JP2003098102A - Method and apparatus for inspecting surface - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method and an apparatus for inspecting surfaces whereby the detecting ability can be improved and costs can be reduced without a photo sensitive material for heat developing being exposed to light even when the photosensitive material is used as a test object. SOLUTION: The surface inspection apparatus 1 for inspecting surface defects of the test object 2 is provided with a light source 3 for irradiating the test object 2 with light, and a sensor 4 for receiving reflecting light or transmitted light from the test object 2. The test object 2 is made the transferred sheet-like photosensitive material for heat developing, and the light source 3 is made a nearly white light source or a light emitting diode. When the light source 3 is made the nearly white light source, a wavelength selecting means 9 is provided for selecting and passing a wavelength of light to be irradiated from the nearly white light source.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface inspection method and apparatus for inspecting a surface defect of an inspection object.

[0002]

2. Description of the Related Art A light from a light source is applied to an inspection object such as a film or a web, and the light reflected or transmitted by the inspection object is received by a light receiving means (sensor) such as a CCD camera or a photodiode array. A surface inspection device for inspecting a surface defect of an inspection target is known.

[0003]

By the way, when the inspection object to be inspected by such a surface inspection apparatus is, for example, a silver salt dry film which is a photosensitive material for heat development, the silver salt dry film is transparent. Since it has a film, when a light source of a single wavelength such as a laser is used in the inspection stage, it is exposed to light and cannot be used as a product. Therefore, it is conceivable to reduce the amount of laser light to use, but if the amount of light is reduced, the amount of light received by the light receiving means decreases, and it is not possible to obtain a sufficient amount of light for detection, resulting in poor detection power. . In addition, the laser
Since the wavelength range is narrow and it is a single wavelength, when a silver salt dry film having a transparent film is to be inspected, it is easily affected by film thickness interference noise and formation noise, and the detection power can be improved. could not. Also, lasers are expensive and costly.

The present invention has been made in view of the above circumstances, and even when a photothermographic material is used as an inspection target, the detection power can be improved without being exposed to light, and the cost can be reduced. It is an object of the present invention to provide a surface inspection method and device that can be used.

[0005]

In order to solve the above-mentioned problems, the invention of claim 1 irradiates an inspection object with light, and receives reflected light or transmitted light from the inspection object with a sensor. A surface inspection method for inspecting a surface defect of the inspection object by a light amount change on the sensor, wherein the inspection object is a sheet-shaped photothermographic material being conveyed, and the light source is When the light source is a substantially white light source or a light emitting diode and the light source is a substantially white light source, the wavelength of the light emitted from the substantially white light source is selected and transmitted.

According to the first aspect of the invention, since the substantially white light source has a wider wavelength range than a laser, it is possible to irradiate light having a wavelength in a range where the photothermographic material is not exposed to light. It is difficult for the photosensitive material for heat development to be exposed. Further, since the light emitting diode has a wavelength in a range in which the photothermographic material is not exposed to light, the photothermographic material is not easily exposed to light even when irradiated. Also, since a substantially white light source has a wide wavelength range,
As compared with a laser, it is possible to make it less susceptible to film thickness interference noise and formation noise due to the photothermographic material, and it is possible to improve the detection power. Further, the substantially white light source and the light emitting diode are cheaper than the laser, leading to cost reduction.

When a light emitting diode is used as the light source, the wavelength range is narrow and limited to some extent.
Unlike the case of using a substantially white light source, it is not necessary to select the wavelength of the irradiation light and transmit the light.

According to a second aspect of the present invention, there is provided a light source for irradiating the inspection object with light, and a sensor for receiving reflected light or transmitted light from the inspection object. A surface inspection apparatus for inspecting a surface defect of the inspection object, wherein the inspection object is a sheet-shaped photothermographic material being conveyed, and the light source is a substantially white light source or a light emitting diode, When the light source is a substantially white light source, the light source includes a wavelength selection unit that selects a wavelength of light emitted from the substantially white light source and transmits the wavelength.

According to the second aspect of the present invention, since the substantially white light source has a wider wavelength range than the laser, it is possible to irradiate light having a wavelength within a range in which the photosensitive material for heat development is not exposed. It is difficult for the photosensitive material for heat development to be exposed. Further, since the light emitting diode has a wavelength in a range in which the photothermographic material is not exposed to light, the photothermographic material is not easily exposed to light even when irradiated. Also, since a substantially white light source has a wide wavelength range,
As compared with a laser, it is possible to make it less susceptible to film thickness interference noise and formation noise due to the photothermographic material, and it is possible to improve the detection power. Further, the substantially white light source and the light emitting diode are cheaper than the laser, leading to cost reduction.

When a light emitting diode is used as the light source, the wavelength range is narrow and limited to some extent.
There is no need for wavelength selection means as in the case of using a substantially white light source.

According to a third aspect of the present invention, in the surface inspection apparatus according to the second aspect, the wavelength selecting means is an absorption type optical filter that blocks light other than a specific wavelength.

According to the invention of claim 3, the absorption type optical filter blocks light other than a specific wavelength and irradiates only the light having the specific wavelength to the inspection object, thereby making it difficult to expose the inspection object to light. be able to. Furthermore, the cost is low, the cost can be reduced, and the adjustment is easy.

According to a fourth aspect of the present invention, in the surface inspection apparatus according to the third aspect, the wavelength selecting means is provided in a plurality of types according to the wavelength of the light to be cut off. Of these, when using an absorption optical filter that blocks light of wavelengths below the near-infrared light, an absorption optical filter that blocks light on the long wavelength side is an absorption optical filter that blocks light on the short wavelength side. It is characterized in that it is arranged at a position farther from the light source than the filter.

According to the invention of claim 4, in the absorption type optical filter for blocking the light on the longer wavelength side, the heat energy of the light absorbed by the absorption type optical filter becomes large, but the wavelength of this long wavelength side is long. By arranging an absorption optical filter that blocks light on the side away from the light source,
The heat dissipation effect can be improved.

According to a fifth aspect of the invention, in the surface inspection apparatus according to the fourth aspect, the light source is installed in a light source box that covers the light source, and the light from the light source is placed in the light source box outside the light source box. An optical filter holder having an opening for irradiating the optical filter is installed, the absorption type optical filter is provided in the optical filter holder so as to face the opening, and the absorption type optical filter and the optical filter are provided. An elastic body is interposed between the holder and the holder.

According to the invention of claim 5, since the light source is arranged in the light source box, it is possible to irradiate the absorptive optical filter with all the diffused light and prevent the inspection object from being exposed to light. it can. Further, even if the absorption optical filter is thermally expanded by the light absorbed by the absorption type optical filter, the elastic body does not directly contact the absorption type optical filter with the optical filter holder, so that the absorption type optical filter is broken. Can be prevented.

According to a sixth aspect of the present invention, in the surface inspection apparatus according to the fourth aspect, the light source is installed in a light source box that covers the light source, and the light from the light source is placed in the light source box outside the light source box. A holder for an optical filter having an opening for irradiating the optical filter is installed, the absorption type optical filter in the holder for the optical filter faces the opening, and is separated from the holder for an optical filter at a predetermined interval. It is characterized by being provided.

According to the invention of claim 6, since the light source is arranged in the light source box, it is possible to irradiate the absorptive optical filter with all the diffused light and prevent the inspection object from being exposed. it can. Further, since the absorptive optical filter and the optical filter holder are provided with a predetermined interval, even if the absorptive optical filter thermally expands, the absorptive optical filter is an optical filter. Hard to contact the holder for
Therefore, it is possible to prevent the absorption type optical filter from cracking.

According to a seventh aspect of the present invention, in the surface inspection apparatus according to the fourth aspect, the light source is installed in a light source box that covers the light source, and the light from the light source is placed in the light source box outside the light source box. There is an optical filter holder with an opening for irradiating to, and a plurality of absorption optical filters are attached to this optical filter holder.
It is characterized in that it is provided so as to face the opening and to face each other with a predetermined distance therebetween.

According to the invention of claim 7, since the light source is arranged in the light source box, it is possible to irradiate the absorptive optical filter with all the diffused light and prevent the inspection object from being exposed. it can. Further, since the absorptive optical filters are provided so as to face each other with a predetermined space therebetween, even if the absorptive optical filters are thermally expanded by the light absorbed in the absorptive optical filter, it is difficult for the absorptive optical filters to come into contact with each other. Therefore, it is possible to prevent the absorption type optical filter from cracking.

