CN103172256B - 退火装置 - Google Patents

退火装置 Download PDF

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Publication number
CN103172256B
CN103172256B CN201210551881.7A CN201210551881A CN103172256B CN 103172256 B CN103172256 B CN 103172256B CN 201210551881 A CN201210551881 A CN 201210551881A CN 103172256 B CN103172256 B CN 103172256B
Authority
CN
China
Prior art keywords
pneumatic
cooling
unit
entrance port
annealing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201210551881.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN103172256A (zh
Inventor
梁相熙
李基雄
金圣进
安珍荣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Display Co Ltd
AP Cells Inc
Original Assignee
Samsung Display Co Ltd
AP Cells Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Co Ltd, AP Cells Inc filed Critical Samsung Display Co Ltd
Publication of CN103172256A publication Critical patent/CN103172256A/zh
Application granted granted Critical
Publication of CN103172256B publication Critical patent/CN103172256B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Recrystallisation Techniques (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
CN201210551881.7A 2011-12-20 2012-12-18 退火装置 Active CN103172256B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110138696A KR101288992B1 (ko) 2011-12-20 2011-12-20 어닐링 장치
KR10-2011-0138696 2011-12-20

Publications (2)

Publication Number Publication Date
CN103172256A CN103172256A (zh) 2013-06-26
CN103172256B true CN103172256B (zh) 2015-05-13

Family

ID=48632537

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201210551881.7A Active CN103172256B (zh) 2011-12-20 2012-12-18 退火装置

Country Status (4)

Country Link
JP (1) JP5555306B2 (ko)
KR (1) KR101288992B1 (ko)
CN (1) CN103172256B (ko)
TW (1) TWI462884B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108878317B (zh) * 2018-06-07 2020-12-11 云谷（固安）科技有限公司 一种激光退火装置和方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5976312A (en) * 1996-05-15 1999-11-02 Asm Japan K.K. Semiconductor processing apparatus
KR20110003159A (ko) * 2009-07-03 2011-01-11 에이피시스템 주식회사 탈산소 모듈을 가지는 레이저 열처리장치
CN102077322A (zh) * 2008-06-30 2011-05-25 株式会社Ihi 激光退火装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59306704D1 (de) * 1992-02-12 1997-07-17 Balzers Hochvakuum Vakuumbearbeitungsanlage
US5291923A (en) * 1992-09-24 1994-03-08 Internatinal Business Machines Corporation Door opening system and method
JPH11111640A (ja) * 1997-09-30 1999-04-23 Sanyo Electric Co Ltd レーザアニール装置
JP2003014125A (ja) * 2001-06-29 2003-01-15 Fuji Kiko:Kk 溶液を有する処理装置の開口部シール構造
KR100633244B1 (ko) * 2004-09-09 2006-10-11 덕양산업주식회사 발포금형의 튜브실링장치
KR100796611B1 (ko) * 2006-11-06 2008-01-22 코닉시스템 주식회사 어닐링 윈도우
KR20100098782A (ko) * 2009-03-02 2010-09-10 이연호 주름성형용 측면압착형 금속관파지장치 및 이 측면압착형 금속관파지장치가 설치된 주름금속관 성형장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5976312A (en) * 1996-05-15 1999-11-02 Asm Japan K.K. Semiconductor processing apparatus
CN102077322A (zh) * 2008-06-30 2011-05-25 株式会社Ihi 激光退火装置
KR20110003159A (ko) * 2009-07-03 2011-01-11 에이피시스템 주식회사 탈산소 모듈을 가지는 레이저 열처리장치

Also Published As

Publication number Publication date
JP2013138200A (ja) 2013-07-11
TW201341323A (zh) 2013-10-16
KR20130071285A (ko) 2013-06-28
CN103172256A (zh) 2013-06-26
JP5555306B2 (ja) 2014-07-23
TWI462884B (zh) 2014-12-01
KR101288992B1 (ko) 2013-08-16

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: SAMSUNG DISPLAY CO., LTD.

Effective date: 20131104

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20131104

Address after: Gyeonggi Do, South Korea

Applicant after: Ap Cells Inc.

Applicant after: Samsung Display Co., Ltd.

Address before: Gyeonggi Do, South Korea

Applicant before: Ap Cells Inc.

C14 Grant of patent or utility model
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20171009

Address after: Gyeonggi Do city of East China South Beach east beach all 8 road 15-5

Co-patentee after: Samsung Display Co., Ltd.

Patentee after: Ap Cells Inc.

Address before: Gyeonggi Do, South Korea

Co-patentee before: Samsung Display Co., Ltd.

Patentee before: Ap Cells Inc.