TWI383467B - Stage device - Google Patents

Stage device Download PDF

Info

Publication number
TWI383467B
TWI383467B TW097109874A TW97109874A TWI383467B TW I383467 B TWI383467 B TW I383467B TW 097109874 A TW097109874 A TW 097109874A TW 97109874 A TW97109874 A TW 97109874A TW I383467 B TWI383467 B TW I383467B
Authority
TW
Taiwan
Prior art keywords
base
frame
cans
upper frame
axis direction
Prior art date
Application number
TW097109874A
Other languages
English (en)
Chinese (zh)
Other versions
TW200926345A (en
Inventor
Tatsuya Yoshida
Yasuhito Nakamori
Original Assignee
Sumitomo Heavy Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries filed Critical Sumitomo Heavy Industries
Publication of TW200926345A publication Critical patent/TW200926345A/zh
Application granted granted Critical
Publication of TWI383467B publication Critical patent/TWI383467B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Machine Tool Units (AREA)
  • Feeding Of Articles To Conveyors (AREA)
TW097109874A 2007-12-12 2008-03-20 Stage device TWI383467B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007321307A JP4195497B2 (ja) 2007-12-12 2007-12-12 ステージ装置

Publications (2)

Publication Number Publication Date
TW200926345A TW200926345A (en) 2009-06-16
TWI383467B true TWI383467B (zh) 2013-01-21

Family

ID=39242917

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097109874A TWI383467B (zh) 2007-12-12 2008-03-20 Stage device

Country Status (4)

Country Link
JP (1) JP4195497B2 (ja)
KR (1) KR100993473B1 (ja)
CN (1) CN101459103B (ja)
TW (1) TWI383467B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010225687A (ja) * 2009-03-19 2010-10-07 Shibaura Mechatronics Corp 基板の処理装置
WO2010118002A1 (en) * 2009-04-07 2010-10-14 Trumpf, Inc. A workpiece processing machine with a processing head, a suction duct and structural connecting frame section for transporting the processing machine
EP2416916B1 (en) 2009-04-07 2015-02-25 Trumpf, Inc. Cutting machine with a cutting head using a beam and a suction duct coupled to the motion unit moving the cutting head
JP5380225B2 (ja) * 2009-09-24 2014-01-08 株式会社日立ハイテクノロジーズ ガラス基板の検査装置
TW201140727A (en) * 2009-11-10 2011-11-16 Ulvac Inc Inspection apparatus
KR101055214B1 (ko) * 2010-08-02 2011-08-09 김복인 현장조립형 중,대형 가공기
JP5605502B2 (ja) * 2011-03-24 2014-10-15 村田機械株式会社 工作機械システム
CN103594280B (zh) * 2013-10-31 2015-08-26 西安交通大学 一种新型复合触头真空灭弧室及其应用的真空断路器
DE102017007962A1 (de) * 2017-08-24 2019-02-28 Deckel Maho Seebach Gmbh Werkzeugmaschine
JP6628950B1 (ja) * 2019-04-25 2020-01-15 三菱電機株式会社 レーザ加工機
CN110000578A (zh) * 2019-04-29 2019-07-12 广船国际有限公司 一种镗孔设备的支撑结构及法兰的加工方法
JP7223289B2 (ja) * 2020-09-24 2023-02-16 日新イオン機器株式会社 搬送装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6002465A (en) * 1996-10-15 1999-12-14 Canon Kabushiki Kaisha Stage device, exposure apparatus using the same, and device production method
US6266133B1 (en) * 1998-05-06 2001-07-24 Canon Kabushiki Kaisha Stage device, an exposure apparatus and a device manufacturing method using the same
JP2002365026A (ja) * 2001-06-07 2002-12-18 Sigma Technos Kk 基板検査装置
JP2006224039A (ja) * 2005-02-21 2006-08-31 Dainippon Printing Co Ltd パターン形成装置、パターニング方法、基板処理装置、基板処理方法
JP2006269509A (ja) * 2005-03-22 2006-10-05 Nsk Ltd 位置決め装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4197238B2 (ja) * 2002-05-24 2008-12-17 大日本スクリーン製造株式会社 基板処理装置
JP2006049384A (ja) * 2004-07-30 2006-02-16 Laserfront Technologies Inc ガントリー型ｘｙステージ

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6002465A (en) * 1996-10-15 1999-12-14 Canon Kabushiki Kaisha Stage device, exposure apparatus using the same, and device production method
US6266133B1 (en) * 1998-05-06 2001-07-24 Canon Kabushiki Kaisha Stage device, an exposure apparatus and a device manufacturing method using the same
JP2002365026A (ja) * 2001-06-07 2002-12-18 Sigma Technos Kk 基板検査装置
JP2006224039A (ja) * 2005-02-21 2006-08-31 Dainippon Printing Co Ltd パターン形成装置、パターニング方法、基板処理装置、基板処理方法
JP2006269509A (ja) * 2005-03-22 2006-10-05 Nsk Ltd 位置決め装置

Also Published As

Publication number Publication date
JP4195497B2 (ja) 2008-12-10
CN101459103A (zh) 2009-06-17
KR20090063076A (ko) 2009-06-17
CN101459103B (zh) 2011-11-30
KR100993473B1 (ko) 2010-11-10
TW200926345A (en) 2009-06-16
JP2008060614A (ja) 2008-03-13

Similar Documents

Publication Publication Date Title
TWI383467B (zh) Stage device
TWI431713B (zh) Stage device
US7239161B2 (en) Gantry-type XY stage
US8991288B2 (en) Machine tool system
JP4150411B2 (ja) ステージ装置
JP4673215B2 (ja) ステージ装置
JP4585018B2 (ja) ステージ装置
KR20080087724A (ko) 스테이지장치
JP4964853B2 (ja) ステージ装置
JP5234277B2 (ja) 走行ガイド付き載物台
CN110199586B (zh) 作业机
US7913789B2 (en) Reinforced upper frame for supporting cabin of heavy construction equipment using welding deformation preventing structure, and method of manufacturing the same
WO2022176122A1 (ja) 移動装置
KR20110069175A (ko) 노광 장치와 그 조립 방법, 및 디바이스 제조 방법
CN108817802B (zh) 转向架构架导框座组对装置
KR100892207B1 (ko) Ｘｙ 위치 결정 장치 및 전자부품 탑재장치
KR101120439B1 (ko) 액정 노광 장치
JP7301655B2 (ja) 基板作業装置およびその製造方法
JP4730014B2 (ja) プレス装置
CN116654150A (zh) 动力单元搭载体的搬送装置和搬送方法
JP2008203327A (ja) 露光装置
JPH10118799A (ja) トランスファプレス
JP2013140920A (ja) 構造部材及び構造部材の補強方法

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees