TWI226938B - Objective - Google Patents
Objective Download PDFInfo
- Publication number
- TWI226938B TWI226938B TW091113615A TW91113615A TWI226938B TW I226938 B TWI226938 B TW I226938B TW 091113615 A TW091113615 A TW 091113615A TW 91113615 A TW91113615 A TW 91113615A TW I226938 B TWI226938 B TW I226938B
- Authority
- TW
- Taiwan
- Prior art keywords
- objective lens
- lens
- scope
- objective
- grating
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 claims description 21
- 230000000694 effects Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 230000004075 alteration Effects 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 3
- 230000008030 elimination Effects 0.000 claims description 2
- 238000003379 elimination reaction Methods 0.000 claims description 2
- 230000001939 inductive effect Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 6
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 5
- 239000010436 fluorite Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 3
- 238000005457 optimization Methods 0.000 description 3
- 230000008092 positive effect Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241001330002 Bambuseae Species 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 239000002969 artificial stone Substances 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10130212A DE10130212A1 (de) | 2001-06-22 | 2001-06-22 | Objektiv |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI226938B true TWI226938B (en) | 2005-01-21 |
Family
ID=7689120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091113615A TWI226938B (en) | 2001-06-22 | 2002-06-21 | Objective |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20040174607A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1397716A2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4252447B2 (cg-RX-API-DMAC7.html) |
| DE (1) | DE10130212A1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI226938B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2003001272A2 (cg-RX-API-DMAC7.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8317345B2 (en) | 2004-12-23 | 2012-11-27 | Carl Zeiss Smt Gmbh | Catoptric objectives and systems using catoptric objectives |
| US8411251B2 (en) | 2006-12-28 | 2013-04-02 | Carl Zeiss Smt Gmbh | Optical element and illumination optics for microlithography |
| US8705005B2 (en) | 2006-02-17 | 2014-04-22 | Carl Zeiss Smt Gmbh | Microlithographic illumination system |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10318560A1 (de) * | 2003-04-24 | 2004-11-11 | Carl Zeiss Sms Gmbh | Anordnung zur Inspektion von Objekten, insbesondere von Masken in der Mikrolithographie |
| DE10319269A1 (de) | 2003-04-25 | 2004-11-25 | Carl Zeiss Sms Gmbh | Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop |
| DE102004009212B4 (de) * | 2004-02-25 | 2015-08-20 | Carl Zeiss Meditec Ag | Kontaktelement für Laserbearbeitung und Laserbearbeitungsvorrichtung |
| DE102005062237A1 (de) * | 2005-12-22 | 2007-07-05 | Carl Zeiss Jena Gmbh | Verfahren und Vorrichtung zur Untersuchung des Abbildungsverhaltens einer Abbildungsoptik |
| DE102007043896A1 (de) | 2007-09-14 | 2009-04-02 | Carl Zeiss Smt Ag | Mikrooptik zur Messung der Position eines Luftbildes |
| JP5614448B2 (ja) * | 2010-06-16 | 2014-10-29 | 株式会社ニコン | 顕微鏡対物レンズ |
| EP2610662B1 (en) * | 2010-08-25 | 2018-04-04 | Nikon Corporation | Microscope optical assembly and microscope system |
| DE102019124919B4 (de) | 2019-09-17 | 2021-08-26 | Ri Research Instruments Gmbh | Mikroskopisches System zur Prüfung von Strukturen und Defekten auf EUV-Lithographie-Photomasken |
| US20220404262A1 (en) * | 2019-11-06 | 2022-12-22 | Sony Group Corporation | Optical measurement device and lens structure |
| WO2022153736A1 (ja) * | 2021-01-14 | 2022-07-21 | ソニーグループ株式会社 | 粒子分析装置、粒子分析方法及び光学測定装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4032259A1 (de) * | 1990-10-11 | 1992-04-16 | Jenoptik Jena Gmbh | Mikroskopobjektiv |
| JPH04361201A (ja) * | 1991-06-10 | 1992-12-14 | Olympus Optical Co Ltd | フレネルゾーンプレートを用いた光学系 |
| US5349471A (en) * | 1993-02-16 | 1994-09-20 | The University Of Rochester | Hybrid refractive/diffractive achromatic lens for optical data storage systems |
| JPH08286113A (ja) * | 1995-04-17 | 1996-11-01 | Olympus Optical Co Ltd | 対物レンズ |
| JPH09197283A (ja) * | 1996-01-12 | 1997-07-31 | Olympus Optical Co Ltd | 対物レンズ |
| US5995286A (en) * | 1997-03-07 | 1999-11-30 | Minolta Co., Ltd. | Diffractive optical element, an optical system having a diffractive optical element, and a method for manufacturing a diffractive optical element |
| JP3746894B2 (ja) * | 1998-02-05 | 2006-02-15 | ペンタックス株式会社 | 色消しレンズ系 |
| JP4097781B2 (ja) * | 1998-05-13 | 2008-06-11 | オリンパス株式会社 | 対物レンズ |
| JP3950571B2 (ja) * | 1999-03-10 | 2007-08-01 | キヤノン株式会社 | 撮影光学系 |
| JP2001100017A (ja) * | 1999-09-29 | 2001-04-13 | Canon Inc | 光学素子 |
-
2001
- 2001-06-22 DE DE10130212A patent/DE10130212A1/de not_active Withdrawn
-
2002
- 2002-06-19 EP EP02760189A patent/EP1397716A2/de not_active Ceased
- 2002-06-19 US US10/481,208 patent/US20040174607A1/en not_active Abandoned
- 2002-06-19 JP JP2003507611A patent/JP4252447B2/ja not_active Expired - Fee Related
- 2002-06-19 WO PCT/EP2002/006798 patent/WO2003001272A2/de not_active Ceased
- 2002-06-21 TW TW091113615A patent/TWI226938B/zh not_active IP Right Cessation
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8317345B2 (en) | 2004-12-23 | 2012-11-27 | Carl Zeiss Smt Gmbh | Catoptric objectives and systems using catoptric objectives |
| US8632195B2 (en) | 2004-12-23 | 2014-01-21 | Carl Zeiss Smt Gmbh | Catoptric objectives and systems using catoptric objectives |
| US8705005B2 (en) | 2006-02-17 | 2014-04-22 | Carl Zeiss Smt Gmbh | Microlithographic illumination system |
| US8411251B2 (en) | 2006-12-28 | 2013-04-02 | Carl Zeiss Smt Gmbh | Optical element and illumination optics for microlithography |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003001272A3 (de) | 2003-11-20 |
| US20040174607A1 (en) | 2004-09-09 |
| EP1397716A2 (de) | 2004-03-17 |
| DE10130212A1 (de) | 2003-01-02 |
| WO2003001272A2 (de) | 2003-01-03 |
| JP4252447B2 (ja) | 2009-04-08 |
| JP2004530937A (ja) | 2004-10-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |