TWI260686B - Coating film forming apparatus - Google Patents

Coating film forming apparatus Download PDF

Info

Publication number
TWI260686B
TWI260686B TW094110774A TW94110774A TWI260686B TW I260686 B TWI260686 B TW I260686B TW 094110774 A TW094110774 A TW 094110774A TW 94110774 A TW94110774 A TW 94110774A TW I260686 B TWI260686 B TW I260686B
Authority
TW
Taiwan
Prior art keywords
coating
substrate
processing liquid
nozzle
roller
Prior art date
Application number
TW094110774A
Other languages
English (en)
Chinese (zh)
Other versions
TW200537585A (en
Inventor
Takeo Kaeriyama
Yoshiharu Ota
Kiyohisa Tateyama
Mitsuhiro Sakai
Kimio Motoda
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200537585A publication Critical patent/TW200537585A/zh
Application granted granted Critical
Publication of TWI260686B publication Critical patent/TWI260686B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094110774A 2004-04-07 2005-04-04 Coating film forming apparatus TWI260686B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004113023 2004-04-07
JP2004273645A JP4386430B2 (ja) 2004-04-07 2004-09-21 塗布膜形成装置

Publications (2)

Publication Number Publication Date
TW200537585A TW200537585A (en) 2005-11-16
TWI260686B true TWI260686B (en) 2006-08-21

Family

ID=35469892

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094110774A TWI260686B (en) 2004-04-07 2005-04-04 Coating film forming apparatus

Country Status (3)

Country Link
JP (1) JP4386430B2 (https=)
KR (1) KR101069494B1 (https=)
TW (1) TWI260686B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100803147B1 (ko) * 2007-04-04 2008-02-14 세메스 주식회사 도포장치 및 이를 이용한 처리액의 도포 방법
KR100840528B1 (ko) 2007-04-13 2008-06-23 주식회사 케이씨텍 슬릿 코터용 예비토출장치
KR200456618Y1 (ko) * 2007-05-07 2011-11-09 주식회사 케이씨텍 슬릿 코터용 예비토출장치
KR100969347B1 (ko) 2009-09-07 2010-07-09 한국기계연구원 멀티 코터 및 이를 이용한 코팅 방법과 롤 프린팅 방법
KR20140024953A (ko) * 2011-07-27 2014-03-03 스미도모쥬기가이고교 가부시키가이샤 기판제조장치 및 기판제조방법
JP5912403B2 (ja) * 2011-10-21 2016-04-27 東京エレクトロン株式会社 塗布処理装置
KR101744512B1 (ko) * 2016-02-04 2017-06-20 황중국 양면 코팅장치
CN117184835A (zh) * 2022-05-31 2023-12-08 上海德沪涂膜设备有限公司 涂布设备

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11169769A (ja) * 1997-12-08 1999-06-29 Toray Ind Inc 塗布装置及び塗布方法並びにカラーフィルタの製造装置及び製造方法
JP2001070858A (ja) * 1999-07-07 2001-03-21 Canon Inc 塗料の塗工装置および塗工方法

Also Published As

Publication number Publication date
KR20060045531A (ko) 2006-05-17
KR101069494B1 (ko) 2011-09-30
JP4386430B2 (ja) 2009-12-16
TW200537585A (en) 2005-11-16
JP2005322873A (ja) 2005-11-17

Similar Documents

Publication Publication Date Title
TWI294639B (en) Stage equipment and coating processing equipment
US8888920B2 (en) Imprint system, imprint method, and non-transitory computer storage medium
JP4407970B2 (ja) 基板処理装置及び基板処理方法
JP2009297718A (ja) 塗布装置
US20120086142A1 (en) Imprint system, imprint method, and non-transitory computer storage medium
TWI388031B (zh) 處理系統
JP4071183B2 (ja) 塗布方法及び塗布装置
TW200842940A (en) Substrate processing apparatus
TW200415702A (en) Method and apparatus for coating with resist
TWI260686B (en) Coating film forming apparatus
KR20050017588A (ko) 도포노즐 및 도포장치
TWI281704B (en) Substrate processing system
JP2002334918A (ja) 処理装置
JP4447757B2 (ja) 塗布装置
JP4451385B2 (ja) 塗布処理装置及び塗布処理方法
JP3930278B2 (ja) 液処理装置および液処理方法
TWI293582B (en) Coating film forming apparatus and coating film forming method
JP4353530B2 (ja) 基板処理方法及び基板処理装置
JP4263559B2 (ja) 現像処理装置及び現像処理方法
JP4539938B2 (ja) 塗布装置
JP2002324740A (ja) 処理装置
KR20070105887A (ko) 마스크 패턴의 형성 방법 및 ｔｆｔ의 제조 방법
JP2005270932A (ja) 塗布膜形成装置
JP4643630B2 (ja) 処理装置
JP4619562B2 (ja) 処理装置

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees