TWI453184B - 光起始劑混合物 - Google Patents

光起始劑混合物 Download PDF

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Publication number
TWI453184B
TWI453184B TW098137142A TW98137142A TWI453184B TW I453184 B TWI453184 B TW I453184B TW 098137142 A TW098137142 A TW 098137142A TW 98137142 A TW98137142 A TW 98137142A TW I453184 B TWI453184 B TW I453184B
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TW
Taiwan
Prior art keywords
alkyl
phenyl
group
substituted
optionally
Prior art date
Application number
TW098137142A
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English (en)
Chinese (zh)
Other versions
TW201033161A (en
Inventor
Katia Studer
Sebastien Villeneuve
Akira Matsumoto
Hisatoshi Kura
Jan Sueltemeyer
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Publication of TW201033161A publication Critical patent/TW201033161A/zh
Application granted granted Critical
Publication of TWI453184B publication Critical patent/TWI453184B/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56Ring systems containing three or more rings
    • C07D209/80[b, c]- or [b, d]-condensed
    • C07D209/82Carbazoles; Hydrogenated carbazoles
    • C07D209/86Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Indole Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Dental Preparations (AREA)
TW098137142A 2008-11-03 2009-11-02 光起始劑混合物 TWI453184B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08168145 2008-11-03

Publications (2)

Publication Number Publication Date
TW201033161A TW201033161A (en) 2010-09-16
TWI453184B true TWI453184B (zh) 2014-09-21

Family

ID=40512891

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098137142A TWI453184B (zh) 2008-11-03 2009-11-02 光起始劑混合物

Country Status (7)

Country Link
US (1) US8507726B2 (cg-RX-API-DMAC7.html)
EP (1) EP2342237B1 (cg-RX-API-DMAC7.html)
JP (1) JP5623416B2 (cg-RX-API-DMAC7.html)
KR (1) KR101648996B1 (cg-RX-API-DMAC7.html)
CN (1) CN102203136B (cg-RX-API-DMAC7.html)
TW (1) TWI453184B (cg-RX-API-DMAC7.html)
WO (1) WO2010060702A1 (cg-RX-API-DMAC7.html)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5566378B2 (ja) * 2008-06-06 2014-08-06 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光開始剤
KR101523421B1 (ko) 2010-06-30 2015-05-27 디에스엠 아이피 어셋츠 비.브이. D1492 액체 비스(아실)포스핀 옥사이드 광 개시제 및 방사선 경화성 조성물에서 이의 용도
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
JP5677036B2 (ja) * 2010-11-08 2015-02-25 キヤノン株式会社 有機発光素子
JP5821401B2 (ja) * 2011-08-19 2015-11-24 大日本印刷株式会社 光インプリント用感光性樹脂組成物、硬化物、レジスト基板及び半導体装置の製造方法
WO2013083505A1 (en) 2011-12-07 2013-06-13 Basf Se Oxime ester photoinitiators
US8878169B2 (en) * 2012-02-07 2014-11-04 Polyera Corporation Photocurable polymeric materials and related electronic devices
RU2613408C2 (ru) 2012-03-22 2017-03-16 Зм Инновейтив Пропертиз Компани Композиция твердого покрытия на основе полиметилметакрилата и изделие с покрытием
US9050820B2 (en) 2012-12-29 2015-06-09 Atasheh Soleimani-Gorgani Three-dimensional ink-jet printing by home and office ink-jet printer
KR102095542B1 (ko) * 2013-02-15 2020-03-31 도레이첨단소재 주식회사 전사특성이 우수한 레이저광 열전사용 도너필름 및 그의 제조방법
CN105339375A (zh) * 2013-07-08 2016-02-17 巴斯夫欧洲公司 液态双酰基氧化膦光引发剂
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用
WO2016092598A1 (ja) 2014-12-10 2016-06-16 互応化学工業株式会社 ソルダーレジスト組成物及び被覆プリント配線板
US9835944B2 (en) 2014-12-10 2017-12-05 Goo Chemical Co., Ltd. Liquid solder resist composition and covered-printed wiring board
JP6741427B2 (ja) * 2015-01-13 2020-08-19 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. 自発光感光性樹脂組成物、これから製造された色変換層を含む表示装置
CN106154358A (zh) * 2015-03-24 2016-11-23 陈国樑 具过滤降低蓝光穿透率的镜片成份及依该成份所制成的镜片
US9908990B2 (en) 2015-04-17 2018-03-06 Samsung Sdi Co., Ltd. Organic layer composition, organic layer, and method of forming patterns
KR20180044227A (ko) * 2015-08-24 2018-05-02 가부시키가이샤 아데카 옥심에스테르 화합물 및 그 화합물을 함유하는 중합 개시제
CN105116629A (zh) * 2015-09-16 2015-12-02 京东方科技集团股份有限公司 一种封框胶组合物、显示面板及其制备方法、显示装置
JP7482628B2 (ja) * 2017-03-16 2024-05-14 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP2018154717A (ja) * 2017-03-16 2018-10-04 富士ゼロックス株式会社 三次元造形材、三次元造形材カートリッジ、三次元造形装置、及び三次元造形物の製造方法
CN107129783B (zh) * 2017-06-02 2020-07-31 金祎 一种防伪感光胶、其制备方法、防伪标签及其制备方法
RU2020110828A (ru) * 2017-08-17 2021-09-17 Колопласт А/С Полимерные покрытия
CN108192413B (zh) * 2017-12-28 2021-02-26 深圳市容大感光科技股份有限公司 一种快速uv光固化油墨及其应用方法
EP3774360B1 (en) 2018-03-27 2024-01-10 Sun Chemical Corporation Uv-curable compositions comprising cleavage type photoinitiators
KR102087885B1 (ko) * 2018-04-25 2020-03-12 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
WO2019209049A1 (ko) * 2018-04-25 2019-10-31 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102087921B1 (ko) * 2018-04-25 2020-03-11 (주)이노시아 포토리소그래피 컬러 잉크
KR102111789B1 (ko) 2018-10-16 2020-05-18 주식회사 그래피 투명교정장치의 제조를 위한 3d 프린터용 광경화형 조성물
KR102115367B1 (ko) 2018-11-23 2020-05-26 주식회사 그래피 환자 맞춤형 깁스의 제조를 위한 3d 프린터용 광경화형 조성물
JP7201422B2 (ja) * 2018-12-21 2023-01-10 サカタインクス株式会社 活性エネルギー線硬化型フレキソ印刷インキ組成物
JP7472429B2 (ja) * 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
CN110076867B (zh) * 2019-04-28 2020-12-15 福建农林大学 基于环氧树脂的木塑复合材料辐射固化方法
KR102275249B1 (ko) * 2019-11-25 2021-07-12 주식회사 케이씨씨 광경화성 수지 조성물
CN113126369A (zh) * 2021-04-09 2021-07-16 西京学院 一种液晶复合薄膜及其制备方法和液晶书写板
CN117170138A (zh) * 2023-05-31 2023-12-05 江苏双星彩塑新材料股份有限公司 一种cpp多层复合膜及其制备方法
WO2025054034A2 (en) * 2023-09-05 2025-03-13 Eastman Chemical Company Energy curable ink compositions and methods thereof
KR102818167B1 (ko) * 2023-09-20 2025-06-11 조광페인트주식회사 보안제품 스크린 인쇄용 바인더 조성물
KR20250088054A (ko) * 2023-12-08 2025-06-17 주식회사 동진쎄미켐 광경화성 조성물, 점착제 및 디스플레이 장치

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002100903A1 (en) * 2001-06-11 2002-12-19 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators having a combined structure
WO2004050653A2 (en) * 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
WO2007071497A1 (en) * 2005-12-20 2007-06-28 Ciba Holding Inc. Oxime ester photoinitiators

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038164A (en) 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
DE2722264C2 (de) 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
EP0003002B1 (de) 1977-12-22 1984-06-13 Ciba-Geigy Ag Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone
DE2830927A1 (de) 1978-07-14 1980-01-31 Basf Ag Acylphosphinoxidverbindungen und ihre verwendung
DE3020092A1 (de) 1980-05-27 1981-12-10 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen und ihre verwendung
US4475999A (en) 1983-06-06 1984-10-09 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators
IT1176018B (it) 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
DE3443221A1 (de) 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
US4950581A (en) 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US5008302A (en) 1987-12-01 1991-04-16 Ciba-Geigy Corporation Titanocenes, the use thereof, and N-substituted pyrroles
US5176984A (en) 1989-10-25 1993-01-05 The Mead Corporation Photohardenable compositions containing a borate salt
EP0441232A3 (en) 1990-02-09 1992-10-14 Basf Aktiengesellschaft Cationic photopolymerisation process
US4987159A (en) 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use
JP2999274B2 (ja) 1991-01-28 2000-01-17 三菱化学株式会社 エチレン重合体の製造法
RU2091385C1 (ru) 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
TW237456B (cg-RX-API-DMAC7.html) 1992-04-09 1995-01-01 Ciba Geigy
AU717137B2 (en) 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
JP3587413B2 (ja) 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
CH691970A5 (de) 1996-03-04 2001-12-14 Ciba Sc Holding Ag Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen.
ES2184233T3 (es) 1997-01-30 2003-04-01 Ciba Sc Holding Ag Esteres fenilglioxalicos no volatiles.
IT1303775B1 (it) 1998-11-19 2001-02-23 Lamberti Spa Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni.
CZ302512B6 (cs) 1998-11-30 2011-06-29 Ciba Specialty Chemicals Holding Inc. Zpusob prípravy acylfosfinu, acylfosfinoxidu a acylfosfinsulfidu
ITVA20010011A1 (it) 2001-04-24 2002-10-24 Lamberti Spa Miscele solide di derivati alfa-idrossicarbonilici di oligomeri dell'alfa-metilstirene e loro uso.
WO2004074328A1 (en) 2003-02-20 2004-09-02 Ciba Specialty Chemicals Holding Inc. Photocurable compositions
MXPA05010951A (es) 2003-04-16 2005-11-25 Ciba Sc Holding Ag Tinta para la impresion de inyeccion de tinta, curable por radiacion, que contiene un alfa-hidroxi-cetona como fotoiniciador.
CN100418973C (zh) 2003-07-18 2008-09-17 西巴特殊化学品控股有限公司 酰基膦及其衍生物的制备方法
CA2599985C (en) 2005-04-01 2012-11-13 Basf Aktiengesellschaft Use of proteins as demulsifying agents
ITVA20050032A1 (it) 2005-05-13 2006-11-14 Lamberti Spa Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
DE102005029704A1 (de) 2005-06-24 2007-01-11 Basf Ag Verwendung von Hydrophobin-Polypeptiden sowie Konjugaten aus Hydrophobin-Polypeptiden mit Wirk-oder Effektstoffen und ihre Herstellung sowie deren Einsatz in der Kosmetik
DE102005033002A1 (de) 2005-07-14 2007-01-18 Basf Ag Wässrige Monomeremulsionen enthaltend Hydrophobin
WO2008138733A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
CN101687794B (zh) 2007-05-11 2013-09-11 巴斯夫欧洲公司 肟酯光引发剂
WO2008142111A1 (de) 2007-05-24 2008-11-27 Basf Se Verwendung von hydrophobinen als hilfsmittel bei der kristallisation von feststoffen
CA2698293A1 (en) 2007-09-13 2009-03-26 Thomas Subkowski Use of hydrophobin polypeptides as penetration intensifiers
US9624171B2 (en) 2008-06-06 2017-04-18 Basf Se Photoinitiator mixtures
JP5566378B2 (ja) * 2008-06-06 2014-08-06 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光開始剤
JP2011527668A (ja) 2008-07-11 2011-11-04 ビーエーエスエフ ソシエタス・ヨーロピア 形態改質剤としての両親媒性タンパク質

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002100903A1 (en) * 2001-06-11 2002-12-19 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators having a combined structure
WO2004050653A2 (en) * 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
WO2007071497A1 (en) * 2005-12-20 2007-06-28 Ciba Holding Inc. Oxime ester photoinitiators

Also Published As

Publication number Publication date
JP2012507571A (ja) 2012-03-29
EP2342237A1 (en) 2011-07-13
CN102203136B (zh) 2013-11-13
TW201033161A (en) 2010-09-16
JP5623416B2 (ja) 2014-11-12
US20110218266A1 (en) 2011-09-08
KR101648996B1 (ko) 2016-08-17
WO2010060702A1 (en) 2010-06-03
EP2342237B1 (en) 2014-04-23
CN102203136A (zh) 2011-09-28
US8507726B2 (en) 2013-08-13
KR20110091742A (ko) 2011-08-12

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