CN102203136B - 光敏引发剂混合物 - Google Patents

光敏引发剂混合物 Download PDF

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Publication number
CN102203136B
CN102203136B CN2009801436477A CN200980143647A CN102203136B CN 102203136 B CN102203136 B CN 102203136B CN 2009801436477 A CN2009801436477 A CN 2009801436477A CN 200980143647 A CN200980143647 A CN 200980143647A CN 102203136 B CN102203136 B CN 102203136B
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CN
China
Prior art keywords
alkyl
phenyl
meth
halogen
replaced
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Expired - Fee Related
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CN2009801436477A
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English (en)
Chinese (zh)
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CN102203136A (zh
Inventor
K·施图德尔
S·维尔纳夫
松本亮
仓久敏
J·聚尔特迈尔
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BASF SE
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BASF SE
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Indole Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Dental Preparations (AREA)
CN2009801436477A 2008-11-03 2009-10-23 光敏引发剂混合物 Expired - Fee Related CN102203136B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08168145 2008-11-03
EP08168145.4 2008-11-03
PCT/EP2009/063963 WO2010060702A1 (en) 2008-11-03 2009-10-23 Photoinitiator mixtures

Publications (2)

Publication Number Publication Date
CN102203136A CN102203136A (zh) 2011-09-28
CN102203136B true CN102203136B (zh) 2013-11-13

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009801436477A Expired - Fee Related CN102203136B (zh) 2008-11-03 2009-10-23 光敏引发剂混合物

Country Status (7)

Country Link
US (1) US8507726B2 (cg-RX-API-DMAC7.html)
EP (1) EP2342237B1 (cg-RX-API-DMAC7.html)
JP (1) JP5623416B2 (cg-RX-API-DMAC7.html)
KR (1) KR101648996B1 (cg-RX-API-DMAC7.html)
CN (1) CN102203136B (cg-RX-API-DMAC7.html)
TW (1) TWI453184B (cg-RX-API-DMAC7.html)
WO (1) WO2010060702A1 (cg-RX-API-DMAC7.html)

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CN105339375A (zh) * 2013-07-08 2016-02-17 巴斯夫欧洲公司 液态双酰基氧化膦光引发剂
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用
WO2016092598A1 (ja) 2014-12-10 2016-06-16 互応化学工業株式会社 ソルダーレジスト組成物及び被覆プリント配線板
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CN106154358A (zh) * 2015-03-24 2016-11-23 陈国樑 具过滤降低蓝光穿透率的镜片成份及依该成份所制成的镜片
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KR20180044227A (ko) * 2015-08-24 2018-05-02 가부시키가이샤 아데카 옥심에스테르 화합물 및 그 화합물을 함유하는 중합 개시제
CN105116629A (zh) * 2015-09-16 2015-12-02 京东方科技集团股份有限公司 一种封框胶组合物、显示面板及其制备方法、显示装置
JP7482628B2 (ja) * 2017-03-16 2024-05-14 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP2018154717A (ja) * 2017-03-16 2018-10-04 富士ゼロックス株式会社 三次元造形材、三次元造形材カートリッジ、三次元造形装置、及び三次元造形物の製造方法
CN107129783B (zh) * 2017-06-02 2020-07-31 金祎 一种防伪感光胶、其制备方法、防伪标签及其制备方法
RU2020110828A (ru) * 2017-08-17 2021-09-17 Колопласт А/С Полимерные покрытия
CN108192413B (zh) * 2017-12-28 2021-02-26 深圳市容大感光科技股份有限公司 一种快速uv光固化油墨及其应用方法
EP3774360B1 (en) 2018-03-27 2024-01-10 Sun Chemical Corporation Uv-curable compositions comprising cleavage type photoinitiators
KR102087885B1 (ko) * 2018-04-25 2020-03-12 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
WO2019209049A1 (ko) * 2018-04-25 2019-10-31 (주)이노시아 스프레이용 포토리소그래피 컬러 잉크
KR102087921B1 (ko) * 2018-04-25 2020-03-11 (주)이노시아 포토리소그래피 컬러 잉크
KR102111789B1 (ko) 2018-10-16 2020-05-18 주식회사 그래피 투명교정장치의 제조를 위한 3d 프린터용 광경화형 조성물
KR102115367B1 (ko) 2018-11-23 2020-05-26 주식회사 그래피 환자 맞춤형 깁스의 제조를 위한 3d 프린터용 광경화형 조성물
JP7201422B2 (ja) * 2018-12-21 2023-01-10 サカタインクス株式会社 活性エネルギー線硬化型フレキソ印刷インキ組成物
JP7472429B2 (ja) * 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
CN110076867B (zh) * 2019-04-28 2020-12-15 福建农林大学 基于环氧树脂的木塑复合材料辐射固化方法
KR102275249B1 (ko) * 2019-11-25 2021-07-12 주식회사 케이씨씨 광경화성 수지 조성물
CN113126369A (zh) * 2021-04-09 2021-07-16 西京学院 一种液晶复合薄膜及其制备方法和液晶书写板
CN117170138A (zh) * 2023-05-31 2023-12-05 江苏双星彩塑新材料股份有限公司 一种cpp多层复合膜及其制备方法
WO2025054034A2 (en) * 2023-09-05 2025-03-13 Eastman Chemical Company Energy curable ink compositions and methods thereof
KR102818167B1 (ko) * 2023-09-20 2025-06-11 조광페인트주식회사 보안제품 스크린 인쇄용 바인더 조성물
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Also Published As

Publication number Publication date
JP2012507571A (ja) 2012-03-29
EP2342237A1 (en) 2011-07-13
TWI453184B (zh) 2014-09-21
TW201033161A (en) 2010-09-16
JP5623416B2 (ja) 2014-11-12
US20110218266A1 (en) 2011-09-08
KR101648996B1 (ko) 2016-08-17
WO2010060702A1 (en) 2010-06-03
EP2342237B1 (en) 2014-04-23
CN102203136A (zh) 2011-09-28
US8507726B2 (en) 2013-08-13
KR20110091742A (ko) 2011-08-12

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