TWI408510B - Exposure apparatus and apparatus manufacturing method - Google Patents
Exposure apparatus and apparatus manufacturing method Download PDFInfo
- Publication number
- TWI408510B TWI408510B TW097150438A TW97150438A TWI408510B TW I408510 B TWI408510 B TW I408510B TW 097150438 A TW097150438 A TW 097150438A TW 97150438 A TW97150438 A TW 97150438A TW I408510 B TWI408510 B TW I408510B
- Authority
- TW
- Taiwan
- Prior art keywords
- concave mirror
- exposure apparatus
- mirror
- supported
- optical system
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 230000003287 optical effect Effects 0.000 claims abstract description 48
- 239000000758 substrate Substances 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 16
- 230000007246 mechanism Effects 0.000 claims description 9
- 238000003384 imaging method Methods 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 4
- 230000005499 meniscus Effects 0.000 abstract description 4
- 230000004075 alteration Effects 0.000 abstract 1
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003306 harvesting Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000003340 mental effect Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007335057A JP5201979B2 (ja) | 2007-12-26 | 2007-12-26 | 露光装置およびデバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200935188A TW200935188A (en) | 2009-08-16 |
| TWI408510B true TWI408510B (zh) | 2013-09-11 |
Family
ID=40962421
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097150438A TWI408510B (zh) | 2007-12-26 | 2008-12-24 | Exposure apparatus and apparatus manufacturing method |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5201979B2 (enrdf_load_stackoverflow) |
| KR (1) | KR101080144B1 (enrdf_load_stackoverflow) |
| TW (1) | TWI408510B (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5782336B2 (ja) * | 2011-08-24 | 2015-09-24 | キヤノン株式会社 | 投影光学系、露光装置及びデバイス製造方法 |
| DE102014216631A1 (de) * | 2014-08-21 | 2016-02-25 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage, Spiegelmodul hierfür, sowie Verfahren zum Betrieb des Spiegelmoduls |
| JP6386896B2 (ja) * | 2014-12-02 | 2018-09-05 | キヤノン株式会社 | 投影光学系、露光装置、および、デバイス製造方法 |
| JP6674250B2 (ja) * | 2015-12-16 | 2020-04-01 | キヤノン株式会社 | 露光装置、露光方法、および物品の製造方法 |
| JP2022114974A (ja) * | 2021-01-27 | 2022-08-08 | キヤノン株式会社 | 光学系、露光装置および物品製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09246139A (ja) * | 1996-03-04 | 1997-09-19 | Nikon Corp | 走査型投影露光装置 |
| TW594438B (en) * | 1997-11-07 | 2004-06-21 | Koninkl Philips Electronics Nv | Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6038819A (ja) * | 1983-08-12 | 1985-02-28 | Hitachi Ltd | 投影露光装置 |
| JPS60201316A (ja) * | 1984-03-26 | 1985-10-11 | Canon Inc | 反射光学系 |
| US6229595B1 (en) * | 1995-05-12 | 2001-05-08 | The B. F. Goodrich Company | Lithography system and method with mask image enlargement |
| US7158215B2 (en) * | 2003-06-30 | 2007-01-02 | Asml Holding N.V. | Large field of view protection optical system with aberration correctability for flat panel displays |
| JP2006078592A (ja) * | 2004-09-07 | 2006-03-23 | Canon Inc | 投影光学系及びそれを有する露光装置 |
| JP2006078631A (ja) * | 2004-09-08 | 2006-03-23 | Canon Inc | 投影光学系及びそれを有する露光装置 |
| JP2006113414A (ja) | 2004-10-18 | 2006-04-27 | Canon Inc | 光学素子保持装置、鏡筒、露光装置及びマイクロデバイスの製造方法 |
| US7184124B2 (en) * | 2004-10-28 | 2007-02-27 | Asml Holding N.V. | Lithographic apparatus having an adjustable projection system and device manufacturing method |
| JP2006140366A (ja) * | 2004-11-15 | 2006-06-01 | Nikon Corp | 投影光学系及び露光装置 |
| JP2008089832A (ja) * | 2006-09-29 | 2008-04-17 | Canon Inc | 露光装置 |
-
2007
- 2007-12-26 JP JP2007335057A patent/JP5201979B2/ja not_active Expired - Fee Related
-
2008
- 2008-12-10 KR KR1020080125054A patent/KR101080144B1/ko not_active Expired - Fee Related
- 2008-12-24 TW TW097150438A patent/TWI408510B/zh not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09246139A (ja) * | 1996-03-04 | 1997-09-19 | Nikon Corp | 走査型投影露光装置 |
| TW594438B (en) * | 1997-11-07 | 2004-06-21 | Koninkl Philips Electronics Nv | Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5201979B2 (ja) | 2013-06-05 |
| KR20090071384A (ko) | 2009-07-01 |
| JP2009158719A (ja) | 2009-07-16 |
| TW200935188A (en) | 2009-08-16 |
| KR101080144B1 (ko) | 2011-11-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |