JP4612672B2 - リソグラフィ用途のための熱硬化性アンダーコート - Google Patents

リソグラフィ用途のための熱硬化性アンダーコート Download PDF

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Publication number
JP4612672B2
JP4612672B2 JP2007502930A JP2007502930A JP4612672B2 JP 4612672 B2 JP4612672 B2 JP 4612672B2 JP 2007502930 A JP2007502930 A JP 2007502930A JP 2007502930 A JP2007502930 A JP 2007502930A JP 4612672 B2 JP4612672 B2 JP 4612672B2
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JP
Japan
Prior art keywords
group
undercoat
double layer
carbon atoms
unsubstituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2007502930A
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English (en)
Japanese (ja)
Other versions
JP2007529037A5 (enExample
JP2007529037A (ja
Inventor
ビノド ビー・デ
サンジェイ・マリク
トマス・ジェイ・コーカブ
トマス・サルービ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Electronic Materials USA Inc
Original Assignee
Fujifilm Electronic Materials USA Inc
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Publication date
Application filed by Fujifilm Electronic Materials USA Inc filed Critical Fujifilm Electronic Materials USA Inc
Publication of JP2007529037A publication Critical patent/JP2007529037A/ja
Publication of JP2007529037A5 publication Critical patent/JP2007529037A5/ja
Application granted granted Critical
Publication of JP4612672B2 publication Critical patent/JP4612672B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2007502930A 2004-03-12 2005-03-09 リソグラフィ用途のための熱硬化性アンダーコート Expired - Lifetime JP4612672B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US55248904P 2004-03-12 2004-03-12
PCT/US2005/007588 WO2005089150A2 (en) 2004-03-12 2005-03-09 Thermally cured undercoat for lithographic application

Publications (3)

Publication Number Publication Date
JP2007529037A JP2007529037A (ja) 2007-10-18
JP2007529037A5 JP2007529037A5 (enExample) 2008-04-17
JP4612672B2 true JP4612672B2 (ja) 2011-01-12

Family

ID=34994171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007502930A Expired - Lifetime JP4612672B2 (ja) 2004-03-12 2005-03-09 リソグラフィ用途のための熱硬化性アンダーコート

Country Status (6)

Country Link
US (1) US7416821B2 (enExample)
EP (1) EP1743363A4 (enExample)
JP (1) JP4612672B2 (enExample)
KR (1) KR20070029157A (enExample)
TW (1) TWI396942B (enExample)
WO (1) WO2005089150A2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1758141B (zh) * 2004-05-18 2013-12-11 罗姆及海斯电子材料有限公司 与外涂光刻胶一起使用的涂料组合物
EP1845416A3 (en) * 2006-04-11 2009-05-20 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for photolithography
US7754414B2 (en) * 2006-07-12 2010-07-13 Az Electronic Materials Usa Corp. Antireflective coating compositions
US7666575B2 (en) * 2006-10-18 2010-02-23 Az Electronic Materials Usa Corp Antireflective coating compositions
US8153346B2 (en) 2007-02-23 2012-04-10 Fujifilm Electronic Materials, U.S.A., Inc. Thermally cured underlayer for lithographic application
US7727705B2 (en) * 2007-02-23 2010-06-01 Fujifilm Electronic Materials, U.S.A., Inc. High etch resistant underlayer compositions for multilayer lithographic processes
JP5106911B2 (ja) * 2007-04-13 2012-12-26 株式会社ダイセル 重合体及びそれを用いた反射防止膜形成組成物
KR101711424B1 (ko) * 2009-01-16 2017-03-02 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. 반도체 기판 코팅을 위한 비중합체성 결합제
KR101321417B1 (ko) 2009-12-28 2013-10-30 제일모직주식회사 컬러필터 보호막용 수지 조성물, 이를 이용하여 제조된 컬러필터 보호막 및 이를 포함하는 이미지 센서
US10809619B2 (en) * 2013-06-26 2020-10-20 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition containing substituted crosslinkable compound
JP6209103B2 (ja) * 2014-02-25 2017-10-04 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク
TWI659991B (zh) 2015-08-31 2019-05-21 Rohm And Haas Electronic Materials Llc 與外塗佈光致抗蝕劑一起使用的塗料組合物
US20220332989A1 (en) 2019-12-10 2022-10-20 Lg Chem, Ltd. Multi-region foldable adhesive film and fabrication method therefor

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4251665A (en) 1978-05-22 1981-02-17 King Industries, Inc. Aromatic sulfonic acid oxa-azacyclopentane adducts
US5187019A (en) 1991-09-06 1993-02-16 King Industries, Inc. Latent catalysts
US6472128B2 (en) 1996-04-30 2002-10-29 Shipley Company, L.L.C. Antihalation compositions
EP0632003B1 (en) 1993-06-30 1998-01-14 Fuji Photo Film Co., Ltd. Novel phenol compounds containing methoxymethyl group or hydroxymethyl group
GB9406815D0 (en) 1994-04-06 1994-05-25 Ici Plc Polymer
US6808869B1 (en) 1996-12-24 2004-10-26 Fuji Photo Film Co., Ltd. Bottom anti-reflective coating material composition and method for forming resist pattern using the same
JP4053631B2 (ja) 1997-10-08 2008-02-27 Ａｚエレクトロニックマテリアルズ株式会社 反射防止膜又は光吸収膜用組成物及びこれに用いる重合体
TW457403B (en) * 1998-07-03 2001-10-01 Clariant Int Ltd Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom
US20020102483A1 (en) 1998-09-15 2002-08-01 Timothy Adams Antireflective coating compositions
JP3852889B2 (ja) 1998-09-24 2006-12-06 富士写真フイルム株式会社 フォトレジスト用反射防止膜材料組成物
US6316165B1 (en) 1999-03-08 2001-11-13 Shipley Company, L.L.C. Planarizing antireflective coating compositions
US6054248A (en) 1999-03-12 2000-04-25 Arch Specialty Chemicals, Inc. Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography
US6924339B2 (en) * 1999-03-12 2005-08-02 Arch Specialty Chemicals, Inc. Thermally cured underlayer for lithographic application
US6610808B2 (en) 1999-03-12 2003-08-26 Arch Specialty Chemicals, Inc. Thermally cured underlayer for lithographic application
US6323287B1 (en) 1999-03-12 2001-11-27 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 NM lithography
DE50015750D1 (de) * 1999-04-28 2009-11-12 Qimonda Ag Bottomresist
JP4253423B2 (ja) 2000-06-14 2009-04-15 富士フイルム株式会社 ポジ型レジスト積層物
EP1172695A1 (en) 2000-07-14 2002-01-16 Shipley Company LLC Barrier layer
KR100709330B1 (ko) 2001-03-13 2007-04-20 아치 스페셜티 케미칼즈, 인코포레이티드 리소그래피 적용을 위한 열 경화 언더레이어
JP4139575B2 (ja) * 2001-04-13 2008-08-27 富士フイルム株式会社 シリコン含有２層レジスト用下層レジスト組成物
TW576859B (en) * 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
JP4181791B2 (ja) 2002-04-08 2008-11-19 本州化学工業株式会社 ヒドロキシメチル置換多官能フェノール類

Also Published As

Publication number Publication date
TWI396942B (zh) 2013-05-21
EP1743363A4 (en) 2010-08-11
EP1743363A2 (en) 2007-01-17
WO2005089150A3 (en) 2006-11-23
US20050238997A1 (en) 2005-10-27
JP2007529037A (ja) 2007-10-18
WO2005089150A2 (en) 2005-09-29
TW200604742A (en) 2006-02-01
US7416821B2 (en) 2008-08-26
KR20070029157A (ko) 2007-03-13

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