TWI358834B - - Google Patents

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Publication number
TWI358834B
TWI358834B TW097108929A TW97108929A TWI358834B TW I358834 B TWI358834 B TW I358834B TW 097108929 A TW097108929 A TW 097108929A TW 97108929 A TW97108929 A TW 97108929A TW I358834 B TWI358834 B TW I358834B
Authority
TW
Taiwan
Prior art keywords
memory
gate electrode
semiconductor device
electrode
insulating film
Prior art date
Application number
TW097108929A
Other languages
English (en)
Chinese (zh)
Other versions
TW200849607A (en
Inventor
Kan Yasui
Tetsuya Ishimaru
Digh Hisamoto
Yasuhiro Shimamoto
Original Assignee
Renesas Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Electronics Corp filed Critical Renesas Electronics Corp
Publication of TW200849607A publication Critical patent/TW200849607A/zh
Application granted granted Critical
Publication of TWI358834B publication Critical patent/TWI358834B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/40—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the peripheral circuit region
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0425—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a merged floating gate and select transistor
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/06—Auxiliary circuits, e.g. for writing into memory
    • G11C16/10—Programming or data input circuits
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/40—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the peripheral circuit region
    • H10B41/42—Simultaneous manufacture of periphery and memory cells
    • H10B41/49—Simultaneous manufacture of periphery and memory cells comprising different types of peripheral transistor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/69—IGFETs having charge trapping gate insulators, e.g. MNOS transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/69—IGFETs having charge trapping gate insulators, e.g. MNOS transistors
    • H10D30/694—IGFETs having charge trapping gate insulators, e.g. MNOS transistors characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • H10D30/696—IGFETs having charge trapping gate insulators, e.g. MNOS transistors characterised by the shapes, relative sizes or dispositions of the gate electrodes having at least one additional gate, e.g. program gate, erase gate or select gate
    • H10P30/20—

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
  • Read Only Memory (AREA)
TW097108929A 2007-05-21 2008-03-13 Nonvolatile semiconductor memory devices with charge injection corner TW200849607A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007134085A JP5149539B2 (ja) 2007-05-21 2007-05-21 半導体装置

Publications (2)

Publication Number Publication Date
TW200849607A TW200849607A (en) 2008-12-16
TWI358834B true TWI358834B (OSRAM) 2012-02-21

Family

ID=40071594

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097108929A TW200849607A (en) 2007-05-21 2008-03-13 Nonvolatile semiconductor memory devices with charge injection corner

Country Status (5)

Country Link
US (1) US7915666B2 (OSRAM)
JP (1) JP5149539B2 (OSRAM)
KR (1) KR101004213B1 (OSRAM)
CN (1) CN101312215A (OSRAM)
TW (1) TW200849607A (OSRAM)

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JP4659527B2 (ja) * 2005-06-20 2011-03-30 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
US8320191B2 (en) 2007-08-30 2012-11-27 Infineon Technologies Ag Memory cell arrangement, method for controlling a memory cell, memory array and electronic device
JP5164520B2 (ja) * 2007-10-19 2013-03-21 ルネサスエレクトロニクス株式会社 不揮発性半導体メモリ及びデータプログラム／消去方法
WO2010082328A1 (ja) 2009-01-15 2010-07-22 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP2010183022A (ja) * 2009-02-09 2010-08-19 Renesas Electronics Corp 半導体装置およびその製造方法
JP2010282987A (ja) * 2009-06-02 2010-12-16 Renesas Technology Corp 半導体装置およびその製造方法
US8750037B2 (en) * 2009-06-16 2014-06-10 Globalfoundries Singapore Pte. Ltd. Non-volatile memory utilizing impact ionization and tunnelling and method of manufacturing thereof
US8174063B2 (en) 2009-07-30 2012-05-08 Ememory Technology Inc. Non-volatile semiconductor memory device with intrinsic charge trapping layer
CN102339833B (zh) * 2010-07-21 2013-04-24 中国科学院微电子研究所 具有高速低压操作的高可靠分裂栅非挥发性存储器结构
JP2012114269A (ja) 2010-11-25 2012-06-14 Renesas Electronics Corp 半導体装置および半導体装置の製造方法
RU2457556C1 (ru) * 2010-12-23 2012-07-27 Федеральное государственное унитарное предприятие "Центральный научно-исследовательский радиотехнический институт имени академика А.И. Берга" Способ и устройство стирания записанной информации
JP5985293B2 (ja) * 2011-10-04 2016-09-06 ルネサスエレクトロニクス株式会社 半導体装置および半導体装置の製造方法
JP5878797B2 (ja) * 2012-03-13 2016-03-08 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
US8724399B2 (en) * 2012-04-20 2014-05-13 Freescale Semiconductor, Inc. Methods and systems for erase biasing of split-gate non-volatile memory cells
TWI485811B (zh) * 2012-07-18 2015-05-21 Maxchip Electronics Corp 半導體結構的製造方法
US20140167142A1 (en) 2012-12-14 2014-06-19 Spansion Llc Use Disposable Gate Cap to Form Transistors, and Split Gate Charge Trapping Memory Cells
US8836006B2 (en) * 2012-12-14 2014-09-16 Spansion Llc Integrated circuits with non-volatile memory and methods for manufacture
KR101979299B1 (ko) * 2012-12-26 2019-09-03 에스케이하이닉스 주식회사 비휘발성 메모리 장치 및 그 제조방법
JP2015015384A (ja) * 2013-07-05 2015-01-22 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
US9076670B2 (en) * 2013-07-16 2015-07-07 Texas Instruments Incorporated Integrated circuit and method of forming the integrated circuit with improved logic transistor performance and SRAM transistor yield
RU2549111C2 (ru) * 2013-08-23 2015-04-20 Федеральное государственное унитарное предприятие "Центральный научно-исследовательский радиотехнический институт имени академика А.И. Берга" Способ и устройство стирания записанной информации
CN103514954B (zh) * 2013-10-11 2016-08-17 芯成半导体（上海）有限公司 闪存的擦除方法、读取方法及编程方法
US8895397B1 (en) * 2013-10-15 2014-11-25 Globalfoundries Singapore Pte. Ltd. Methods for forming thin film storage memory cells
US10050050B2 (en) * 2013-11-08 2018-08-14 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device with metal gate memory device and metal gate logic device and method for manufacturing the same
JP6274826B2 (ja) * 2013-11-14 2018-02-07 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
US9001580B1 (en) * 2013-12-04 2015-04-07 Synopsys, Inc. Asymmetric dense floating gate nonvolatile memory with decoupled capacitor
JP5684414B2 (ja) * 2014-01-24 2015-03-11 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
US9287279B2 (en) * 2014-03-26 2016-03-15 Taiwan Semiconductor Manufacturing Co., Ltd. Silicon nitride (SiN) encapsulating layer for silicon nanocrystal memory storage
TWI671805B (zh) * 2014-06-18 2019-09-11 United Microelectronics Corp. 半導體元件及其製作方法
US9589805B2 (en) * 2014-08-04 2017-03-07 Cypress Semiconductor Corporation Split-gate semiconductor device with L-shaped gate
JP6510289B2 (ja) 2015-03-30 2019-05-08 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP6450624B2 (ja) 2015-03-30 2019-01-09 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP2017045947A (ja) * 2015-08-28 2017-03-02 ルネサスエレクトロニクス株式会社 半導体装置および半導体装置の製造方法
US9324724B1 (en) * 2015-09-21 2016-04-26 United Microelectronics Corporation Method of fabricating a memory structure
US10319675B2 (en) * 2016-01-13 2019-06-11 Taiwan Semiconductor Manufacturing Company, Ltd. Capacitor embedded with nanocrystals
US9985031B2 (en) * 2016-01-21 2018-05-29 Taiwan Semiconductor Manufacturing Co., Ltd. Integrated circuit and manufacturing method thereof
JP6718248B2 (ja) * 2016-02-17 2020-07-08 ルネサスエレクトロニクス株式会社 半導体装置
US10269440B2 (en) * 2016-05-17 2019-04-23 Silicon Storage Technology, Inc. Flash memory array with individual memory cell read, program and erase
US9997253B1 (en) * 2016-12-08 2018-06-12 Cypress Semiconductor Corporation Non-volatile memory array with memory gate line and source line scrambling
JP6883422B2 (ja) * 2016-12-28 2021-06-09 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP2019114627A (ja) * 2017-12-22 2019-07-11 ルネサスエレクトロニクス株式会社 半導体装置及び半導体装置の製造方法
US11380769B2 (en) 2019-10-01 2022-07-05 Taiwan Semiconductor Manufacturing Company, Ltd. Select gate spacer formation to facilitate embedding of split gate flash memory
US11037830B2 (en) * 2019-10-14 2021-06-15 Renesas Electronics Corporation Method of manufacturing semiconductor device
US11588031B2 (en) * 2019-12-30 2023-02-21 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor structure for memory device and method for forming the same
JP2021190464A (ja) * 2020-05-26 2021-12-13 ローム株式会社 半導体装置およびその製造方法
US11877456B2 (en) * 2020-09-15 2024-01-16 Ememory Technology Inc. Memory cell of non-volatile memory
US20220254799A1 (en) * 2021-02-05 2022-08-11 Macronix International Co., Ltd. Semiconductor device and operation method thereof
US12190941B2 (en) * 2022-12-28 2025-01-07 Macronix International Co., Ltd. Memory cell and memory device thereof
US12347481B2 (en) 2023-01-16 2025-07-01 Macronix International Co., Ltd. Universal memory for in-memory computing and operation method thereof
JP2025039058A (ja) 2023-09-08 2025-03-21 ルネサスエレクトロニクス株式会社 半導体記憶装置

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US5768192A (en) * 1996-07-23 1998-06-16 Saifun Semiconductors, Ltd. Non-volatile semiconductor memory cell utilizing asymmetrical charge trapping
JP3303789B2 (ja) * 1998-09-01 2002-07-22 日本電気株式会社 フラッシュメモリ、その書き込み・消去方法
JP4198903B2 (ja) * 2001-08-31 2008-12-17 株式会社東芝 半導体記憶装置
JP4647175B2 (ja) 2002-04-18 2011-03-09 ルネサスエレクトロニクス株式会社 半導体集積回路装置
US20030227047A1 (en) * 2002-06-11 2003-12-11 Cheng-Yuan Hsu Split-gate flash memory structure and method of manufacture
JP2004039965A (ja) * 2002-07-05 2004-02-05 Renesas Technology Corp 不揮発性半導体記憶装置
TW548834B (en) * 2002-08-20 2003-08-21 Macronix Int Co Ltd Non-volatile memory cell and its operation method
JP2004111749A (ja) * 2002-09-19 2004-04-08 Renesas Technology Corp 半導体装置およびその製造方法
JP2004186452A (ja) * 2002-12-04 2004-07-02 Renesas Technology Corp 不揮発性半導体記憶装置およびその製造方法
JP2004343014A (ja) 2003-05-19 2004-12-02 Sharp Corp 半導体記憶装置、半導体装置、及びそれらの製造方法、並びに携帯電子機器、並びにｉｃカード
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US7098502B2 (en) * 2003-11-10 2006-08-29 Freescale Semiconductor, Inc. Transistor having three electrically isolated electrodes and method of formation
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JP4611878B2 (ja) 2005-12-01 2011-01-12 ルネサスエレクトロニクス株式会社 半導体装置

Also Published As

Publication number Publication date
CN101312215A (zh) 2008-11-26
JP2008288503A (ja) 2008-11-27
KR101004213B1 (ko) 2010-12-27
KR20080102957A (ko) 2008-11-26
US7915666B2 (en) 2011-03-29
US20080290401A1 (en) 2008-11-27
JP5149539B2 (ja) 2013-02-20
TW200849607A (en) 2008-12-16

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MM4A Annulment or lapse of patent due to non-payment of fees