TWI462884B - 退火裝置 - Google Patents
退火裝置 Download PDFInfo
- Publication number
- TWI462884B TWI462884B TW101146340A TW101146340A TWI462884B TW I462884 B TWI462884 B TW I462884B TW 101146340 A TW101146340 A TW 101146340A TW 101146340 A TW101146340 A TW 101146340A TW I462884 B TWI462884 B TW I462884B
- Authority
- TW
- Taiwan
- Prior art keywords
- pneumatic
- seal
- cooling
- bottom plate
- unit
- Prior art date
Links
- 238000000137 annealing Methods 0.000 title claims description 41
- 238000001816 cooling Methods 0.000 claims description 53
- 238000007789 sealing Methods 0.000 claims description 41
- 238000003780 insertion Methods 0.000 claims description 22
- 230000037431 insertion Effects 0.000 claims description 22
- 239000007789 gas Substances 0.000 claims description 16
- 239000000112 cooling gas Substances 0.000 claims description 13
- 238000004891 communication Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 10
- 230000008602 contraction Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Recrystallisation Techniques (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110138696A KR101288992B1 (ko) | 2011-12-20 | 2011-12-20 | 어닐링 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201341323A TW201341323A (zh) | 2013-10-16 |
TWI462884B true TWI462884B (zh) | 2014-12-01 |
Family
ID=48632537
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101146340A TWI462884B (zh) | 2011-12-20 | 2012-12-10 | 退火裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5555306B2 (ko) |
KR (1) | KR101288992B1 (ko) |
CN (1) | CN103172256B (ko) |
TW (1) | TWI462884B (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108878317B (zh) * | 2018-06-07 | 2020-12-11 | 云谷(固安)科技有限公司 | 一种激光退火装置和方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5415729A (en) * | 1992-02-12 | 1995-05-16 | Balzers Aktiengesellschaft | Vacuum treatment apparatus |
JPH11111640A (ja) * | 1997-09-30 | 1999-04-23 | Sanyo Electric Co Ltd | レーザアニール装置 |
JP2003014125A (ja) * | 2001-06-29 | 2003-01-15 | Fuji Kiko:Kk | 溶液を有する処理装置の開口部シール構造 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5291923A (en) * | 1992-09-24 | 1994-03-08 | Internatinal Business Machines Corporation | Door opening system and method |
JP3156920B2 (ja) * | 1996-05-15 | 2001-04-16 | 日本エー・エス・エム株式会社 | 半導体処理装置 |
KR100633244B1 (ko) * | 2004-09-09 | 2006-10-11 | 덕양산업주식회사 | 발포금형의 튜브실링장치 |
KR100796611B1 (ko) * | 2006-11-06 | 2008-01-22 | 코닉시스템 주식회사 | 어닐링 윈도우 |
JP5540476B2 (ja) * | 2008-06-30 | 2014-07-02 | 株式会社Ihi | レーザアニール装置 |
KR20100098782A (ko) * | 2009-03-02 | 2010-09-10 | 이연호 | 주름성형용 측면압착형 금속관파지장치 및 이 측면압착형 금속관파지장치가 설치된 주름금속관 성형장치 |
KR101089625B1 (ko) * | 2009-07-03 | 2011-12-06 | 에이피시스템 주식회사 | 탈산소 모듈을 가지는 레이저 열처리장치 |
-
2011
- 2011-12-20 KR KR1020110138696A patent/KR101288992B1/ko active IP Right Grant
-
2012
- 2012-12-10 TW TW101146340A patent/TWI462884B/zh active
- 2012-12-18 JP JP2012275835A patent/JP5555306B2/ja active Active
- 2012-12-18 CN CN201210551881.7A patent/CN103172256B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5415729A (en) * | 1992-02-12 | 1995-05-16 | Balzers Aktiengesellschaft | Vacuum treatment apparatus |
JPH11111640A (ja) * | 1997-09-30 | 1999-04-23 | Sanyo Electric Co Ltd | レーザアニール装置 |
JP2003014125A (ja) * | 2001-06-29 | 2003-01-15 | Fuji Kiko:Kk | 溶液を有する処理装置の開口部シール構造 |
Also Published As
Publication number | Publication date |
---|---|
CN103172256A (zh) | 2013-06-26 |
CN103172256B (zh) | 2015-05-13 |
KR101288992B1 (ko) | 2013-08-16 |
TW201341323A (zh) | 2013-10-16 |
JP5555306B2 (ja) | 2014-07-23 |
JP2013138200A (ja) | 2013-07-11 |
KR20130071285A (ko) | 2013-06-28 |
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