TWI395053B - 灰階罩幕及灰階罩幕毛胚 - Google Patents
灰階罩幕及灰階罩幕毛胚 Download PDFInfo
- Publication number
- TWI395053B TWI395053B TW099103293A TW99103293A TWI395053B TW I395053 B TWI395053 B TW I395053B TW 099103293 A TW099103293 A TW 099103293A TW 99103293 A TW99103293 A TW 99103293A TW I395053 B TWI395053 B TW I395053B
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- light
- semi
- etching
- pattern
- Prior art date
Links
- 238000005530 etching Methods 0.000 claims description 136
- 239000000758 substrate Substances 0.000 claims description 54
- 239000000463 material Substances 0.000 claims description 44
- 238000004519 manufacturing process Methods 0.000 claims description 43
- 239000011651 chromium Substances 0.000 claims description 36
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 25
- 229910052804 chromium Inorganic materials 0.000 claims description 22
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 21
- 238000002834 transmittance Methods 0.000 claims description 16
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 239000010408 film Substances 0.000 description 335
- 238000000034 method Methods 0.000 description 25
- 239000007788 liquid Substances 0.000 description 18
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- 239000007789 gas Substances 0.000 description 9
- 238000001039 wet etching Methods 0.000 description 8
- 238000004380 ashing Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 229910000423 chromium oxide Inorganic materials 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 2
- 150000001845 chromium compounds Chemical class 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000000475 sunscreen effect Effects 0.000 description 2
- 239000000516 sunscreening agent Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- XXKQQUIACCCABH-UHFFFAOYSA-O [Y].[N+](=O)([O-])[O-].[NH4+] Chemical compound [Y].[N+](=O)([O-])[O-].[NH4+] XXKQQUIACCCABH-UHFFFAOYSA-O 0.000 description 1
- HKVFISRIUUGTIB-UHFFFAOYSA-O azanium;cerium;nitrate Chemical compound [NH4+].[Ce].[O-][N+]([O-])=O HKVFISRIUUGTIB-UHFFFAOYSA-O 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005054352 | 2005-02-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201027235A TW201027235A (en) | 2010-07-16 |
| TWI395053B true TWI395053B (zh) | 2013-05-01 |
Family
ID=37625148
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099103293A TWI395053B (zh) | 2005-02-28 | 2006-02-27 | 灰階罩幕及灰階罩幕毛胚 |
| TW095106896A TW200639576A (en) | 2005-02-28 | 2006-02-27 | Method of manufacturing gray level mask, gray level mask, and gray level mask blank |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095106896A TW200639576A (en) | 2005-02-28 | 2006-02-27 | Method of manufacturing gray level mask, gray level mask, and gray level mask blank |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5201762B2 (OSRAM) |
| KR (3) | KR20060095522A (OSRAM) |
| TW (2) | TWI395053B (OSRAM) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101329525B1 (ko) * | 2006-10-04 | 2013-11-14 | 주식회사 에스앤에스텍 | 그레이톤 블랭크 마스크와 그레이톤 포토마스크 및 그제조방법 |
| JP5064116B2 (ja) * | 2007-05-30 | 2012-10-31 | Ｈｏｙａ株式会社 | フォトマスクの検査方法、フォトマスクの製造方法及び電子部品の製造方法 |
| TWI422961B (zh) * | 2007-07-19 | 2014-01-11 | Hoya Corp | 光罩及其製造方法、圖案轉印方法、以及顯示裝置之製造方法 |
| KR101216242B1 (ko) * | 2010-03-05 | 2013-01-18 | 주식회사 피케이엘 | 슬릿형 하프톤 패턴을 이용한 포토 마스크 제조 방법 및 이를 이용하여 제조된 포토 마스크 |
| JP6076593B2 (ja) * | 2011-09-30 | 2017-02-08 | Hoya株式会社 | 表示装置製造用多階調フォトマスク、表示装置製造用多階調フォトマスクの製造方法、パターン転写方法及び薄膜トランジスタの製造方法 |
| KR101414335B1 (ko) * | 2012-06-25 | 2014-07-02 | 주식회사 피케이엘 | 해상도 및 초점심도가 우수한 하프톤 위상반전마스크 및 그 제조 방법 |
| JP5686216B1 (ja) * | 2013-08-20 | 2015-03-18 | 大日本印刷株式会社 | マスクブランクス、位相シフトマスク及びその製造方法 |
| JP6322607B2 (ja) * | 2015-07-30 | 2018-05-09 | Hoya株式会社 | 表示デバイス製造用多階調フォトマスク、表示デバイス製造用多階調フォトマスクの製造方法、及び薄膜トランジスタの製造方法 |
| JP6761255B2 (ja) * | 2016-02-15 | 2020-09-23 | 関東化学株式会社 | エッチング液およびエッチング液により加工されたフォトマスク |
| JP6322682B2 (ja) * | 2016-10-26 | 2018-05-09 | Hoya株式会社 | パターン転写方法、表示装置の製造方法、及び、多階調フォトマスク |
| JP6463536B1 (ja) * | 2018-05-09 | 2019-02-06 | 株式会社エスケーエレクトロニクス | プロキシミティ露光用フォトマスクとその製造方法 |
| CN111367142A (zh) * | 2018-12-26 | 2020-07-03 | 聚灿光电科技（宿迁）有限公司 | 一种包含不同透光性的新型光学掩膜版 |
| KR102697809B1 (ko) * | 2019-01-16 | 2024-08-23 | 엘지이노텍 주식회사 | 포토 마스크 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW312820B (en) * | 1996-09-26 | 1997-08-11 | Winbond Electronics Corp | Contact defined photomask and method of applying to etching |
| CN1577085A (zh) * | 2003-06-30 | 2005-02-09 | Hoya株式会社 | 灰调掩模的制造方法和灰调掩模 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3262302B2 (ja) * | 1993-04-09 | 2002-03-04 | 大日本印刷株式会社 | 位相シフトフォトマスク、位相シフトフォトマスク用ブランクス及びそれらの製造方法 |
| KR100295385B1 (ko) * | 1993-04-09 | 2001-09-17 | 기타지마 요시토시 | 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법 |
| JP3289992B2 (ja) * | 1993-05-11 | 2002-06-10 | 株式会社長谷工コーポレーション | 建物の共用縦管収納部の構築方法とその方法に用いる収納部構成用の区画壁 |
| JP3453435B2 (ja) * | 1993-10-08 | 2003-10-06 | 大日本印刷株式会社 | 位相シフトマスクおよびその製造方法 |
| JP2878143B2 (ja) * | 1994-02-22 | 1999-04-05 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 減衰位相シフト・マスク作成用の薄膜材料及びその作成方法 |
| JP4290386B2 (ja) * | 2002-04-26 | 2009-07-01 | Ｈｏｙａ株式会社 | ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク |
| JP2004177683A (ja) * | 2002-11-27 | 2004-06-24 | Clariant (Japan) Kk | 超高耐熱ポジ型感光性組成物を用いたパターン形成方法 |
| JP4393290B2 (ja) * | 2003-06-30 | 2010-01-06 | Ｈｏｙａ株式会社 | グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法 |
| JP4521694B2 (ja) * | 2004-03-09 | 2010-08-11 | Ｈｏｙａ株式会社 | グレートーンマスク及び薄膜トランジスタの製造方法 |
| JP5161419B2 (ja) * | 2004-06-22 | 2013-03-13 | Ｈｏｙａ株式会社 | グレートーンマスクブランク及びグレートーンマスクの製造方法 |
-
2006
- 2006-02-27 TW TW099103293A patent/TWI395053B/zh active
- 2006-02-27 TW TW095106896A patent/TW200639576A/zh unknown
- 2006-02-28 KR KR1020060019440A patent/KR20060095522A/ko not_active Ceased
-
2009
- 2009-10-23 KR KR1020090101062A patent/KR20090128354A/ko not_active Ceased
-
2011
- 2011-02-06 JP JP2011023432A patent/JP5201762B2/ja active Active
-
2012
- 2012-03-26 KR KR1020120030420A patent/KR101269364B1/ko active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW312820B (en) * | 1996-09-26 | 1997-08-11 | Winbond Electronics Corp | Contact defined photomask and method of applying to etching |
| CN1577085A (zh) * | 2003-06-30 | 2005-02-09 | Hoya株式会社 | 灰调掩模的制造方法和灰调掩模 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060095522A (ko) | 2006-08-31 |
| KR20090128354A (ko) | 2009-12-15 |
| TW201027235A (en) | 2010-07-16 |
| TW200639576A (en) | 2006-11-16 |
| JP5201762B2 (ja) | 2013-06-05 |
| KR20120042809A (ko) | 2012-05-03 |
| KR101269364B1 (ko) | 2013-05-29 |
| JP2011090344A (ja) | 2011-05-06 |
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