TWI398725B - A photosensitive resin composition and a photosensitive resin laminate using the same - Google Patents

A photosensitive resin composition and a photosensitive resin laminate using the same Download PDF

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Publication number
TWI398725B
TWI398725B TW98111861A TW98111861A TWI398725B TW I398725 B TWI398725 B TW I398725B TW 98111861 A TW98111861 A TW 98111861A TW 98111861 A TW98111861 A TW 98111861A TW I398725 B TWI398725 B TW I398725B
Authority
TW
Taiwan
Prior art keywords
photosensitive resin
group
compound
resin composition
substrate
Prior art date
Application number
TW98111861A
Other languages
English (en)
Chinese (zh)
Other versions
TW201001066A (en
Inventor
Yosuke Hata
Youichiroh Ide
Original Assignee
Asahi Kasei E Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei E Materials Corp filed Critical Asahi Kasei E Materials Corp
Publication of TW201001066A publication Critical patent/TW201001066A/zh
Application granted granted Critical
Publication of TWI398725B publication Critical patent/TWI398725B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polyethers (AREA)
TW98111861A 2008-04-10 2009-04-09 A photosensitive resin composition and a photosensitive resin laminate using the same TWI398725B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008102038 2008-04-10
JP2008102036 2008-04-10

Publications (2)

Publication Number Publication Date
TW201001066A TW201001066A (en) 2010-01-01
TWI398725B true TWI398725B (zh) 2013-06-11

Family

ID=41161884

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98111861A TWI398725B (zh) 2008-04-10 2009-04-09 A photosensitive resin composition and a photosensitive resin laminate using the same

Country Status (3)

Country Link
JP (2) JP5155389B2 (ja)
TW (1) TWI398725B (ja)
WO (1) WO2009125752A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI485521B (zh) * 2010-06-28 2015-05-21 Everlight Chem Ind Corp 正型感光樹脂組成物
KR102375653B1 (ko) 2014-02-12 2022-03-16 쇼와덴코머티리얼즈가부시끼가이샤 감광성 엘리먼트
JP6641217B2 (ja) * 2016-03-30 2020-02-05 東京応化工業株式会社 金属酸化物膜形成用塗布剤及び金属酸化物膜を有する基体の製造方法
KR102293963B1 (ko) * 2016-12-20 2021-08-25 아사히 가세이 가부시키가이샤 2 층 감광층 롤
KR102522749B1 (ko) 2017-11-06 2023-04-17 아사히 가세이 가부시키가이샤 감광성 수지 적층체 및 레지스트 패턴의 제조 방법
KR101920783B1 (ko) * 2018-03-14 2018-11-21 동우 화인켐 주식회사 감광성 수지 조성물 및 이를 사용한 패턴 형성 방법
JP7076329B2 (ja) * 2018-08-01 2022-05-27 旭化成株式会社 感光性樹脂組成物及びそれを用いた感光性樹脂積層体
JP7338142B2 (ja) * 2018-10-30 2023-09-05 住友ベークライト株式会社 感光性樹脂組成物および電子デバイスの製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030087179A1 (en) * 2001-05-14 2003-05-08 Fuji Photo Film Co., Ltd. Positive photoresist transfer material and method for processing surface of substrate using the transfer material

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH087433B2 (ja) * 1989-04-19 1996-01-29 日本ゼオン株式会社 ポジ型レジスト組成物
JP3203843B2 (ja) * 1992-12-24 2001-08-27 住友化学工業株式会社 カラーフィルター用レジスト組成物
JP2888236B2 (ja) * 1997-12-01 1999-05-10 ジェイエスアール株式会社 １，２−ナフトキノンジアジド化合物の製造方法
JP4236559B2 (ja) * 2002-11-01 2009-03-11 住友化学株式会社 着色感光性樹脂組成物およびそれを用いたカラーフィルタ
JP2005215137A (ja) * 2004-01-28 2005-08-11 Fuji Photo Film Co Ltd 感光性樹脂組成物、感光性転写材料、液晶配向制御用突起及びその製造方法、並びに液晶表示装置
JP2005221726A (ja) * 2004-02-05 2005-08-18 Fuji Photo Film Co Ltd 感光性転写材料、液晶配向制御用突起及びその形成方法、並びに、液晶表示装置
JP4655882B2 (ja) * 2004-10-29 2011-03-23 Ｊｓｒ株式会社 ポジ型感光性絶縁樹脂組成物およびその硬化物
KR101240643B1 (ko) * 2005-07-08 2013-03-08 삼성디스플레이 주식회사 포토레지스트 조성물, 상기 포토레지스트 조성물을 이용한 패턴의 형성 방법 및 이를 이용한 박막 트랜지스터표시판의 제조 방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030087179A1 (en) * 2001-05-14 2003-05-08 Fuji Photo Film Co., Ltd. Positive photoresist transfer material and method for processing surface of substrate using the transfer material

Also Published As

Publication number Publication date
WO2009125752A1 (ja) 2009-10-15
TW201001066A (en) 2010-01-01
JPWO2009125752A1 (ja) 2011-08-04
JP2013054363A (ja) 2013-03-21
JP5155389B2 (ja) 2013-03-06

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