TWI389744B - Method of controlling coating apparatus - Google Patents

Method of controlling coating apparatus Download PDF

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TWI389744B
TWI389744B TW99125111A TW99125111A TWI389744B TW I389744 B TWI389744 B TW I389744B TW 99125111 A TW99125111 A TW 99125111A TW 99125111 A TW99125111 A TW 99125111A TW I389744 B TWI389744 B TW I389744B
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application
distance
vertical position
applicator
substrate
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TW99125111A
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TW201105425A (en
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Kwang-Hyun Kim
Kyoung-Cheol Shin
Won-Min Sung
Seung-Hun Oh
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Ap Systems Inc
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控制塗施設備的方法 Method of controlling application equipment

本發明涉及一種控制塗施設備(coating apparatus)的方法,且更明確地說,涉及一種控制用於塗施密封劑的密封分配器(seal dispenser)的噴嘴(nozzle)與感測器(sensor)之間的距離的方法。 The present invention relates to a method of controlling a coating apparatus, and more particularly to a nozzle and a sensor for controlling a seal dispenser for applying a sealant. The method of distance between.

迄今通常已使用陰極射線管(cathode ray tube,CRT)作為顯示裝置。然而,由於其缺點(例如體積大且重量重),針對包含液晶顯示器(liquid crystal display,LCD)、等離子體顯示面板(plasma display panel,PDP)、有機發光裝置(organic light emitting device,OLED)等在內的平板顯示器(flat panel display)的市場正在增長。 A cathode ray tube (CRT) has been conventionally used as a display device. However, due to its disadvantages (eg, bulky and heavy), it is intended to include a liquid crystal display (LCD), a plasma display panel (PDP), an organic light emitting device (OLED), and the like. The market for flat panel displays is growing.

上文所描述的平板顯示器通常是通過連結一對平坦基底來製造的。舉例來說,就液晶顯示面板(liquid crystal display panel)而論,首先製造上面形成有多個薄膜電晶體(thin film transistor)和畫素電極(pixel electrode)的下部基底以及上面形成有彩色濾光片(color filter)和共用電極(common electrode)的上部基底。接著,將液晶滴落在下部基底上,且在下部基底的邊緣區中塗施密封劑。此後,將下部基底的上面形成有畫素電極的表面與上部基底的上面形成有共用電極的表面定位成面向彼此、附接在一起且密封,以便製造液晶顯示面板。 The flat panel display described above is typically fabricated by joining a pair of flat substrates. For example, in the case of a liquid crystal display panel, first, a lower substrate on which a plurality of thin film transistors and a pixel electrode are formed and color filters are formed thereon are formed. The upper substrate of the color filter and the common electrode. Next, the liquid crystal is dropped on the lower substrate, and a sealant is applied in the edge region of the lower substrate. Thereafter, the surface on which the pixel electrode is formed on the lower substrate and the surface on which the common electrode is formed on the upper substrate are positioned to face each other, attached together, and sealed to manufacture a liquid crystal display panel.

在製造過程期間,使用塗施設備來塗施密封劑,且需 要所述設備使用精確地控制密封劑注射噴嘴(sealant injection nozzle)與基底之間的間隙的技術。舉例來說,當基底與噴嘴之間的間隙非常小時,所塗施的密封劑的圖案的寬度變寬,且圖案的高度變低。然而,當基底與噴嘴之間的間隙過大時,基底上的塗施材料圖案的寬度變窄,且有時塗施材料圖案可能具有不連貫的區段。 Application equipment is used to apply the sealant during the manufacturing process, and The device is intended to use a technique that precisely controls the gap between the sealant injection nozzle and the substrate. For example, when the gap between the substrate and the nozzle is very small, the width of the applied sealant pattern becomes wider, and the height of the pattern becomes lower. However, when the gap between the substrate and the nozzle is too large, the width of the pattern of the application material on the substrate becomes narrow, and sometimes the pattern of the application material may have a discontinuous section.

在將密封劑塗施在基底上以形成塗施材料圖案的情況下,當基底的表面不平或基底的表面上的一部分中形成額外膜層時,可能會無意地改變噴嘴與基底之間的間隙。 In the case where a sealant is applied on a substrate to form a pattern of an application material, when a surface of the substrate is uneven or an additional film layer is formed in a portion on the surface of the substrate, the gap between the nozzle and the substrate may be unintentionally changed. .

因此,新近塗施設備中的一些設備經配置以包含用於測量噴嘴與基底之間的間隙的感測器。在密封劑的塗施期間,使用感測器來週期性地測量噴嘴與基底之間的間隙,使得基底與噴嘴之間的間隙可保持恆定。由此,可抑制在塗施材料圖案中產生缺陷。 Accordingly, some of the recent applicator devices are configured to include a sensor for measuring the gap between the nozzle and the substrate. During application of the sealant, a sensor is used to periodically measure the gap between the nozzle and the substrate such that the gap between the substrate and the nozzle can be kept constant. Thereby, generation of defects in the pattern of the application material can be suppressed.

然而,因為噴嘴與感測器組合並安裝到塗施設備,所以噴嘴與感測器之間的實際距離變得不同於原始既定的距離。所述距離可能在例如更換噴嘴等任何操作期間改變。 However, since the nozzle is combined with the sensor and mounted to the application device, the actual distance between the nozzle and the sensor becomes different from the original predetermined distance. The distance may change during any operation, such as changing a nozzle.

由於噴嘴與間隙感測器之間的距離的差異,感測器的測量點可能改變。在此情況下,從感測器發射的光可能到達非既定基底區,這導致塗施材料圖案的變化。舉例來說,由於噴嘴與感測器之間的距離的差異,感測器可能測量基底與噴嘴之間對應於上面塗施有膜層的基底區的間隙,而不是測量基底與噴嘴之間對應於基底的密封劑塗施區的間隙。因此,需要精確地測量噴嘴與感測器之間的距離。 Due to the difference in distance between the nozzle and the gap sensor, the measurement point of the sensor may change. In this case, light emitted from the sensor may reach a non-determined base region, which results in a change in the pattern of the applied material. For example, due to the difference in distance between the nozzle and the sensor, the sensor may measure the gap between the substrate and the nozzle corresponding to the substrate region on which the film layer is applied, instead of measuring the correspondence between the substrate and the nozzle. The gap in the sealant application area of the substrate. Therefore, it is necessary to accurately measure the distance between the nozzle and the sensor.

為了測量噴嘴與感測器之間的距離,通常已使用例如視覺相機(vision camera)等額外裝置。然而,在此情況下,應另外提供用於測量噴嘴與感測器之間的距離的視覺相機,這伴有用於製造分配器的成本增加或設備的體積增加的缺點。 In order to measure the distance between the nozzle and the sensor, additional devices such as a vision camera have typically been used. However, in this case, a visual camera for measuring the distance between the nozzle and the sensor should be additionally provided, which is accompanied by the disadvantage of an increase in cost for manufacturing the dispenser or an increase in volume of the device.

本發明提供一種控制塗施設備的方法,所述方法能夠通過使用測量基底與塗施構件之間的距離的感測器測量光點(optical spot)與塗施材料圖案(coating material pattern)之間的距離來增強測量所述距離的準確性。 The present invention provides a method of controlling an applicator apparatus capable of measuring an optical spot and a coating material pattern by using a sensor that measures a distance between a substrate and an applicator member. The distance to enhance the accuracy of measuring the distance.

