TWI396942B - 供顯影術應用之熱固性底塗料 - Google Patents
供顯影術應用之熱固性底塗料 Download PDFInfo
- Publication number
- TWI396942B TWI396942B TW094107532A TW94107532A TWI396942B TW I396942 B TWI396942 B TW I396942B TW 094107532 A TW094107532 A TW 094107532A TW 94107532 A TW94107532 A TW 94107532A TW I396942 B TWI396942 B TW I396942B
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- carbon atoms
- unsubstituted
- alkyl
- integer
- Prior art date
Links
- -1 heterocyclic amine Chemical class 0.000 claims description 188
- 239000000203 mixture Substances 0.000 claims description 177
- 229920000642 polymer Polymers 0.000 claims description 125
- 239000010410 layer Substances 0.000 claims description 102
- 125000004432 carbon atom Chemical group C* 0.000 claims description 95
- 229920002120 photoresistant polymer Polymers 0.000 claims description 93
- 239000000758 substrate Substances 0.000 claims description 75
- 238000000576 coating method Methods 0.000 claims description 60
- 239000000463 material Substances 0.000 claims description 59
- 239000011248 coating agent Substances 0.000 claims description 57
- 125000000217 alkyl group Chemical group 0.000 claims description 53
- 239000004971 Cross linker Substances 0.000 claims description 51
- 238000000034 method Methods 0.000 claims description 48
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 47
- 125000002723 alicyclic group Chemical group 0.000 claims description 40
- 125000003118 aryl group Chemical group 0.000 claims description 38
- 239000002253 acid Substances 0.000 claims description 35
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 20
- 239000002904 solvent Substances 0.000 claims description 20
- 125000001624 naphthyl group Chemical group 0.000 claims description 18
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 18
- 125000002947 alkylene group Chemical group 0.000 claims description 16
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 16
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 claims description 15
- 229910052799 carbon Inorganic materials 0.000 claims description 15
- 125000005843 halogen group Chemical group 0.000 claims description 15
- 238000012545 processing Methods 0.000 claims description 15
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 15
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- WSNMPAVSZJSIMT-UHFFFAOYSA-N COc1c(C)c2COC(=O)c2c(O)c1CC(O)C1(C)CCC(=O)O1 Chemical compound COc1c(C)c2COC(=O)c2c(O)c1CC(O)C1(C)CCC(=O)O1 WSNMPAVSZJSIMT-UHFFFAOYSA-N 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 12
- 239000001257 hydrogen Substances 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 11
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 11
- 230000001590 oxidative effect Effects 0.000 claims description 11
- 125000003031 C5-C7 cycloalkylene group Chemical group 0.000 claims description 10
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 10
- 125000004122 cyclic group Chemical group 0.000 claims description 10
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 claims description 9
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 8
- 150000001721 carbon Chemical group 0.000 claims description 6
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 6
- 125000003107 substituted aryl group Chemical group 0.000 claims description 6
- 125000005346 substituted cycloalkyl group Chemical group 0.000 claims description 6
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 4
- 125000000732 arylene group Chemical group 0.000 claims description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims 4
- 239000002355 dual-layer Substances 0.000 claims 3
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 2
- 239000000470 constituent Substances 0.000 claims 2
- 125000004429 atom Chemical group 0.000 claims 1
- 150000001924 cycloalkanes Chemical class 0.000 claims 1
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 1
- 239000000243 solution Substances 0.000 description 172
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 104
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 66
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 39
- 239000002585 base Substances 0.000 description 39
- 239000000178 monomer Substances 0.000 description 36
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 33
- 239000008199 coating composition Substances 0.000 description 31
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 27
- 238000011161 development Methods 0.000 description 25
- 230000018109 developmental process Effects 0.000 description 24
- 235000012431 wafers Nutrition 0.000 description 23
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 20
- 239000003999 initiator Substances 0.000 description 20
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 20
- 229920003270 Cymel® Polymers 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 18
- 239000007787 solid Substances 0.000 description 17
- 238000006116 polymerization reaction Methods 0.000 description 16
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 13
- 239000012986 chain transfer agent Substances 0.000 description 13
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 12
- 230000005855 radiation Effects 0.000 description 11
- 239000004094 surface-active agent Substances 0.000 description 11
