R2. Furthermore, in the form in which the light irradiation means is provided with the luminance adjustment means, the luminance adjustment means may be further provided separately from the luminance adjustment means arranged in the light irradiation means.

10, 10A, 10B, 10C, 10D, 10E Defect inspection system 20, 20A, 20B, 20C, 20D, 20E Imaging device for defect inspection 21 Light source (light irradiation means) 21A Light source (brightness adjustment means ), 22... Area sensor (imaging means), 22a... CCD or CMOS, 22b... Lens, ₂₃₁ , ₂₄₁ ... First polarizing filter, ₂₃₂ , ₂₄₂ ... Second polarizing filter, ₂₅₁ , ₂₅₃ 1st brightness adjusting polarizing filter (brightness adjusting means) 25 ₂ , 25 ₄ 2nd brightness adjusting polarizing filter (brightness adjusting means) 26 attenuation filter (brightness adjusting means) 30 image analysis section , 40... Marking device, 100... Manufacturing apparatus (film manufacturing apparatus), 101, 102, 103... Original fabric roll, 104, 105... Pasting roller, 106... Conveying roller, 110... Film, 111... Polarizing film body, 112... Adhesive material with separate film, 113... Surface protective film, R... Imaging area, R0... Intermediate imaging area, R1... First imaging area, R2... Second imaging area, R3... Third imaging area.

Claims (15)

An imaging device for defect inspection of a film having polarization properties,
a light irradiating means for irradiating an imaging area of the film;
an imaging means for imaging the imaging area of the film as a two-dimensional image;
A first light emitting device disposed between the light irradiation means and the imaging area of the film or between the imaging area of the film and the imaging means so as to form a crossed Nicols state with the film. a polarizing filter;
conveying means for conveying the film relative to the light irradiation means, the imaging means, and the first polarizing filter in a conveying direction;
with
The imaging area includes a first imaging area and a second imaging area divided in the transport direction,
The first polarizing filter is arranged between the light irradiation means and the first imaging area, or between the first imaging area and the imaging means,
Further comprising a luminance adjusting means for adjusting the luminance value of the light irradiated to the second imaging area, or transmitted through the second imaging area or reflected by the second imaging area,
The brightness adjustment means is an attenuation filter arranged between the light irradiation means and the second imaging area or between the second imaging area and the imaging means,
Imaging device for defect inspection. 2. The imaging apparatus for defect inspection according to claim 1, wherein said first polarizing filter is arranged between said light irradiation means and said first imaging area. An imaging device for defect inspection of a film having polarization properties,
a light irradiating means for irradiating an imaging area of the film;
an imaging means for imaging the imaging area of the film as a two-dimensional image;
A first light emitting device disposed between the light irradiation means and the imaging area of the film or between the imaging area of the film and the imaging means so as to form a crossed Nicols state with the film. a polarizing filter;
conveying means for conveying the film relative to the light irradiation means, the imaging means, and the first polarizing filter in a conveying direction;
with
The imaging area includes a first imaging area and a second imaging area divided in the transport direction,
The first polarizing filter is arranged between the light irradiation means and the first imaging area, or between the first imaging area and the imaging means,
At least one of the first imaging region and the second imaging region is irradiated, or transmitted through at least one of the first imaging region and the second imaging region or the first imaging region Further comprising a luminance adjusting means for adjusting the luminance value of the light reflected in at least one of the imaging region and the second imaging region,
the first polarizing filter forms a crossed Nicols state with the first imaging area of the film;
The brightness adjustment means is arranged between the light irradiation means and the second imaging area, or between the second imaging area and the imaging means, between the second imaging area and the first imaging area of the film. including a first luminance adjusting polarizing filter arranged to form a half-crossed Nicols state;
Imaging device for defect inspection. An imaging device for defect inspection of a film having polarization properties,
a light irradiating means for irradiating an imaging area of the film;
an imaging means for imaging the imaging area of the film as a two-dimensional image;
disposed between the light irradiation means and the imaging area of the film or between the imaging area of the film and the imaging means so as to form a first half-crossed Nicols state with the film a first polarizing filter;
conveying means for conveying the film relative to the light irradiation means, the imaging means, and the first polarizing filter in a conveying direction;
with
The imaging area includes a first imaging area and a second imaging area divided in the transport direction,
