TWI344976B - Stained sensitization resin - Google Patents

Stained sensitization resin Download PDF

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Publication number
TWI344976B
TWI344976B TW093130074A TW93130074A TWI344976B TW I344976 B TWI344976 B TW I344976B TW 093130074 A TW093130074 A TW 093130074A TW 93130074 A TW93130074 A TW 93130074A TW I344976 B TWI344976 B TW I344976B
Authority
TW
Taiwan
Prior art keywords
compound
resin
acrylate
meth
photosensitive resin
Prior art date
Application number
TW093130074A
Other languages
English (en)
Chinese (zh)
Other versions
TW200514824A (en
Inventor
Kazuo Takebe
Satoru Tanaka
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW200514824A publication Critical patent/TW200514824A/zh
Application granted granted Critical
Publication of TWI344976B publication Critical patent/TWI344976B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1494—Polycondensates modified by chemical after-treatment followed by a further chemical treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)
TW093130074A 2003-10-27 2004-10-05 Stained sensitization resin TWI344976B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003365737 2003-10-27

Publications (2)

Publication Number Publication Date
TW200514824A TW200514824A (en) 2005-05-01
TWI344976B true TWI344976B (en) 2011-07-11

Family

ID=34779827

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093130074A TWI344976B (en) 2003-10-27 2004-10-05 Stained sensitization resin

Country Status (4)

Country Link
JP (1) JP5012917B2 (ja)
KR (1) KR101128171B1 (ja)
CN (1) CN100568096C (ja)
TW (1) TWI344976B (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006118094A1 (ja) * 2005-04-27 2006-11-09 Mitsubishi Chemical Corporation 硬化性組成物、硬化物及びこれを用いた液晶表示装置
JP4717767B2 (ja) * 2006-09-15 2011-07-06 富士フイルム株式会社 顔料分散組成物
CN101178541B (zh) * 2006-10-31 2012-04-25 三洋化成工业株式会社 感光性树脂组合物
KR101420868B1 (ko) * 2007-07-16 2014-08-13 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR101403242B1 (ko) * 2007-08-14 2014-06-02 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
JP2010002886A (ja) * 2008-05-21 2010-01-07 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP5617177B2 (ja) * 2009-03-27 2014-11-05 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
KR101288559B1 (ko) * 2009-12-29 2013-07-22 제일모직주식회사 감광성 수지 조성물, 이를 이용한 컬러필터
KR101942407B1 (ko) * 2011-01-28 2019-01-28 토요잉크Sc홀딩스주식회사 컬러필터용 디케토피롤로피롤계 안료 조성물, 컬러필터용 착색 조성물 및 컬러필터
JP5657442B2 (ja) * 2011-03-22 2015-01-21 富士フイルム株式会社 着色感放射線性組成物、パターンの形成方法、カラーフィルタ及びそのカラーフィルタの製造方法、並びに、固体撮像素子
TWI427412B (zh) * 2011-04-28 2014-02-21 Chi Mei Corp 彩色濾光片用感光性樹脂組成物及其所形成之彩色濾光片
CN103558706A (zh) * 2013-11-05 2014-02-05 京东方科技集团股份有限公司 一种显示基板及其制备方法、显示装置
KR101987107B1 (ko) * 2014-03-31 2019-06-10 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이로부터 제조되는 컬러 필터
WO2018179095A1 (ja) * 2017-03-28 2018-10-04 日立化成株式会社 転写型感光性フィルム、硬化膜パターンの形成方法、硬化膜及びタッチパネル

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854337A (ja) * 1981-09-28 1983-03-31 Sekisui Chem Co Ltd 感光性樹脂組成物
JPH08292574A (ja) * 1995-04-20 1996-11-05 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPH10288837A (ja) 1997-04-14 1998-10-27 Toppan Printing Co Ltd 感光性着色組成物及びそれを用いたカラーフィルタ
JP3688949B2 (ja) * 1999-09-24 2005-08-31 昭和高分子株式会社 感光性樹脂
JP2002105112A (ja) * 2000-09-29 2002-04-10 Taiyo Ink Mfg Ltd 感光性ペースト組成物及びそれを用いて焼成物パターンを形成したパネル
JP2002296775A (ja) * 2001-03-30 2002-10-09 Dainippon Printing Co Ltd 感光性樹脂組成物、カラーフィルター、及び、液晶パネル
JP2002323762A (ja) * 2001-04-25 2002-11-08 Nippon Kayaku Co Ltd ネガ型着色感光性組成物
ATE446322T1 (de) * 2001-06-11 2009-11-15 Basf Se Oxim ester photoinitiatoren mit kombinierter struktur
JP4534697B2 (ja) * 2003-10-27 2010-09-01 住友化学株式会社 着色感光性樹脂組成物

Also Published As

Publication number Publication date
CN100568096C (zh) 2009-12-09
JP5012917B2 (ja) 2012-08-29
JP2010140042A (ja) 2010-06-24
KR101128171B1 (ko) 2012-03-26
TW200514824A (en) 2005-05-01
CN1612042A (zh) 2005-05-04
KR20050040103A (ko) 2005-05-03

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