根據示範性實施例,一種控制包含用於將塗施材料塗施在基底上的塗施構件以及具有用於測量基底與塗施構件之間的距離的感測器的分配器的塗施設備的方法可包含:使用塗施構件在基底上形成塗施材料圖案;通過使用感測器將光照射到基底來獲得光點與塗施材料圖案之間的距離相對於塗施構件的垂直位置的變化率;基於所獲得的光點與塗施材料圖案之間的距離相對於塗施構件的垂直位置的變化率,計算相對於既定在實際過程中使用的塗施構件的垂直位置的光點與塗施材料圖案之間的距離;將所計算的光點與塗施材料圖案之間的距離與預設距離值進行比較;以及基於比較結果,通過控制感測器與塗施構件之間的距離來控制光點與塗施材料圖案之間的距離。 According to an exemplary embodiment, a control device includes a coating member for applying an application material on a substrate and a dispenser having a sensor for measuring a distance between the substrate and the application member. The method may include: forming an application material pattern on the substrate using the application member; and obtaining a change in the distance between the light spot and the application material pattern relative to the vertical position of the application member by irradiating light to the substrate using a sensor. Rate; based on the rate of change of the distance between the obtained spot and the applied material pattern with respect to the vertical position of the application member, calculating the spot and the coating relative to the vertical position of the application member to be used in the actual process The distance between the material patterns; the distance between the calculated light spot and the applied material pattern is compared with a preset distance value; and based on the comparison result, by controlling the distance between the sensor and the application member Controls the distance between the spot and the applied material pattern.

從感測器照射的光相對於基底可具有在50度到70度的範圍內的恆定傾角。 The light illuminated from the sensor can have a constant tilt angle in the range of 50 degrees to 70 degrees with respect to the substrate.

使用塗施構件在基底上形成塗施材料圖案可包含:控制塗施構件的垂直位置,使其與既定在實際過程中使用的塗施構件的垂直位置相同;以及形成塗施材料圖案。 Forming the pattern of the application material on the substrate using the applicator member can include: controlling the vertical position of the application member to be the same as the vertical position of the application member intended to be used in the actual process; and forming a pattern of the application material.

獲得光點與塗施材料圖案之間的距離相對於塗施構件的垂直位置的變化率可包含:升高或降低塗施構件,以使塗施構件相對於基底定位在兩個或兩個以上不同位置處;以及測量相對於塗施構件的相應垂直位置的光點與塗施材料圖案之間的距離,以便獲得光點與塗施材料圖案之間的距離相對於塗施構件的垂直位置的變化率。 Obtaining a rate of change of the distance between the spot and the application material pattern relative to the vertical position of the applicator member can include: raising or lowering the applicator member to position the applicator member in two or more relative to the substrate And at different locations; and measuring a distance between the spot relative to the corresponding vertical position of the applicator member and the pattern of the application material to obtain a distance between the spot and the pattern of the applied material relative to the vertical position of the applicator member Rate of change.

使用塗施構件的兩個或兩個以上不同垂直位置處的光點與塗施材料圖案之間的距離來計算相對於既定在實際過程中使用的塗施構件的垂直位置的光點與塗施材料圖案之間的距離。 Calculating the spot and application relative to the vertical position of the applicator member used in the actual process using the distance between the spot at two or more different vertical positions of the applicator member and the pattern of the applied material The distance between the material patterns.

假定將塗施構件的垂直位置表示為H,將相對於塗施構件的垂直位置的光點與塗施材料圖案之間的距離表示為X,那麼可將垂直位置表達為等式H=AX+B。使用所述等式來計算相對於既定在實際過程中使用的塗施構件的垂直位置的光點與塗施材料圖案之間的距離。 Assuming that the vertical position of the application member is denoted as H, and the distance between the spot relative to the vertical position of the application member and the pattern of the application material is expressed as X, the vertical position can be expressed as the equation H=AX+ B. The equation is used to calculate the distance between the spot of light and the pattern of applied material relative to the vertical position of the applicator member intended to be used in the actual process.

測量相對於塗施構件的相應垂直位置的光點與塗施材料圖案之間的距離可包含:控制塗施構件的垂直位置;使用感測器將光照射到基底上;將從感測器照射到基底上的光所形成的光點位於其上的第一點設置為虛擬坐標系上的參考座標;通過在連續照射光的同時移動分配器且使用所述光來檢測塗施材料圖案的中心點,且在虛擬坐標系上標 記所述中心點;以及計算設置在虛擬坐標系上的參考座標與標記在虛擬坐標系上的塗施材料圖案的中心點的座標之間的差異。 Measuring the distance between the spot relative to the respective vertical position of the applicator member and the pattern of the application material can include: controlling the vertical position of the applicator member; using a sensor to illuminate the light onto the substrate; illuminating from the sensor The first point on which the light spot formed by the light on the substrate is located is set as a reference coordinate on the virtual coordinate system; the center of the application material pattern is detected by moving the dispenser while continuously irradiating the light and using the light Point and mark on the virtual coordinate system Recording the center point; and calculating a difference between a reference coordinate set on the virtual coordinate system and a coordinate of a center point of the applied material pattern marked on the virtual coordinate system.

檢測塗施材料圖案的中心點可包含:水平地移動分配器,且使用分配器的感測器連續地照射光,以檢測塗施材料圖案的具有最大厚度的位置;以及將具有最大厚度的位置的中心設置為中心點。 Detecting a center point of the application material pattern may include: moving the dispenser horizontally, and continuously illuminating the light using a sensor of the dispenser to detect a position having a maximum thickness of the application material pattern; and a position having a maximum thickness The center is set to the center point.

或者,檢測塗施材料圖案的中心點可包含:使用感測器來測量塗施材料圖案的線寬;以及將所測量的塗施材料圖案的線寬的中心設置為中心點。 Alternatively, detecting the center point of the application material pattern may include: measuring a line width of the application material pattern using a sensor; and setting a center of the line width of the measured application material pattern as a center point.

在控制塗施構件的垂直位置期間,控制塗施構件的垂直位置使其高於既定在實際過程中使用的塗施構件的垂直位置。 During control of the vertical position of the applicator member, the vertical position of the applicator member is controlled to be higher than the vertical position of the applicator member that is intended to be used in the actual process.

為讓本發明之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the present invention will be more apparent from the following description.

在下文中,將參看附圖詳細描述示範性實施例。然而,本發明可以許多不同形式體現,且不應被解釋為限於本文所陳述的示範性實施例。相反,提供這些示範性實施例是為了使本揭示內容將為全面且完整的,且將把本發明的概念完全傳達給所屬領域的技術人員。 Hereinafter, exemplary embodiments will be described in detail with reference to the accompanying drawings. However, the invention may be embodied in many different forms and should not be construed as being limited to the exemplary embodiments set forth herein. Rather, the exemplary embodiments are provided so that this disclosure will be thorough and complete, and the concept of the invention will be fully conveyed to those skilled in the art.

圖1是說明根據示範性實施例的塗施設備的示意性概念圖。圖2是說明根據示範性實施例的分配器的截面圖。 FIG. 1 is a schematic conceptual view illustrating an application device according to an exemplary embodiment. 2 is a cross-sectional view illustrating a dispenser in accordance with an exemplary embodiment.

參看圖1和圖2,根據示範性實施例的塗施設備包含: 台(stage)100,基底10安放於所述台100上;分配器(dispenser)200,其用於將塗施材料塗施在安放於臺上的基底上;驅動單元(driving unit)500,其用於升高和降低分配器200;傳送單元(transfer unit)300,其用於水平地傳送台100和分配器200;以及控制單元(controlling unit)400,其用於控制傳送單元300、台100和分配器200。儘管在示範性實施例中將密封劑用作塗施材料,但不限於此,且可將各種材料用作塗施材料。 Referring to FIGS. 1 and 2, an applicator apparatus according to an exemplary embodiment includes: a stage 100 on which the substrate 10 is placed; a dispenser 200 for applying the application material to the substrate placed on the stage; a driving unit 500, For raising and lowering the dispenser 200; a transfer unit 300 for horizontally transferring the stage 100 and the dispenser 200; and a control unit 400 for controlling the transfer unit 300, the stage 100 And dispenser 200. Although the sealant is used as the application material in the exemplary embodiment, it is not limited thereto, and various materials may be used as the application material.

台100可在x和y方向上移動,以沿基底10的邊緣區的周長形成塗施材料圖案。或者,分配器200可在x和y方向上移動,以將塗施材料塗施在基底10上,或台100和分配器200兩者均可在x和y方向上移動以塗施塗施材料,或台100可在一個方向上移動,而分配器200在另一方向上移動,以塗施塗施材料。傳送單元300使用電動機或軌道來移動台100和分配器200。可使用另一各種構件來移動台100和分配器200。 The stage 100 is movable in the x and y directions to form a pattern of application material along the perimeter of the edge region of the substrate 10. Alternatively, the dispenser 200 can be moved in the x and y directions to apply the application material to the substrate 10, or both the station 100 and the dispenser 200 can be moved in the x and y directions to apply the application material. Or the table 100 can be moved in one direction while the dispenser 200 is moved in the other direction to apply the application material. The transfer unit 300 uses the motor or track to move the stage 100 and the dispenser 200. Another variety of components can be used to move station 100 and dispenser 200.

分配器200包含塗施構件210、感測器220和支撐部件(supporting member)230。塗施構件210包含:注射器(syringe)212,其中儲存塗施材料(例如,密封劑);主體部分(body part)213,注射器212安裝並固定在其中;以及噴嘴211,其安置在主體部分213下方,且將儲存在注射器212中的塗施材料塗施到基底10上。感測器220檢測塗施構件210的噴嘴211與基底10之間的距離。支撐部件230安置在塗施構件210與感測器220之間,使得感測器 220可安裝並固定到支撐部件230。 The dispenser 200 includes an application member 210, a sensor 220, and a supporting member 230. The application member 210 includes a syringe 212 in which a coating material (for example, a sealant) is stored, a body part 213 in which the syringe 212 is mounted and fixed, and a nozzle 211 disposed in the body portion 213. Below, the application material stored in the syringe 212 is applied to the substrate 10. The sensor 220 detects the distance between the nozzle 211 of the application member 210 and the substrate 10. The support member 230 is disposed between the application member 210 and the sensor 220 such that the sensor 220 can be mounted and secured to support member 230.

塗施構件210的噴嘴211和注射器212可附接到主體部分213且可從主體部分213拆卸,以實現噴嘴211和注射器212的更換。另外,感測器220可附接到支撐部件230且可從支撐部件230拆卸,且支撐部件230可附接到分配器210的主體部分213且可從分配器210的主體部分213拆卸。感測器安裝並固定到其的支撐部件230與分配器210的主體部分213可使用耦合部件(coupling member)(未圖示)(例如螺絲)彼此連接。由此,可通過控制耦合部件(未圖示)來控制安裝到支撐部件230的感測器220與噴嘴211之間的距離。 The nozzle 211 and syringe 212 of the applicator member 210 can be attached to and detachable from the body portion 213 to effect replacement of the nozzle 211 and the syringe 212. Additionally, the sensor 220 can be attached to and detachable from the support member 230, and the support member 230 can be attached to and detachable from the body portion 213 of the dispenser 210. The support member 230 to which the sensor is mounted and fixed and the body portion 213 of the dispenser 210 may be connected to each other using a coupling member (not shown) such as a screw. Thereby, the distance between the sensor 220 mounted to the support member 230 and the nozzle 211 can be controlled by controlling a coupling member (not shown).

分配器200隨著其在x和y方向上移動而經由噴嘴211將注射器212中的塗施材料塗施到基底10上。同時,感測器220測量基底10與噴嘴211之間的距離,且基於測量結果,使用驅動單元在向上和向下方向上移動分配器200,以使基底10與噴嘴211之間的距離保持恆定。以此方式,可使沿基底的邊緣的周長形成的塗施材料圖案維持為均一線性形狀。 The dispenser 200 applies the application material in the syringe 212 to the substrate 10 via the nozzle 211 as it moves in the x and y directions. At the same time, the sensor 220 measures the distance between the substrate 10 and the nozzle 211, and based on the measurement result, the dispenser 200 is moved in the upward and downward directions using the driving unit to keep the distance between the substrate 10 and the nozzle 211 constant. In this way, the pattern of the application material formed along the circumference of the edge of the substrate can be maintained in a uniform linear shape.

根據示範性實施例的感測器使用(例如)利用雷射的距離測量感測器(distance measuring sensor)。儘管未圖示,但此類型的感測器包含:發光部分(light emitting part)(未圖示),其用於朝基底10發射距離測量光(distancemeasuring light);以及光接收部分(light receiving part)(未圖示),其用於接收從發光部分(未圖示)發射的光。發光 部分(未圖示)和光接收部分(未圖示)可一體式形成,且彼此間隔開預定距離。 A sensor according to an exemplary embodiment uses, for example, a distance measuring sensor that utilizes a laser. Although not shown, this type of sensor includes a light emitting part (not shown) for transmitting distance measuring light toward the substrate 10; and a light receiving part (not shown) for receiving light emitted from a light emitting portion (not shown). Illuminate A portion (not shown) and a light receiving portion (not shown) may be integrally formed and spaced apart from each other by a predetermined distance.

如前面所提到,當從感測器220照射到基底10的亮點(light spot)與塗施材料圖案之間的距離變得超出預設距離值時,可能產生塗施材料圖案的缺陷。 As mentioned earlier, when the distance between the light spot irradiated from the sensor 220 to the substrate 10 and the pattern of the application material becomes beyond the preset distance value, a defect in the pattern of the applied material may be generated.

出於所述原因,根據示範性實施例,在基底10上實際上形成塗施材料圖案之前,獲得從感測器220照射的光點203與塗施材料圖案202之間的距離。 For the reason described, according to an exemplary embodiment, the distance between the light spot 203 irradiated from the sensor 220 and the application material pattern 202 is obtained before the application material pattern is actually formed on the substrate 10.

圖3是繪示根據示範性實施例的控制分配器的塗施構件以及感測器的方法的流程圖。圖4是說明根據示範性實施例使用分配器的塗施構件在測試基底上形成塗施材料圖案的圖。圖5和圖6是循序地說明在假定塗施構件的垂直位置為H1的情況下測量塗施材料圖案與光點之間的距離的圖。圖7是繪示當塗施構件的垂直位置為H1時塗施材料圖案和光點的座標的圖。圖8和圖9是循序地說明在假定塗施構件的垂直位置為H2的情況下測量塗施材料圖案與光點之間的距離的圖。圖10是繪示當塗施構件的垂直位置為H2時塗施材料圖案和光點的座標的圖。 FIG. 3 is a flow chart illustrating a method of controlling an applicator member of a dispenser and a sensor, in accordance with an exemplary embodiment. 4 is a diagram illustrating the formation of an application material pattern on a test substrate using an applicator member of a dispenser, in accordance with an exemplary embodiment. 5 and 6 are views sequentially illustrating the measurement of the distance between the application material pattern and the light spot in the case where the vertical position of the application member is assumed to be H1. Fig. 7 is a view showing a texture of a material pattern and a light spot when the vertical position of the application member is H1. 8 and 9 are views sequentially illustrating the measurement of the distance between the application material pattern and the light spot in the case where the vertical position of the application member is assumed to be H2. Figure 10 is a diagram showing the coordinates of the applied material pattern and the light spot when the vertical position of the application member is H2.

在下文中,將參看圖3到圖10來闡釋控制塗施構件210與感測器220之間的距離。 Hereinafter, the distance between the control application member 210 and the sensor 220 will be explained with reference to FIGS. 3 to 10.

根據示範性實施例,控制塗施構件210與感測器220之間的距離包含將測試基底201定位在台100上。可使用與實際過程中使用的基底10相同類型的基底作為測試基底201。如圖3和圖4中所說明,在測試基底201上形成 塗施材料圖案202(步驟S100)。將塗施構件210的垂直位置設置為Ht,且從塗施構件210釋放密封劑以形成塗施材料圖案202,用於測量測試基底201上的距離。如前面所提到,根據示範性實施例,塗施構件210的用於釋放塗施材料的噴嘴211安裝在主體部分213下方,且塗施材料202使用噴嘴211形成於基底201上。因此,可能優選的是塗施構件210的噴嘴211相對於基底201的垂直位置為Ht。Ht與如圖1中所說明的當在實際過程期間在基底上形成塗施材料圖案202時所使用的噴嘴211的垂直位置相同,這允許塗施材料圖案202在與實際過程相同的條件下形成於測試基底201上。Ht可在20微米到70微米的範圍內。根據示範性實施例,塗施材料圖案202形成為圓形形狀,且如圖4中所說明測量塗施材料圖案202與光點203之間的距離。然而,本發明不限於此,且塗施材料圖案202可以預定桿(或條)形狀形成於測試基底201上。 According to an exemplary embodiment, controlling the distance between the applicator member 210 and the sensor 220 includes positioning the test substrate 201 on the stage 100. As the test substrate 201, the same type of substrate as that used in the actual process can be used. Formed on the test substrate 201 as illustrated in FIGS. 3 and 4 The material pattern 202 is applied (step S100). The vertical position of the application member 210 is set to Ht, and the sealant is released from the application member 210 to form an application material pattern 202 for measuring the distance on the test substrate 201. As mentioned previously, according to an exemplary embodiment, the nozzle 211 of the application member 210 for releasing the application material is installed under the body portion 213, and the application material 202 is formed on the substrate 201 using the nozzle 211. Therefore, it may be preferable that the vertical position of the nozzle 211 of the application member 210 with respect to the substrate 201 is Ht. Ht is the same as the vertical position of the nozzle 211 used when forming the application material pattern 202 on the substrate during the actual process as illustrated in FIG. 1, which allows the application material pattern 202 to be formed under the same conditions as the actual process. On the test substrate 201. Ht can range from 20 microns to 70 microns. According to an exemplary embodiment, the application material pattern 202 is formed into a circular shape, and the distance between the application material pattern 202 and the light spot 203 is measured as illustrated in FIG. However, the present invention is not limited thereto, and the application material pattern 202 may be formed on the test substrate 201 in a predetermined rod (or strip) shape.

此後,使用感測器220獲得光點203與塗施材料圖案202之間的距離相對於噴嘴211的垂直位置的變化率(步驟S110)。為此,如圖5和圖8中所說明,將噴嘴211的垂直位置設置於兩個不同位置H1和H2,且計算相對於噴嘴211的垂直位置H1和H2的光點203與塗施材料圖案202之間的距離X1和X2。用等式H=AX+B來獲得光點203與塗施材料圖案202之間的距離相對於噴嘴211的垂直位置的變化率。H表示噴嘴211的垂直位置,且X表示光點203與塗施材料圖案202之間的距離。A和B是表徵 塗施材料圖案202與光點203之間的距離相對於噴嘴211的垂直位置的變化率的係數。為了獲得A和B的值,根據示範性實施例,測量相對於噴嘴211的垂直位置H1和H2的光點203與塗施材料圖案202之間的距離X1和X2。將所測量的值應用於等式H=AX+B,以將所述等式表達為H1=AX1+B和H2=AX2+B。可通過求解以上聯立等式來獲得係數A和B。以此方式,可獲得光點203與塗施材料圖案202之間的距離相對於噴嘴211的垂直位置的變化率。 Thereafter, the rate of change of the distance between the light spot 203 and the application material pattern 202 with respect to the vertical position of the nozzle 211 is obtained using the sensor 220 (step S110). To this end, as illustrated in FIGS. 5 and 8, the vertical position of the nozzle 211 is set at two different positions H1 and H2, and the light spot 203 and the application material pattern with respect to the vertical positions H1 and H2 of the nozzle 211 are calculated. The distance between 202 is X1 and X2. The rate of change of the distance between the spot 203 and the spread material pattern 202 with respect to the vertical position of the nozzle 211 is obtained by the equation H = AX + B. H represents the vertical position of the nozzle 211, and X represents the distance between the spot 203 and the application material pattern 202. A and B are characterizations A coefficient of the rate of change of the distance between the application material pattern 202 and the light spot 203 with respect to the vertical position of the nozzle 211. In order to obtain the values of A and B, distances X1 and X2 between the light spot 203 and the application material pattern 202 with respect to the vertical positions H1 and H2 of the nozzle 211 are measured according to an exemplary embodiment. The measured values are applied to the equation H = AX + B to express the equation as H1 = AX1 + B and H2 = AX2 + B. The coefficients A and B can be obtained by solving the above simultaneous equations. In this way, the rate of change of the distance between the light spot 203 and the application material pattern 202 with respect to the vertical position of the nozzle 211 can be obtained.

下文中將給出更詳細的闡釋。 A more detailed explanation will be given below.

如圖5中所說明,使用驅動單元500來升高和降低分配器200,以將噴嘴211定位於相對於測試基底201的垂直位置H1處。換句話說,將測試基底201與噴嘴211之間的距離設置為H1。可能優選的是H1大於上文所述的Ht。當噴嘴211的垂直位置等於或低於Ht時,可能難以測量光點203與塗施材料圖案202之間的距離。也就是說,噴嘴211可能在測量光點203與塗施材料圖案之間的距離的過程期間刮傷測試基底201,或塗施在測試基底201上的塗施材料圖案202可能污染噴嘴211的末端。 As illustrated in FIG. 5, the drive unit 500 is used to raise and lower the dispenser 200 to position the nozzle 211 at a vertical position H1 relative to the test substrate 201. In other words, the distance between the test substrate 201 and the nozzle 211 is set to H1. It may be preferred that H1 is greater than Ht as described above. When the vertical position of the nozzle 211 is equal to or lower than Ht, it may be difficult to measure the distance between the light spot 203 and the application material pattern 202. That is, the nozzle 211 may scratch the test substrate 201 during the process of measuring the distance between the light spot 203 and the application material pattern, or the application material pattern 202 applied on the test substrate 201 may contaminate the end of the nozzle 211. .

此後,使用感測器220將光(例如,雷射)照射到測試基底201上。從感測器220照射的光相對於測試基底201的傾角可在50度到70度的範圍內,且優選為60度。根據示範性實施例,如圖7中所說明,將從感測器220照射的光最初入射到的基底201的點設置為原點(0,0)。可能優選的是將最初照射到測試基底201的光點203的中心點設 置為原點(0,0)。 Thereafter, light (eg, a laser) is irradiated onto the test substrate 201 using the sensor 220. The angle of inclination of the light irradiated from the sensor 220 with respect to the test substrate 201 may be in the range of 50 degrees to 70 degrees, and is preferably 60 degrees. According to an exemplary embodiment, as illustrated in FIG. 7, the point at which the light irradiated from the sensor 220 is initially incident to the substrate 201 is set to the origin (0, 0). It may be preferable to set the center point of the light spot 203 that is initially irradiated to the test substrate 201. Set to the origin (0,0).

此後,搜索塗施材料圖案202的中心點。為此,如圖6中所說明,使用傳送單元300和控制單元400來水平地傳送分配器200,同時使用感測器220連續地將光照射到測試基底201。可通過測量塗施材料圖案202的厚度以找出最高點來搜索塗施材料圖案202的中心點。為此,如前面所提到那樣傳送分配器200,以找出感測器220顯示最低輸出的區。將感測器220顯示最低輸出的區設置為塗施材料圖案202的中心點。 Thereafter, the center point of the application material pattern 202 is searched. To this end, as illustrated in FIG. 6, the transfer unit 300 and the control unit 400 are used to horizontally transport the dispenser 200 while the sensor 220 is used to continuously illuminate the light to the test substrate 201. The center point of the application material pattern 202 can be searched by measuring the thickness of the application material pattern 202 to find the highest point. To this end, the dispenser 200 is transported as previously mentioned to find the region in which the sensor 220 displays the lowest output. The region where the sensor 220 displays the lowest output is set as the center point of the application material pattern 202.

儘管圖中未繪示,但可通過測量塗施材料圖案202的線寬來找出塗施材料圖案202的中心點。因為塗施在測試基底201上的塗施材料圖案202經形成為具有實質上恆定的寬度,所以可通過使用感測器220測量塗施材料圖案202的線寬且將所測量的塗施材料圖案202的線寬的中心設置為中心點來找出塗施材料圖案202的中心點。 Although not shown in the drawings, the center point of the application material pattern 202 can be found by measuring the line width of the application material pattern 202. Since the application material pattern 202 applied on the test substrate 201 is formed to have a substantially constant width, the line width of the application material pattern 202 can be measured by using the sensor 220 and the measured application material pattern can be measured. The center of the line width of 202 is set as the center point to find the center point of the application material pattern 202.

接著,如圖7中所說明,將使用感測器220找出的塗施材料圖案202的中心點(Xx,Yy)標記在虛擬坐標系上。在虛擬坐標系上,還標記最初照射到測試基底201的光點203的中心點,即原點(0,0)。因此,可通過檢測光點203的中心所位於的原點(0,0)以及塗施材料圖案202的中心點(Xx,Yy)來計算光點203與塗施材料圖案202之間的距離值X1。光點203與塗施材料圖案202之間的距離值X1對應於噴嘴211的垂直位置H1。 Next, as illustrated in FIG. 7, the center point (Xx, Yy) of the application material pattern 202 found using the sensor 220 is marked on the virtual coordinate system. On the virtual coordinate system, the center point of the spot 203 originally irradiated to the test substrate 201, that is, the origin (0, 0) is also marked. Therefore, the distance value between the light spot 203 and the application material pattern 202 can be calculated by detecting the origin (0, 0) where the center of the light spot 203 is located and the center point (Xx, Yy) of the application material pattern 202. X1. The distance value X1 between the light spot 203 and the application material pattern 202 corresponds to the vertical position H1 of the nozzle 211.

接著,將噴嘴211的垂直位置改變為與以上描述的H1 不同的位置,且計算相對於改變的垂直位置的光點203與塗施材料圖案202之間的距離值。 Next, the vertical position of the nozzle 211 is changed to H1 as described above. Different positions are calculated, and the distance value between the light spot 203 and the application material pattern 202 with respect to the changed vertical position is calculated.

具體地說,使用傳送單元500來升高或降低分配器200,直到噴嘴211的垂直位置變為H2為止,如圖8中所說明。H2可大於以上描述的Ht,且不同於H1。在示範性實施例中,將H2設置為大於H1。接著,使用感測器220將光照射到測試基底201。如圖10中所說明,將從感測器220照射的光最初入射到的測試基底201的點設置為原點(0,0)。可能優選的是將最初照射到測試基底201的光點203的中心點設置為原點(0,0)。 Specifically, the transfer unit 500 is used to raise or lower the dispenser 200 until the vertical position of the nozzle 211 becomes H2, as illustrated in FIG. H2 may be greater than Ht described above and is different from H1. In an exemplary embodiment, H2 is set to be greater than H1. Next, the sensor 220 is used to illuminate the light onto the test substrate 201. As illustrated in FIG. 10, the point at which the light irradiated from the sensor 220 is initially incident on the test substrate 201 is set to the origin (0, 0). It may be preferable to set the center point of the light spot 203 originally irradiated to the test substrate 201 to the origin (0, 0).

此後,搜索塗施材料圖案202的中心點。為此,如圖9中所說明,使用傳送單元300和控制單元400來水平地傳送分配器200,同時使用感測器220連續地將光照射到測試基底201。可通過測量塗施材料圖案202的厚度以找出最高點來搜索塗施材料圖案202的中心點。為此,如前面所提到那樣傳送分配器200,以找出感測器220顯示最低輸出的區。將感測器220顯示最低輸出的區設置為塗施材料圖案202的中心點。 Thereafter, the center point of the application material pattern 202 is searched. To this end, as illustrated in FIG. 9, the transfer unit 300 and the control unit 400 are used to horizontally transport the dispenser 200 while the sensor 220 is used to continuously illuminate the light to the test substrate 201. The center point of the application material pattern 202 can be searched by measuring the thickness of the application material pattern 202 to find the highest point. To this end, the dispenser 200 is transported as previously mentioned to find the region in which the sensor 220 displays the lowest output. The region where the sensor 220 displays the lowest output is set as the center point of the application material pattern 202.

接著,如圖10中所說明,將使用感測器220找出的塗施材料圖案202的中心點(Xx,Yy)標記在虛擬坐標系上。在虛擬坐標系上,還標記最初照射到測試基底201的光點203的中心,即原點(0,0)。因此,可通過檢測光點203的中心所位於的原點(0,0)以及塗施材料圖案202的中心點(Xx,Yy)來計算光點203與塗施材料圖案202之間 的距離值X2。光點203與塗施材料圖案202之間的距離值X2對應於噴嘴211的垂直位置H2。 Next, as illustrated in FIG. 10, the center point (Xx, Yy) of the application material pattern 202 found using the sensor 220 is marked on the virtual coordinate system. On the virtual coordinate system, the center of the spot 203 initially irradiated to the test substrate 201, that is, the origin (0, 0), is also marked. Therefore, the light spot 203 and the application material pattern 202 can be calculated by detecting the origin (0, 0) where the center of the light spot 203 is located and the center point (Xx, Yy) of the application material pattern 202. The distance value is X2. The distance value X2 between the light spot 203 and the application material pattern 202 corresponds to the vertical position H2 of the nozzle 211.

根據示範性實施例,將噴嘴211的垂直位置設置於不同位置H1和H2,以測量相對於相應位置H1和H2的光點203與塗施材料圖案202之間的距離值X1和X2。然而,本發明不限於此,且可將噴嘴211控制為處於兩個或兩個以上不同垂直位置,以便計算相對於噴嘴211的垂直位置的光點203與塗施材料圖案202之間的距離值。 According to an exemplary embodiment, the vertical position of the nozzle 211 is set at different positions H1 and H2 to measure distance values X1 and X2 between the light spot 203 and the application material pattern 202 with respect to the respective positions H1 and H2. However, the present invention is not limited thereto, and the nozzle 211 may be controlled to be at two or more different vertical positions in order to calculate a distance value between the light spot 203 and the application material pattern 202 with respect to the vertical position of the nozzle 211. .

一旦相對於噴嘴211的垂直位置H1和H2測量了光點203與塗施材料圖案202之間的距離值,便可基於所測量的值獲得光點203與塗施材料圖案202之間的距離值相對於噴嘴211的垂直位置的變化率。這可表達為等式H=AX+B,其中H表示噴嘴的垂直位置,且X為光點203與塗施材料圖案202之間的距離。A和B是表徵塗施材料圖案202與光點203之間的距離相對於噴嘴211的垂直位置的變化率的係數。為了獲得A和B的值,如前面所提到,測量相對於噴嘴211的垂直位置H1和H2的光點203與塗施材料圖案202之間的距離X1和X2。將所測量的值應用於等式H=AX+B,以將所述等式表達為H1=AX1+B和H2=AX2+B。可通過求解以上聯立等式來獲得係數A和B。以此方式,可獲得光點203與塗施材料圖案202之間的距離相對於噴嘴211的垂直位置的變化率。 Once the distance value between the light spot 203 and the application material pattern 202 is measured with respect to the vertical positions H1 and H2 of the nozzle 211, the distance value between the light spot 203 and the application material pattern 202 can be obtained based on the measured value. The rate of change with respect to the vertical position of the nozzle 211. This can be expressed as the equation H = AX + B, where H represents the vertical position of the nozzle and X is the distance between the spot 203 and the application material pattern 202. A and B are coefficients that characterize the rate of change of the distance between the application material pattern 202 and the spot 203 with respect to the vertical position of the nozzle 211. In order to obtain the values of A and B, as described above, the distances X1 and X2 between the spot 203 and the application material pattern 202 with respect to the vertical positions H1 and H2 of the nozzle 211 are measured. The measured values are applied to the equation H = AX + B to express the equation as H1 = AX1 + B and H2 = AX2 + B. The coefficients A and B can be obtained by solving the above simultaneous equations. In this way, the rate of change of the distance between the light spot 203 and the application material pattern 202 with respect to the vertical position of the nozzle 211 can be obtained.

舉例來說,當H1為500 um,X1為1.5 mm,H2為700 um,且X2為1.7mm時,所述等式可表達為500um=1.5A mm+B和700um=1.7A mm+B。通過求解聯立等式,A經計算為1000,且B經計算為-1000。因此,相對於H的光點203與塗施材料圖案202之間的距離X可表達為等式H=1000X-1000。A和B的值可根據噴嘴211與感測器220之間的距離而改變。 For example, when H1 is 500 um, X1 is 1.5 mm, H2 is 700 um, and X2 is 1.7 mm, the equation can be expressed as 500 um = 1.5 A. Mm+B and 700um=1.7A mm+B. By solving the simultaneous equation, A is calculated to be 1000, and B is calculated to be -1000. Therefore, the distance X between the light spot 203 with respect to H and the application material pattern 202 can be expressed as the equation H=1000X-1000. The values of A and B may vary depending on the distance between the nozzle 211 and the sensor 220.

另外,用既定在實際過程中使用的噴嘴211的垂直位置Ht代替等式(H=1000X-1000)中的H,以計算照射到基底10上的光點203與塗施材料圖案202之間的距離Xt(步驟S120)。舉例來說,當噴嘴211的垂直位置Ht在實際過程中為30 um時,根據以上等式,光點203與塗施材料圖案202之間的距離Xt經計算為1.03 mm。 Further, H in the equation (H = 1000X - 1000) is replaced with the vertical position Ht of the nozzle 211 which is intended to be used in the actual process to calculate the relationship between the light spot 203 irradiated onto the substrate 10 and the application material pattern 202. The distance Xt (step S120). For example, when the vertical position Ht of the nozzle 211 is 30 um in the actual process, according to the above equation, the distance Xt between the light spot 203 and the application material pattern 202 is calculated to be 1.03 mm.

在計算相對於既定在實際過程中使用的噴嘴211的垂直位置的光點203與塗施材料圖案202之間的距離之後,將所計算的值與預設距離值進行比較(步驟S130)。如果兩個值相同,那麼完成對光點203與塗施材料圖案202之間的距離的調整。如果兩個值不同,那麼控制感測器與塗施構件之間的距離,以調整光點203與塗施材料圖案202之間的距離(步驟S140)。 After calculating the distance between the light spot 203 and the application material pattern 202 with respect to the vertical position of the nozzle 211 which is intended to be used in the actual process, the calculated value is compared with the preset distance value (step S130). If the two values are the same, then the adjustment of the distance between the spot 203 and the application material pattern 202 is completed. If the two values are different, the distance between the sensor and the application member is controlled to adjust the distance between the light spot 203 and the application material pattern 202 (step S140).

