TWI388019B - 封裝結構之製法 - Google Patents

封裝結構之製法 Download PDF

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Publication number
TWI388019B
TWI388019B TW098129496A TW98129496A TWI388019B TW I388019 B TWI388019 B TW I388019B TW 098129496 A TW098129496 A TW 098129496A TW 98129496 A TW98129496 A TW 98129496A TW I388019 B TWI388019 B TW I388019B
Authority
TW
Taiwan
Prior art keywords
package
layer
package substrate
full
manufacturing
Prior art date
Application number
TW098129496A
Other languages
English (en)
Chinese (zh)
Other versions
TW201110247A (en
Inventor
胡竹青
Original Assignee
欣興電子股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 欣興電子股份有限公司 filed Critical 欣興電子股份有限公司
Priority to TW098129496A priority Critical patent/TWI388019B/zh
Priority to JP2009263063A priority patent/JP5285580B2/ja
Priority to US12/871,447 priority patent/US8222080B2/en
Publication of TW201110247A publication Critical patent/TW201110247A/zh
Application granted granted Critical
Publication of TWI388019B publication Critical patent/TWI388019B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7412—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7424—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self-supporting substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/744—Details of chemical or physical process used for separating the auxiliary support from a device or a wafer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01—Manufacture or treatment
    • H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65—Shapes or dispositions of interconnections
    • H10W70/654—Top-view layouts
    • H10W70/655—Fan-out layouts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68—Shapes or dispositions thereof
    • H10W70/685—Shapes or dispositions thereof comprising multiple insulating layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/0198—Manufacture or treatment batch processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/072—Connecting or disconnecting of bump connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/241—Dispositions, e.g. layouts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251—Materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Dicing (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
TW098129496A 2009-09-02 2009-09-02 封裝結構之製法 TWI388019B (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW098129496A TWI388019B (zh) 2009-09-02 2009-09-02 封裝結構之製法
JP2009263063A JP5285580B2 (ja) 2009-09-02 2009-11-18 パッケージ構造の製造方法
US12/871,447 US8222080B2 (en) 2009-09-02 2010-08-30 Fabrication method of package structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW098129496A TWI388019B (zh) 2009-09-02 2009-09-02 封裝結構之製法

Publications (2)

Publication Number Publication Date
TW201110247A TW201110247A (en) 2011-03-16
TWI388019B true TWI388019B (zh) 2013-03-01

Family

ID=43625513

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098129496A TWI388019B (zh) 2009-09-02 2009-09-02 封裝結構之製法

Country Status (3)

Country Link
US (1) US8222080B2 (https=)
JP (1) JP5285580B2 (https=)
TW (1) TWI388019B (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI425886B (zh) * 2011-06-07 2014-02-01 欣興電子股份有限公司 嵌埋有電子元件之封裝結構及其製法
HK1167067A2 (en) * 2011-09-06 2012-11-16 Centricam Technologies Limited A system and method for processing a very wide angle image
JP2013214578A (ja) * 2012-03-30 2013-10-17 Ibiden Co Ltd 配線板及びその製造方法
JP2014229698A (ja) * 2013-05-21 2014-12-08 イビデン株式会社 配線板及び配線板の製造方法
TWI551207B (zh) * 2014-09-12 2016-09-21 矽品精密工業股份有限公司 基板結構及其製法
TWI570816B (zh) * 2014-09-26 2017-02-11 矽品精密工業股份有限公司 封裝結構及其製法
US10504871B2 (en) 2017-12-11 2019-12-10 Amkor Technology, Inc. Semiconductor device and manufacturing method thereof
US10818636B2 (en) 2018-08-30 2020-10-27 Advanced Semiconductor Engineering, Inc. Substrate panel structure and manufacturing process
US10624213B1 (en) * 2018-12-20 2020-04-14 Intel Corporation Asymmetric electronic substrate and method of manufacture
US11545455B2 (en) * 2019-05-28 2023-01-03 Apple Inc. Semiconductor packaging substrate fine pitch metal bump and reinforcement structures
US11694906B2 (en) 2019-09-03 2023-07-04 Amkor Technology Singapore Holding Pte. Ltd. Semiconductor devices and methods of manufacturing semiconductor devices
US11605552B2 (en) 2020-02-21 2023-03-14 Amkor Technology Singapore Holding Pte. Ltd. Hybrid panel method of manufacturing electronic devices and electronic devices manufactured thereby
US11915949B2 (en) 2020-02-21 2024-02-27 Amkor Technology Singapore Holding Pte. Ltd. Hybrid panel method of manufacturing electronic devices and electronic devices manufactured thereby

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111395A (ja) * 1981-12-25 1983-07-02 株式会社日立製作所 混成集積回路の製造方法
JP4115560B2 (ja) * 1997-09-22 2008-07-09 シチズンホールディングス株式会社 半導体パッケージの製造方法
JP5410660B2 (ja) * 2007-07-27 2014-02-05 新光電気工業株式会社 配線基板及びその製造方法と電子部品装置及びその製造方法
TWI328423B (en) * 2007-09-14 2010-08-01 Unimicron Technology Corp Circuit board structure having heat-dissipating structure
US10074553B2 (en) * 2007-12-03 2018-09-11 STATS ChipPAC Pte. Ltd. Wafer level package integration and method
US7790503B2 (en) * 2007-12-18 2010-09-07 Stats Chippac, Ltd. Semiconductor device and method of forming integrated passive device module
KR101486420B1 (ko) * 2008-07-25 2015-01-26 삼성전자주식회사 칩 패키지, 이를 이용한 적층형 패키지 및 그 제조 방법

Also Published As

Publication number Publication date
TW201110247A (en) 2011-03-16
US20110053318A1 (en) 2011-03-03
JP5285580B2 (ja) 2013-09-11
US8222080B2 (en) 2012-07-17
JP2011054921A (ja) 2011-03-17

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