WO2008099655A1 - 感光性樹脂組成物及び積層体 - Google Patents

感光性樹脂組成物及び積層体 Download PDF

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Publication number
WO2008099655A1
WO2008099655A1 PCT/JP2008/051051 JP2008051051W WO2008099655A1 WO 2008099655 A1 WO2008099655 A1 WO 2008099655A1 JP 2008051051 W JP2008051051 W JP 2008051051W WO 2008099655 A1 WO2008099655 A1 WO 2008099655A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
mass
layered product
ethylenically unsaturated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/051051
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
Yukari Himeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Kasei Microdevices Corp
Original Assignee
Asahi Kasei E Materials Corp
Asahi Kasei EMD Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei E Materials Corp, Asahi Kasei EMD Corp filed Critical Asahi Kasei E Materials Corp
Priority to JP2008558028A priority Critical patent/JP4885243B2/ja
Publication of WO2008099655A1 publication Critical patent/WO2008099655A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Polymerisation Methods In General (AREA)
PCT/JP2008/051051 2007-02-02 2008-01-25 感光性樹脂組成物及び積層体 Ceased WO2008099655A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008558028A JP4885243B2 (ja) 2007-02-02 2008-01-25 感光性樹脂組成物及び積層体

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007024363 2007-02-02
JP2007-024363 2007-02-02

Publications (1)

Publication Number Publication Date
WO2008099655A1 true WO2008099655A1 (ja) 2008-08-21

Family

ID=39689901

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/051051 Ceased WO2008099655A1 (ja) 2007-02-02 2008-01-25 感光性樹脂組成物及び積層体

Country Status (5)

Country Link
JP (1) JP4885243B2 (enExample)
KR (1) KR20090082240A (enExample)
CN (1) CN101568882A (enExample)
TW (1) TW200846825A (enExample)
WO (1) WO2008099655A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012077272A (ja) * 2010-10-06 2012-04-19 Yokohama Rubber Co Ltd:The 紫外線硬化型樹脂組成物
JP2013246387A (ja) * 2012-05-29 2013-12-09 Asahi Kasei E-Materials Corp 感光性樹脂組成物
WO2014115887A1 (ja) * 2013-01-28 2014-07-31 日産化学工業株式会社 パターンを有する基板の製造方法及びフッ酸エッチング用樹脂組成物

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101811091B1 (ko) * 2011-03-03 2017-12-20 닛코-매터리얼즈 가부시키가이샤 감광성 수지 조성물, 이를 이용한 포토레지스트 필름, 레지스터 패턴의 형성 방법 및 도체 패턴의 형성 방법
KR102030179B1 (ko) * 2012-07-03 2019-11-08 현대모비스 주식회사 마이크로 하이브리드 시스템용 전력관리장치
KR102792073B1 (ko) * 2016-12-29 2025-04-08 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH106404A (ja) * 1996-06-19 1998-01-13 Takemoto Oil & Fat Co Ltd 光学的立体造形物の製造方法
JPH10279819A (ja) * 1997-02-05 1998-10-20 Teijin Seiki Co Ltd 光学的立体造形用樹脂組成物
JP2000250214A (ja) * 1999-03-03 2000-09-14 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物
JP2001109139A (ja) * 1999-10-07 2001-04-20 Fuji Photo Film Co Ltd 平版印刷版用原版
JP2004252093A (ja) * 2003-02-19 2004-09-09 Asahi Kasei Chemicals Corp 液状感光性樹脂凸版印刷版の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH106404A (ja) * 1996-06-19 1998-01-13 Takemoto Oil & Fat Co Ltd 光学的立体造形物の製造方法
JPH10279819A (ja) * 1997-02-05 1998-10-20 Teijin Seiki Co Ltd 光学的立体造形用樹脂組成物
JP2000250214A (ja) * 1999-03-03 2000-09-14 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物
JP2001109139A (ja) * 1999-10-07 2001-04-20 Fuji Photo Film Co Ltd 平版印刷版用原版
JP2004252093A (ja) * 2003-02-19 2004-09-09 Asahi Kasei Chemicals Corp 液状感光性樹脂凸版印刷版の製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012077272A (ja) * 2010-10-06 2012-04-19 Yokohama Rubber Co Ltd:The 紫外線硬化型樹脂組成物
JP2013246387A (ja) * 2012-05-29 2013-12-09 Asahi Kasei E-Materials Corp 感光性樹脂組成物
WO2014115887A1 (ja) * 2013-01-28 2014-07-31 日産化学工業株式会社 パターンを有する基板の製造方法及びフッ酸エッチング用樹脂組成物
JPWO2014115887A1 (ja) * 2013-01-28 2017-01-26 日産化学工業株式会社 パターンを有する基板の製造方法及びフッ酸エッチング用樹脂組成物

Also Published As

Publication number Publication date
JPWO2008099655A1 (ja) 2010-05-27
TW200846825A (en) 2008-12-01
TWI356972B (enExample) 2012-01-21
JP4885243B2 (ja) 2012-02-29
KR20090082240A (ko) 2009-07-29
CN101568882A (zh) 2009-10-28

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