TWI356972B - - Google Patents

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Publication number
TWI356972B
TWI356972B TW97103548A TW97103548A TWI356972B TW I356972 B TWI356972 B TW I356972B TW 97103548 A TW97103548 A TW 97103548A TW 97103548 A TW97103548 A TW 97103548A TW I356972 B TWI356972 B TW I356972B
Authority
TW
Taiwan
Prior art keywords
photosensitive resin
substrate
photoresist pattern
resin composition
mass
Prior art date
Application number
TW97103548A
Other languages
English (en)
Chinese (zh)
Other versions
TW200846825A (en
Inventor
Yukari Himeda
Original Assignee
Asahi Kasei Emd Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Emd Corp filed Critical Asahi Kasei Emd Corp
Publication of TW200846825A publication Critical patent/TW200846825A/zh
Application granted granted Critical
Publication of TWI356972B publication Critical patent/TWI356972B/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
TW97103548A 2007-02-02 2008-01-30 Photosensitive resin composition and layered product TW200846825A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007024363 2007-02-02

Publications (2)

Publication Number Publication Date
TW200846825A TW200846825A (en) 2008-12-01
TWI356972B true TWI356972B (enExample) 2012-01-21

Family

ID=39689901

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97103548A TW200846825A (en) 2007-02-02 2008-01-30 Photosensitive resin composition and layered product

Country Status (5)

Country Link
JP (1) JP4885243B2 (enExample)
KR (1) KR20090082240A (enExample)
CN (1) CN101568882A (enExample)
TW (1) TW200846825A (enExample)
WO (1) WO2008099655A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5682214B2 (ja) * 2010-10-06 2015-03-11 横浜ゴム株式会社 紫外線硬化型樹脂組成物
KR101811091B1 (ko) * 2011-03-03 2017-12-20 닛코-매터리얼즈 가부시키가이샤 감광성 수지 조성물, 이를 이용한 포토레지스트 필름, 레지스터 패턴의 형성 방법 및 도체 패턴의 형성 방법
JP5948543B2 (ja) * 2012-05-29 2016-07-06 旭化成株式会社 感光性樹脂組成物
KR102030179B1 (ko) * 2012-07-03 2019-11-08 현대모비스 주식회사 마이크로 하이브리드 시스템용 전력관리장치
JP6379404B2 (ja) * 2013-01-28 2018-08-29 日産化学株式会社 パターンを有する基板の製造方法及びフッ酸エッチング用樹脂組成物
KR102792073B1 (ko) * 2016-12-29 2025-04-08 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH106404A (ja) * 1996-06-19 1998-01-13 Takemoto Oil & Fat Co Ltd 光学的立体造形物の製造方法
JP4046398B2 (ja) * 1997-02-05 2008-02-13 ナブテスコ株式会社 光学的立体造形用樹脂組成物
JP3283239B2 (ja) * 1999-03-03 2002-05-20 日本合成化学工業株式会社 感光性樹脂組成物
JP3967049B2 (ja) * 1999-10-07 2007-08-29 富士フイルム株式会社 平版印刷版用原版
JP2004252093A (ja) * 2003-02-19 2004-09-09 Asahi Kasei Chemicals Corp 液状感光性樹脂凸版印刷版の製造方法

Also Published As

Publication number Publication date
JPWO2008099655A1 (ja) 2010-05-27
TW200846825A (en) 2008-12-01
JP4885243B2 (ja) 2012-02-29
KR20090082240A (ko) 2009-07-29
CN101568882A (zh) 2009-10-28
WO2008099655A1 (ja) 2008-08-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees