TWI361457B - Substrate cleaning apparatus - Google Patents

Substrate cleaning apparatus Download PDF

Info

Publication number
TWI361457B
TWI361457B TW096143660A TW96143660A TWI361457B TW I361457 B TWI361457 B TW I361457B TW 096143660 A TW096143660 A TW 096143660A TW 96143660 A TW96143660 A TW 96143660A TW I361457 B TWI361457 B TW I361457B
Authority
TW
Taiwan
Prior art keywords
flow path
cleaning
gas
liquid
injection
Prior art date
Application number
TW096143660A
Other languages
English (en)
Chinese (zh)
Other versions
TW200830399A (en
Inventor
Eun-Soo Kim
Original Assignee
Dms Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dms Co Ltd filed Critical Dms Co Ltd
Publication of TW200830399A publication Critical patent/TW200830399A/zh
Application granted granted Critical
Publication of TWI361457B publication Critical patent/TWI361457B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Nozzles (AREA)
TW096143660A 2007-01-04 2007-11-19 Substrate cleaning apparatus TWI361457B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070001068A KR100783763B1 (ko) 2007-01-04 2007-01-04 기판 세정장치

Publications (2)

Publication Number Publication Date
TW200830399A TW200830399A (en) 2008-07-16
TWI361457B true TWI361457B (en) 2012-04-01

Family

ID=39140249

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096143660A TWI361457B (en) 2007-01-04 2007-11-19 Substrate cleaning apparatus

Country Status (3)

Country Link
KR (1) KR100783763B1 (ko)
CN (1) CN101214484B (ko)
TW (1) TWI361457B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101229775B1 (ko) * 2008-12-26 2013-02-06 엘지디스플레이 주식회사 기판 세정장치
US20120216840A1 (en) * 2009-11-03 2012-08-30 Arakawa Chemical Industries, Ltd. Electronic component cleaning device and cleaning method
CN105081930B (zh) * 2015-08-12 2017-05-17 京东方科技集团股份有限公司 面板抛光装置和面板清洁设备
KR101966648B1 (ko) * 2016-09-05 2019-08-14 주식회사 디엠에스 기판세정장치
CN106623189A (zh) * 2016-12-19 2017-05-10 武汉华星光电技术有限公司 基板清洗设备
KR101833745B1 (ko) * 2017-09-01 2018-03-02 류병길 다종의 디스플레이 패널을 위한 세정 장치, 이를 위한 혼합배출관

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100390661B1 (ko) * 2001-07-19 2003-07-07 (주)케이.씨.텍 유체분사장치 및 이를 갖는 세정장치
TW561072B (en) * 2001-10-15 2003-11-11 Soshio Kk Cleaning nozzle
US7018481B2 (en) 2002-01-28 2006-03-28 Kabushiki Kaisha Toshiba Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
KR100591475B1 (ko) 2004-03-23 2006-06-20 주식회사 디엠에스 평판디스플레이용 세정장치

Also Published As

Publication number Publication date
CN101214484B (zh) 2010-08-18
CN101214484A (zh) 2008-07-09
TW200830399A (en) 2008-07-16
KR100783763B1 (ko) 2007-12-07

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees