TWI370802B - Silica-based particles coated with antimony oxide, method of producing the particles, and base material with coat including the particles - Google Patents

Silica-based particles coated with antimony oxide, method of producing the particles, and base material with coat including the particles

Info

Publication number
TWI370802B
TWI370802B TW093131146A TW93131146A TWI370802B TW I370802 B TWI370802 B TW I370802B TW 093131146 A TW093131146 A TW 093131146A TW 93131146 A TW93131146 A TW 93131146A TW I370802 B TWI370802 B TW I370802B
Authority
TW
Taiwan
Prior art keywords
particles
silica
producing
base material
antimony oxide
Prior art date
Application number
TW093131146A
Other languages
English (en)
Other versions
TW200516048A (en
Inventor
Ryo Muraguchi
Mitsuaki Kumazawa
Hiroyasu Nishida
Toshiharu Hirai
Original Assignee
Jgc Catalysts & Chemicals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jgc Catalysts & Chemicals Ltd filed Critical Jgc Catalysts & Chemicals Ltd
Publication of TW200516048A publication Critical patent/TW200516048A/zh
Application granted granted Critical
Publication of TWI370802B publication Critical patent/TWI370802B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/149—Coating
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G30/00—Compounds of antimony
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3045—Treatment with inorganic compounds
    • C09C1/3054—Coating
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/40—Electric properties
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Colloid Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW093131146A 2003-10-17 2004-10-14 Silica-based particles coated with antimony oxide, method of producing the particles, and base material with coat including the particles TWI370802B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003357113A JP4592274B2 (ja) 2003-10-17 2003-10-17 酸化アンチモン被覆シリカ系微粒子、該微粒子の製造方法および該微粒子を含む被膜付基材

Publications (2)

Publication Number Publication Date
TW200516048A TW200516048A (en) 2005-05-16
TWI370802B true TWI370802B (en) 2012-08-21

Family

ID=34614099

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093131146A TWI370802B (en) 2003-10-17 2004-10-14 Silica-based particles coated with antimony oxide, method of producing the particles, and base material with coat including the particles

Country Status (5)

Country Link
US (1) US7323122B2 (zh)
JP (1) JP4592274B2 (zh)
KR (1) KR101135835B1 (zh)
CN (1) CN1281491C (zh)
TW (1) TWI370802B (zh)

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TWI388876B (zh) * 2003-12-26 2013-03-11 Fujifilm Corp 抗反射膜、偏光板，其製造方法，液晶顯示元件，液晶顯示裝置，及影像顯示裝置
WO2006006207A1 (ja) * 2004-07-08 2006-01-19 Catalysts & Chemicals Industries Co.,Ltd. シリカ系微粒子の製造方法、被膜形成用塗料および被膜付基材
US20060153979A1 (en) * 2004-11-30 2006-07-13 Fuji Photo Film Co., Ltd. Anti-glare and anti-reflection film, polarizing plate using the anti-glare and anti-reflection film, and liquid crystal display device using the polarizing plate
US7758956B2 (en) 2005-02-16 2010-07-20 Fujifilm Corporation Antireflection film and polarizing plate and image display device using same
JP2006259703A (ja) * 2005-02-16 2006-09-28 Fuji Photo Film Co Ltd 反射防止フィルム、並びにそれを用いた偏光板、及び画像表示装置
JP5057199B2 (ja) 2005-06-02 2012-10-24 旭硝子株式会社 中空状ＳｉＯ２微粒子分散液の製造方法、塗料組成物及び反射防止塗膜付き基材
US20070065660A1 (en) * 2005-09-16 2007-03-22 Fuji Photo Film Co., Ltd. Antireflection film, polarizing plate, and image display device
US20070086091A1 (en) * 2005-09-26 2007-04-19 Fujifilm Corporation Antireflection film, polarizing plate, and image display device including the same
US8057907B2 (en) 2006-03-06 2011-11-15 Fujifilm Corporation Optical film, coating composition, polarizing plate and image display device
JP5026172B2 (ja) * 2007-07-06 2012-09-12 日揮触媒化成株式会社 ハードコート膜付基材およびハードコート膜形成用塗布液
KR101571706B1 (ko) * 2007-08-31 2015-11-25 니끼 쇼꾸바이 카세이 가부시키가이샤 하드 코팅막부 기재 및 하드 코팅막 형성용 도포액
JP2009135044A (ja) * 2007-11-30 2009-06-18 Tdk Corp 透明導電材料及び透明導電体
JP5284632B2 (ja) * 2007-12-12 2013-09-11 日揮触媒化成株式会社 導電性繊維状中空シリカ微粒子分散質およびその製造方法
JP5657197B2 (ja) * 2008-06-11 2015-01-21 日揮触媒化成株式会社 酸化チタン系粒子およびその製造方法
WO2010071010A1 (ja) * 2008-12-18 2010-06-24 日揮触媒化成株式会社 鎖状シリカ系中空微粒子とその製造方法、該微粒子を含む透明被膜形成用塗布液および透明被膜付基材
WO2011059081A1 (ja) * 2009-11-16 2011-05-19 日揮触媒化成株式会社 シリカ・アルミナゾルの製造方法、シリカ・アルミナゾル、該ゾルを含む透明被膜形成用塗料および透明被膜付基材
TWI421211B (zh) * 2011-12-12 2014-01-01 Nat Univ Chin Yi Technology 中空矽石微粒之製備方法
JP2014177552A (ja) * 2013-03-14 2014-09-25 Hitachi Maxell Ltd 透明導電性コーティング組成物、透明導電性膜及びタッチパネル機能内蔵型横電界方式液晶表示パネル
WO2015122453A1 (ja) 2014-02-14 2015-08-20 日揮触媒化成株式会社 透明被膜形成用の塗布液および透明被膜付基材の製造方法
WO2019240294A1 (ja) * 2018-06-15 2019-12-19 国立大学法人東北大学 コアシェル型多孔質シリカ粒子の製造方法
JPWO2023238558A1 (zh) * 2022-06-09 2023-12-14

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JPH02180717A (ja) * 1988-12-28 1990-07-13 Catalysts & Chem Ind Co Ltd 酸化アンチモンゾルとその製造方法
JPH0822997B2 (ja) * 1989-01-18 1996-03-06 信越化学工業株式会社 ハードコーティング剤
JPH0643515B2 (ja) * 1989-10-25 1994-06-08 水澤化学工業株式会社 新規充填剤及びその製法
JPH05116930A (ja) * 1991-10-22 1993-05-14 Nippon Chem Ind Co Ltd 白色導電性粉末
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JP3477265B2 (ja) * 1994-12-26 2003-12-10 株式会社トクヤマ 導電性酸化物粒子
JPH09151124A (ja) * 1995-11-29 1997-06-10 Kao Corp 熱線遮蔽性粒子及びその製造方法
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FR2747669B1 (fr) * 1996-04-22 1998-05-22 Rhone Poulenc Chimie Procede de preparation de particules creuses de silice
EP1077236B1 (en) * 1999-08-16 2004-05-26 Nissan Chemical Industries Ltd. Modified metal oxide sol, coating composition and optical element
JP3380511B2 (ja) * 2000-02-17 2003-02-24 大塚化学株式会社 カーボン被覆多孔質シリカ粉末、その製造方法及び該粉末を含有する導電性樹脂組成物
JP4046921B2 (ja) * 2000-02-24 2008-02-13 触媒化成工業株式会社 シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材
JP3969968B2 (ja) * 2001-06-08 2007-09-05 触媒化成工業株式会社 アンチモン酸化物被覆酸化チタン含有複合酸化物粒子および該粒子分散ゾル、該微粒子含有透明被膜形成用塗布液、透明被膜付基材。

Also Published As

Publication number Publication date
CN1281491C (zh) 2006-10-25
KR101135835B1 (ko) 2012-04-20
JP4592274B2 (ja) 2010-12-01
KR20050037387A (ko) 2005-04-21
JP2005119909A (ja) 2005-05-12
US20050121654A1 (en) 2005-06-09
TW200516048A (en) 2005-05-16
CN1608986A (zh) 2005-04-27
US7323122B2 (en) 2008-01-29

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