TWI408510B - Exposure apparatus and apparatus manufacturing method - Google Patents

Exposure apparatus and apparatus manufacturing method Download PDF

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Publication number
TWI408510B
TWI408510B TW097150438A TW97150438A TWI408510B TW I408510 B TWI408510 B TW I408510B TW 097150438 A TW097150438 A TW 097150438A TW 97150438 A TW97150438 A TW 97150438A TW I408510 B TWI408510 B TW I408510B
Authority
TW
Taiwan
Prior art keywords
concave mirror
exposure apparatus
mirror
supported
optical system
Prior art date
Application number
TW097150438A
Other languages
English (en)
Chinese (zh)
Other versions
TW200935188A (en
Inventor
大野文靖
宮崎恭一
Original Assignee
佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 佳能股份有限公司 filed Critical 佳能股份有限公司
Publication of TW200935188A publication Critical patent/TW200935188A/zh
Application granted granted Critical
Publication of TWI408510B publication Critical patent/TWI408510B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW097150438A 2007-12-26 2008-12-24 Exposure apparatus and apparatus manufacturing method TWI408510B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007335057A JP5201979B2 (ja) 2007-12-26 2007-12-26 露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
TW200935188A TW200935188A (en) 2009-08-16
TWI408510B true TWI408510B (zh) 2013-09-11

Family

ID=40962421

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097150438A TWI408510B (zh) 2007-12-26 2008-12-24 Exposure apparatus and apparatus manufacturing method

Country Status (3)

Country Link
JP (1) JP5201979B2 (https=)
KR (1) KR101080144B1 (https=)
TW (1) TWI408510B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5782336B2 (ja) 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
DE102014216631A1 (de) * 2014-08-21 2016-02-25 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage, Spiegelmodul hierfür, sowie Verfahren zum Betrieb des Spiegelmoduls
JP6386896B2 (ja) * 2014-12-02 2018-09-05 キヤノン株式会社 投影光学系、露光装置、および、デバイス製造方法
JP6674250B2 (ja) * 2015-12-16 2020-04-01 キヤノン株式会社 露光装置、露光方法、および物品の製造方法
JP2022114974A (ja) * 2021-01-27 2022-08-08 キヤノン株式会社 光学系、露光装置および物品製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09246139A (ja) * 1996-03-04 1997-09-19 Nikon Corp 走査型投影露光装置
TW594438B (en) * 1997-11-07 2004-06-21 Koninkl Philips Electronics Nv Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6038819A (ja) * 1983-08-12 1985-02-28 Hitachi Ltd 投影露光装置
JPS60201316A (ja) * 1984-03-26 1985-10-11 Canon Inc 反射光学系
US6229595B1 (en) * 1995-05-12 2001-05-08 The B. F. Goodrich Company Lithography system and method with mask image enlargement
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
JP2006078592A (ja) * 2004-09-07 2006-03-23 Canon Inc 投影光学系及びそれを有する露光装置
JP2006078631A (ja) * 2004-09-08 2006-03-23 Canon Inc 投影光学系及びそれを有する露光装置
JP2006113414A (ja) 2004-10-18 2006-04-27 Canon Inc 光学素子保持装置、鏡筒、露光装置及びマイクロデバイスの製造方法
US7184124B2 (en) * 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
JP2006140366A (ja) * 2004-11-15 2006-06-01 Nikon Corp 投影光学系及び露光装置
JP2008089832A (ja) * 2006-09-29 2008-04-17 Canon Inc 露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09246139A (ja) * 1996-03-04 1997-09-19 Nikon Corp 走査型投影露光装置
TW594438B (en) * 1997-11-07 2004-06-21 Koninkl Philips Electronics Nv Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system

Also Published As

Publication number Publication date
KR20090071384A (ko) 2009-07-01
JP2009158719A (ja) 2009-07-16
JP5201979B2 (ja) 2013-06-05
TW200935188A (en) 2009-08-16
KR101080144B1 (ko) 2011-11-07

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