TWI329360B - Semiconductor device production method and semiconductor device - Google Patents

Semiconductor device production method and semiconductor device

Info

Publication number
TWI329360B
TWI329360B TW092129529A TW92129529A TWI329360B TW I329360 B TWI329360 B TW I329360B TW 092129529 A TW092129529 A TW 092129529A TW 92129529 A TW92129529 A TW 92129529A TW I329360 B TWI329360 B TW I329360B
Authority
TW
Taiwan
Prior art keywords
semiconductor device
metal
production method
mask layer
stopper mask
Prior art date
Application number
TW092129529A
Other languages
English (en)
Other versions
TW200417016A (en
Inventor
Kazumasa Tanida
Yoshihiko Nemoto
Mitsuo Umemoto
Original Assignee
Rohm Co Ltd
Renesas Tech Corp
Sanyo Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd, Renesas Tech Corp, Sanyo Electric Co filed Critical Rohm Co Ltd
Publication of TW200417016A publication Critical patent/TW200417016A/zh
Application granted granted Critical
Publication of TWI329360B publication Critical patent/TWI329360B/zh

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TW092129529A 2002-11-21 2003-10-24 Semiconductor device production method and semiconductor device TWI329360B (en)

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