TW200834060A - Defect inspection apparatus and method for light transmittance material - Google Patents

Defect inspection apparatus and method for light transmittance material

Info

Publication number
TW200834060A
TW200834060A TW096147632A TW96147632A TW200834060A TW 200834060 A TW200834060 A TW 200834060A TW 096147632 A TW096147632 A TW 096147632A TW 96147632 A TW96147632 A TW 96147632A TW 200834060 A TW200834060 A TW 200834060A
Authority
TW
Taiwan
Prior art keywords
light
defect inspection
light transmittance
inspection apparatus
polarizer
Prior art date
Application number
TW096147632A
Other languages
Chinese (zh)
Other versions
TWI480539B (en
Inventor
Takeshi Nakajima
Takeshi Wakita
Ippei Takahashi
Manabu Higuchi
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200834060A publication Critical patent/TW200834060A/en
Application granted granted Critical
Publication of TWI480539B publication Critical patent/TWI480539B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Textile Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

A first and a second polarizers are set above and below a running film such as a cross Nicol. By means of irradiating light from a projector and passing through the first polarizer on the film and receiving the light from the second polarizer by a light receiver, the defect of the film is inspected. A band pass filter is set between the first polarizer and the projector. The band pass filter eliminates the light from the projector with a wavelength area of 420nm or less and 700nm or more. The precision of defect inspection is improved, because the light with a needless wavelength area is not incident into the light receiver.
TW096147632A 2007-01-16 2007-12-13 Defect inspection apparatus and method for light transmittance material TWI480539B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007007028A JP5024935B2 (en) 2007-01-16 2007-01-16 Device and method for detecting defect of light transmitting member

Publications (2)

Publication Number Publication Date
TW200834060A true TW200834060A (en) 2008-08-16
TWI480539B TWI480539B (en) 2015-04-11

Family

ID=39702706

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096147632A TWI480539B (en) 2007-01-16 2007-12-13 Defect inspection apparatus and method for light transmittance material

Country Status (4)

Country Link
JP (1) JP5024935B2 (en)
KR (1) KR101366633B1 (en)
CN (1) CN101226158A (en)
TW (1) TWI480539B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011033564A (en) * 2009-08-05 2011-02-17 Sumitomo Chemical Co Ltd Optical film inspection method
KR101300132B1 (en) * 2011-01-31 2013-08-26 삼성코닝정밀소재 주식회사 Apparatus for detecting particle in flat glass and detecting method using same
JP5399453B2 (en) * 2011-08-31 2014-01-29 富士フイルム株式会社 Defect inspection apparatus and method for patterned retardation film, and manufacturing method
JP5422620B2 (en) * 2011-08-31 2014-02-19 富士フイルム株式会社 Defect detection apparatus and method for patterned retardation film, and manufacturing method
EP2647949A1 (en) 2012-04-04 2013-10-09 Siemens VAI Metals Technologies GmbH Method and device for measuring the flatness of a metal product
CN102706898A (en) * 2012-05-30 2012-10-03 昆山明本光电有限公司 Texture observer and application method thereof
JP6156820B2 (en) * 2013-08-22 2017-07-05 住友化学株式会社 Defect inspection apparatus, optical member manufacturing system, and optical display device production system
DE102015003019A1 (en) 2015-03-06 2016-09-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and device for the optical detection of movement in a biological sample with spatial extent
CN107024482B (en) * 2015-12-15 2020-11-20 住友化学株式会社 Defect imaging device and method, film manufacturing device and method, and defect inspection method
JP6924002B2 (en) * 2016-07-22 2021-08-25 日東電工株式会社 Inspection equipment and inspection method
US10241036B2 (en) * 2017-05-08 2019-03-26 Siemens Energy, Inc. Laser thermography
CN116858141B (en) * 2023-09-02 2023-12-05 江苏迪牌新材料有限公司 Flatness detection device for PVC film

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01263540A (en) * 1988-04-15 1989-10-20 Hitachi Ltd Pattern detecting apparatus
JPH07270325A (en) * 1994-03-30 1995-10-20 Ricoh Co Ltd Defect inspector
JP2003098102A (en) * 2001-09-25 2003-04-03 Konica Corp Method and apparatus for inspecting surface
JP4033443B2 (en) * 2002-01-22 2008-01-16 日本化薬株式会社 Dye-type polarizing film and polarizing plate
JP4396160B2 (en) * 2003-07-31 2010-01-13 住友化学株式会社 Foreign film inspection method for transparent film
WO2005015275A1 (en) * 2003-08-07 2005-02-17 Nippon Kayaku Kabushiki Kaisha Dye-containing polarizer
TW200519373A (en) * 2003-10-27 2005-06-16 Nikon Corp Surface inspection device and method
JP2005274156A (en) * 2004-03-22 2005-10-06 Olympus Corp Flaw inspection device
JP2006030962A (en) * 2004-05-14 2006-02-02 Fuji Photo Film Co Ltd Optical cellulose acylate film, polarizing plate and liquid crystal display device
JP2006078426A (en) * 2004-09-13 2006-03-23 Konica Minolta Holdings Inc Apparatus and method for inspecting defect
KR100639371B1 (en) * 2004-10-07 2006-10-26 엘지전자 주식회사 SMS service method in the multimedia playing process in the mobile communication terminal
JP4613090B2 (en) * 2005-04-21 2011-01-12 東芝三菱電機産業システム株式会社 Inspection device
JP4960026B2 (en) * 2006-06-09 2012-06-27 富士フイルム株式会社 Film defect inspection apparatus and film manufacturing method

Also Published As

Publication number Publication date
CN101226158A (en) 2008-07-23
TWI480539B (en) 2015-04-11
KR101366633B1 (en) 2014-02-24
JP2008175565A (en) 2008-07-31
JP5024935B2 (en) 2012-09-12
KR20080067573A (en) 2008-07-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees