TWI341865B - - Google Patents

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Publication number
TWI341865B
TWI341865B TW094139921A TW94139921A TWI341865B TW I341865 B TWI341865 B TW I341865B TW 094139921 A TW094139921 A TW 094139921A TW 94139921 A TW94139921 A TW 94139921A TW I341865 B TWI341865 B TW I341865B
Authority
TW
Taiwan
Prior art keywords
solvent
cleaning
patent application
constituent unit
group
Prior art date
Application number
TW094139921A
Other languages
English (en)
Chinese (zh)
Other versions
TW200630483A (en
Inventor
Tomoyuki Hirano
Masaaki Yoshida
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200630483A publication Critical patent/TW200630483A/zh
Application granted granted Critical
Publication of TWI341865B publication Critical patent/TWI341865B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5022Organic solvents containing oxygen
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/261Alcohols; Phenols
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/261Alcohols; Phenols
    • C11D7/262Alcohols; Phenols fatty or with at least 8 carbon atoms in the alkyl or alkenyl chain
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/22Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Chemistry (AREA)
  • Emergency Medicine (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW094139921A 2004-12-06 2005-11-14 Cleaning solvent for semiconductor production apparatus TW200630483A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004353375A JP2006160859A (ja) 2004-12-06 2004-12-06 半導体製造装置の洗浄用溶剤

Publications (2)

Publication Number Publication Date
TW200630483A TW200630483A (en) 2006-09-01
TWI341865B true TWI341865B (US06620555-20030916-C00004.png) 2011-05-11

Family

ID=36577798

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094139921A TW200630483A (en) 2004-12-06 2005-11-14 Cleaning solvent for semiconductor production apparatus

Country Status (6)

Country Link
US (1) US20080132740A1 (US06620555-20030916-C00004.png)
EP (1) EP1840199A1 (US06620555-20030916-C00004.png)
JP (1) JP2006160859A (US06620555-20030916-C00004.png)
KR (1) KR20070084614A (US06620555-20030916-C00004.png)
TW (1) TW200630483A (US06620555-20030916-C00004.png)
WO (1) WO2006061967A1 (US06620555-20030916-C00004.png)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101367252B1 (ko) * 2011-11-10 2014-02-25 제일모직 주식회사 수소화폴리실록사잔 박막용 린스액 및 이를 이용한 수소화폴리실록사잔 박막의 패턴 형성 방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4378303A (en) * 1980-04-14 1983-03-29 Daikin Kogyo Co., Ltd. Azeotropic solvent composition
JPS59202298A (ja) * 1983-05-02 1984-11-16 ポリプラスチックス株式会社 金型付着物の除去方法
JPS61159499A (ja) * 1985-01-07 1986-07-19 ポリプラスチックス株式会社 金型付着物の除去方法
JP3169024B2 (ja) * 1991-07-12 2001-05-21 三菱瓦斯化学株式会社 シリコンウエハーおよび半導体素子洗浄液
JPH10146844A (ja) * 1996-09-17 1998-06-02 Asahi Chem Ind Co Ltd 金型付着物の除去方法
JP2001194785A (ja) * 2000-01-11 2001-07-19 Mitsubishi Electric Corp レジストパターン微細化材料及びこの材料を用いた半導体装置の製造方法並びにこの製造方法を用いた半導体装置
US6663723B1 (en) * 2000-10-24 2003-12-16 Advanced Micro Devices, Inc. Vapor drying for cleaning photoresists
US7179774B2 (en) * 2002-06-19 2007-02-20 Henkel Kommanditgesellschaft Auf Aktien Flushing solutions for coatings removal
JP4265766B2 (ja) * 2003-08-25 2009-05-20 東京応化工業株式会社 液浸露光プロセス用レジスト保護膜形成用材料、該保護膜形成材料からなるレジスト保護膜、および該レジスト保護膜を用いたレジストパターン形成方法
JP4305095B2 (ja) * 2003-08-29 2009-07-29 株式会社ニコン 光学部品の洗浄機構を搭載した液浸投影露光装置及び液浸光学部品洗浄方法
US20070122741A1 (en) * 2005-11-29 2007-05-31 Shin-Etsu Chemical Co., Ltd. Resist protective coating material and patterning process

Also Published As

Publication number Publication date
JP2006160859A (ja) 2006-06-22
KR20070084614A (ko) 2007-08-24
WO2006061967A1 (ja) 2006-06-15
TW200630483A (en) 2006-09-01
EP1840199A1 (en) 2007-10-03
US20080132740A1 (en) 2008-06-05

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