TWI462884B - 退火裝置 - Google Patents

退火裝置 Download PDF

Info

Publication number
TWI462884B
TWI462884B TW101146340A TW101146340A TWI462884B TW I462884 B TWI462884 B TW I462884B TW 101146340 A TW101146340 A TW 101146340A TW 101146340 A TW101146340 A TW 101146340A TW I462884 B TWI462884 B TW I462884B
Authority
TW
Taiwan
Prior art keywords
pneumatic
seal
cooling
bottom plate
unit
Prior art date
Application number
TW101146340A
Other languages
English (en)
Chinese (zh)
Other versions
TW201341323A (zh
Inventor
Sang Hee Yang
Ki Ung Lee
Sung Jin Kim
Jin Young An
Original Assignee
Ap Systems Inc
Samsung Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ap Systems Inc, Samsung Display Co Ltd filed Critical Ap Systems Inc
Publication of TW201341323A publication Critical patent/TW201341323A/zh
Application granted granted Critical
Publication of TWI462884B publication Critical patent/TWI462884B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Recrystallisation Techniques (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
TW101146340A 2011-12-20 2012-12-10 退火裝置 TWI462884B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110138696A KR101288992B1 (ko) 2011-12-20 2011-12-20 어닐링 장치

Publications (2)

Publication Number Publication Date
TW201341323A TW201341323A (zh) 2013-10-16
TWI462884B true TWI462884B (zh) 2014-12-01

Family

ID=48632537

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101146340A TWI462884B (zh) 2011-12-20 2012-12-10 退火裝置

Country Status (4)

Country Link
JP (1) JP5555306B2 (ko)
KR (1) KR101288992B1 (ko)
CN (1) CN103172256B (ko)
TW (1) TWI462884B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108878317B (zh) * 2018-06-07 2020-12-11 云谷(固安)科技有限公司 一种激光退火装置和方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5415729A (en) * 1992-02-12 1995-05-16 Balzers Aktiengesellschaft Vacuum treatment apparatus
JPH11111640A (ja) * 1997-09-30 1999-04-23 Sanyo Electric Co Ltd レーザアニール装置
JP2003014125A (ja) * 2001-06-29 2003-01-15 Fuji Kiko:Kk 溶液を有する処理装置の開口部シール構造

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5291923A (en) * 1992-09-24 1994-03-08 Internatinal Business Machines Corporation Door opening system and method
JP3156920B2 (ja) * 1996-05-15 2001-04-16 日本エー・エス・エム株式会社 半導体処理装置
KR100633244B1 (ko) * 2004-09-09 2006-10-11 덕양산업주식회사 발포금형의 튜브실링장치
KR100796611B1 (ko) * 2006-11-06 2008-01-22 코닉시스템 주식회사 어닐링 윈도우
JP5540476B2 (ja) * 2008-06-30 2014-07-02 株式会社Ihi レーザアニール装置
KR20100098782A (ko) * 2009-03-02 2010-09-10 이연호 주름성형용 측면압착형 금속관파지장치 및 이 측면압착형 금속관파지장치가 설치된 주름금속관 성형장치
KR101089625B1 (ko) * 2009-07-03 2011-12-06 에이피시스템 주식회사 탈산소 모듈을 가지는 레이저 열처리장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5415729A (en) * 1992-02-12 1995-05-16 Balzers Aktiengesellschaft Vacuum treatment apparatus
JPH11111640A (ja) * 1997-09-30 1999-04-23 Sanyo Electric Co Ltd レーザアニール装置
JP2003014125A (ja) * 2001-06-29 2003-01-15 Fuji Kiko:Kk 溶液を有する処理装置の開口部シール構造

Also Published As

Publication number Publication date
CN103172256A (zh) 2013-06-26
CN103172256B (zh) 2015-05-13
KR101288992B1 (ko) 2013-08-16
TW201341323A (zh) 2013-10-16
JP5555306B2 (ja) 2014-07-23
JP2013138200A (ja) 2013-07-11
KR20130071285A (ko) 2013-06-28

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