The first polarizing filter is arranged between the light irradiation means and the first imaging area, or between the first imaging area and the imaging means,
Further comprising a luminance adjusting means for adjusting the luminance value of the light irradiated to the second imaging area, or transmitted through the second imaging area or reflected by the second imaging area,
the first polarizing filter forms a first half-crossed Nicols state with the first imaging area of the film ;
The brightness adjustment means is an attenuation filter arranged between the light irradiation means and the second imaging area, or between the second imaging area and the imaging means,
Imaging device for defect inspection. The imaging area includes a third imaging area divided in the transport direction,
The brightness adjustment means is arranged between the light irradiation means and the third imaging area, or between the third imaging area and the imaging means, between the third imaging area and the second imaging area of the film. A second luminance adjusting polarizing filter arranged to form a half-crossed Nicols state, adjusting the luminance value of the light irradiated to the third imaging region ;
The imaging device for defect inspection according to claim 3 . The imaging area includes a third imaging area divided in the transport direction,
a second half-crossed nicol film disposed between the light irradiation means and the third imaging area or between the third imaging area and the imaging means; further comprising a second polarizing filter forming the state;
The imaging device for defect inspection according to claim 4 . An imaging device for defect inspection of a film having polarization properties,
a light irradiating means for irradiating an imaging area of the film;
an imaging means for imaging the imaging area of the film as a two-dimensional image;
disposed between the light irradiation means and the imaging area of the film or between the imaging area of the film and the imaging means so as to form a first half-crossed Nicols state with the film a first polarizing filter;
conveying means for conveying the film relative to the light irradiation means, the imaging means, and the first polarizing filter in a conveying direction;
with
The imaging area includes a first imaging area and a second imaging area divided in the transport direction,
The first polarizing filter is arranged between the light irradiation means and the first imaging area, or between the first imaging area and the imaging means,
At least one of the first imaging region and the second imaging region is irradiated, or transmitted through at least one of the first imaging region and the second imaging region or the first imaging region Further comprising a luminance adjusting means for adjusting the luminance value of the light reflected in at least one of the imaging region and the second imaging region,
the first polarizing filter forms a first half-crossed Nicols state with the first imaging area of the film;
The brightness adjusting means is arranged between the second imaging area and the second imaging area of the film between the light irradiation means and the second imaging area, or between the second imaging area and the imaging means. including a first luminance adjusting polarizing filter arranged to form a half-crossed Nicols state;
Imaging device for defect inspection. An imaging device for defect inspection of a film that does not have polarization properties,
a light irradiating means for irradiating an imaging area of the film;
an imaging means for imaging the imaging area of the film as a two-dimensional image;
A pair of first light emitting means and the imaging area of the film, and between the imaging area of the film and the imaging means, respectively, so as to form a crossed Nicols state . a polarizing filter;
conveying means for conveying the film relative to the light irradiation means, the imaging means, and the pair of first polarizing filters in a conveying direction;
with
The imaging area includes a first imaging area and a second imaging area divided in the transport direction,
The pair of first polarizing filters are arranged between the light irradiation means and the first imaging area and between the first imaging area and the imaging means,
Luminance adjusting means for adjusting a luminance value of light emitted to the second imaging region , transmitted through the second imaging region , or reflected by the second imaging region further comprising
The brightness adjustment means is an attenuation filter arranged between the light irradiation means and the second imaging area or between the second imaging area and the imaging means,
Imaging device for defect inspection. An imaging device for defect inspection of a film that does not have polarization properties,
a light irradiating means for irradiating an imaging area of the film;
an imaging means for imaging the imaging area of the film as a two-dimensional image;
A pair of first light emitting means and the imaging area of the film, and between the imaging area of the film and the imaging means, respectively, so as to form a crossed Nicols state . a polarizing filter;
conveying means for conveying the film relative to the light irradiation means, the imaging means, and the pair of first polarizing filters in a conveying direction;
with
The imaging area includes a first imaging area and a second imaging area divided in the transport direction,
The pair of first polarizing filters are arranged between the light irradiation means and the first imaging area and between the first imaging area and the imaging means,
At least one of the first imaging region and the second imaging region is irradiated, or transmitted through at least one of the first imaging region and the second imaging region or the first imaging region Further comprising a luminance adjusting means for adjusting the luminance value of the light reflected in at least one of the imaging region and the second imaging region,
The luminance adjustment means is arranged between the light irradiation means and the second imaging area and between the second imaging area and the imaging means so as to form a first half-crossed Nicols state. including a pair of first brightness adjustment polarizing filters,
Imaging device for defect inspection. An imaging device for defect inspection of a film that does not have polarization properties,
a light irradiating means for irradiating an imaging area of the film;
an imaging means for imaging the imaging area of the film as a two-dimensional image;
A pair of light emitting means and the imaging area of the film, and between the imaging area of the film and the imaging means, respectively, so as to form a first half - crossed Nicols state. a first polarizing filter;
conveying means for conveying the film relative to the light irradiation means, the imaging means, and the pair of first polarizing filters in a conveying direction;
with
The imaging area includes a first imaging area and a second imaging area divided in the transport direction,
The pair of first polarizing filters are arranged between the light irradiation means and the first imaging area and between the first imaging area and the imaging means,
Further comprising a luminance adjusting means for adjusting the luminance value of the light irradiated to the second imaging area, or transmitted through the second imaging area or reflected by the second imaging area,
The brightness adjustment means is an attenuation filter arranged between the light irradiation means and the second imaging area, or between the second imaging area and the imaging means,
Imaging device for defect inspection. The imaging area includes a third imaging area divided in the transport direction,
The luminance adjustment means is arranged between the light irradiation means and the third imaging area and between the third imaging area and the imaging means so as to form a second half-crossed Nicols state. a pair of second luminance adjusting polarizing filters, which adjusts the luminance value of the light irradiated to the third imaging region;
The imaging device for defect inspection according to claim 9 . The imaging area includes a third imaging area divided in the transport direction,
A pair of light irradiating means and the third imaging area and between the third imaging area and the imaging means are arranged so as to form a second half-crossed Nicols state. further comprising a second polarizing filter;
The imaging device for defect inspection according to claim 10 . An imaging device for defect inspection of a film that does not have polarization properties,
a light irradiating means for irradiating an imaging area of the film;
an imaging means for imaging the imaging area of the film as a two-dimensional image;
A pair of light emitting means and the imaging area of the film, and between the imaging area of the film and the imaging means, respectively, so as to form a first half - crossed Nicols state. a first polarizing filter;
conveying means for conveying the film relative to the light irradiation means, the imaging means, and the pair of first polarizing filters in a conveying direction;
with
The imaging area includes a first imaging area and a second imaging area divided in the transport direction,
The pair of first polarizing filters are arranged between the light irradiation means and the first imaging area and between the first imaging area and the imaging means,
At least one of the first imaging region and the second imaging region is irradiated, or transmitted through at least one of the first imaging region and the second imaging region or the first imaging region Further comprising a luminance adjustment means for adjusting the luminance value of the light reflected in at least one of the imaging region and the second imaging region,
The luminance adjustment means is arranged between the light irradiation means and the second imaging area and between the second imaging area and the imaging means so as to form a second half-crossed Nicols state. including a pair of first brightness adjustment polarizing filters,
Imaging device for defect inspection. An imaging device for defect inspection according to any one of claims 1 to 13 ;
a detection unit that detects defects present in the film based on the two-dimensional image captured by the defect inspection imaging device;
A defect inspection system. A film manufacturing apparatus comprising the defect inspection system according to claim 14 .

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