TWI457699B - 防塵薄膜組件框架 - Google Patents

防塵薄膜組件框架 Download PDF

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Publication number
TWI457699B
TWI457699B TW102116299A TW102116299A TWI457699B TW I457699 B TWI457699 B TW I457699B TW 102116299 A TW102116299 A TW 102116299A TW 102116299 A TW102116299 A TW 102116299A TW I457699 B TWI457699 B TW I457699B
Authority
TW
Taiwan
Prior art keywords
pellicle frame
pellicle
frame
width
mask adhesive
Prior art date
Application number
TW102116299A
Other languages
English (en)
Chinese (zh)
Other versions
TW201400978A (zh
Inventor
Kazutoshi Sekihara
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of TW201400978A publication Critical patent/TW201400978A/zh
Application granted granted Critical
Publication of TWI457699B publication Critical patent/TWI457699B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW102116299A 2012-05-11 2013-05-08 防塵薄膜組件框架 TWI457699B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012109518A JP5746662B2 (ja) 2012-05-11 2012-05-11 ペリクルフレーム

Publications (2)

Publication Number Publication Date
TW201400978A TW201400978A (zh) 2014-01-01
TWI457699B true TWI457699B (zh) 2014-10-21

Family

ID=49533925

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102116299A TWI457699B (zh) 2012-05-11 2013-05-08 防塵薄膜組件框架

Country Status (5)

Country Link
JP (1) JP5746662B2 (ko)
KR (1) KR102070074B1 (ko)
CN (1) CN103389618B (ko)
HK (1) HK1188486A1 (ko)
TW (1) TWI457699B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI670562B (zh) * 2018-06-21 2019-09-01 美商微相科技股份有限公司 光罩保護組件結構

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6293041B2 (ja) * 2014-12-01 2018-03-14 信越化学工業株式会社 ペリクルフレームおよびこれを用いたペリクル
JP6347741B2 (ja) 2014-12-25 2018-06-27 信越化学工業株式会社 ペリクル
JP6632057B2 (ja) * 2016-01-07 2020-01-15 信越化学工業株式会社 ペリクル
KR102002689B1 (ko) * 2017-09-08 2019-07-23 주식회사 에프에스티 펠리클 프레임

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001109135A (ja) * 1999-07-30 2001-04-20 Asahi Kasei Electronics Co Ltd 大型ペリクル用枠体及び大型ペリクル
TWI271598B (en) * 2004-04-19 2007-01-21 Shinetsu Chemical Co Pellicle frame and pellicle assembly for photolithography using the pellicle frame
CN101224457A (zh) * 2007-01-19 2008-07-23 信越化学工业株式会社 对防护薄膜框架涂布膜接合剂的方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3642145B2 (ja) 1997-02-21 2005-04-27 信越化学工業株式会社 ペリクルの製造方法及びペリクルのレチクル貼着用粘着剤層への貼着用ライナー
JP3330898B2 (ja) 1999-04-26 2002-09-30 沖電気工業株式会社 ペリクル
JP2005091983A (ja) 2003-09-19 2005-04-07 Toppan Printing Co Ltd Ｒｆタグにより識別されるフォトマスク、ペリクル、ペリクル付きフォトマスク及び収納ケース
JP4637053B2 (ja) * 2006-05-15 2011-02-23 信越化学工業株式会社 ペリクルおよびペリクル剥離装置
CN102132210B (zh) 2008-09-12 2013-01-23 旭化成电子材料株式会社 表膜构件框体、表膜构件和表膜构件框体的使用方法
JP5481106B2 (ja) * 2009-06-24 2014-04-23 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル
JP5199217B2 (ja) * 2009-11-02 2013-05-15 信越化学工業株式会社 ペリクル
JP2011164402A (ja) 2010-02-10 2011-08-25 Shin-Etsu Chemical Co Ltd ペリクルの製造方法
JP5940283B2 (ja) * 2011-11-04 2016-06-29 信越化学工業株式会社 ペリクル

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001109135A (ja) * 1999-07-30 2001-04-20 Asahi Kasei Electronics Co Ltd 大型ペリクル用枠体及び大型ペリクル
TWI271598B (en) * 2004-04-19 2007-01-21 Shinetsu Chemical Co Pellicle frame and pellicle assembly for photolithography using the pellicle frame
CN101224457A (zh) * 2007-01-19 2008-07-23 信越化学工业株式会社 对防护薄膜框架涂布膜接合剂的方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI670562B (zh) * 2018-06-21 2019-09-01 美商微相科技股份有限公司 光罩保護組件結構

Also Published As

Publication number Publication date
JP5746662B2 (ja) 2015-07-08
HK1188486A1 (zh) 2014-05-02
KR20130126465A (ko) 2013-11-20
CN103389618B (zh) 2015-12-23
JP2013238637A (ja) 2013-11-28
CN103389618A (zh) 2013-11-13
TW201400978A (zh) 2014-01-01
KR102070074B1 (ko) 2020-01-28

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