The invention of claim 8 is the surface inspection apparatus according to any one of claims 3 to 7, wherein the specific wavelength is a wavelength on the longer wavelength side of 5% or more than the peak sensitivity wavelength of the inspection object. It is characterized by

According to the invention of claim 8, since the specific wavelength is a wavelength region in which the inspection target has low sensitivity, the inspection target is less likely to be exposed to light even when irradiated with light of such specific wavelength. . In addition, a sufficient amount of light for detecting the surface can be obtained, and high detection power can be obtained.

The specific wavelength is defined as a wavelength on the longer wavelength side of 5% or more than the peak sensitivity wavelength of the inspection target, because the specific wavelength is less than 5% on the long wavelength side of the peak sensitivity wavelength of the inspection target. This is because the inspection target has a wavelength range having high sensitivity when the wavelength is set to, and the inspection target is exposed to light by irradiating light having such a wavelength.

According to a ninth aspect of the present invention, in the surface inspection apparatus according to any of the third to seventh aspects, the specific wavelength is a wavelength shorter than the peak sensitivity wavelength of the inspection target by 5% or more. It is characterized by

According to the invention of claim 9, since the specific wavelength is a wavelength region in which the inspection target has low sensitivity, the inspection target is less likely to be exposed to light even when irradiated with light of such specific wavelength. . In addition, a sufficient amount of light for detecting the surface can be obtained, and high detection power can be obtained.

The specific wavelength is defined as a wavelength shorter than the peak sensitivity wavelength of the inspection object by 5% or more. That is, the specific wavelength is shorter than the peak sensitivity wavelength of the inspection object by less than 5%. This is because the inspection target has a wavelength range having high sensitivity when the wavelength is set to, and the inspection target is exposed to light by irradiating light having such a wavelength.

According to a tenth aspect of the invention, in the surface inspection apparatus according to the second aspect, the wavelength selecting means is an interference filter.

According to the invention of claim 10, claims 3 to 9
As compared with the case where the wavelength selection unit is an absorption type optical filter as described above, the interference filter transmits or reflects the irradiated light without absorbing it, so that the heat dissipation effect can be further improved. . In addition, it is possible to make the inspection target less likely to be exposed to light by allowing the interference filter to transmit or reflect only the light of a specific wavelength. Furthermore, the cost is low, the cost can be reduced, and the adjustment is easy.

The invention of claim 11 is the surface inspection apparatus according to any one of claims 2 to 10, wherein the sensor is
It has a high sensitivity to a specific wavelength of the light transmitted by the wavelength selection means.

According to the invention of claim 11, the detection power can be further improved by the sensor.

[0031]

DESCRIPTION OF THE PREFERRED EMBODIMENTS First and second embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a side view showing a configuration of a surface inspection apparatus according to a first embodiment of the present invention, and FIG. 2 is a schematic view showing a spectral sensitivity characteristic of an inspection target. As shown in FIG. 1, the surface inspection apparatus 1 according to the first embodiment of the present invention receives a light source 3 that irradiates an inspection target 2 with light and a reflected light or a transmitted light from the inspection target 2. An apparatus that has a sensor 4 and inspects a surface defect of the inspection target 2 by a change in the amount of light on the sensor 4.

The inspection target 2 is, for example, a long sheet-shaped photosensitive material for heat development, that is, a silver salt dry film, which is conveyed in the arrow direction D shown in FIG. 1 by a conveying means (not shown). . The sensor 4 is, for example, a CCD
It is provided in the camera 5 and includes a photodiode sensor and the like. The light source 3 is a substantially white light source, and examples thereof include a halogen lamp. The light source 3 is arranged in a light source box 6 that covers the light source 3. The light source box 6 receives light from the light source 3
An optical filter holder 8 having an opening 7 for irradiating the outside of the optical disk is installed.

The surface inspection apparatus 1 also comprises a wavelength selection means 9 for selecting the wavelength of the light emitted from the substantially white light source 3 and transmitting it. The wavelength selecting means 9 is absorption type optical filters 9a ₁ and 9a ₂ that block light other than a specific wavelength. The specific wavelength is, as shown in FIG. 2, a wavelength B that is 5% or more longer than the peak sensitivity wavelength A of the inspection target 2 or a 5% or more shorter wavelength side than the peak sensitivity wavelength A of the inspection target 2. Is the wavelength C. That is, when the peak sensitivity wavelength A of the inspection target 2 is, for example, 830 nm, the specific wavelengths B and C have a wavelength of 870 nm or more on the long wavelength side and a wavelength of 788 nm or less on the short wavelength side. In addition,
When the inspection target 2 is a silver salt dry film, the specific wavelength is generally 900 nm to 1000 nm.

Here, the specific wavelength is a wavelength B which is 5% or more longer than the peak sensitivity wavelength A of the inspection object 2, or
The wavelength C on the short wavelength side of 5% or more means that the specific wavelength is a wavelength a on the long wavelength side of less than 5% or less than the peak sensitivity wavelength A of the inspection target 2 or on the short wavelength side of 5% or more. Wavelength b
Then, the inspection target 2 is in a wavelength region having high sensitivity, and the inspection target 2 is exposed to light by irradiating the inspection target 2 with light having such a wavelength. In FIG. 2, the vertical axis represents the sensitivity of the silver salt dry film that is the inspection target 2, and the horizontal axis represents the wavelength. The sensor 4 has a high sensitivity to the specific wavelengths B and C, and improves the detection power.

Here, in the case of using the absorption type optical filter having a plurality of different cutoff wavelengths in the region of the specific wavelength B, the absorption type optical filter 9a ₁ for cutting off the light on the longer wavelength side, There is an absorption type optical filter 9a ₂ which blocks light on the short wavelength side. As shown in FIG. 1, the absorption optical filters 9a ₁ and 9a ₂ are provided so as to face the opening 7 of the optical filter holder 8 and block the light on the long wavelength side. The absorptive optical filter 9a ₁ is arranged at a position farther from the light source 3 than the absorptive optical filter 9a ₂ that blocks light on the shorter wavelength side. These two absorption type optical filters 9a ₁ and 9a ₂ are in contact with each other. Further, the absorption type optical filter 9a ₁ for blocking the light on the longer wavelength side is used.
Between the front side of the and the optical filter holder 8,
The elastic body 10 is interposed. Examples of the elastic body 10 include those having a cushion such as a leaf spring.

In the light source box 6, the light source 3
A cylindrical lens 11 for converging the light emitted from the device in at least one direction is provided. Further, between the light source box 6 and the inspection object 2, a plane mirror 12 for receiving the light transmitted through the _two absorption type optical filters 9a ₁ and 9a ₂ is provided, and the light reflected by the plane mirror 12 is The light is received by the concave mirror 13. The concave mirror 13 squeezes light in a direction orthogonal to the direction in which the light is condensed by the cylindrical lens 11 and irradiates the inspection target 2 with the light. Next, the light reflected or transmitted by the inspection object 2 is received by the light receiving lens 14 provided in front of the CCD camera 5 having the sensor 4, and the CCD camera 5 outputs a signal waveform.

Next, the operation of the surface inspection apparatus 1 thus constructed will be described. The light emitted from the substantially white light source 3 is narrowed down in a certain direction by the cylindrical lens 11, and further two absorption type optical filters 9a ₁ and 9a are used.
_{By 2} , the light having the specific wavelength B or less is blocked from the wavelength components included in the light transmitted through the cylindrical lens 11, only the light having the specific wavelength B is selected and transmitted, and the flat mirror 12 is irradiated with the light. Then, the light is reflected by the plane mirror 12 and directed toward the concave mirror 13, and the light received by the concave mirror 13 is condensed. Then, the condensed light is applied to the inspection object 2, and the light reflected or transmitted through the inspection object 2 is received by the light receiving lens 14. The light received by the light receiving lens 14 is converted into an electric signal by the CCD camera 5 and a signal waveform is output.

According to the first embodiment of the present invention, since the substantially white light source 3 has a wide wavelength range, it is possible to irradiate light having a wavelength in a range in which the inspection object 2 is not exposed, and the inspection object 2 is Hard to be exposed to light. In addition, the substantially white light source 3 is the inspection target 2
It is possible to reduce the influence of film thickness interference noise and formation noise due to, and to improve the detection power. Further, the substantially white light source 3 is less expensive than a laser and leads to cost reduction.

By making the absorption type optical filters 9a ₁ and 9a ₂ block the light having a specific wavelength B or less and irradiating only the light having the specific wavelength B to the inspection object 2, the inspection object 2 is made difficult to be exposed to light. You can

By disposing the absorptive optical filter 9a ₁ for blocking the light on the longer wavelength side at a position farther from the light source 3 than the absorptive optical filter 9a ₂ for blocking the light on the shorter wavelength side, The heat dissipation effect can be improved.

Since the light source 3 is arranged in the light source box 6, all the diffused light can be applied to the absorption type optical filters 9a ₁ and 9a ₂ and the inspection object 2 can be prevented from being exposed. Further, the elastic body 10 can prevent cracking even when the light absorbed by the absorption optical filters 9a ₁ and 9a ₂ is thermally expanded.

Since the specific wavelength B is a wavelength region in which the inspection object 2 has a low sensitivity, it is difficult to be exposed to light even when irradiated with the light of the specific wavelength B. In addition, a sufficient amount of light for detecting the surface can be obtained, and high detection power can be obtained.

Next, a second embodiment of the present invention will be described. FIG. 3 is a side view showing the configuration of the surface inspection apparatus according to the second embodiment of the present invention. The second aspect of the present invention
The surface inspection apparatus according to the second embodiment is the absorption type optical filter 9a ₁ in the surface inspection apparatus 1 according to the first embodiment.
The installation structure of 9a ₂ is different, and the rest is the same configuration as that of the first embodiment. Therefore, the same components are designated by the same reference numerals, and the description thereof will be omitted. Only the different points will be described. To do.

That is, also in the surface inspection apparatus 21 according to the second embodiment of the present invention, the absorption type optical filter 9a ₁ for blocking the light with the longer wavelength side and the absorption type optical filter for blocking the light with the shorter wavelength side are used. It is provided with an optical filter 9a ₂ . The absorptive optical filters 9a ₁ and 9a ₂ are provided so as to face the opening 7 of the optical filter holder 8, and the absorptive optical filter 9a ₁ for blocking light on the long wavelength side is provided. , Is arranged at a position farther from the light source 3 than the absorption type optical filter 9a ₂ that blocks light on the short wavelength side.

Further, the absorption type optical filter 9a ₁ and the optical filter holder 8 for blocking the light of the longer wavelength side, and the absorption type optical filter 9a ₂ and the optical filter for blocking the light of the shorter wavelength side are used. What is the holder 8?
They are provided at predetermined intervals. Further, an absorption type optical filter 9 for blocking the light on the longer wavelength side.
The a ₁ and the absorptive optical filter 9a ₂ that blocks the light on the short wavelength side are provided to face each other with a predetermined space therebetween.

According to the second embodiment of the present invention, the absorption type optical filters 9a ₁ and 9a ₂ and the optical filter holder 8 are provided so as to be separated by a predetermined distance, and the absorption type optical filter 9a _{1 is also provided.} Since 9a ₂ and 9a ₂ are provided so as to face each other with a predetermined gap, even if the absorption type optical filters 9a ₁ and 9a ₂ are thermally expanded, it is possible to prevent the absorption type optical filters 9a ₁ and 9a _{2 from} being cracked.

The same effects can be obtained for the same components as those of the first embodiment.

In the first and second embodiments of the present invention, the light source 3 is a substantially white light source, but this light source may be a light emitting diode. In this case, the light emitting diode is a photosensitive material for heat development (silver salt dry film).
Has a wavelength in the range that does not sensitize, it is difficult for the photothermographic material to be exposed even when the photothermographic material is irradiated. Further, it is not necessary to provide the wavelength selection means 9 which is the absorption type optical filters 9a ₁ and 9a ₂ as described above.

In the first and second embodiments,
Absorption type optical filter 9a as the wavelength selecting means 9₁,
9a₂Was used, but this absorption type optical filter 9a₁, 9a
₂An interference filter may be used instead of. This dried
For example, the wavelength filter selects light with a wavelength of 1000 nm.
Select and transmit. You can use an interference filter like this
For example, the absorption type optical filter 9a₁, 9a ₂Unlike, Teru
Because it transmits or reflects the emitted light without absorbing it,
The heat dissipation effect can be further improved. Also, the inspection pair
The elephant 2 can be made difficult to be exposed to light. In addition, cheap
Reduces costs and facilitates adjustment.

In the first embodiment, the absorption type optical filters 9a ₁ and 9a ₂ are provided in the optical filter holder 8 so as to be in contact with each other.
For example, as in the second embodiment, the absorption type optical filters 9a ₁ and 9a ₂ may be provided so as to be spaced from each other by a predetermined distance. Further, although the absorption type optical filter 9a ₂ for blocking the light on the short wavelength side and the optical filter holder 8 are in contact with each other, for example, they may be provided at a predetermined interval as in the second embodiment. Alternatively, an elastic body 10 may be further provided between the absorption type optical filter 9a ₂ and the optical filter holder 8.
These combinations can be changed appropriately.

Further, with respect to the cylindrical lens 11, the plane mirror 12, the concave mirror 13 and the like which compose the surface inspection apparatuses 1 and 21 described in the first and second embodiments of the present invention, the gist of the present invention is deviated. It can be appropriately changed within a range that does not exist.

[0052]

According to the invention of claim 1, the photothermographic material to be inspected is difficult to be exposed. Further, it is less susceptible to film thickness interference noise and formation noise due to the photothermographic material, and the detection power can be improved. Furthermore, it is cheaper than a laser and leads to cost reduction.

According to the second aspect of the invention, the photothermographic material to be inspected is difficult to be exposed. Further, it is less susceptible to film thickness interference noise and formation noise due to the photothermographic material, and the detection power can be improved. Furthermore, it is cheaper than a laser and leads to cost reduction.

According to the third aspect of the invention, it is possible to obtain the same effect as that of the second aspect, and it is possible to make it difficult to expose the inspection object to light. Further, the cost is low, the cost can be reduced, and the adjustment is easy.

According to the invention of claim 4, not only the same effect as that of claim 3 can be obtained, but also the heat radiation effect can be improved.

According to the invention of claim 5, it is of course possible to obtain the same effect as in claim 4, and it is possible to prevent the inspection object from being exposed to light. Further, it is possible to prevent the absorption type optical filter from cracking due to thermal expansion.

According to the invention of claim 6, it is possible to obtain the same effect as in claim 4, and it is possible to prevent the inspection object from being exposed to light. Further, it is possible to prevent the absorption type optical filter from cracking due to thermal expansion.

According to the invention of claim 7, it is possible to obtain the same effect as that of claim 4, and it is possible to prevent the inspection object from being exposed to light. Further, it is possible to prevent the absorption type optical filter from cracking due to thermal expansion.

According to the invention of claim 8, it is of course possible to obtain the same effect as that of any one of claims 3 to 7, and it is difficult for the inspection object to be exposed to light. In addition, a sufficient amount of light for detecting the surface can be obtained, and high detection power can be obtained.

According to the invention of claim 9, it is of course possible to obtain the same effect as that of any one of claims 3 to 7, and it is difficult for the inspection object to be exposed to light. In addition, a sufficient amount of light for detecting the surface can be obtained, and high detection power can be obtained.

According to the invention of claim 10, the same effect as that of claim 2 can be obtained, and of course, claim 3
9 to 9, the heat radiation effect can be further improved by the interference filter as compared with the case where the wavelength selection means is an absorption type optical filter. Further, it is possible to make it difficult for the inspection target to be exposed to light. Furthermore, the cost is low, the cost can be reduced, and the adjustment is easy.

According to the invention of claim 11, claims 2 to 1
The same effect as any of 0 can be obtained, and the detection power can be further improved.

[Brief description of drawings]

FIG. 1 is a side view showing a configuration of a surface inspection device for showing a first embodiment of the present invention.

FIG. 2 is a schematic diagram showing a spectral sensitivity characteristic of an inspection target.

FIG. 3 is a side view showing a configuration of a surface inspection device for showing a second embodiment of the present invention.

[Explanation of symbols]

1, 21 Surface inspection device 2 Inspection target 3 Light source 4 Sensor 6 Light source box 7 Opening 8 Optical filter holder 9 Wavelength selection means 9a ₁ , 9a ₂ Absorption optical filter 10 Elastic body A Peak sensitivity wavelength B, C Specific wavelength

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Yoshio Sawazumi             Konica Stock, 1 Sakura-cho, Hino City, Tokyo             In the company (72) Inventor Kazuhiro Sakino             Konica Stock, 1 Sakura-cho, Hino City, Tokyo             In the company F term (reference) 2G051 AA41 BA06 BA08 BA20 BB07                       BB09 BB11 CA01 CA04 CB01                       CB02

Claims (11)

[Claims] 1. An inspection target is irradiated with light, reflected light or transmitted light from the inspection target is received by a sensor, and a surface defect of the inspection target is inspected by a light amount change on the sensor. A surface inspection method, wherein the inspection target is a sheet-shaped heat-developable photosensitive material being conveyed, the light source is a substantially white light source or a light emitting diode, and the light source is a substantially white light source, A surface inspection method, wherein a wavelength of light emitted from the substantially white light source is selected and transmitted. 2. A light source for irradiating an object to be inspected with light,
A sensor for receiving reflected light or transmitted light from the inspection object, a surface inspection apparatus for inspecting a surface defect of the inspection object by a change in the amount of light on the sensor, wherein the inspection object is The sheet-shaped photosensitive material for heat development being conveyed, wherein the light source is a substantially white light source or a light emitting diode, and when the light source is a substantially white light source, the wavelength of light emitted from the substantially white light source. A surface inspection apparatus comprising a wavelength selection means for selecting and transmitting the light. 3. The surface inspection apparatus according to claim 2, wherein the wavelength selection unit is an absorption type optical filter that blocks light other than a specific wavelength. 4. The surface inspection apparatus according to claim 3, wherein the wavelength selection unit is provided in a plurality of types according to the wavelength of the light to be blocked, and among the plurality of types of absorption type optical filters, near infrared rays are used. When using an absorption optical filter that blocks light of a wavelength of light or less, the absorption optical filter that blocks light on the long wavelength side is a light source that is more than the absorption optical filter that blocks light on the short wavelength side. A surface inspection device characterized in that the surface inspection device is arranged at a position far from the. 5. The surface inspection apparatus according to claim 4, wherein the light source is installed in a light source box that covers the light source, and the light source box has an opening for irradiating light from the light source to the outside of the light source box. An optical filter holder having is installed, the absorption type optical filter is provided in the optical filter holder so as to face the opening, and the space between the absorption type optical filter and the optical filter holder is provided. A surface inspection apparatus, in which an elastic body is interposed. 6. The surface inspection apparatus according to claim 4, wherein the light source is installed in a light source box that covers the light source, and the light source box has an opening for irradiating light from the light source to the outside of the light source box. An optical filter holder having the above is installed, and the absorption type optical filter is provided in the optical filter holder facing the opening and at a predetermined distance from the optical filter holder. Surface inspection device characterized by. 7. The surface inspection apparatus according to claim 4, wherein the light source is installed in a light source box that covers the light source, and the light source box has an opening for irradiating light from the light source to the outside of the light source box. An optical filter holder provided with is provided, and a plurality of absorption type optical filters are provided in the optical filter holder so as to face the opening and face each other at a predetermined interval. A surface inspection device characterized in that 8. The surface inspection apparatus according to claim 3, wherein the specific wavelength is a wavelength on the longer wavelength side of 5% or more than the peak sensitivity wavelength of the inspection target. Surface inspection device. 9. The surface inspection apparatus according to claim 3, wherein the specific wavelength is a wavelength shorter than the peak sensitivity wavelength of the inspection target by 5% or more. Surface inspection device. 10. The surface inspection apparatus according to claim 2, wherein the wavelength selection unit is an interference filter. 11. The surface inspection apparatus according to claim 2, wherein the sensor has a high sensitivity to a specific wavelength of the light transmitted by the wavelength selection unit. .