TWI389744B - 控制塗施設備的方法 - Google Patents
控制塗施設備的方法 Download PDFInfo
- Publication number
- TWI389744B TWI389744B TW99125111A TW99125111A TWI389744B TW I389744 B TWI389744 B TW I389744B TW 99125111 A TW99125111 A TW 99125111A TW 99125111 A TW99125111 A TW 99125111A TW I389744 B TWI389744 B TW I389744B
- Authority
- TW
- Taiwan
- Prior art keywords
- application
- distance
- vertical position
- applicator
- substrate
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 38
- 239000011248 coating agent Substances 0.000 title claims description 11
- 238000000576 coating method Methods 0.000 title claims description 11
- 239000000463 material Substances 0.000 claims description 146
- 239000000758 substrate Substances 0.000 claims description 88
- 230000008859 change Effects 0.000 claims description 18
- 230000008569 process Effects 0.000 claims description 18
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000012360 testing method Methods 0.000 description 23
- 239000000565 sealant Substances 0.000 description 12
- 238000012546 transfer Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20090069216A KR101089747B1 (ko) | 2009-07-29 | 2009-07-29 | 도포 장치의 제어 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201105425A TW201105425A (en) | 2011-02-16 |
| TWI389744B true TWI389744B (zh) | 2013-03-21 |
Family
ID=43744223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW99125111A TWI389744B (zh) | 2009-07-29 | 2010-07-29 | 控制塗施設備的方法 |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101089747B1 (ko) |
| CN (1) | CN101987317B (ko) |
| TW (1) | TWI389744B (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015182877A1 (ko) * | 2014-05-30 | 2015-12-03 | 주식회사 파미 | 디스펜서 내장형삼차원 측정 장치 |
| KR102655331B1 (ko) * | 2016-11-30 | 2024-04-08 | 주식회사 탑 엔지니어링 | 토출 헤드의 변위 모니터링이 가능한 도포장치 및 그의 제어방법 |
| CN112383715B (zh) * | 2020-12-07 | 2022-05-17 | Oppo（重庆）智能科技有限公司 | 图像获取装置、终端和图像获取方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3469991B2 (ja) | 1996-06-25 | 2003-11-25 | 株式会社 日立インダストリイズ | ペースト塗布機 |
| JP2000009432A (ja) * | 1998-06-19 | 2000-01-14 | Nikon Corp | 線幅測定装置及び測定方法 |
| KR100710683B1 (ko) * | 2004-05-12 | 2007-04-24 | 주식회사 탑 엔지니어링 | 씰런트 디스펜서 |
| KR100696932B1 (ko) * | 2005-04-15 | 2007-03-20 | 주식회사 탑 엔지니어링 | 페이스트 도포기 및 그 제어방법 |
| JP4673180B2 (ja) * | 2005-10-13 | 2011-04-20 | 東京エレクトロン株式会社 | 塗布装置及び塗布方法 |
| KR100752237B1 (ko) * | 2006-09-20 | 2007-08-28 | 주식회사 탑 엔지니어링 | 페이스트 디스펜서의 노즐과 갭 센서 사이의 거리 측정방법 |
| KR100919622B1 (ko) * | 2007-12-05 | 2009-09-30 | 주식회사 탑 엔지니어링 | 페이스트 디스펜서의 거리 센서 |
-
2009
- 2009-07-29 KR KR20090069216A patent/KR101089747B1/ko active IP Right Grant
-
2010
- 2010-07-28 CN CN 201010240769 patent/CN101987317B/zh active Active
- 2010-07-29 TW TW99125111A patent/TWI389744B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CN101987317B (zh) | 2013-03-20 |
| TW201105425A (en) | 2011-02-16 |
| KR101089747B1 (ko) | 2011-12-07 |
| CN101987317A (zh) | 2011-03-23 |
| KR20110011800A (ko) | 2011-02-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5848755B2 (ja) | 表面形状の調節方法 | |
| KR100752237B1 (ko) | 페이스트 디스펜서의 노즐과 갭 센서 사이의 거리 측정방법 | |
| KR20050108193A (ko) | 씰런트 디스펜서 및 그 제어방법 | |
| CN107561784B (zh) | 一种光配向控制方法及光配向设备 | |
| TWI389744B (zh) | 控制塗施設備的方法 | |
| JP4841459B2 (ja) | ペーストパターン検査方法 | |
| CN101859036A (zh) | 基板贴合装置和基板贴合方法 | |
| JP2007152261A (ja) | ペースト塗布装置、ペースト塗布方法及びこれを用いた表示パネルの製造装置 | |
| TWI462780B (zh) | 分配器設備及其控制方法 | |
| JP2003177411A (ja) | シール剤の塗布装置および塗布方法 | |
| KR20110028787A (ko) | 페이스트 디스펜서 및 페이스트 도포방법 | |
| KR101346782B1 (ko) | 실런트 도포 상태에 근거한 액정 적하량 결정 방법 | |
| JP5171230B2 (ja) | アライメントマークの検出装置及び方法 | |
| TW201535079A (zh) | 用於校準制動輪的座標的方法及用於處理襯底的設備 | |
| TW201109089A (en) | Method for applying paste | |
| MX2013004672A (es) | Procedimiento y aparato para impedir la fuga de luz desde una placa de guia luminica, y dispositivo con una placa de guia luminica con material reflector. | |
| TW201829076A (zh) | 分配裝置 | |
| JPH0894984A (ja) | シール剤の塗布装置およびその方法 | |
| JP4532512B2 (ja) | シーラント塗布状態に基づいた液晶滴下量決定方法 | |
| CN109671647A (zh) | 液滴排出装置、液滴排出方法、程序和计算机存储介质 | |
| TW201422091A (zh) | 頂朝下式基板印刷裝置及基板印刷方法 | |
| TWI671519B (zh) | 聚醯亞胺膜缺陷之非接觸式修補方法 | |
| JP2011255260A (ja) | 塗布方法および塗布装置ならびにプラズマディスプレイ用部材の製造方法およびプラズマディスプレイ用部材の製造装置 | |
| KR101107499B1 (ko) | 페이스트 디스펜서 및 그 제어방법 | |
| KR20210097846A (ko) | 디스플레이 사이드 레이저 패턴설비의 스테이지 백업구조 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |