TWI278730B - System and method for calculating aerial image of a spatial light modulator - Google Patents
System and method for calculating aerial image of a spatial light modulator Download PDFInfo
- Publication number
- TWI278730B TWI278730B TW094113474A TW94113474A TWI278730B TW I278730 B TWI278730 B TW I278730B TW 094113474 A TW094113474 A TW 094113474A TW 94113474 A TW94113474 A TW 94113474A TW I278730 B TWI278730 B TW I278730B
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- TW
- Taiwan
- Prior art keywords
- pixel
- matrix
- gray scale
- function
- image
- Prior art date
Links
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
- G03F7/70441—Optical proximity correction [OPC]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70653—Metrology techniques
- G03F7/70666—Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/835,403 US6963434B1 (en) | 2004-04-30 | 2004-04-30 | System and method for calculating aerial image of a spatial light modulator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200535587A TW200535587A (en) | 2005-11-01 |
| TWI278730B true TWI278730B (en) | 2007-04-11 |
Family
ID=35186777
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094113474A TWI278730B (en) | 2004-04-30 | 2005-04-27 | System and method for calculating aerial image of a spatial light modulator |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US6963434B1 (ko) |
| JP (1) | JP4237729B2 (ko) |
| KR (1) | KR100636039B1 (ko) |
| CN (1) | CN100470372C (ko) |
| TW (1) | TWI278730B (ko) |
Families Citing this family (27)
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| JP2005311084A (ja) * | 2004-04-21 | 2005-11-04 | Canon Inc | 露光装置、デバイス製造方法、パターン生成装置及びメンテナンス方法 |
| US7372547B2 (en) * | 2004-04-27 | 2008-05-13 | Lsi Corporation | Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography |
| US6963434B1 (en) * | 2004-04-30 | 2005-11-08 | Asml Holding N.V. | System and method for calculating aerial image of a spatial light modulator |
| JP2006119601A (ja) * | 2004-09-24 | 2006-05-11 | Canon Inc | 光変調素子及びそれを利用した光学装置 |
| CN101111850A (zh) * | 2005-01-28 | 2008-01-23 | Asml控股股份有限公司 | 用于基于全局优化的无掩模光刻光栅化技术的方法和系统 |
| US7286137B2 (en) * | 2005-02-28 | 2007-10-23 | Asml Holding N.V. | Method and system for constrained pixel graytones interpolation for pattern rasterization |
| US7209275B2 (en) * | 2005-06-30 | 2007-04-24 | Asml Holding N.V. | Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation |
| JP4810154B2 (ja) * | 2005-07-28 | 2011-11-09 | 富士フイルム株式会社 | 微小電気機械素子の駆動方法、微小電気機械素子アレイ及び画像形成装置 |
| US7934172B2 (en) * | 2005-08-08 | 2011-04-26 | Micronic Laser Systems Ab | SLM lithography: printing to below K1=.30 without previous OPC processing |
| EP1956431A4 (en) * | 2005-11-15 | 2009-06-24 | Nikon Corp | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
| EP1994446A1 (en) * | 2006-02-24 | 2008-11-26 | Micronic Laser Systems Ab | Slm lithography: printing to below k1=.30 without previous opc processing |
| US7936445B2 (en) * | 2006-06-19 | 2011-05-03 | Asml Netherlands B.V. | Altering pattern data based on measured optical element characteristics |
| US20080002174A1 (en) * | 2006-06-30 | 2008-01-03 | Asml Netherlands B.V. | Control system for pattern generator in maskless lithography |
| NL2003364A (en) * | 2008-09-26 | 2010-03-29 | Asml Netherlands Bv | Lithographic apparatus and method. |
| US8539395B2 (en) | 2010-03-05 | 2013-09-17 | Micronic Laser Systems Ab | Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image |
| US8582195B2 (en) | 2011-11-29 | 2013-11-12 | General Electric Company | Systems and methods for relative positioning |
| CN104170054B (zh) * | 2012-01-18 | 2018-11-02 | 株式会社尼康 | 空间光调制器的驱动方法、曝光用图案的生成方法、以及曝光方法和装置 |
| JP6676942B2 (ja) * | 2015-12-01 | 2020-04-08 | 株式会社ニコン | 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム |
| JP6676941B2 (ja) * | 2015-12-01 | 2020-04-08 | 株式会社ニコン | 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム |
| JP2017207329A (ja) * | 2016-05-17 | 2017-11-24 | Juki株式会社 | 照明装置及び検査装置 |
| WO2018136197A1 (en) * | 2017-01-20 | 2018-07-26 | Applied Materials, Inc. | Resolution enhanced digital lithography with anti-blazed dmd |
| WO2019010410A1 (en) * | 2017-07-07 | 2019-01-10 | Massachusetts Institute Of Technology | SYSTEMS AND METHODS OF GENETIC IDENTIFICATION AND ANALYSIS |
| CN108227407B (zh) * | 2018-02-28 | 2020-08-21 | 南昌航空大学 | 一种基于相干图像反馈的数字光成型方法 |
| CN114924410B (zh) * | 2022-05-20 | 2023-06-30 | 西南科技大学 | 一种基于小相位调制以及相位补偿的聚焦方法以及装置 |
| US11899198B2 (en) | 2022-05-23 | 2024-02-13 | Applied Materials, Inc. | Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems |
| CN114779464A (zh) * | 2022-05-24 | 2022-07-22 | 北京有竹居网络技术有限公司 | 光学信号调制器、控制方法及投影设备 |
| CN118348752A (zh) * | 2024-06-17 | 2024-07-16 | 全芯智造技术有限公司 | Opc建模方法 |
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| US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
| US5416616A (en) * | 1990-04-06 | 1995-05-16 | University Of Southern California | Incoherent/coherent readout of double angularly multiplexed volume holographic optical elements |
| US5296891A (en) | 1990-05-02 | 1994-03-22 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Illumination device |
| US5083015A (en) * | 1990-11-16 | 1992-01-21 | United Technologies Corporation | Optical centroid processor wavefront sensor |
| US5229872A (en) | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
| US6219015B1 (en) | 1992-04-28 | 2001-04-17 | The Board Of Directors Of The Leland Stanford, Junior University | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
| JP3224041B2 (ja) | 1992-07-29 | 2001-10-29 | 株式会社ニコン | 露光方法及び装置 |
| US5402234A (en) * | 1992-08-31 | 1995-03-28 | Zygo Corporation | Method and apparatus for the rapid acquisition of data in coherence scanning interferometry |
| US5729331A (en) | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| JP3339149B2 (ja) | 1993-12-08 | 2002-10-28 | 株式会社ニコン | 走査型露光装置ならびに露光方法 |
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| US5530482A (en) | 1995-03-21 | 1996-06-25 | Texas Instruments Incorporated | Pixel data processing for spatial light modulator having staggered pixels |
| JP2001500628A (ja) | 1996-02-28 | 2001-01-16 | ケニス シー ジョンソン | マイクロリトグラフィ用マイクロレンズスキャナ及び広フィールド共焦顕微鏡 |
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| US6177980B1 (en) | 1997-02-20 | 2001-01-23 | Kenneth C. Johnson | High-throughput, maskless lithography system |
| SE509062C2 (sv) | 1997-02-28 | 1998-11-30 | Micronic Laser Systems Ab | Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster |
| US5982553A (en) | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
| SE9800665D0 (sv) | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
| US6219143B1 (en) * | 1999-06-16 | 2001-04-17 | Bandag, Incorporated | Method and apparatus for analyzing shearogram images by animation |
| KR100827874B1 (ko) | 2000-05-22 | 2008-05-07 | 가부시키가이샤 니콘 | 노광 장치, 노광 장치의 제조 방법, 노광 방법, 마이크로 장치의 제조 방법, 및 디바이스의 제조 방법 |
| US6804429B2 (en) * | 2001-02-09 | 2004-10-12 | The Board Of Trustees Of The Leland Stanford Junior University | Reconfigurable wavelength multiplexers and filters employing micromirror array in a gires-tournois interferometer |
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| EP1372036A1 (en) | 2002-06-12 | 2003-12-17 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US6870554B2 (en) | 2003-01-07 | 2005-03-22 | Anvik Corporation | Maskless lithography with multiplexed spatial light modulators |
| US6775049B1 (en) * | 2003-01-20 | 2004-08-10 | Texas Instruments Incorporated | Optical digital signal processing system and method |
| EP1482373A1 (en) | 2003-05-30 | 2004-12-01 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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| US7755657B2 (en) * | 2003-06-12 | 2010-07-13 | Micronic Laser Systems Ab | Method for high precision printing of patterns |
| US6847461B1 (en) * | 2004-01-29 | 2005-01-25 | Asml Holding N.V. | System and method for calibrating a spatial light modulator array using shearing interferometry |
| JP4083751B2 (ja) * | 2004-01-29 | 2008-04-30 | エーエスエムエル ホールディング エヌ．ブイ． | 空間光変調器アレイを較正するシステムおよび空間光変調器アレイを較正する方法 |
| US6963434B1 (en) * | 2004-04-30 | 2005-11-08 | Asml Holding N.V. | System and method for calculating aerial image of a spatial light modulator |
-
2004
- 2004-04-30 US US10/835,403 patent/US6963434B1/en not_active Expired - Lifetime
-
2005
- 2005-04-27 TW TW094113474A patent/TWI278730B/zh not_active IP Right Cessation
- 2005-04-29 CN CNB2005100684238A patent/CN100470372C/zh not_active Expired - Fee Related
- 2005-04-29 KR KR1020050035841A patent/KR100636039B1/ko not_active IP Right Cessation
- 2005-05-02 JP JP2005134694A patent/JP4237729B2/ja not_active Expired - Fee Related
- 2005-06-30 US US11/169,587 patent/US7394584B2/en not_active Expired - Fee Related
-
2008
- 2008-05-22 US US12/125,844 patent/US7889411B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20080219562A1 (en) | 2008-09-11 |
| CN100470372C (zh) | 2009-03-18 |
| KR20060047613A (ko) | 2006-05-18 |
| JP4237729B2 (ja) | 2009-03-11 |
| US7889411B2 (en) | 2011-02-15 |
| US6963434B1 (en) | 2005-11-08 |
| KR100636039B1 (ko) | 2006-10-19 |
| JP2005322924A (ja) | 2005-11-17 |
| CN1700097A (zh) | 2005-11-23 |
| US20050243398A1 (en) | 2005-11-03 |
| US20050243397A1 (en) | 2005-11-03 |
| US7394584B2 (en) | 2008-07-01 |
| TW200535587A (en) | 2005-11-01 |
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