可通過精細地控制連接感測器220安裝到其的支撐部件230與塗施構件210的耦合部件(未圖示)來調整光點203與塗施材料圖案202之間的距離。連接支撐部件230與塗施構件210的耦合部件(未圖示)可包含呈螺紋形狀的x軸和y軸主體,所述主體與支撐部件230和塗施構件210組合以精細地控制所述距離。也就是說,通過旋轉所 述主體,感測器安裝到其的支撐部件230可移動。用於精細地控制所述距離的構件不限於此,且可使用各種構件。可通過僅移動噴嘴211來控制噴嘴211與感測器220之間的距離。或者,噴嘴211和感測器220兩者均可移動。 The distance between the light spot 203 and the application material pattern 202 can be adjusted by finely controlling the coupling member (not shown) of the support member 230 to which the connection sensor 220 is attached and the application member 210. A coupling member (not shown) connecting the support member 230 and the application member 210 may include an x-axis and a y-axis body in a thread shape, the body being combined with the support member 230 and the application member 210 to finely control the distance . That is, by rotating The main body, the support member 230 to which the sensor is mounted is movable. The member for finely controlling the distance is not limited thereto, and various members may be used. The distance between the nozzle 211 and the sensor 220 can be controlled by moving only the nozzle 211. Alternatively, both the nozzle 211 and the sensor 220 can be moved.

當調整噴嘴211與感測器220之間的距離時,重複圖4到圖10中所說明的前述過程。也就是說,以噴嘴211與感測器220之間經調整的距離來測量塗施材料圖案202與光點203之間的距離。 When the distance between the nozzle 211 and the sensor 220 is adjusted, the foregoing processes illustrated in FIGS. 4 to 10 are repeated. That is, the distance between the application material pattern 202 and the light spot 203 is measured by the adjusted distance between the nozzle 211 and the sensor 220.

如前面在示範性實施例中提到,使用感測器220來獲得光點203與塗施材料圖案202之間的距離,且根據所測量的值來控制感測器220與塗施構件210之間的距離。因此,可在無額外儀器的情況下測量光點203與塗施材料圖案202之間的距離,且可改進測量所述距離的準確性。 As previously mentioned in the exemplary embodiment, the sensor 220 is used to obtain the distance between the light spot 203 and the application material pattern 202, and the sensor 220 and the application member 210 are controlled according to the measured values. The distance between them. Therefore, the distance between the light spot 203 and the application material pattern 202 can be measured without additional instruments, and the accuracy of measuring the distance can be improved.

針對控制用於塗施密封劑的塗施設備的方法闡釋了示範性實施例。但所述方法不限於此,且可應用於各種類型的塗施設備。 An exemplary embodiment is illustrated for a method of controlling an application device for applying a sealant. However, the method is not limited thereto and can be applied to various types of application equipment.

如上文所陳述,根據先前實施例,使用用於測量基底與塗施構件之間的距離的感測器來測量光點與塗施材料圖案之間的距離。可基於所測量的值來控制感測器與塗施構件之間的距離。以此方式,可在無額外儀器的情況下測量光點與塗施材料圖案之間的距離,且可改進測量所述距離的準確性。因此,可使基底與塗施構件之間的距離在塗施材料的塗施期間保持恆定,且可避免塗施材料圖案中的缺陷。 As stated above, according to the previous embodiment, a sensor for measuring the distance between the substrate and the application member is used to measure the distance between the light spot and the pattern of the application material. The distance between the sensor and the applicator member can be controlled based on the measured value. In this way, the distance between the spot and the pattern of the applied material can be measured without additional instrumentation, and the accuracy of measuring the distance can be improved. Therefore, the distance between the substrate and the application member can be kept constant during the application of the application material, and defects in the pattern of the application material can be avoided.

另外,在無額外儀器的情況下使用感測器來測量從感測器照射到基底上的光點與噴嘴之間的距離,可降低製造分配器的成本。 In addition, the use of a sensor to measure the distance between the spot of light impinging on the substrate from the sensor and the nozzle without additional instrumentation can reduce the cost of manufacturing the dispenser.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

10、201‧‧‧基底 10, 201‧‧‧ base

100‧‧‧台 100‧‧‧

200‧‧‧分配器 200‧‧‧Distributor

202‧‧‧塗施材料圖案 202‧‧‧Material material pattern

203‧‧‧光點 203‧‧‧ light spots

210‧‧‧塗施構件 210‧‧‧Applying components

211‧‧‧噴嘴 211‧‧‧ nozzle

212‧‧‧注射器 212‧‧‧Syringe

213‧‧‧主體部分 213‧‧‧ body part

220‧‧‧感測器 220‧‧‧ sensor

230‧‧‧支撐部件 230‧‧‧Support parts

300‧‧‧傳送單元 300‧‧‧Transfer unit

400‧‧‧控制單元 400‧‧‧Control unit

500‧‧‧驅動單元 500‧‧‧ drive unit

S100~S140‧‧‧步驟 S100~S140‧‧‧Steps

可從結合附圖進行的以下描述更詳細地理解示範性實施例,在附圖中:圖1是說明根據示範性實施例的塗施設備的示意性概念圖。 The exemplary embodiments may be understood in more detail in the following description in conjunction with the accompanying drawings in which: FIG. 1 is a schematic conceptual diagram illustrating an applicator apparatus in accordance with an exemplary embodiment.

圖2是說明根據示範性實施例的分配器的截面圖。 2 is a cross-sectional view illustrating a dispenser in accordance with an exemplary embodiment.

圖3是繪示根據示範性實施例的控制分配器的塗施構件以及感測器的方法的流程圖。 FIG. 3 is a flow chart illustrating a method of controlling an applicator member of a dispenser and a sensor, in accordance with an exemplary embodiment.

圖4是說明根據示範性實施例使用分配器的塗施構件在測試基底上形成塗施材料圖案的圖。 4 is a diagram illustrating the formation of an application material pattern on a test substrate using an applicator member of a dispenser, in accordance with an exemplary embodiment.

圖5和圖6是循序地說明在假定塗施構件的垂直位置為H1的情況下測量塗施材料圖案與光點之間的距離的圖。 5 and 6 are views sequentially illustrating the measurement of the distance between the application material pattern and the light spot in the case where the vertical position of the application member is assumed to be H1.

圖7是繪示當塗施構件的垂直位置為H1時塗施材料圖案和光點的座標的圖。 Fig. 7 is a view showing a texture of a material pattern and a light spot when the vertical position of the application member is H1.

圖8和圖9是循序地說明在假定塗施構件的垂直位置為H2的情況下測量塗施材料圖案與光點之間的距離的圖。 8 and 9 are views sequentially illustrating the measurement of the distance between the application material pattern and the light spot in the case where the vertical position of the application member is assumed to be H2.

圖10是繪示當塗施構件的垂直位置為H2時塗施材料 圖案和光點的座標的圖。 Figure 10 is a view showing the application material when the vertical position of the application member is H2 A diagram of the coordinates of the pattern and the light spot.

S100~S140‧‧‧步驟 S100~S140‧‧‧Steps

Claims (10)

一種控制塗施設備的方法,所述塗施設備包括用於將塗施材料塗施在基底上的塗施構件以及包含用於測量所述基底與所述塗施構件之間的距離的感測器的分配器,所述方法包括:使用所述塗施構件在所述基底上形成塗施材料圖案;通過使用所述感測器將光照射到所述基底上來獲得光點與所述塗施材料圖案之間的距離相對於所述塗施構件的垂直位置的變化率;基於所述所獲得的所述光點與所述塗施材料圖案之間的所述距離相對於所述塗施構件的所述垂直位置的變化率,計算相對於既定在實際過程中使用的所述塗施構件的垂直位置的所述光點與所述塗施材料圖案之間的距離值;將所述所計算的所述光點與所述塗施材料圖案之間的距離值與預設距離值進行比較;以及基於比較結果,通過控制所述感測器與所述塗施構件之間的距離來控制所述光點與所述塗施材料圖案之間的所述距離。 A method of controlling an applicator apparatus, the applicator apparatus comprising an applicator member for applying an applicator material to a substrate and sensing for measuring a distance between the substrate and the applicator member a dispenser comprising: forming an application material pattern on the substrate using the application member; obtaining a light spot and the application by irradiating light onto the substrate using the sensor a rate of change of the distance between the material patterns relative to the vertical position of the applicator member; based on the obtained distance between the spot and the applicator material pattern relative to the applicator member a rate of change of the vertical position, calculating a distance value between the spot and the applied material pattern relative to a vertical position of the applicator member intended to be used in an actual process; The distance value between the light spot and the application material pattern is compared with a preset distance value; and based on the comparison result, the distance is controlled by controlling the distance between the sensor and the application member Light spot and the coating The distance between the pattern material. 如申請專利範圍第1項所述之控制塗施設備的方法,其中從所述感測器照射的所述光相對於所述基底具有在50度到70度的範圍內的恆定傾角。 The method of controlling an applicator device of claim 1, wherein the light illuminated from the sensor has a constant tilt angle in a range of 50 degrees to 70 degrees with respect to the substrate. 如申請專利範圍第1項所述之控制塗施設備的方 法,其中使用所述塗施構件在所述基底上形成所述塗施材料圖案包括:控制所述塗施構件的所述垂直位置,使其與既定在實際過程中使用的所述塗施構件的所述垂直位置相同;以及在所述基底上形成所述塗施材料圖案。 The party that controls the application equipment as described in item 1 of the patent application scope The method of forming the application material pattern on the substrate using the application member includes: controlling the vertical position of the application member to be applied to the application member that is intended to be used in an actual process The vertical positions are the same; and the application material pattern is formed on the substrate. 如申請專利範圍第1項所述之控制塗施設備的方法,其中獲得所述光點與所述塗施材料圖案之間的所述距離相對於所述塗施構件的所述垂直位置的所述變化率包括:升高或降低所述塗施構件,以使所述塗施構件相對於所述基底定位在兩個或兩個以上不同位置處;以及測量相對於所述塗施構件的相應垂直位置的所述光點與所述塗施材料圖案之間的所述距離,以便獲得所述光點與所述塗施材料圖案之間的所述距離相對於所述塗施構件的所述垂直位置的所述變化率。 The method of controlling an application device according to claim 1, wherein the distance between the light spot and the application material pattern relative to the vertical position of the application member is obtained. The rate of change includes: raising or lowering the applicator member to position the applicator member at two or more different positions relative to the substrate; and measuring a corresponding position relative to the applicator member The distance between the spot of the vertical position and the pattern of applied material to obtain the distance between the spot and the pattern of applied material relative to the applicator member The rate of change of the vertical position. 如申請專利範圍第4項所述之控制塗施設備的方法,其中使用所述塗施構件的所述兩個或兩個以上不同垂直位置處的所述光點與所述塗施材料圖案之間的距離值來計算相對於既定在實際過程中使用的所述塗施構件的所述垂直位置的所述光點與所述塗施材料圖案之間的所述距離值。 The method of controlling an applicator device according to claim 4, wherein the spot of the two or more different vertical positions of the applicator member and the pattern of the application material are used. The distance value between the distances is calculated relative to the distance between the spot of the vertical position of the applicator member used in the actual process and the pattern of applied material. 如申請專利範圍第5項所述之控制塗施設備的方法,其中假定將所述塗施構件的所述垂直位置表示為H,將相對於所述塗施構件的所述垂直位置的所述光點與所述塗施材料圖案之間的所述距離值表示為X,那麼可將所述 垂直位置表達為等式H=AX+B,且使用所述等式來計算相對於既定在實際過程中使用的所述塗施構件的所述垂直位置的所述光點與所述塗施材料圖案之間的所述距離值。 A method of controlling an applicator apparatus according to claim 5, wherein the vertical position of the applicator member is assumed to be H, and the vertical position relative to the applicator member is The distance value between the light spot and the application material pattern is expressed as X, then the The vertical position is expressed as the equation H=AX+B, and the equation is used to calculate the spot and the coating material relative to the vertical position of the applicator member that is intended to be used in an actual process. The distance value between the patterns. 如申請專利範圍第4項所述之控制塗施設備的方法,其中測量相對於所述塗施構件的所述相應垂直位置的所述光點與所述塗施材料圖案之間的所述距離包括:控制所述塗施構件的所述垂直位置;使用所述感測器將光照射到所述基底上;將從所述感測器照射到所述基底上的所述光所形成的所述光點最初位於所述基底上的點設置為虛擬坐標系上的參考座標;通過在連續照射所述光的同時移動所述分配器且使用所述光來檢測所述塗施材料圖案的中心點,且在所述虛擬坐標系上標記所述中心點;以及計算設置在所述虛擬坐標系上的所述參考座標與標記在所述虛擬坐標系上的所述塗施材料圖案的所述中心點的座標之間的差異。 The method of controlling an applicator device of claim 4, wherein the distance between the spot of the corresponding vertical position relative to the applicator member and the pattern of application material is measured Included: controlling the vertical position of the applicator member; using the sensor to illuminate light onto the substrate; forming the light from the sensor onto the substrate a point at which the light spot is initially located on the substrate is set as a reference coordinate on the virtual coordinate system; the center of the coating material pattern is detected by moving the dispenser while continuously illuminating the light and using the light a point, and marking the center point on the virtual coordinate system; and calculating the reference coordinate set on the virtual coordinate system and the coating material pattern marked on the virtual coordinate system The difference between the coordinates of the center point. 如申請專利範圍第7項所述之控制塗施設備的方法,其中檢測所述塗施材料圖案的所述中心點包括:水平地移動所述分配器,且使用所述分配器的所述感測器連續地照射光,以檢測所述塗施材料圖案的具有最大厚度的位置;以及將具有所述最大厚度的所述位置的中心設置為所述中心點。 The method of controlling an applicator device of claim 7, wherein detecting the center point of the application material pattern comprises: moving the dispenser horizontally, and using the sense of the dispenser The detector continuously irradiates light to detect a position of the application material pattern having a maximum thickness; and sets a center of the position having the maximum thickness as the center point. 如申請專利範圍第7項所述之控制塗施設備的方法,其中檢測所述塗施材料圖案的所述中心點包括:使用所述感測器來測量所述塗施材料圖案的線寬;以及將所述所測量的所述塗施材料圖案的線寬的中心設置為所述中心點。 The method of controlling an application device according to claim 7, wherein detecting the center point of the application material pattern comprises: measuring a line width of the application material pattern using the sensor; And setting the center of the line width of the measured coating material pattern to the center point. 如申請專利範圍第7項所述之控制塗施設備的方法,其中在控制所述塗施構件的所述垂直位置期間,控制所述塗施構件的所述垂直位置使其高於既定在實際過程中使用的所述塗施構件的所述垂直位置。 The method of controlling an applicator device according to claim 7, wherein the controlling the vertical position of the applicator member is controlled to be higher than a predetermined one during control of the vertical position of the applicator member The vertical position of the applicator member used in the process.
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