TWI267127B - Illumination optical system and exposure apparatus - Google Patents

Illumination optical system and exposure apparatus Download PDF

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Publication number
TWI267127B
TWI267127B TW093102016A TW93102016A TWI267127B TW I267127 B TWI267127 B TW I267127B TW 093102016 A TW093102016 A TW 093102016A TW 93102016 A TW93102016 A TW 93102016A TW I267127 B TWI267127 B TW I267127B
Authority
TW
Taiwan
Prior art keywords
light
optical system
exposure apparatus
reflective mask
aperture
Prior art date
Application number
TW093102016A
Other languages
English (en)
Chinese (zh)
Other versions
TW200512805A (en
Inventor
Toshihiko Tsuji
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200512805A publication Critical patent/TW200512805A/zh
Application granted granted Critical
Publication of TWI267127B publication Critical patent/TWI267127B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093102016A 2003-09-17 2004-01-29 Illumination optical system and exposure apparatus TWI267127B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003324639A JP4241281B2 (ja) 2003-09-17 2003-09-17 露光装置

Publications (2)

Publication Number Publication Date
TW200512805A TW200512805A (en) 2005-04-01
TWI267127B true TWI267127B (en) 2006-11-21

Family

ID=34191311

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093102016A TWI267127B (en) 2003-09-17 2004-01-29 Illumination optical system and exposure apparatus

Country Status (5)

Country Link
US (2) US7110084B2 (https=)
EP (1) EP1517339A3 (https=)
JP (1) JP4241281B2 (https=)
KR (1) KR100687655B1 (https=)
TW (1) TWI267127B (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4241295B2 (ja) * 2003-09-26 2009-03-18 キヤノン株式会社 ステージ装置
JP4458330B2 (ja) * 2003-12-26 2010-04-28 キヤノン株式会社 光源ユニットの多層膜ミラーを交換する方法
JP2005317611A (ja) * 2004-04-27 2005-11-10 Canon Inc 露光方法及び装置
EP1875292A2 (en) * 2005-04-26 2008-01-09 Carl Zeiss SMT AG Illumination system for a microlithgraphic exposure apparatus
US8873021B2 (en) * 2005-06-14 2014-10-28 Koninklijke Philips N.V. Debris mitigation system with improved gas distribution
WO2007001624A2 (en) * 2005-06-28 2007-01-04 Microchips, Inc. Medical and dental implant devices for controlled drug delivery
KR100729263B1 (ko) * 2005-07-14 2007-06-15 삼성전자주식회사 기판 노광 장치
JP4986754B2 (ja) * 2007-07-27 2012-07-25 キヤノン株式会社 照明光学系及びそれを有する露光装置
JP2009176838A (ja) * 2008-01-22 2009-08-06 Canon Inc 液浸露光装置及びデバイス製造方法
DE102008001553B4 (de) * 2008-05-05 2015-04-30 Carl Zeiss Smt Gmbh Komponente zur Einstellung einer scanintegrierten Beleuchtungsenergie in einer Objektebene einer Mikrolithographie-Projektionsbelichtungsanlage
US8227778B2 (en) * 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
JP5534910B2 (ja) * 2009-04-23 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
US12401779B1 (en) * 2024-04-09 2025-08-26 DISTANCE TECHNOLOGIES Oy Calibrating optical combiner using structured light

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JP3371512B2 (ja) 1994-02-23 2003-01-27 株式会社ニコン 照明装置及び露光装置
US5677939A (en) 1994-02-23 1997-10-14 Nikon Corporation Illuminating apparatus
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US5737137A (en) * 1996-04-01 1998-04-07 The Regents Of The University Of California Critical illumination condenser for x-ray lithography
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JP2000089000A (ja) 1998-09-14 2000-03-31 Nikon Corp Ｘ線発生装置
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JP2003506881A (ja) 1999-07-30 2003-02-18 カール ツァイス シュティフトゥング トレイディング アズ カール ツァイス Ｅｕｖ照明光学系の射出瞳における照明分布の制御
JP2002023055A (ja) * 2000-07-10 2002-01-23 Nikon Corp 結像光学系および該結像光学系を備えた露光装置
JP2003015040A (ja) * 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
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JP3605053B2 (ja) 2001-07-27 2004-12-22 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
JP3605055B2 (ja) * 2001-07-31 2004-12-22 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
JP2003227914A (ja) * 2002-01-31 2003-08-15 Canon Inc Ｅｕｖ光用の波面分割素子及びそれを有する位相測定装置
JP2003233005A (ja) * 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP3720788B2 (ja) * 2002-04-15 2005-11-30 キヤノン株式会社 投影露光装置及びデバイス製造方法
US20040080815A1 (en) * 2002-07-12 2004-04-29 Peter Muys Lens with optimized heat transfer properties
JP2004138926A (ja) * 2002-10-21 2004-05-13 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

Also Published As

Publication number Publication date
TW200512805A (en) 2005-04-01
US7110084B2 (en) 2006-09-19
EP1517339A3 (en) 2009-06-10
JP2005093693A (ja) 2005-04-07
KR100687655B1 (ko) 2007-02-28
US7064806B2 (en) 2006-06-20
US20050057737A1 (en) 2005-03-17
EP1517339A2 (en) 2005-03-23
JP4241281B2 (ja) 2009-03-18
KR20050028848A (ko) 2005-03-23
US20050057738A1 (en) 2005-03-17

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