TWI369588B - Stage apparatus, method for controlling the same, exposure apparatus, and method for manufacturing device - Google Patents

Stage apparatus, method for controlling the same, exposure apparatus, and method for manufacturing device

Info

Publication number
TWI369588B
TWI369588B TW096109516A TW96109516A TWI369588B TW I369588 B TWI369588 B TW I369588B TW 096109516 A TW096109516 A TW 096109516A TW 96109516 A TW96109516 A TW 96109516A TW I369588 B TWI369588 B TW I369588B
Authority
TW
Taiwan
Prior art keywords
controlling
same
manufacturing device
exposure apparatus
stage
Prior art date
Application number
TW096109516A
Other languages
English (en)
Other versions
TW200801835A (en
Inventor
Satoru Itoh
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200801835A publication Critical patent/TW200801835A/zh
Application granted granted Critical
Publication of TWI369588B publication Critical patent/TWI369588B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW096109516A 2006-03-30 2007-03-20 Stage apparatus, method for controlling the same, exposure apparatus, and method for manufacturing device TWI369588B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006095850A JP4834439B2 (ja) 2006-03-30 2006-03-30 ステージ装置及びその制御方法、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
TW200801835A TW200801835A (en) 2008-01-01
TWI369588B true TWI369588B (en) 2012-08-01

Family

ID=38558380

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109516A TWI369588B (en) 2006-03-30 2007-03-20 Stage apparatus, method for controlling the same, exposure apparatus, and method for manufacturing device

Country Status (4)

Country Link
US (1) US7738080B2 (zh)
JP (1) JP4834439B2 (zh)
KR (1) KR100848598B1 (zh)
TW (1) TWI369588B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009033058A (ja) * 2007-07-30 2009-02-12 Sumitomo Heavy Ind Ltd 反力処理装置
JP5505871B2 (ja) * 2008-03-07 2014-05-28 株式会社ニコン 移動体装置及び露光装置
KR101138901B1 (ko) 2008-04-14 2012-05-14 에이에스엠엘 네델란즈 비.브이. 위치설정 시스템, 리소그래피 장치 및 디바이스 제조 방법
US8144310B2 (en) 2008-04-14 2012-03-27 Asml Netherlands B.V. Positioning system, lithographic apparatus and device manufacturing method
TW201007124A (en) * 2008-08-08 2010-02-16 Taiwan First Brakes Technology Co Ltd Object surface inspection device
NL2003993A (nl) * 2009-01-22 2010-07-26 Asml Netherlands Bv Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object.
JP5295855B2 (ja) * 2009-04-28 2013-09-18 住友重機械工業株式会社 反力処理機構
JP5918965B2 (ja) * 2011-10-25 2016-05-18 キヤノン株式会社 加工機システム及び加工機の配置方法
CN103472678B (zh) * 2012-06-08 2015-07-22 上海微电子装备有限公司 光刻机及应用于光刻机中的工件台系统
EP3038137B1 (en) * 2013-06-28 2019-10-30 Nikon Corporation Mobile body apparatus, exposure apparatus, and device manufacturing method
US10471610B2 (en) 2015-06-16 2019-11-12 Samsung Electronics Co., Ltd. Robot arm having weight compensation mechanism
JP6556196B2 (ja) * 2017-07-27 2019-08-07 倉敷化工株式会社 アクティブ除振装置
WO2019134776A1 (en) * 2018-01-04 2019-07-11 Asml Netherlands B.V. Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9100407A (nl) 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
JP2714502B2 (ja) 1991-09-18 1998-02-16 キヤノン株式会社 移動ステージ装置
US5684856A (en) 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
JP2954815B2 (ja) * 1993-06-24 1999-09-27 キヤノン株式会社 鉛直方向除振装置
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
JP3535749B2 (ja) * 1997-12-10 2004-06-07 キヤノン株式会社 ステージ装置、露光装置、並びにデバイス製造方法
JP3630964B2 (ja) 1997-12-26 2005-03-23 キヤノン株式会社 ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JPH11294520A (ja) * 1998-04-08 1999-10-29 Canon Inc 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法
JP3919382B2 (ja) * 1999-05-19 2007-05-23 株式会社クボタ コンバインの運転部構造
JP4229347B2 (ja) * 1999-05-31 2009-02-25 キヤノン株式会社 能動制振装置、露光装置及びデバイス製造方法
JP4387491B2 (ja) * 1999-05-31 2009-12-16 キヤノン株式会社 能動制振装置およびこれを用いた半導体露光装置
JP2001118773A (ja) * 1999-10-18 2001-04-27 Nikon Corp ステージ装置及び露光装置
JP2001304332A (ja) * 2000-04-24 2001-10-31 Canon Inc 能動制振装置
JP2002221249A (ja) * 2000-11-27 2002-08-09 Canon Inc 能動制振装置、その制御方法および能動制振装置を備えた露光装置
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP2004356222A (ja) * 2003-05-27 2004-12-16 Canon Inc ステージ装置及びその制御方法、露光装置、並びにデバイス製造方法
JP2005203567A (ja) * 2004-01-15 2005-07-28 Canon Inc 駆動装置、露光装置及びデバイス製造方法
US7224432B2 (en) * 2004-05-14 2007-05-29 Canon Kabushiki Kaisha Stage device, exposure apparatus, and device manufacturing method
JP2005354022A (ja) * 2004-05-14 2005-12-22 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
JP2006032788A (ja) * 2004-07-20 2006-02-02 Canon Inc 露光装置及び半導体デバイスの製造方法
US7321418B2 (en) * 2004-10-14 2008-01-22 Canon Kabushiki Kaisha Stage apparatus, exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date
JP4834439B2 (ja) 2011-12-14
US20070229794A1 (en) 2007-10-04
KR20070098559A (ko) 2007-10-05
US7738080B2 (en) 2010-06-15
KR100848598B1 (ko) 2008-07-28
JP2007273633A (ja) 2007-10-18
TW200801835A (en) 2008-01-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees