JP2007529037A5 - - Google Patents

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Publication number
JP2007529037A5
JP2007529037A5 JP2007502930A JP2007502930A JP2007529037A5 JP 2007529037 A5 JP2007529037 A5 JP 2007529037A5 JP 2007502930 A JP2007502930 A JP 2007502930A JP 2007502930 A JP2007502930 A JP 2007502930A JP 2007529037 A5 JP2007529037 A5 JP 2007529037A5
Authority
JP
Japan
Prior art keywords
group
double layer
carbon atoms
undercoat
layer photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007502930A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007529037A (ja
JP4612672B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2005/007588 external-priority patent/WO2005089150A2/en
Publication of JP2007529037A publication Critical patent/JP2007529037A/ja
Publication of JP2007529037A5 publication Critical patent/JP2007529037A5/ja
Application granted granted Critical
Publication of JP4612672B2 publication Critical patent/JP4612672B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2007502930A 2004-03-12 2005-03-09 リソグラフィ用途のための熱硬化性アンダーコート Expired - Lifetime JP4612672B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US55248904P 2004-03-12 2004-03-12
PCT/US2005/007588 WO2005089150A2 (en) 2004-03-12 2005-03-09 Thermally cured undercoat for lithographic application

Publications (3)

Publication Number Publication Date
JP2007529037A JP2007529037A (ja) 2007-10-18
JP2007529037A5 true JP2007529037A5 (enExample) 2008-04-17
JP4612672B2 JP4612672B2 (ja) 2011-01-12

Family

ID=34994171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007502930A Expired - Lifetime JP4612672B2 (ja) 2004-03-12 2005-03-09 リソグラフィ用途のための熱硬化性アンダーコート

Country Status (6)

Country Link
US (1) US7416821B2 (enExample)
EP (1) EP1743363A4 (enExample)
JP (1) JP4612672B2 (enExample)
KR (1) KR20070029157A (enExample)
TW (1) TWI396942B (enExample)
WO (1) WO2005089150A2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1600814A3 (en) * 2004-05-18 2008-12-17 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
EP1845416A3 (en) * 2006-04-11 2009-05-20 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for photolithography
US7754414B2 (en) * 2006-07-12 2010-07-13 Az Electronic Materials Usa Corp. Antireflective coating compositions
US7666575B2 (en) * 2006-10-18 2010-02-23 Az Electronic Materials Usa Corp Antireflective coating compositions
US7727705B2 (en) * 2007-02-23 2010-06-01 Fujifilm Electronic Materials, U.S.A., Inc. High etch resistant underlayer compositions for multilayer lithographic processes
US8153346B2 (en) * 2007-02-23 2012-04-10 Fujifilm Electronic Materials, U.S.A., Inc. Thermally cured underlayer for lithographic application
JP5106911B2 (ja) * 2007-04-13 2012-12-26 株式会社ダイセル 重合体及びそれを用いた反射防止膜形成組成物
JP6129472B2 (ja) * 2009-01-16 2017-05-17 フジフィルム・エレクトロニック・マテリアルズ・ユーエスエイ・インコーポレイテッドＦｕｊｉＦｉｌｍ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＵＳＡ， Ｉｎｃ． 半導体基板コーティングのための非ポリマーバインダー
KR101321417B1 (ko) 2009-12-28 2013-10-30 제일모직주식회사 컬러필터 보호막용 수지 조성물, 이를 이용하여 제조된 컬러필터 보호막 및 이를 포함하는 이미지 센서
KR102276783B1 (ko) * 2013-06-26 2021-07-14 닛산 가가쿠 가부시키가이샤 치환된 가교성 화합물을 포함하는 레지스트 하층막 형성 조성물
JP6209103B2 (ja) * 2014-02-25 2017-10-04 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク
CN115058175A (zh) 2015-08-31 2022-09-16 罗门哈斯电子材料有限责任公司 与外涂布光致抗蚀剂一起使用的涂料组合物
US20220332989A1 (en) 2019-12-10 2022-10-20 Lg Chem, Ltd. Multi-region foldable adhesive film and fabrication method therefor

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4251665A (en) * 1978-05-22 1981-02-17 King Industries, Inc. Aromatic sulfonic acid oxa-azacyclopentane adducts
US5187019A (en) * 1991-09-06 1993-02-16 King Industries, Inc. Latent catalysts
US6472128B2 (en) * 1996-04-30 2002-10-29 Shipley Company, L.L.C. Antihalation compositions
EP0632003B1 (en) * 1993-06-30 1998-01-14 Fuji Photo Film Co., Ltd. Novel phenol compounds containing methoxymethyl group or hydroxymethyl group
GB9406815D0 (en) * 1994-04-06 1994-05-25 Ici Plc Polymer
US6808869B1 (en) * 1996-12-24 2004-10-26 Fuji Photo Film Co., Ltd. Bottom anti-reflective coating material composition and method for forming resist pattern using the same
JP4053631B2 (ja) 1997-10-08 2008-02-27 Ａｚエレクトロニックマテリアルズ株式会社 反射防止膜又は光吸収膜用組成物及びこれに用いる重合体
TW457403B (en) * 1998-07-03 2001-10-01 Clariant Int Ltd Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom
US20020102483A1 (en) 1998-09-15 2002-08-01 Timothy Adams Antireflective coating compositions
JP3852889B2 (ja) * 1998-09-24 2006-12-06 富士写真フイルム株式会社 フォトレジスト用反射防止膜材料組成物
US6316165B1 (en) * 1999-03-08 2001-11-13 Shipley Company, L.L.C. Planarizing antireflective coating compositions
US6610808B2 (en) * 1999-03-12 2003-08-26 Arch Specialty Chemicals, Inc. Thermally cured underlayer for lithographic application
US6054248A (en) * 1999-03-12 2000-04-25 Arch Specialty Chemicals, Inc. Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography
US6323287B1 (en) * 1999-03-12 2001-11-27 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 NM lithography
US6924339B2 (en) * 1999-03-12 2005-08-02 Arch Specialty Chemicals, Inc. Thermally cured underlayer for lithographic application
DE50015750D1 (de) * 1999-04-28 2009-11-12 Qimonda Ag Bottomresist
JP4253423B2 (ja) * 2000-06-14 2009-04-15 富士フイルム株式会社 ポジ型レジスト積層物
EP1172695A1 (en) 2000-07-14 2002-01-16 Shipley Company LLC Barrier layer
WO2002073307A2 (en) 2001-03-13 2002-09-19 Arch Specialty Chemicals, Inc. Thermally cured underlayer for lithographic application
JP4139575B2 (ja) * 2001-04-13 2008-08-27 富士フイルム株式会社 シリコン含有２層レジスト用下層レジスト組成物
TW576859B (en) * 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
JP4181791B2 (ja) * 2002-04-08 2008-11-19 本州化学工業株式会社 ヒドロキシメチル置換多官能フェノール類

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