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 10
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 10
- 150000002148 esters Chemical class 0.000 description 10
- 239000011541 reaction mixture Substances 0.000 description 10
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 10
- JAMNSIXSLVPNLC-UHFFFAOYSA-N (4-ethenylphenyl) acetate Chemical compound CC(=O)OC1=CC=C(C=C)C=C1 JAMNSIXSLVPNLC-UHFFFAOYSA-N 0.000 description 9
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 9
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 9
- 239000007858 starting material Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 8
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 8
- 238000004132 cross linking Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 229910052707 ruthenium Inorganic materials 0.000 description 8
- 238000000859 sublimation Methods 0.000 description 8
- 230000008022 sublimation Effects 0.000 description 8
- YFSUTJLHUFNCNZ-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-M 0.000 description 7
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000001235 sensitizing effect Effects 0.000 description 7
- CPQUDUZKHJNUHS-UHFFFAOYSA-N 1-[2-(cyclopenten-1-yloxy)ethoxy]cyclopentene Chemical compound C=1CCCC=1OCCOC1=CCCC1 CPQUDUZKHJNUHS-UHFFFAOYSA-N 0.000 description 6
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 230000002411 adverse Effects 0.000 description 5
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 150000003440 styrenes Chemical class 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- VDNSZPNSUQRUMS-UHFFFAOYSA-N 1-cyclohexyl-4-ethenylbenzene Chemical compound C1=CC(C=C)=CC=C1C1CCCCC1 VDNSZPNSUQRUMS-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- HDBWAWNLGGMZRQ-UHFFFAOYSA-N p-Vinylbiphenyl Chemical compound C1=CC(C=C)=CC=C1C1=CC=CC=C1 HDBWAWNLGGMZRQ-UHFFFAOYSA-N 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 4
- 239000002534 radiation-sensitizing agent Substances 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000003381 solubilizing effect Effects 0.000 description 4
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 4
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- YZUPZGFPHUVJKC-UHFFFAOYSA-N 1-bromo-2-methoxyethane Chemical compound COCCBr YZUPZGFPHUVJKC-UHFFFAOYSA-N 0.000 description 3
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 3
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 3
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002250 absorbent Substances 0.000 description 3
- 230000002745 absorbent Effects 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 238000010533 azeotropic distillation Methods 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000002952 polymeric resin Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 238000005809 transesterification reaction Methods 0.000 description 3
- QUEWJUQWKGAHON-UHFFFAOYSA-N (2-phenylphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1C1=CC=CC=C1 QUEWJUQWKGAHON-UHFFFAOYSA-N 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 2
- LSLDKVVADNPHSA-UHFFFAOYSA-N (4-cyclohexylphenyl) prop-2-enoate Chemical compound C1=CC(OC(=O)C=C)=CC=C1C1CCCCC1 LSLDKVVADNPHSA-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- QKPDORDNDPOKCK-UHFFFAOYSA-N 1-[2-(cyclopenten-1-yloxy)ethoxy]cyclopentene;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.C=1CCCC=1OCCOC1=CCCC1 QKPDORDNDPOKCK-UHFFFAOYSA-N 0.000 description 2
- PHPRWKJDGHSJMI-UHFFFAOYSA-N 1-adamantyl prop-2-enoate Chemical compound C1C(C2)CC3CC2CC1(OC(=O)C=C)C3 PHPRWKJDGHSJMI-UHFFFAOYSA-N 0.000 description 2
- DLVKMMLOLLDHHO-UHFFFAOYSA-N 1-ethenyl-4-(4-methoxyphenyl)benzene Chemical compound C1=CC(OC)=CC=C1C1=CC=C(C=C)C=C1 DLVKMMLOLLDHHO-UHFFFAOYSA-N 0.000 description 2
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 2
- SFPNZPQIIAJXGL-UHFFFAOYSA-N 2-ethoxyethyl 2-methylprop-2-enoate Chemical compound CCOCCOC(=O)C(C)=C SFPNZPQIIAJXGL-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- CEXQWAAGPPNOQF-UHFFFAOYSA-N 2-phenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC1=CC=CC=C1 CEXQWAAGPPNOQF-UHFFFAOYSA-N 0.000 description 2
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 2
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical class OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 2
- CWVFILUMTNJKBN-UHFFFAOYSA-N 2-phenylmethoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCC1=CC=CC=C1 CWVFILUMTNJKBN-UHFFFAOYSA-N 0.000 description 2
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 2
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 2
- FBTSUTGMWBDAAC-UHFFFAOYSA-N 3,4-Dihydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1O FBTSUTGMWBDAAC-UHFFFAOYSA-N 0.000 description 2
- YNGIFMKMDRDNBQ-UHFFFAOYSA-N 3-ethenylphenol Chemical compound OC1=CC=CC(C=C)=C1 YNGIFMKMDRDNBQ-UHFFFAOYSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- MNUIIOIZUIYJBF-UHFFFAOYSA-N 4-bicyclo[2.1.1]hexanyl 2-methylprop-2-enoate Chemical compound C1C2CC1(OC(=O)C(=C)C)CC2 MNUIIOIZUIYJBF-UHFFFAOYSA-N 0.000 description 2
- LYECQNYXCRATFL-UHFFFAOYSA-N 5-ethenylbenzene-1,3-diol Chemical compound OC1=CC(O)=CC(C=C)=C1 LYECQNYXCRATFL-UHFFFAOYSA-N 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- 101000915769 Escherichia coli (strain K12) DNA-3-methyladenine glycosylase 1 Proteins 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- JIRRYRDXJPHTAE-UHFFFAOYSA-N [4-(4-chlorocyclohexyl)phenyl] 2-methylprop-2-enoate Chemical compound C(C(=C)C)(=O)OC1=CC=C(C=C1)C1CCC(CC1)Cl JIRRYRDXJPHTAE-UHFFFAOYSA-N 0.000 description 2
- OEKSGCGVABQFTA-UHFFFAOYSA-N [4-(4-chlorocyclohexyl)phenyl] prop-2-enoate Chemical compound C(C=C)(=O)OC1=CC=C(C=C1)C1CCC(CC1)Cl OEKSGCGVABQFTA-UHFFFAOYSA-N 0.000 description 2
- KEKKVMDUMHBVAJ-UHFFFAOYSA-N [4-(4-methylcyclohexyl)phenyl] 2-methylprop-2-enoate Chemical compound C(C(=C)C)(=O)OC1=CC=C(C=C1)C1CCC(CC1)C KEKKVMDUMHBVAJ-UHFFFAOYSA-N 0.000 description 2
- BMUFJMIIXDLYRF-UHFFFAOYSA-N [4-(4-methylphenyl)phenyl] 2-methylprop-2-enoate Chemical compound C1=CC(OC(=O)C(=C)C)=CC=C1C1=CC=C(C)C=C1 BMUFJMIIXDLYRF-UHFFFAOYSA-N 0.000 description 2
- YUFWCEKCFDNJSZ-UHFFFAOYSA-N [S].C(CCCCCCCCCCC)O Chemical compound [S].C(CCCCCCCCCCC)O YUFWCEKCFDNJSZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 150000001454 anthracenes Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 125000002619 bicyclic group Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- FWLDHHJLVGRRHD-UHFFFAOYSA-N decyl prop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C=C FWLDHHJLVGRRHD-UHFFFAOYSA-N 0.000 description 2
- 210000003298 dental enamel Anatomy 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229940116333 ethyl lactate Drugs 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229940057867 methyl lactate Drugs 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 2
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 2
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 231100000572 poisoning Toxicity 0.000 description 2
- 230000000607 poisoning effect Effects 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000010561 standard procedure Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 2
- MCUMKZQJKPLVBJ-UHFFFAOYSA-N (2,4-dinitrophenyl)methyl 4-(trifluoromethyl)benzenesulfonate Chemical compound [O-][N+](=O)C1=CC([N+](=O)[O-])=CC=C1COS(=O)(=O)C1=CC=C(C(F)(F)F)C=C1 MCUMKZQJKPLVBJ-UHFFFAOYSA-N 0.000 description 1
- MCJPJAJHPRCILL-UHFFFAOYSA-N (2,6-dinitrophenyl)methyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC1=C([N+]([O-])=O)C=CC=C1[N+]([O-])=O MCJPJAJHPRCILL-UHFFFAOYSA-N 0.000 description 1
- ZMZHRHTZJDBLEX-UHFFFAOYSA-N (2-phenylphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1C1=CC=CC=C1 ZMZHRHTZJDBLEX-UHFFFAOYSA-N 0.000 description 1
- BSHLUPBYQADWQM-UHFFFAOYSA-N (4-chlorophenyl)-diphenylphosphane Chemical compound C1=CC(Cl)=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 BSHLUPBYQADWQM-UHFFFAOYSA-N 0.000 description 1
- AVANOXQWMCQYIH-UHFFFAOYSA-N (4-chlorophenyl)phosphanium 1,1,2,2,3,3-hexafluoropropane-1-sulfonate Chemical compound FC(C(C(S(=O)(=O)[O-])(F)F)(F)F)F.ClC1=CC=C(C=C1)[PH3+] AVANOXQWMCQYIH-UHFFFAOYSA-N 0.000 description 1
- NFUHZIQMRGXQJJ-UHFFFAOYSA-N (4-cycloheptylphenyl) prop-2-enoate Chemical compound C(C=C)(=O)OC1=CC=C(C=C1)C1CCCCCC1 NFUHZIQMRGXQJJ-UHFFFAOYSA-N 0.000 description 1
- GAZSZCWRMSVQPJ-UHFFFAOYSA-N (4-methoxyphenyl)-diphenylphosphane Chemical compound C1=CC(OC)=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 GAZSZCWRMSVQPJ-UHFFFAOYSA-N 0.000 description 1
- QJIMTLTYXBDJFC-UHFFFAOYSA-N (4-methylphenyl)-diphenylphosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QJIMTLTYXBDJFC-UHFFFAOYSA-N 0.000 description 1
- QKMZWPXETIHFAR-UHFFFAOYSA-N (4-methylphenyl)-diphenylphosphane trifluoromethanesulfonic acid Chemical compound FC(S(=O)(=O)[O-])(F)F.CC1=CC=C(C=C1)[PH+](C1=CC=CC=C1)C1=CC=CC=C1 QKMZWPXETIHFAR-UHFFFAOYSA-N 0.000 description 1
- 125000006705 (C5-C7) cycloalkyl group Chemical group 0.000 description 1
- VLLPVDKADBYKLM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 VLLPVDKADBYKLM-UHFFFAOYSA-M 0.000 description 1
- SSDIHNAZJDCUQV-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonate;triphenylsulfanium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1.[O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SSDIHNAZJDCUQV-UHFFFAOYSA-M 0.000 description 1
- OKRNPJCKEKHKII-UHFFFAOYSA-N 1,1,2,2,3,3-hexafluoropropane-1-sulfonate (4-methylphenyl)-diphenylphosphanium Chemical compound FC(C(C(S(=O)(=O)[O-])(F)F)(F)F)F.CC1=CC=C(C=C1)[PH+](C1=CC=CC=C1)C1=CC=CC=C1 OKRNPJCKEKHKII-UHFFFAOYSA-N 0.000 description 1
- UVBHITFDOQNDRU-UHFFFAOYSA-M 1,1,2,2,3,3-hexafluoropropane-1-sulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 UVBHITFDOQNDRU-UHFFFAOYSA-M 0.000 description 1
- LTOQTEOVRRXGBX-UHFFFAOYSA-N 1,1,2,2,3,3-hexafluoropropane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)F LTOQTEOVRRXGBX-UHFFFAOYSA-N 0.000 description 1
- OVFYGRVXSBSBQY-UHFFFAOYSA-N 1,1,2-trimethyl-2-phenylhydrazine Chemical compound CN(C)N(C)C1=CC=CC=C1 OVFYGRVXSBSBQY-UHFFFAOYSA-N 0.000 description 1
- YFROKWYWKNHKDD-UHFFFAOYSA-N 1,1-bis(4-methylphenyl)-2-phenylhydrazine Chemical compound C1(=CC=CC=C1)NN(C1=CC=C(C=C1)C)C1=CC=C(C=C1)C YFROKWYWKNHKDD-UHFFFAOYSA-N 0.000 description 1
- GHYCDQZHLJYSRX-UHFFFAOYSA-N 1,2-dimethoxyethane;ethyl acetate Chemical compound CCOC(C)=O.COCCOC GHYCDQZHLJYSRX-UHFFFAOYSA-N 0.000 description 1
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 1
- DPOPGHCRRJYPMP-UHFFFAOYSA-N 1-[diazo(methylsulfonyl)methyl]sulfonyl-4-methylbenzene Chemical compound CC1=CC=C(S(=O)(=O)C(=[N+]=[N-])S(C)(=O)=O)C=C1 DPOPGHCRRJYPMP-UHFFFAOYSA-N 0.000 description 1
- MZVABYGYVXBZDP-UHFFFAOYSA-N 1-adamantyl 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC2CC1(OC(=O)C(=C)C)C3 MZVABYGYVXBZDP-UHFFFAOYSA-N 0.000 description 1
- LTLWUUHOWDQZEY-UHFFFAOYSA-N 1-bicyclo[3.2.1]octanyl prop-2-enoate Chemical compound C12(CCCC(CC1)C2)OC(C=C)=O LTLWUUHOWDQZEY-UHFFFAOYSA-N 0.000 description 1
- JSHASCFKOSDFHY-UHFFFAOYSA-N 1-butylpyrrolidine Chemical compound CCCCN1CCCC1 JSHASCFKOSDFHY-UHFFFAOYSA-N 0.000 description 1
- UGDXXMCTNJHYKN-UHFFFAOYSA-N 1-cyclohexyl-2-cyclohexylsulfonyl-2-diazonioethenolate Chemical compound C1CCCCC1S(=O)(=O)C(=[N+]=[N-])C(=O)C1CCCCC1 UGDXXMCTNJHYKN-UHFFFAOYSA-N 0.000 description 1
- VWJFWYXFPOARLW-UHFFFAOYSA-N 1-cyclohexyl-2-diazonio-2-(4-methylphenyl)sulfonylethenolate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C([N+]#N)=C([O-])C1CCCCC1 VWJFWYXFPOARLW-UHFFFAOYSA-N 0.000 description 1
- BLLJJXHFQMICAY-UHFFFAOYSA-N 1-cyclohexyl-3-ethenylbenzene Chemical compound C=CC1=CC=CC(C2CCCCC2)=C1 BLLJJXHFQMICAY-UHFFFAOYSA-N 0.000 description 1
- KJPDERSXMYGMBR-UHFFFAOYSA-N 1-cyclohexylsulfonyl-1-diazonio-3,3-dimethylbut-1-en-2-olate Chemical compound CC(C)(C)C(=O)C(=[N+]=[N-])S(=O)(=O)C1CCCCC1 KJPDERSXMYGMBR-UHFFFAOYSA-N 0.000 description 1
- WGMMWXBLGUAUGQ-UHFFFAOYSA-N 1-diazonio-1-methylsulfonyl-4-phenylbut-1-en-2-olate Chemical compound CS(=O)(=O)C(=[N+]=[N-])C(=O)CCC1=CC=CC=C1 WGMMWXBLGUAUGQ-UHFFFAOYSA-N 0.000 description 1
- AFMKLJCLBQEQTM-UHFFFAOYSA-N 1-diazonio-3,3-dimethyl-1-(4-methylphenyl)sulfonylbut-1-en-2-olate Chemical compound CC1=CC=C(S(=O)(=O)C(=[N+]=[N-])C(=O)C(C)(C)C)C=C1 AFMKLJCLBQEQTM-UHFFFAOYSA-N 0.000 description 1
- BPDJYHYNEQRLLW-UHFFFAOYSA-N 1-diazonio-3-methyl-1-(4-methylphenyl)sulfonylbut-1-en-2-olate Chemical compound CC(C)C(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C)C=C1 BPDJYHYNEQRLLW-UHFFFAOYSA-N 0.000 description 1
- ZMXAHWXPRKVGCM-UHFFFAOYSA-N 1-ethenyl-3-phenylbenzene Chemical compound C=CC1=CC=CC(C=2C=CC=CC=2)=C1 ZMXAHWXPRKVGCM-UHFFFAOYSA-N 0.000 description 1
- IYSVFZBXZVPIFA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)benzene Chemical compound C1=CC(C=C)=CC=C1C1=CC=C(C=C)C=C1 IYSVFZBXZVPIFA-UHFFFAOYSA-N 0.000 description 1
- MZUZTNVCGSKTCH-UHFFFAOYSA-N 1-ethenyl-4-(4-phenoxyphenyl)benzene Chemical compound C1=CC(C=C)=CC=C1C(C=C1)=CC=C1OC1=CC=CC=C1 MZUZTNVCGSKTCH-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- YJBXNRXOZKGTME-UHFFFAOYSA-N 1-ethyl-4-(2-methoxyethenyl)benzene Chemical compound CCc1ccc(C=COC)cc1 YJBXNRXOZKGTME-UHFFFAOYSA-N 0.000 description 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 1
- VPQKATKRTYXEOO-UHFFFAOYSA-N 1-tert-butyl-4-iodobenzene;trifluoromethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)F.CC(C)(C)C1=CC=C(I)C=C1 VPQKATKRTYXEOO-UHFFFAOYSA-N 0.000 description 1
- JPSDCHFODMCZCM-UHFFFAOYSA-N 1-tert-butylsulfonyl-1-diazonio-3,3-dimethylbut-1-en-2-olate Chemical compound CC(C)(C)C(=O)C(=[N+]=[N-])S(=O)(=O)C(C)(C)C JPSDCHFODMCZCM-UHFFFAOYSA-N 0.000 description 1
- RNIPJYFZGXJSDD-UHFFFAOYSA-N 2,4,5-triphenyl-1h-imidazole Chemical compound C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 RNIPJYFZGXJSDD-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- URYHQMZOXSKGRF-UHFFFAOYSA-N 2-(cyclopenten-1-yloxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CCCC1 URYHQMZOXSKGRF-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- SAFWZKVQMVOANB-UHFFFAOYSA-N 2-[tert-butylsulfonyl(diazo)methyl]sulfonyl-2-methylpropane Chemical compound CC(C)(C)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(C)(C)C SAFWZKVQMVOANB-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- FWWXYLGCHHIKNY-UHFFFAOYSA-N 2-ethoxyethyl prop-2-enoate Chemical compound CCOCCOC(=O)C=C FWWXYLGCHHIKNY-UHFFFAOYSA-N 0.000 description 1
- WHNIMRYJAUUVQJ-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylethanone;4-methylbenzenesulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1.C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 WHNIMRYJAUUVQJ-UHFFFAOYSA-N 0.000 description 1
- GPLIMIJPIZGPIF-UHFFFAOYSA-N 2-hydroxy-1,4-benzoquinone Chemical compound OC1=CC(=O)C=CC1=O GPLIMIJPIZGPIF-UHFFFAOYSA-N 0.000 description 1
- YXYJVFYWCLAXHO-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate Chemical compound COCCOC(=O)C(C)=C YXYJVFYWCLAXHO-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- IIFFFBSAXDNJHX-UHFFFAOYSA-N 2-methyl-n,n-bis(2-methylpropyl)propan-1-amine Chemical compound CC(C)CN(CC(C)C)CC(C)C IIFFFBSAXDNJHX-UHFFFAOYSA-N 0.000 description 1
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 1
- ROJWTNWAEYEKMO-UHFFFAOYSA-N 2-phenylmethoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCC1=CC=CC=C1 ROJWTNWAEYEKMO-UHFFFAOYSA-N 0.000 description 1
- TUJZQBKMFDTVMB-UHFFFAOYSA-N 3-(4-tert-butylphenyl)-1,2-diphenyl-9H-fluorene Chemical compound C(C)(C)(C)C1=CC=C(C=C1)C=1C(=C(C=2CC3=CC=CC=C3C2C1)C1=CC=CC=C1)C1=CC=CC=C1 TUJZQBKMFDTVMB-UHFFFAOYSA-N 0.000 description 1
- JDSONMNGELBMAN-UHFFFAOYSA-N 3-chloro-4-ethenylphenol Chemical compound OC1=CC=C(C=C)C(Cl)=C1 JDSONMNGELBMAN-UHFFFAOYSA-N 0.000 description 1
- VHSZHZHXFJGADJ-UHFFFAOYSA-N 4,4-di(propan-2-yl)-1,3-oxazolidine Chemical compound CC(C)C1(C(C)C)COCN1 VHSZHZHXFJGADJ-UHFFFAOYSA-N 0.000 description 1
- UPGBQNIPUNZHTL-UHFFFAOYSA-N 4,4-diethyl-1,3-oxazolidine Chemical compound CCC1(CC)COCN1 UPGBQNIPUNZHTL-UHFFFAOYSA-N 0.000 description 1
- KPISYFMQDKLQNL-UHFFFAOYSA-N 4,4-dimethyl-1,3-oxazinane Chemical compound CC1(C)CCOCN1 KPISYFMQDKLQNL-UHFFFAOYSA-N 0.000 description 1
- JPSGQOJSUTUQHZ-UHFFFAOYSA-N 4,4-ditert-butyl-1,3-oxazolidine Chemical compound CC(C)(C)C1(C(C)(C)C)COCN1 JPSGQOJSUTUQHZ-UHFFFAOYSA-N 0.000 description 1
- BEXCUZYLCHDBAX-UHFFFAOYSA-N 4-bicyclo[2.1.1]hexanyl prop-2-enoate Chemical compound C1C2CC1(OC(=O)C=C)CC2 BEXCUZYLCHDBAX-UHFFFAOYSA-N 0.000 description 1
- FEZAQYCRLLDDBS-UHFFFAOYSA-N 4-bicyclo[2.2.1]heptanyl 2-methylprop-2-enoate Chemical compound C1CC2CCC1(OC(=O)C(=C)C)C2 FEZAQYCRLLDDBS-UHFFFAOYSA-N 0.000 description 1
- WGUJUIMHWNHXGB-UHFFFAOYSA-N 4-bicyclo[2.2.1]heptanyl prop-2-enoate Chemical compound C1CC2CCC1(OC(=O)C=C)C2 WGUJUIMHWNHXGB-UHFFFAOYSA-N 0.000 description 1
- UBAIJWGSXRFRGI-UHFFFAOYSA-M 4-chlorobenzenesulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C1=CC=C(Cl)C=C1.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 UBAIJWGSXRFRGI-UHFFFAOYSA-M 0.000 description 1
- HUBRTTPKTLCKLZ-UHFFFAOYSA-N 4-ethenyl-2,6-dimethylphenol Chemical compound CC1=CC(C=C)=CC(C)=C1O HUBRTTPKTLCKLZ-UHFFFAOYSA-N 0.000 description 1
- QKJHNPXSYSFZMJ-UHFFFAOYSA-N 4-ethenyl-2-methylphenol Chemical compound CC1=CC(C=C)=CC=C1O QKJHNPXSYSFZMJ-UHFFFAOYSA-N 0.000 description 1
- LFBOTPSZVHTHON-UHFFFAOYSA-N 4-ethenyl-3-fluorophenol Chemical compound OC1=CC=C(C=C)C(F)=C1 LFBOTPSZVHTHON-UHFFFAOYSA-N 0.000 description 1
- RYRGGXUPGWTAPZ-UHFFFAOYSA-N 4-ethenyl-3-methylphenol Chemical compound CC1=CC(O)=CC=C1C=C RYRGGXUPGWTAPZ-UHFFFAOYSA-N 0.000 description 1
- DPFWQZHVGRHUDI-UHFFFAOYSA-M 4-methoxybenzenesulfonate;triphenylsulfanium Chemical compound COC1=CC=C(S([O-])(=O)=O)C=C1.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 DPFWQZHVGRHUDI-UHFFFAOYSA-M 0.000 description 1
- OOTBVTALXQHTHX-UHFFFAOYSA-N 4-methyl-1,3-oxazolidine Chemical compound CC1COCN1 OOTBVTALXQHTHX-UHFFFAOYSA-N 0.000 description 1
- YXZXRYDYTRYFAF-UHFFFAOYSA-M 4-methylbenzenesulfonate;triphenylsulfanium Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 YXZXRYDYTRYFAF-UHFFFAOYSA-M 0.000 description 1
- WXAIEIRYBSKHDP-UHFFFAOYSA-N 4-phenyl-n-(4-phenylphenyl)-n-[4-[4-(4-phenyl-n-(4-phenylphenyl)anilino)phenyl]phenyl]aniline Chemical compound C1=CC=CC=C1C1=CC=C(N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC=CC=2)C=C1 WXAIEIRYBSKHDP-UHFFFAOYSA-N 0.000 description 1
- ZZMFDMIBZYLXQE-UHFFFAOYSA-N 5-ethenylbenzene-1,2,3-triol Chemical compound OC1=CC(C=C)=CC(O)=C1O ZZMFDMIBZYLXQE-UHFFFAOYSA-N 0.000 description 1
- XIPXCVZIOAPJIN-UHFFFAOYSA-N 79638-11-2 Chemical compound C12C=CCC2C2CC(OCCOC(=O)C=C)C1C2 XIPXCVZIOAPJIN-UHFFFAOYSA-N 0.000 description 1
- ZRCMGIXRGFOXNT-UHFFFAOYSA-N 7a-ethyl-1,3,5,7-tetrahydro-[1,3]oxazolo[3,4-c][1,3]oxazole Chemical compound C1OCN2COCC21CC ZRCMGIXRGFOXNT-UHFFFAOYSA-N 0.000 description 1
- YWIJBUYJSIQULU-UHFFFAOYSA-N 7a-methyl-1,3,5,7-tetrahydro-[1,3]oxazolo[3,4-c][1,3]oxazole Chemical compound C1OCN2COCC21C YWIJBUYJSIQULU-UHFFFAOYSA-N 0.000 description 1
- HDCJCGXDWDFUNY-UHFFFAOYSA-N 7a-tert-butyl-1,3,5,7-tetrahydro-[1,3]oxazolo[3,4-c][1,3]oxazole Chemical compound C1OCN2COCC21C(C)(C)C HDCJCGXDWDFUNY-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- SHSCMGOQVKLIOJ-UHFFFAOYSA-N CC(=C)C(=O)OC12CCC(C1)CCC2 Chemical compound CC(=C)C(=O)OC12CCC(C1)CCC2 SHSCMGOQVKLIOJ-UHFFFAOYSA-N 0.000 description 1
- PQLQXKQLJXBWLE-UHFFFAOYSA-N CC1=CC=C(C=C1)S(=O)(=O)OC.C(C1=CC=CC=C1)(=N)N Chemical compound CC1=CC=C(C=C1)S(=O)(=O)OC.C(C1=CC=CC=C1)(=N)N PQLQXKQLJXBWLE-UHFFFAOYSA-N 0.000 description 1
- HFRFIOPMFVIJBT-UHFFFAOYSA-N COC1=CC=C(C=C1)C1=CC=CC2=C(C3=CC=CC=C3C(=C12)C1=CC=CC=C1)C1=CC=CC=C1.FC(C(C(S(=O)(=O)O)(F)F)(F)F)F Chemical compound COC1=CC=C(C=C1)C1=CC=CC2=C(C3=CC=CC=C3C(=C12)C1=CC=CC=C1)C1=CC=CC=C1.FC(C(C(S(=O)(=O)O)(F)F)(F)F)F HFRFIOPMFVIJBT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- AVVWPBAENSWJCB-QTVWNMPRSA-N D-talofuranose Chemical compound OC[C@@H](O)[C@@H]1OC(O)[C@@H](O)[C@H]1O AVVWPBAENSWJCB-QTVWNMPRSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- XFGCVOLHSCVJIP-UHFFFAOYSA-N FC(S(=O)(=O)O)(F)F.CC1=CC=C(C=C1)C1=C2C(=C(NC2=CC=C1)C1=CC=CC=C1)C1=CC=C(C=C1)C Chemical compound FC(S(=O)(=O)O)(F)F.CC1=CC=C(C=C1)C1=C2C(=C(NC2=CC=C1)C1=CC=CC=C1)C1=CC=C(C=C1)C XFGCVOLHSCVJIP-UHFFFAOYSA-N 0.000 description 1
- GRCLRMPFHZYJQC-UHFFFAOYSA-N FC(S(=O)(=O)O)(F)F.ClC1=CC=C(C=C1)C1=C2C(=C(NC2=CC=C1)C1=CC=CC=C1)C1=CC=C(C=C1)Cl Chemical compound FC(S(=O)(=O)O)(F)F.ClC1=CC=C(C=C1)C1=C2C(=C(NC2=CC=C1)C1=CC=CC=C1)C1=CC=C(C=C1)Cl GRCLRMPFHZYJQC-UHFFFAOYSA-N 0.000 description 1
- MQIYJOMKOCEQQB-UHFFFAOYSA-N FC(S(=O)(=O)[O-])(F)F.COC1=CC=C(C=C1)[PH+](C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound FC(S(=O)(=O)[O-])(F)F.COC1=CC=C(C=C1)[PH+](C1=CC=CC=C1)C1=CC=CC=C1 MQIYJOMKOCEQQB-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 244000147568 Laurus nobilis Species 0.000 description 1
- 235000017858 Laurus nobilis Nutrition 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229920000715 Mucilage Polymers 0.000 description 1
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- HJTJXOABNOEEQY-UHFFFAOYSA-N N-methyl-3-phenylprop-1-en-1-amine Chemical compound CNC=CCC1=CC=CC=C1 HJTJXOABNOEEQY-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 235000005212 Terminalia tomentosa Nutrition 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- NTLSYSZBWNPERW-UHFFFAOYSA-N [2-hydroxy-3-[2-hydroxy-3-(4-methylphenyl)sulfonyloxy-1,2-diphenylpropoxy]-2,3-diphenylpropyl] 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC(O)(C=1C=CC=CC=1)C(C=1C=CC=CC=1)OC(C(O)(COS(=O)(=O)C=1C=CC(C)=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 NTLSYSZBWNPERW-UHFFFAOYSA-N 0.000 description 1
- DGLKTVPDIVUXNW-UHFFFAOYSA-N [4-(3-methylcyclohexyl)phenyl] 2-methylprop-2-enoate Chemical compound C(C(=C)C)(=O)OC1=CC=C(C=C1)C1CC(CCC1)C DGLKTVPDIVUXNW-UHFFFAOYSA-N 0.000 description 1
- BWNOOCOIGKIHEW-UHFFFAOYSA-N [4-(3-methylcyclohexyl)phenyl] prop-2-enoate Chemical compound C(C=C)(=O)OC1=CC=C(C=C1)C1CC(CCC1)C BWNOOCOIGKIHEW-UHFFFAOYSA-N 0.000 description 1
- MDWHRJQFLMTHNL-UHFFFAOYSA-N [4-(4-bromophenyl)phenyl] prop-2-enoate Chemical compound C(C=C)(=O)OC1=CC=C(C=C1)C1=CC=C(C=C1)Br MDWHRJQFLMTHNL-UHFFFAOYSA-N 0.000 description 1
- NKZRMKULHGKWAI-UHFFFAOYSA-N [4-(4-methylcyclohexyl)phenyl] prop-2-enoate Chemical compound C1CC(C)CCC1C1=CC=C(OC(=O)C=C)C=C1 NKZRMKULHGKWAI-UHFFFAOYSA-N 0.000 description 1
- DAFMALKPYITARJ-UHFFFAOYSA-N [4-(4-methylphenyl)phenyl] prop-2-enoate Chemical compound C1=CC(C)=CC=C1C1=CC=C(OC(=O)C=C)C=C1 DAFMALKPYITARJ-UHFFFAOYSA-N 0.000 description 1
- XYHDWRQXCZIARJ-UHFFFAOYSA-N [4-(4-tert-butylcyclohexyl)phenyl] prop-2-enoate Chemical compound C(C=C)(=O)OC1=CC=C(C=C1)C1CCC(CC1)C(C)(C)C XYHDWRQXCZIARJ-UHFFFAOYSA-N 0.000 description 1
- AFISRPCHFVRAGB-UHFFFAOYSA-N [N+](=O)([O-])C(C(C(C)(C)C)=O)S(=O)(=O)C1=CC=CC=C1 Chemical compound [N+](=O)([O-])C(C(C(C)(C)C)=O)S(=O)(=O)C1=CC=CC=C1 AFISRPCHFVRAGB-UHFFFAOYSA-N 0.000 description 1
- HZJRVOPQORKHIH-UHFFFAOYSA-N [N+](=[N-])=C.C(C)(C)S(=O)(=O)O.C(C)(C)S(=O)(=O)O Chemical compound [N+](=[N-])=C.C(C)(C)S(=O)(=O)O.C(C)(C)S(=O)(=O)O HZJRVOPQORKHIH-UHFFFAOYSA-N 0.000 description 1
- MWSUAXLRONDAQS-UHFFFAOYSA-N [O-]S(=O)(=O)C(F)(F)F.ClC1=CC=C(C=C1)[PH+](C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound [O-]S(=O)(=O)C(F)(F)F.ClC1=CC=C(C=C1)[PH+](C1=CC=CC=C1)C1=CC=CC=C1 MWSUAXLRONDAQS-UHFFFAOYSA-N 0.000 description 1
- GLGXSTXZLFQYKJ-UHFFFAOYSA-N [cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane Chemical compound C1CCCCC1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1CCCCC1 GLGXSTXZLFQYKJ-UHFFFAOYSA-N 0.000 description 1
- FEVJONIJUZTKGL-UHFFFAOYSA-N [tert-butylsulfonyl(diazo)methyl]sulfonylcyclohexane Chemical compound CC(C)(C)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1CCCCC1 FEVJONIJUZTKGL-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 238000007171 acid catalysis Methods 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 125000005074 adamantylmethyl group Chemical group 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000004849 alkoxymethyl group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 150000008425 anthrones Chemical class 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- BLBKTJIPOBRUGU-UHFFFAOYSA-M benzenesulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 BLBKTJIPOBRUGU-UHFFFAOYSA-M 0.000 description 1
- DNFSNYQTQMVTOK-UHFFFAOYSA-N bis(4-tert-butylphenyl)iodanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 DNFSNYQTQMVTOK-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- KRJIBMFDBVWHBJ-UHFFFAOYSA-N cycloheptyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCCC1 KRJIBMFDBVWHBJ-UHFFFAOYSA-N 0.000 description 1
- VLIHGIDKOZKVBS-UHFFFAOYSA-N cycloheptyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCCC1 VLIHGIDKOZKVBS-UHFFFAOYSA-N 0.000 description 1
- WRAABIJFUKKEJQ-UHFFFAOYSA-N cyclopentyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCC1 WRAABIJFUKKEJQ-UHFFFAOYSA-N 0.000 description 1
- BTQLDZMOTPTCGG-UHFFFAOYSA-N cyclopentyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCC1 BTQLDZMOTPTCGG-UHFFFAOYSA-N 0.000 description 1
- GTBGXKPAKVYEKJ-UHFFFAOYSA-N decyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C(C)=C GTBGXKPAKVYEKJ-UHFFFAOYSA-N 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011981 development test Methods 0.000 description 1
- KTFWVPPPATXYEG-UHFFFAOYSA-N diaminomethylidenesulfamic acid Chemical compound NC(=N)NS(O)(=O)=O KTFWVPPPATXYEG-UHFFFAOYSA-N 0.000 description 1
- URQUNWYOBNUYJQ-UHFFFAOYSA-N diazonaphthoquinone Chemical compound C1=CC=C2C(=O)C(=[N]=[N])C=CC2=C1 URQUNWYOBNUYJQ-UHFFFAOYSA-N 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- LAWOZCWGWDVVSG-UHFFFAOYSA-N dioctylamine Chemical compound CCCCCCCCNCCCCCCCC LAWOZCWGWDVVSG-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- RMUYKKBIADOHFL-UHFFFAOYSA-M diphenyliodanium;1,1,2,2,3,3-hexafluoropropane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)F.C=1C=CC=CC=1[I+]C1=CC=CC=C1 RMUYKKBIADOHFL-UHFFFAOYSA-M 0.000 description 1
- UMIKAXKFQJWKCV-UHFFFAOYSA-M diphenyliodanium;4-methylbenzenesulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C=1C=CC=CC=1[I+]C1=CC=CC=C1 UMIKAXKFQJWKCV-UHFFFAOYSA-M 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229930004069 diterpene Natural products 0.000 description 1
- 150000004141 diterpene derivatives Chemical class 0.000 description 1
- MSHALHDXRMDVAL-UHFFFAOYSA-N dodec-1-enylbenzene Chemical compound CCCCCCCCCCC=CC1=CC=CC=C1 MSHALHDXRMDVAL-UHFFFAOYSA-N 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 125000005567 fluorenylene group Chemical group 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000001046 glycoluril group Chemical class [H]C12N(*)C(=O)N(*)C1([H])N(*)C(=O)N2* 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 238000007031 hydroxymethylation reaction Methods 0.000 description 1
- 125000000879 imine group Chemical group 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000002934 lysing effect Effects 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- OCUXHFVNHQTZKR-UHFFFAOYSA-M methanesulfonate;triphenylsulfanium Chemical compound CS([O-])(=O)=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 OCUXHFVNHQTZKR-UHFFFAOYSA-M 0.000 description 1
- ZQMHJBXHRFJKOT-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC ZQMHJBXHRFJKOT-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- QGYQNISEIHXUGA-UHFFFAOYSA-N methyl 4-[4-(2-methylprop-2-enoyloxy)phenyl]benzoate Chemical compound C1=CC(C(=O)OC)=CC=C1C1=CC=C(OC(=O)C(C)=C)C=C1 QGYQNISEIHXUGA-UHFFFAOYSA-N 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- BDDNGLQSBHBGBQ-UHFFFAOYSA-N n,2-dimethyl-3-phenylprop-2-enamide Chemical compound CNC(=O)C(C)=CC1=CC=CC=C1 BDDNGLQSBHBGBQ-UHFFFAOYSA-N 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XRKQMIFKHDXFNQ-UHFFFAOYSA-N n-cyclohexyl-n-ethylcyclohexanamine Chemical compound C1CCCCC1N(CC)C1CCCCC1 XRKQMIFKHDXFNQ-UHFFFAOYSA-N 0.000 description 1
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N phenyl propionaldehyde Natural products CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- SBYHFKPVCBCYGV-UHFFFAOYSA-N quinuclidine Chemical compound C1CC2CCN1CC2 SBYHFKPVCBCYGV-UHFFFAOYSA-N 0.000 description 1
- 238000001448 refractive index detection Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- DFKSOSAMNIMACB-UHFFFAOYSA-N sulfanyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OS DFKSOSAMNIMACB-UHFFFAOYSA-N 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- 238000009482 thermal adhesion granulation Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- CWERGRDVMFNCDR-UHFFFAOYSA-M thioglycolate(1-) Chemical compound [O-]C(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-M 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- CMSYDJVRTHCWFP-UHFFFAOYSA-N triphenylphosphane;hydrobromide Chemical compound Br.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 CMSYDJVRTHCWFP-UHFFFAOYSA-N 0.000 description 1
- AVCVDUDESCZFHJ-UHFFFAOYSA-N triphenylphosphane;hydrochloride Chemical compound [Cl-].C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 AVCVDUDESCZFHJ-UHFFFAOYSA-N 0.000 description 1
- CVJLQNNJZBCTLI-UHFFFAOYSA-M triphenylsulfanium;iodide Chemical compound [I-].C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 CVJLQNNJZBCTLI-UHFFFAOYSA-M 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- IQKSLJOIKWOGIZ-UHFFFAOYSA-N tris(4-chlorophenyl)phosphane Chemical compound C1=CC(Cl)=CC=C1P(C=1C=CC(Cl)=CC=1)C1=CC=C(Cl)C=C1 IQKSLJOIKWOGIZ-UHFFFAOYSA-N 0.000 description 1
- XLRPYZSEQKXZAA-OCAPTIKFSA-N tropane Chemical compound C1CC[C@H]2CC[C@@H]1N2C XLRPYZSEQKXZAA-OCAPTIKFSA-N 0.000 description 1
- 229930004006 tropane Natural products 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/128—Radiation-activated cross-linking agent containing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US55248904P | 2004-03-12 | 2004-03-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200604742A TW200604742A (en) | 2006-02-01 |
| TWI396942B true TWI396942B (zh) | 2013-05-21 |
Family
ID=34994171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094107532A TWI396942B (zh) | 2004-03-12 | 2005-03-11 | 供顯影術應用之熱固性底塗料 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7416821B2 (enExample) |
| EP (1) | EP1743363A4 (enExample) |
| JP (1) | JP4612672B2 (enExample) |
| KR (1) | KR20070029157A (enExample) |
| TW (1) | TWI396942B (enExample) |
| WO (1) | WO2005089150A2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1600814A3 (en) * | 2004-05-18 | 2008-12-17 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| EP1845416A3 (en) * | 2006-04-11 | 2009-05-20 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for photolithography |
| US7754414B2 (en) * | 2006-07-12 | 2010-07-13 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US7666575B2 (en) * | 2006-10-18 | 2010-02-23 | Az Electronic Materials Usa Corp | Antireflective coating compositions |
| US7727705B2 (en) * | 2007-02-23 | 2010-06-01 | Fujifilm Electronic Materials, U.S.A., Inc. | High etch resistant underlayer compositions for multilayer lithographic processes |
| US8153346B2 (en) * | 2007-02-23 | 2012-04-10 | Fujifilm Electronic Materials, U.S.A., Inc. | Thermally cured underlayer for lithographic application |
| JP5106911B2 (ja) * | 2007-04-13 | 2012-12-26 | 株式会社ダイセル | 重合体及びそれを用いた反射防止膜形成組成物 |
| JP6129472B2 (ja) * | 2009-01-16 | 2017-05-17 | フジフィルム・エレクトロニック・マテリアルズ・ユーエスエイ・インコーポレイテッドＦｕｊｉＦｉｌｍ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＵＳＡ， Ｉｎｃ． | 半導体基板コーティングのための非ポリマーバインダー |
| KR101321417B1 (ko) | 2009-12-28 | 2013-10-30 | 제일모직주식회사 | 컬러필터 보호막용 수지 조성물, 이를 이용하여 제조된 컬러필터 보호막 및 이를 포함하는 이미지 센서 |
| KR102276783B1 (ko) * | 2013-06-26 | 2021-07-14 | 닛산 가가쿠 가부시키가이샤 | 치환된 가교성 화합물을 포함하는 레지스트 하층막 형성 조성물 |
| JP6209103B2 (ja) * | 2014-02-25 | 2017-10-04 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク |
| CN115058175A (zh) | 2015-08-31 | 2022-09-16 | 罗门哈斯电子材料有限责任公司 | 与外涂布光致抗蚀剂一起使用的涂料组合物 |
| US20220332989A1 (en) | 2019-12-10 | 2022-10-20 | Lg Chem, Ltd. | Multi-region foldable adhesive film and fabrication method therefor |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030059552A1 (en) * | 2001-04-13 | 2003-03-27 | Fuji Photo Film Co., Ltd. | Lower layer resist composition for silicon-containing two-layer resist |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4251665A (en) * | 1978-05-22 | 1981-02-17 | King Industries, Inc. | Aromatic sulfonic acid oxa-azacyclopentane adducts |
| US5187019A (en) * | 1991-09-06 | 1993-02-16 | King Industries, Inc. | Latent catalysts |
| US6472128B2 (en) * | 1996-04-30 | 2002-10-29 | Shipley Company, L.L.C. | Antihalation compositions |
| EP0632003B1 (en) * | 1993-06-30 | 1998-01-14 | Fuji Photo Film Co., Ltd. | Novel phenol compounds containing methoxymethyl group or hydroxymethyl group |
| GB9406815D0 (en) * | 1994-04-06 | 1994-05-25 | Ici Plc | Polymer |
| US6808869B1 (en) * | 1996-12-24 | 2004-10-26 | Fuji Photo Film Co., Ltd. | Bottom anti-reflective coating material composition and method for forming resist pattern using the same |
| JP4053631B2 (ja) | 1997-10-08 | 2008-02-27 | Ａｚエレクトロニックマテリアルズ株式会社 | 反射防止膜又は光吸収膜用組成物及びこれに用いる重合体 |
| TW457403B (en) * | 1998-07-03 | 2001-10-01 | Clariant Int Ltd | Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom |
| US20020102483A1 (en) | 1998-09-15 | 2002-08-01 | Timothy Adams | Antireflective coating compositions |
| JP3852889B2 (ja) * | 1998-09-24 | 2006-12-06 | 富士写真フイルム株式会社 | フォトレジスト用反射防止膜材料組成物 |
| US6316165B1 (en) * | 1999-03-08 | 2001-11-13 | Shipley Company, L.L.C. | Planarizing antireflective coating compositions |
| US6610808B2 (en) * | 1999-03-12 | 2003-08-26 | Arch Specialty Chemicals, Inc. | Thermally cured underlayer for lithographic application |
| US6054248A (en) * | 1999-03-12 | 2000-04-25 | Arch Specialty Chemicals, Inc. | Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography |
| US6323287B1 (en) * | 1999-03-12 | 2001-11-27 | Arch Specialty Chemicals, Inc. | Hydroxy-amino thermally cured undercoat for 193 NM lithography |
| US6924339B2 (en) * | 1999-03-12 | 2005-08-02 | Arch Specialty Chemicals, Inc. | Thermally cured underlayer for lithographic application |
| DE50015750D1 (de) * | 1999-04-28 | 2009-11-12 | Qimonda Ag | Bottomresist |
| JP4253423B2 (ja) * | 2000-06-14 | 2009-04-15 | 富士フイルム株式会社 | ポジ型レジスト積層物 |
| EP1172695A1 (en) | 2000-07-14 | 2002-01-16 | Shipley Company LLC | Barrier layer |
| WO2002073307A2 (en) | 2001-03-13 | 2002-09-19 | Arch Specialty Chemicals, Inc. | Thermally cured underlayer for lithographic application |
| TW576859B (en) * | 2001-05-11 | 2004-02-21 | Shipley Co Llc | Antireflective coating compositions |
| JP4181791B2 (ja) * | 2002-04-08 | 2008-11-19 | 本州化学工業株式会社 | ヒドロキシメチル置換多官能フェノール類 |
-
2005
- 2005-03-09 JP JP2007502930A patent/JP4612672B2/ja not_active Expired - Lifetime
- 2005-03-09 KR KR1020067021214A patent/KR20070029157A/ko not_active Ceased
- 2005-03-09 EP EP05732614A patent/EP1743363A4/en not_active Withdrawn
- 2005-03-09 US US11/075,518 patent/US7416821B2/en not_active Expired - Fee Related
- 2005-03-09 WO PCT/US2005/007588 patent/WO2005089150A2/en not_active Ceased
- 2005-03-11 TW TW094107532A patent/TWI396942B/zh not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030059552A1 (en) * | 2001-04-13 | 2003-03-27 | Fuji Photo Film Co., Ltd. | Lower layer resist composition for silicon-containing two-layer resist |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070029157A (ko) | 2007-03-13 |
| WO2005089150A2 (en) | 2005-09-29 |
| JP2007529037A (ja) | 2007-10-18 |
| EP1743363A2 (en) | 2007-01-17 |
| JP4612672B2 (ja) | 2011-01-12 |
| US20050238997A1 (en) | 2005-10-27 |
| US7416821B2 (en) | 2008-08-26 |
| TW200604742A (en) | 2006-02-01 |
| EP1743363A4 (en) | 2010-08-11 |
| WO2005089150A3 (en) | 2006-11-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1465877B1 (en) | Positive-working photoimageable bottom antireflective coating | |
| JP3778485B2 (ja) | １９３ｎｍリソグラフィーのためのヒドロキシ−アミノ熱硬化下塗り | |
| JP5074529B2 (ja) | リソグラフィー用途のための熱硬化型下層 | |
| US8951710B2 (en) | Chemically amplified negative resist composition and patterning process | |
| US7727705B2 (en) | High etch resistant underlayer compositions for multilayer lithographic processes | |
| US6610808B2 (en) | Thermally cured underlayer for lithographic application | |
| JP5681208B2 (ja) | レジスト下層膜用芳香族環含有重合体およびこれを含むレジスト下層膜組成物 | |
| TW201312281A (zh) | 底層組合物及其方法 | |
| TWI396942B (zh) | 供顯影術應用之熱固性底塗料 | |
| TW201616224A (zh) | 負型光阻劑組成及其中的多官能聚合物 | |
| JP3854367B2 (ja) | 光吸収性ポリマー、光吸収膜形成性組成物及び光吸収膜とそれを用いた反射防止膜 | |
| TWI497207B (zh) | 負型光阻材料及利用此之圖案形成方法 | |
| US6924339B2 (en) | Thermally cured underlayer for lithographic application | |
| KR100844019B1 (ko) | 카본 함량이 개선된 고 내에칭성 반사방지 하드마스크조성물, 이를 이용한 패턴화된 재료 형상의 제조방법 | |
| KR101711424B1 (ko) | 반도체 기판 코팅을 위한 비중합체성 결합제 | |
| JP2003532932A (ja) | マイクロリソグラフィのフォトレジスト組成物に用いられるポリマー | |
| KR100709330B1 (ko) | 리소그래피 적용을 위한 열 경화 언더레이어 | |
| TWI430033B (zh) | 供微影術應用之經熱固化底層 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |